JP6462532B2 - Semiconductor element storage package and semiconductor device - Google Patents

Semiconductor element storage package and semiconductor device

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JP6462532B2
JP6462532B2 JP2015166882A JP2015166882A JP6462532B2 JP 6462532 B2 JP6462532 B2 JP 6462532B2 JP 2015166882 A JP2015166882 A JP 2015166882A JP 2015166882 A JP2015166882 A JP 2015166882A JP 6462532 B2 JP6462532 B2 JP 6462532B2
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wall body
main surface
semiconductor element
wall
package
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稔弘 浅野
稔弘 浅野
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Kyocera Corp
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Description

本発明は、半導体素子を収納する半導体素子収納用パッケージおよびこれを備えた半導体装置に関する。   The present invention relates to a semiconductor element housing package for housing a semiconductor element and a semiconductor device including the same.

発光素子、受光素子などの光半導体素子や信号処理用演算素子などの半導体素子は、半導体素子を保護するとともに、半導体素子と外部の配線とを接続するために半導体素子収納用パッケージに収納される。   Optical semiconductor elements such as light emitting elements and light receiving elements and semiconductor elements such as signal processing arithmetic elements are housed in a semiconductor element housing package for protecting the semiconductor elements and connecting the semiconductor elements and external wiring. .

半導体素子収納用パッケージとしては、たとえば、複数の矩形板状の壁体が互いに嵌合されて枠状を成す周壁体によって構成されたものがある(特許文献1参照)。   As a package for housing a semiconductor element, for example, there is a package constituted by a peripheral wall body in which a plurality of rectangular plate-shaped wall bodies are fitted to each other to form a frame shape (see Patent Document 1).

国際公開第2014/069432号International Publication No. 2014/069432

上記の従来技術の半導体素子収納用パッケージでは、壁体に反りや変形が生じる場合があり、このような場合には、複数の壁体を互いに嵌合させ、その嵌合部をろう材などの接合材によって接合して周壁体を形成する際に、各壁体に位置ずれが生じるおそれがある。   In the above-described conventional package for storing semiconductor elements, the wall body may be warped or deformed. In such a case, a plurality of wall bodies are fitted to each other, and the fitting portion is made of brazing material or the like. When the peripheral wall body is formed by bonding with a bonding material, there is a possibility that a positional shift occurs in each wall body.

本発明の目的は、複数の矩形板状の壁体が互いに嵌合されて枠状を成す周壁体を備えた半導体素子収納用パッケージであって、周壁体において各壁体に位置ずれが生じることが抑制された半導体素子収納用パッケージ、およびこれを備えた半導体装置を提供することである。   SUMMARY OF THE INVENTION An object of the present invention is a package for housing a semiconductor element having a peripheral wall body in which a plurality of rectangular plate-like wall bodies are fitted together to form a frame shape, and each wall body is displaced in the peripheral wall body. It is an object of the present invention to provide a package for housing a semiconductor element in which the above is suppressed, and a semiconductor device including the same.

本発明の一態様の半導体素子収納用パッケージは、半導体素子が載置される載置領域を含む主面を有する板状の基体と、前記載置領域を囲むように前記基体の前記主面に設けられて枠状を成す周壁体とを含み、前記周壁体は、前記主面に垂直に立設された矩形板状の第1壁体であって、前記主面に平行な方向の一方端部に第1凸部が設けられ、かつ他方端部に第2凸部が設けられるとともに、厚み方向に貫通した貫通開口が設けられた第1壁体と、前記主面に垂直に立設された、前記第1壁体に対向する矩形板状の第2壁体であって、前記主面に平行な方向の一方端部に第3凸部が設けられ、かつ他方端部に第4凸部が設けられた第2壁体と、前記主面に垂直に立設された、前記第1壁体および前記第2壁体に隣接する矩形板状の第3壁体であって、前記主面に平行な方向の一方端部に前記第1凸部と嵌合する第1凹部が設けられ、かつ他方端部に前記第3凸部と嵌合する第2凹部が設けられた、前記第1壁体および前記第2壁体よりも高さが高い第3壁体と、前記主面に垂直に立設された、前記第1壁体および前記第2壁体に隣接する矩形板状の第4壁体であって、前記主面に平行な方向の一方端部に前記第2凸部と嵌合する第3凹部が設けられ、かつ他方端部に前記第4凸部と嵌合する第4凹部が設けられた、前記第1壁体および前記第2壁体よりも高さが高い第4壁体と、から成ることを特徴とするものである。   A package for housing a semiconductor element of one embodiment of the present invention includes a plate-like base body having a main surface including a placement region on which a semiconductor element is placed, and the main surface of the base body so as to surround the placement region. A peripheral wall body having a frame shape, and the peripheral wall body is a rectangular plate-shaped first wall body erected perpendicularly to the main surface, and one end in a direction parallel to the main surface The first wall is provided with a first protrusion, the other end is provided with a second protrusion, and a through-opening penetrating in the thickness direction is provided. In addition, the second wall body is a rectangular plate-shaped second wall facing the first wall body, the third protrusion is provided at one end in a direction parallel to the main surface, and the fourth protrusion is provided at the other end. A second wall body provided with a portion and a rectangular plate-shaped third wall body that is erected vertically to the main surface and is adjacent to the first wall body and the second wall body Thus, a first concave portion that fits with the first convex portion is provided at one end portion in a direction parallel to the main surface, and a second concave portion that fits with the third convex portion is provided at the other end portion. A third wall having a height higher than that of the first wall and the second wall, and adjacent to the first wall and the second wall, which are erected vertically to the main surface. A rectangular plate-like fourth wall body, wherein a third concave portion that fits the second convex portion is provided at one end portion in a direction parallel to the main surface, and the fourth convex portion is provided at the other end portion. And a fourth wall body having a height higher than that of the first wall body and the second wall body.

また本発明の一態様の半導体装置は、前記半導体素子収納用パッケージと、前記基体における前記主面の載置領域に載置された半導体素子と、を含むことを特徴とするものである。   According to another aspect of the present invention, there is provided a semiconductor device including the semiconductor element storage package and a semiconductor element mounted on a mounting region of the main surface of the base body.

本発明の一態様の半導体素子収納用パッケージによれば、半導体素子が載置される載置領域を囲むように基体の主面に設けられて枠状を成す周壁体は、第1凸部、第2凸部および貫通開口が設けられた第1壁体と、該第1壁体に対向する、第3凸部および第4凸部が設けられた第2壁体と、第1壁体および第2壁体に隣接する第3壁体と第4壁体とから成る。第3壁体および第4壁体は、第1壁体および第2壁体よりも高さが高い。第3壁体は、基体の主面に平行な方向の一方端部に第1凸部と嵌合する第1凹部が設けられ、他方端部に第3凸部と嵌合する第2凹部が設けられる。第4壁体は、基体の主面に平行な方向の一方端部に第2凸部と嵌合する第3凹部が設けられ、他方端部に第4凸部と嵌合する第4凹部が設けられる。   According to the package for housing a semiconductor element of one aspect of the present invention, the peripheral wall body that is provided on the main surface of the base so as to surround the mounting region on which the semiconductor element is mounted and has a frame shape includes the first convex portion, A first wall provided with a second convex part and a through-opening; a second wall provided with a third convex part and a fourth convex part opposite to the first wall; a first wall; It consists of a 3rd wall body and a 4th wall body adjacent to a 2nd wall body. The third wall body and the fourth wall body are higher in height than the first wall body and the second wall body. The third wall body is provided with a first concave portion fitted to the first convex portion at one end portion in a direction parallel to the main surface of the base body, and a second concave portion fitted to the third convex portion at the other end portion. Provided. The fourth wall body is provided with a third concave portion that fits with the second convex portion at one end portion in a direction parallel to the main surface of the base, and the fourth concave portion that fits with the fourth convex portion at the other end portion. Provided.

上記のように構成される半導体素子収納用パッケージの周壁体において、貫通開口が設けられた第1壁体と該第1壁体に対向する第2壁体とに、第3壁体および第4壁体が嵌合され、その第3壁体および第4壁体は、第1壁体および第2壁体よりも高さが高いので、第1壁体の上端と第3壁体および第4壁体の上端との間に段差が形成されるとともに、第2壁体の上端と第3壁体および第4壁体の上端との間にも段差が形成されることになる。第1壁体と第3壁体および第4壁体との間の嵌合構造、第2壁体と第3壁体および第4壁体との間の嵌合構造において、ろう材などの接合材によって接合して周壁体を形成する際に、前記段差に接合材の液溜まりを形成させることができるので、各壁体が強固に接合された周壁体とすることができ、周壁体において各壁体に位置ずれが生じることが抑制される。   In the peripheral wall body of the semiconductor element storage package configured as described above, the third wall body and the fourth wall body are provided on the first wall body provided with the through opening and the second wall body facing the first wall body. Since the wall body is fitted, and the third wall body and the fourth wall body are higher than the first wall body and the second wall body, the upper end of the first wall body and the third wall body and the fourth wall body are the same. A step is formed between the upper end of the wall body and a step is also formed between the upper end of the second wall body and the upper ends of the third wall body and the fourth wall body. In the fitting structure between the first wall body, the third wall body, and the fourth wall body, and in the fitting structure between the second wall body, the third wall body, and the fourth wall body, joining of a brazing material or the like When forming a peripheral wall body by bonding with a material, a liquid pool of the bonding material can be formed at the step, so that each wall body can be a firmly bonded peripheral wall body. It is suppressed that position shift arises in a wall.

本発明の一態様の半導体装置によれば、各壁体に位置ずれが生じることが抑制された周壁体を備えた半導体素子収納用パッケージと、該半導体素子収納用パッケージに収納された半導体素子とによって実現される。   According to the semiconductor device of one embodiment of the present invention, a semiconductor element storage package including a peripheral wall body in which displacement of each wall body is suppressed, and a semiconductor element stored in the semiconductor element storage package; It is realized by.

本発明の一実施形態である半導体素子収納用パッケージ2を備えた半導体装置1の構成を示す分解斜視図である。It is a disassembled perspective view which shows the structure of the semiconductor device 1 provided with the package 2 for semiconductor element accommodation which is one Embodiment of this invention. 半導体装置1において、半導体素子3が半導体素子収納用パッケージ2に収納された状態を示す分解斜視図である。FIG. 3 is an exploded perspective view showing a state in which a semiconductor element 3 is housed in a semiconductor element housing package 2 in the semiconductor device 1. 半導体素子収納用パッケージ2の構成を示す斜視図である。2 is a perspective view showing a configuration of a semiconductor element storage package 2. FIG. 半導体素子収納用パッケージ2の構成を示す分解斜視図である。2 is an exploded perspective view showing a configuration of a semiconductor element storage package 2. FIG. 半導体素子収納用パッケージ2を、基体21の主面21aに垂直な上方側から見た平面図である。3 is a plan view of the semiconductor element storage package 2 as viewed from the upper side perpendicular to the main surface 21a of the base 21. FIG. 半導体素子収納用パッケージ2を、第2壁体222に垂直な背面側から見た背面図である。FIG. 5 is a rear view of the semiconductor element storage package 2 as viewed from the back side perpendicular to the second wall body 222. 半導体素子収納用パッケージ2を、第1壁体221に垂直な正面側から見た正面図である。FIG. 3 is a front view of the semiconductor element storage package 2 as viewed from the front side perpendicular to the first wall body 221. 半導体素子収納用パッケージ2を、第4壁体224に垂直な側方側から見た側面図である。FIG. 5 is a side view of the semiconductor element storage package 2 as viewed from the side perpendicular to the fourth wall body 224. 図5に示す半導体素子収納用パッケージ2を切断面線A−Aで切断した断面図である。It is sectional drawing which cut | disconnected the semiconductor element storage package 2 shown in FIG. 5 by cut surface line AA. 半導体素子収納用パッケージ2の第1壁体221の近傍を拡大して示す斜視図である。4 is an enlarged perspective view showing the vicinity of a first wall 221 of a package 2 for housing a semiconductor element. FIG.

以下、本発明を添付の図面を参照して詳細に説明する。図1は本発明の一実施形態である半導体素子収納用パッケージ2を備えた半導体装置1の構成を示す分解斜視図であり、
図2は半導体装置1において、半導体素子3が半導体素子収納用パッケージ2に収納された状態を示す分解斜視図である。図3は半導体素子収納用パッケージ2の構成を示す斜視図であり、図4は半導体素子収納用パッケージ2の構成を示す分解斜視図である。また、図5は半導体素子収納用パッケージ2を基体21の主面21aに垂直な上方側から見た平面図であり、図6は半導体素子収納用パッケージ2を第2壁体222に垂直な背面側から見た背面図であり、図7は半導体素子収納用パッケージ2を第1壁体221に垂直な正面側から見た正面図であり、図8は半導体素子収納用パッケージ2を、第4壁体224に垂直な側方側から見た側面図である。また、図9は図5に示す半導体素子収納用パッケージ2を切断面線A−Aで切断した断面図であり、図10は半導体素子収納用パッケージ2の第1壁体221の近傍を拡大して示す斜視図である。
Hereinafter, the present invention will be described in detail with reference to the accompanying drawings. FIG. 1 is an exploded perspective view showing a configuration of a semiconductor device 1 having a package 2 for housing a semiconductor element according to an embodiment of the present invention.
FIG. 2 is an exploded perspective view showing a state in which the semiconductor element 3 is housed in the semiconductor element housing package 2 in the semiconductor device 1. FIG. 3 is a perspective view showing the configuration of the semiconductor element storage package 2, and FIG. 4 is an exploded perspective view showing the configuration of the semiconductor element storage package 2. 5 is a plan view of the semiconductor element storage package 2 as viewed from the upper side perpendicular to the main surface 21a of the base 21. FIG. 6 is a back view of the semiconductor element storage package 2 perpendicular to the second wall 222. 7 is a rear view as seen from the side, FIG. 7 is a front view of the semiconductor element accommodation package 2 as seen from the front side perpendicular to the first wall body 221, and FIG. It is the side view seen from the side perpendicular | vertical to the wall body 224. 9 is a cross-sectional view of the semiconductor element storage package 2 shown in FIG. 5 taken along the cutting plane line AA. FIG. 10 is an enlarged view of the vicinity of the first wall 221 of the semiconductor element storage package 2. FIG.

半導体装置1は、半導体素子収納用パッケージ2と、該半導体素子収納用パッケージ2に収納される半導体素子3と、蓋体5とを含んで構成される。半導体素子収納用パッケージ2は、半導体素子3を収納するためのパッケージであり、図3〜図10に示すように、基体21と、周壁体22と、端子部材23と、シールリング24とを含んで構成される。   The semiconductor device 1 includes a semiconductor element storage package 2, a semiconductor element 3 stored in the semiconductor element storage package 2, and a lid 5. The semiconductor element housing package 2 is a package for housing the semiconductor element 3 and includes a base body 21, a peripheral wall body 22, a terminal member 23, and a seal ring 24 as shown in FIGS. Consists of.

基体21は、板状に形成されており、半導体素子3が素子載置用基台4を介して載置される載置領域Rを含む主面21aを有する。基体21は、たとえば、銅、鉄、タングステン、モリブデン、ニッケルまたはコバルトなどの金属材料、もしくはこれらの金属材料を含有する合金材料、またはこれらの複合材料から成る。基体21の熱伝導率は、たとえば、7W/(m・K)〜398W/(m・K)に設定される。基体21のヤング率は、たとえば、110GPa〜345GPaに設定される。基体21の熱膨張係数は、たとえば、4×10−6/℃〜22×10−6/℃に設定される。 The base 21 is formed in a plate shape, and has a main surface 21 a including a mounting region R on which the semiconductor element 3 is mounted via the element mounting base 4. The base 21 is made of, for example, a metal material such as copper, iron, tungsten, molybdenum, nickel, or cobalt, an alloy material containing these metal materials, or a composite material thereof. The thermal conductivity of the base body 21 is set to, for example, 7 W / (m · K) to 398 W / (m · K). The Young's modulus of the base body 21 is set to 110 GPa to 345 GPa, for example. The thermal expansion coefficient of the base 21 is set to 4 × 10 −6 / ° C. to 22 × 10 −6 / ° C., for example.

本実施形態では、基体21は矩形板状に形成されており、基体21の大きさは、たとえば、長辺の長さが10mm〜50mmに設定され、短辺の長さが5mm〜20mmに設定され、厚みが0.2mm〜5mmに設定される。   In the present embodiment, the base body 21 is formed in a rectangular plate shape, and the size of the base body 21 is set such that, for example, the long side length is set to 10 mm to 50 mm, and the short side length is set to 5 mm to 20 mm. And the thickness is set to 0.2 mm to 5 mm.

また、基体21は、溶融した金属材料、合金材料または複合材料を型枠に鋳込んで固化させたインゴットを、従来周知の圧延加工または打ち抜き加工などの金属加工によって作製することができる。   In addition, the base 21 can be manufactured by ingot obtained by casting and solidifying a molten metal material, alloy material or composite material into a mold by metal processing such as conventionally known rolling or punching.

また、基体21の酸化腐食を抑制するために、電気めっき法または無電解めっき法によって、基体21の外表面に、ニッケルまたは金などの金属層を形成しておいてもよい。   Further, in order to suppress oxidative corrosion of the substrate 21, a metal layer such as nickel or gold may be formed on the outer surface of the substrate 21 by electroplating or electroless plating.

周壁体22は、半導体素子3が素子載置用基台4を介して載置される載置領域Rを囲むように、矩形板状の基体21の外周縁に沿って基体21の主面21aに設けられて枠状を成す、上端が開口した部材である。周壁体22は、ろう材などの接合材を介して基体21の主面21aに接合される。なお、ろう材は、たとえば、銀、銅、金、亜鉛、アルミニウムまたはマグネシウムなどから成り、ニッケル、カドミウムまたはリンなどの添加物を含有させたものであってもよい。   The peripheral wall body 22 has a main surface 21a of the base body 21 along the outer peripheral edge of the rectangular plate-shaped base body 21 so as to surround the mounting region R on which the semiconductor element 3 is mounted via the element mounting base 4. It is a member having a frame shape and having an open upper end. The peripheral wall body 22 is joined to the main surface 21a of the base body 21 via a joining material such as a brazing material. The brazing material is made of, for example, silver, copper, gold, zinc, aluminum, or magnesium, and may contain an additive such as nickel, cadmium, or phosphorus.

周壁体22は、たとえば、銅、鉄、タングステン、モリブデン、ニッケルまたはコバルトなどの金属材料、もしくはこれらの金属材料を含有する合金材料、またはこれらの複合材料から成る。周壁体22の熱伝導率は、たとえば、7W/(m・K)〜398W/(m・K)に設定される。周壁体22のヤング率は、たとえば、110GPa〜345GPaに設定される。周壁体22の熱膨張係数は、たとえば、4×10−6/℃〜22×10−6/℃に設定される。 The peripheral wall body 22 is made of, for example, a metal material such as copper, iron, tungsten, molybdenum, nickel, or cobalt, an alloy material containing these metal materials, or a composite material thereof. The thermal conductivity of the peripheral wall body 22 is set to 7 W / (m · K) to 398 W / (m · K), for example. The Young's modulus of the peripheral wall body 22 is set to 110 GPa to 345 GPa, for example. The thermal expansion coefficient of the peripheral wall body 22 is set to 4 × 10 −6 / ° C. to 22 × 10 −6 / ° C., for example.

周壁体22は、基体21の主面21aに垂直な上方側から見たときの形状が矩形環状で
あり、その外形の大きさは、たとえば、長辺の長さが10mm〜50mmに設定され、短辺の長さが5mm〜20mmに設定される。また、基体21の主面21aに垂直な上方側から見たときの、周壁体22の内周縁から外周縁までの長さ(厚み)は、たとえば、0.5mm〜3mmに設定される。さらに、周壁体22の上端から下端までの長さ(高さ)は、たとえば、5mm〜20mmに設定される。
The shape of the peripheral wall body 22 when viewed from the upper side perpendicular to the main surface 21a of the base body 21 is a rectangular ring, and the size of the outer shape is set, for example, to a length of 10 mm to 50 mm on the long side, The length of the short side is set to 5 mm to 20 mm. The length (thickness) from the inner peripheral edge to the outer peripheral edge of the peripheral wall body 22 when viewed from the upper side perpendicular to the main surface 21a of the base body 21 is set to 0.5 mm to 3 mm, for example. Furthermore, the length (height) from the upper end to the lower end of the peripheral wall body 22 is set to, for example, 5 mm to 20 mm.

周壁体22は、矩形板状の基体21の一方の短辺に沿って主面21aに垂直に立設された矩形板状の第1壁体221と、基体21の他方の短辺に沿って主面21aに垂直に立設された、第1壁体221に対向する矩形板状の第2壁体222と、基体21の一方の長辺に沿って主面21aに垂直に立設された、第1壁体221および第2壁体222に隣接する矩形板状の第3壁体223と、基体21の他方の長辺に沿って主面21aに垂直に立設された、第1壁体221および第2壁体222に隣接する矩形板状の第4壁体224と、から成る。   The peripheral wall body 22 includes a rectangular plate-shaped first wall body 221 erected perpendicularly to the main surface 21 a along one short side of the rectangular plate-shaped base body 21, and the other short side of the base body 21. A rectangular plate-like second wall body 222 that is erected perpendicularly to the main surface 21a and that opposes the first wall body 221, and is erected perpendicularly to the main surface 21 a along one long side of the base 21. A rectangular plate-shaped third wall body 223 adjacent to the first wall body 221 and the second wall body 222, and a first wall erected perpendicularly to the main surface 21a along the other long side of the base body 21 A rectangular plate-like fourth wall body 224 adjacent to the body 221 and the second wall body 222.

第1壁体221は、対向する短辺が基体21の主面21aに垂直となるように、主面21aに立設されており、主面21aに平行な方向の一方端部221aの下端部に第1凸部221cが設けられ、かつ他方端部221bの下端部に第2凸部221dが設けられるとともに、厚み方向に貫通した貫通開口221eが設けられている。なお、第1壁体221において、第1凸部221cおよび第2凸部221dは、第1壁体221に垂直な方向から見たときに、主面21aに垂直な方向に関して、後述の端子部材23よりも下方側に位置している。   The first wall body 221 is erected on the main surface 21a such that the opposing short sides are perpendicular to the main surface 21a of the base body 21, and the lower end portion of the one end 221a in the direction parallel to the main surface 21a. Are provided with a first protrusion 221c, a second protrusion 221d at the lower end of the other end 221b, and a through-opening 221e penetrating in the thickness direction. In the first wall body 221, the first protrusions 221c and the second protrusions 221d are terminal members to be described later in the direction perpendicular to the main surface 21a when viewed from the direction perpendicular to the first wall body 221. It is located below 23.

本実施形態では、第1壁体221の第1凸部221cおよび第2凸部221dは、それぞれ、貫通開口221eから離反する方向に突出して形成される。第1壁体221において、第1凸部221cと第2凸部221dとは同じ形状であり、第1壁体221に垂直な方向から見たときの形状が、矩形状である。第1壁体221に垂直な方向から見たときの、第1凸部221cの一方端部221aに沿った長さ、および、第2凸部221dの他方端部221bに沿った長さは、たとえば、0.5mm〜5mmに設定され、第1凸部221cおよび第2凸部221dの突出長さは、たとえば、0.5mm〜3mmに設定される。   In this embodiment, the 1st convex part 221c and the 2nd convex part 221d of the 1st wall body 221 are each projected and formed in the direction away from the through opening 221e. In the first wall 221, the first protrusion 221 c and the second protrusion 221 d have the same shape, and the shape when viewed from the direction perpendicular to the first wall 221 is a rectangular shape. The length along one end 221a of the first convex portion 221c and the length along the other end 221b of the second convex portion 221d when viewed from the direction perpendicular to the first wall 221 are: For example, it is set to 0.5 mm to 5 mm, and the protruding lengths of the first convex portion 221c and the second convex portion 221d are set to 0.5 mm to 3 mm, for example.

また、本実施形態では、第1壁体221の貫通開口221eは円形状であり、その直径は、たとえば、1mm〜10mmに設定される。   Moreover, in this embodiment, the through-opening 221e of the 1st wall body 221 is circular shape, The diameter is set to 1 mm-10 mm, for example.

また、第1壁体221において、貫通開口221eは、第1壁体221に垂直な方向から見たときに、主面21aに垂直な方向に関して、第1凸部221cおよび第2凸部221dよりも上方側に位置し、主面21aに平行な方向に関して、中央に位置している。   Further, in the first wall body 221, the through-opening 221e is seen from the first convex portion 221c and the second convex portion 221d in the direction perpendicular to the main surface 21a when viewed from the direction perpendicular to the first wall body 221. Is also located on the upper side and is located in the center in the direction parallel to the main surface 21a.

第2壁体222は、対向する短辺が基体21の主面21aに垂直となるように、第1壁体221に対向して主面21aに立設されており、主面21aに平行な方向の一方端部222aの下端部に第3凸部222cが設けられ、かつ他方端部222bの下端部に第4凸部222dが設けられている。なお、第2壁体222において、第3凸部222cおよび第4凸部222dは、第2壁体222に垂直な方向から見たときに、主面21aに垂直な方向に関して、後述の端子部材23よりも下方側に位置している。   The second wall body 222 is erected on the main surface 21a so as to face the first wall body 221 so that the opposing short side is perpendicular to the main surface 21a of the base body 21, and is parallel to the main surface 21a. A third convex portion 222c is provided at the lower end portion of the one end portion 222a in the direction, and a fourth convex portion 222d is provided at the lower end portion of the other end portion 222b. In the second wall 222, the third convex portion 222c and the fourth convex portion 222d are terminal members described later with respect to the direction perpendicular to the main surface 21a when viewed from the direction perpendicular to the second wall 222. It is located below 23.

本実施形態では、第2壁体222の第3凸部222cおよび第4凸部222dは、それぞれ、外方側に突出して形成される。第2壁体222において、第3凸部222cと第4凸部222dとは同じ形状であり、第2壁体222に垂直な方向から見たときの形状が、矩形状である。第2壁体222に垂直な方向から見たときの、第3凸部222cの一方端部222aに沿った長さ、および、第4凸部222dの他方端部222bに沿った長さは
、たとえば、0.5mm〜5mmに設定され、第3凸部222cおよび第4凸部222dの突出長さは、たとえば、0.5mm〜3mmに設定される。
In this embodiment, the 3rd convex part 222c and the 4th convex part 222d of the 2nd wall body 222 are each projected and formed in the outward side. In the second wall 222, the third convex portion 222c and the fourth convex portion 222d have the same shape, and the shape when viewed from the direction perpendicular to the second wall 222 is a rectangular shape. When viewed from the direction perpendicular to the second wall 222, the length along the one end 222a of the third protrusion 222c and the length along the other end 222b of the fourth protrusion 222d are: For example, it is set to 0.5 mm to 5 mm, and the protruding lengths of the third convex portion 222c and the fourth convex portion 222d are set to 0.5 mm to 3 mm, for example.

第3壁体223は、対向する短辺が基体21の主面21aに垂直となるように、第1壁体221および第2壁体222に隣接して主面21aに立設されており、主面21aに平行な方向の一方端部223aの下端部に第1壁体221の第1凸部221cと嵌合する第1凹部223cが設けられ、他方端部223bの下端部に第2壁体222の第3凸部222cと嵌合する第2凹部223dが設けられている。なお、第3壁体223の上端部は、厚み方向に貫通して一部が切り欠かれており、後述の端子部材23が嵌合される端子嵌合用切欠き部223hが形成されている。   The third wall body 223 is erected on the main surface 21 a adjacent to the first wall body 221 and the second wall body 222 so that the opposing short sides are perpendicular to the main surface 21 a of the base body 21. A first concave portion 223c that fits with the first convex portion 221c of the first wall body 221 is provided at the lower end portion of the one end portion 223a in the direction parallel to the main surface 21a, and the second wall is provided at the lower end portion of the other end portion 223b. A second recess 223d that fits with the third protrusion 222c of the body 222 is provided. Note that the upper end portion of the third wall body 223 is partially cut out so as to penetrate in the thickness direction, and a terminal fitting notch portion 223h into which a terminal member 23 described later is fitted is formed.

第3壁体223は、第1壁体221および第2壁体222よりも高さが高い。すなわち、第3壁体223の上端223eが、第1壁体221の上端221fおよび第2壁体222の上端222eよりも上方側に位置している。   The third wall body 223 is higher in height than the first wall body 221 and the second wall body 222. That is, the upper end 223 e of the third wall body 223 is positioned above the upper end 221 f of the first wall body 221 and the upper end 222 e of the second wall body 222.

本実施形態では、第3壁体223に垂直な方向から見たときの、第1凹部223cの一方端部223aに沿った長さ、および、第2凹部223dの他方端部223bに沿った長さは、たとえば、0.5mm〜5mmに設定され、第1凹部223cおよび第2凹部223dの凹み長さ(凹部の開口縁端から凹部の底面までの長さ)は、たとえば、0.5mm〜3mmに設定される。   In the present embodiment, the length along one end 223a of the first recess 223c and the length along the other end 223b of the second recess 223d when viewed from the direction perpendicular to the third wall 223. The length is set to, for example, 0.5 mm to 5 mm, and the recess lengths of the first recess 223c and the second recess 223d (the length from the opening edge of the recess to the bottom surface of the recess) are, for example, 0.5 mm to Set to 3 mm.

第4壁体224は、対向する短辺が基体21の主面21aに垂直となるように、第1壁体221および第2壁体222に隣接して主面21aに立設されており、主面21aに平行な方向の一方端部224aの下端部に第1壁体221の第2凸部221dと嵌合する第3凹部224cが設けられ、他方端部224bの下端部に第2壁体222の第4凸部222dと嵌合する第4凹部224dが設けられている。なお、第4壁体224の上端部は、厚み方向に貫通して一部が切り欠かれており、後述の端子部材23が嵌合される端子嵌合用切欠き部224hが形成されている。   The fourth wall body 224 is erected on the main surface 21a adjacent to the first wall body 221 and the second wall body 222 so that the opposing short sides are perpendicular to the main surface 21a of the base body 21. A third recess 224c that fits with the second protrusion 221d of the first wall 221 is provided at the lower end of the one end 224a in the direction parallel to the main surface 21a, and the second wall is provided at the lower end of the other end 224b. A fourth recess 224d that fits with the fourth protrusion 222d of the body 222 is provided. Note that the upper end portion of the fourth wall body 224 is partially cut out so as to penetrate in the thickness direction, and a terminal fitting notch portion 224h into which a terminal member 23 described later is fitted is formed.

第4壁体224は、第1壁体221および第2壁体222よりも高さが高い。すなわち、第4壁体224の上端224eが、第1壁体221の上端221fおよび第2壁体222の上端222eよりも上方側に位置している。   The fourth wall body 224 is higher in height than the first wall body 221 and the second wall body 222. That is, the upper end 224e of the fourth wall body 224 is located above the upper end 221f of the first wall body 221 and the upper end 222e of the second wall body 222.

本実施形態では、第4壁体224に垂直な方向から見たときの、第3凹部224cの一方端部224aに沿った長さ、および、第4凹部224dの他方端部224bに沿った長さは、たとえば、0.5mm〜3mmに設定され、第3凹部224cおよび第4凹部224dの凹み長さ(凹部の開口縁端から凹部の底面までの長さ)は、たとえば、0.5mm〜3mmに設定される。   In the present embodiment, the length along one end 224a of the third recess 224c and the length along the other end 224b of the fourth recess 224d when viewed from the direction perpendicular to the fourth wall body 224. The length is set to 0.5 mm to 3 mm, for example, and the recess lengths of the third recess 224c and the fourth recess 224d (the length from the opening edge of the recess to the bottom surface of the recess) are, for example, 0.5 mm to Set to 3 mm.

上記のように構成された周壁体22の上面には、シールリング24が、ろう材などの接合材25によって接合されている。シールリング24は、基体21の主面21aに垂直な方向から見たときに、主面21aに設けられた周壁体22と重なる矩形環状の部材である。シールリング24は、たとえば、銅、鉄、タングステン、モリブデン、ニッケルまたはコバルトなどの熱伝導性の優れた金属材料から成る。   A seal ring 24 is joined to a top surface of the peripheral wall body 22 configured as described above by a joining material 25 such as a brazing material. The seal ring 24 is a rectangular annular member that overlaps with the peripheral wall body 22 provided on the main surface 21 a when viewed from a direction perpendicular to the main surface 21 a of the base 21. The seal ring 24 is made of a metal material having excellent thermal conductivity such as copper, iron, tungsten, molybdenum, nickel, or cobalt.

第1壁体221の第1凸部221cと第3壁体223の第1凹部223cとが嵌合し、第1壁体221の第2凸部221dと第4壁体224の第3凹部224cとが嵌合し、第2壁体222の第3凸部222cと第3壁体223の第2凹部223dとが嵌合し、第2壁体222の第4凸部222dと第4壁体224の第4凹部224dとが嵌合した状態で周壁体22を形成し、その周壁体22の上面に沿って接合材25を配置する。そして、接
合材25上にシールリング24を重ねて配置した状態で、シールリング24に熱を加えることで、接合材25が溶融して、シールリング24と接続される。さらに、溶融した接合材25が冷却されて固化することで、シールリング24が接合材25を介して周壁体22に固定される。
The first convex portion 221c of the first wall body 221 and the first concave portion 223c of the third wall body 223 are fitted, and the second convex portion 221d of the first wall body 221 and the third concave portion 224c of the fourth wall body 224 are fitted. And the third convex portion 222c of the second wall body 222 and the second concave portion 223d of the third wall body 223 are fitted, and the fourth convex portion 222d and the fourth wall body of the second wall body 222 are fitted. The peripheral wall body 22 is formed in a state where the fourth recess 224 d of 224 is fitted, and the bonding material 25 is disposed along the upper surface of the peripheral wall body 22. Then, in a state where the seal ring 24 is placed on the bonding material 25, the bonding material 25 is melted and connected to the seal ring 24 by applying heat to the seal ring 24. Further, the melted bonding material 25 is cooled and solidified, whereby the seal ring 24 is fixed to the peripheral wall body 22 via the bonding material 25.

ここで、本実施形態の周壁体22において、第3壁体223および第4壁体224は、第1壁体221および第2壁体222よりも高さが高いので、第1壁体221の上端221fと、第3壁体223の上端223eおよび第4壁体224の上端224eとの間に段差が形成されるとともに、第2壁体222の上端222eと、第3壁体223の上端223eおよび第4壁体224の上端224eとの間にも段差が形成されることになる。したがって、第1壁体221と第3壁体223および第4壁体224との間の嵌合構造、第2壁体222と第3壁体223および第4壁体224との間の嵌合構造において、接合材25によって接合して周壁体22を形成する際に、前記段差に、周壁体22の上面とシールリング24との間で溶融した接合材25の液溜まりを形成させることができる。   Here, in the peripheral wall body 22 of this embodiment, since the 3rd wall body 223 and the 4th wall body 224 are higher than the 1st wall body 221 and the 2nd wall body 222, the 1st wall body 221 of A step is formed between the upper end 221f, the upper end 223e of the third wall body 223, and the upper end 224e of the fourth wall body 224, and the upper end 222e of the second wall body 222 and the upper end 223e of the third wall body 223. Further, a step is also formed between the upper end 224e of the fourth wall body 224. Accordingly, the fitting structure between the first wall body 221 and the third wall body 223 and the fourth wall body 224, and the fitting structure between the second wall body 222 and the third wall body 223 and the fourth wall body 224. In the structure, when the peripheral wall body 22 is formed by bonding with the bonding material 25, a liquid pool of the bonding material 25 melted between the upper surface of the peripheral wall body 22 and the seal ring 24 can be formed at the step. .

そして、周壁体22の上面とシールリング24との間で溶融した接合材25の一部は、第1凸部221cと第1凹部223cとの間を含む、第1壁体221の一方端部221aと第3壁体223の一方端部223aとの間、第2凸部221dと第3凹部224cとの間を含む、第1壁体221の他方端部221bと第4壁体224の一方端部224aとの間、第3凸部222cと第2凹部223dとの間を含む、第2壁体222の一方端部222aと第3壁体223の他方端部223bとの間、第4凸部222dと第4凹部224dとの間を含む、第2壁体222の他方端部222bと第4壁体224の他方端部224bとの間、に流れ込んで、前記各端部間が接続される。さらに、流れ込んだ接合材25が冷却固化されることで、前記各端部間が嵌合された状態で、第1壁体221、第2壁体222、第3壁体223および第4壁体224の各壁体が接合材25によって接合される。   A part of the bonding material 25 melted between the upper surface of the peripheral wall body 22 and the seal ring 24 includes one end portion of the first wall body 221 including the space between the first protrusion 221c and the first recess 223c. One of the other end portion 221b of the first wall body 221 and the fourth wall body 224 including the space between 221a and the one end portion 223a of the third wall body 223 and the space between the second protrusion 221d and the third recess 224c. Between the end 224a, between the third protrusion 222c and the second recess 223d, between the one end 222a of the second wall 222 and the other end 223b of the third wall 223, the fourth It flows between the other end portion 222b of the second wall body 222 and the other end portion 224b of the fourth wall body 224 including between the convex portion 222d and the fourth concave portion 224d, and the end portions are connected to each other. Is done. Further, the joining material 25 that has flowed in is cooled and solidified, so that the first wall body 221, the second wall body 222, the third wall body 223, and the fourth wall body are engaged with each other between the end portions. Each wall body of 224 is joined by the joining material 25.

上記のように、第1壁体221と第3壁体223および第4壁体224との間の嵌合構造、第2壁体222と第3壁体223および第4壁体224との間の嵌合構造において、接合材25によって接合して周壁体22を形成する際に、前記段差に、周壁体22の上面とシールリング24との間で溶融した接合材25の液溜まりを形成させることができるので、各壁体が強固に接合された周壁体22とすることができ、周壁体22において各壁体に位置ずれが生じることが抑制される。   As described above, the fitting structure between the first wall body 221 and the third wall body 223 and the fourth wall body 224, between the second wall body 222 and the third wall body 223 and the fourth wall body 224. In this fitting structure, when the peripheral wall body 22 is formed by bonding with the bonding material 25, a liquid pool of the bonding material 25 melted between the upper surface of the peripheral wall body 22 and the seal ring 24 is formed at the step. Therefore, it can be set as the surrounding wall body 22 to which each wall body was joined firmly, and it is suppressed that position shift arises in each wall body in the surrounding wall body 22. FIG.

第1壁体221、第2壁体222、第3壁体223および第4壁体224の各壁体を接合する接合材25は、基体21および周壁体22のヤング率よりも小さいヤング率を有する材料により構成されるのがよい。   The bonding material 25 for bonding the first wall body 221, the second wall body 222, the third wall body 223, and the fourth wall body 224 has a Young's modulus smaller than the Young's modulus of the base body 21 and the peripheral wall body 22. It is good to be comprised with the material which has.

半導体素子収納用パッケージ2に収納される半導体素子3から熱が発生することがあるが、この熱によって基体21および周壁体22が熱膨張することがある。そこで、接合材25のヤング率が基体21および周壁体22のヤング率よりも小さいことによって、基体21および周壁体22の熱膨張による応力を接合材25が変形することで緩和することができる。なお、接合材25のヤング率は、たとえば、30GPa〜100GPaに設定される。   Although heat may be generated from the semiconductor element 3 housed in the semiconductor element housing package 2, the base 21 and the peripheral wall body 22 may be thermally expanded by this heat. Therefore, when the Young's modulus of the bonding material 25 is smaller than the Young's modulus of the base body 21 and the peripheral wall body 22, the stress due to thermal expansion of the base body 21 and the peripheral wall body 22 can be reduced by the deformation of the bonding material 25. The Young's modulus of the bonding material 25 is set to 30 GPa to 100 GPa, for example.

また、接合材25は、周壁体22の熱伝導率よりも高い熱伝導率を有する材料により構成されるのがよい。このような接合材25として、例えば、銀−銅共晶組成をベースとする銀ろう(例えば、71〜73質量%銀−27〜29質量%銅、JIS名称:BAg−8)等を用いればよい。   Further, the bonding material 25 may be made of a material having a higher thermal conductivity than the thermal conductivity of the peripheral wall body 22. As such a bonding material 25, for example, a silver solder based on a silver-copper eutectic composition (for example, 71 to 73 mass% silver-27 to 29 mass% copper, JIS name: BAg-8) is used. Good.

半導体素子収納用パッケージ2に収納される半導体素子3から発生する熱は、周壁体2
2の内側に籠りやすい。熱が周壁体22の内側に籠ると半導体素子3が高温になり、半導体素子3が誤動作したり、破損したりする可能性がある。そこで、接合材25の熱伝導率が周壁体22の熱伝導率よりも高いことによって、周壁体22の内側に籠った熱が接合材25を介して外部に放散されやすくなり、周壁体22の内側の温度を低下させることで、半導体素子3が誤動作したり、破損したりすることを抑制することができる。なお、接合材25の熱伝導率は、たとえば、100W/(m・K)〜400W/(m・K)に設定される。
The heat generated from the semiconductor element 3 accommodated in the semiconductor element accommodation package 2 is generated by the peripheral wall 2.
2 is easy to hit inside. If the heat spreads inside the peripheral wall 22, the semiconductor element 3 becomes high temperature, and the semiconductor element 3 may malfunction or be damaged. Therefore, when the thermal conductivity of the bonding material 25 is higher than the thermal conductivity of the peripheral wall body 22, the heat that has spread inside the peripheral wall body 22 is easily dissipated to the outside through the bonding material 25. By lowering the inner temperature, it is possible to prevent the semiconductor element 3 from malfunctioning or being damaged. The thermal conductivity of the bonding material 25 is set to, for example, 100 W / (m · K) to 400 W / (m · K).

また、第1壁体221の第1凸部221cと第3壁体223の第1凹部223cとが嵌合し、第1壁体221の第2凸部221dと第4壁体224の第3凹部224cとが嵌合し、第2壁体222の第3凸部222cと第3壁体223の第2凹部223dとが嵌合し、第2壁体222の第4凸部222dと第4壁体224の第4凹部224dとが嵌合した状態で、第1壁体221の一方端部221aと第3壁体223の一方端部223aとの間、第1壁体221の他方端部221bと第4壁体224の一方端部224aとの間、第2壁体222の一方端部222aと第3壁体223の他方端部223bとの間、第2壁体222の他方端部222bと第4壁体224の他方端部224bとの間に、図10の例に示すような段差Dが形成されていてもよい。   Further, the first convex portion 221c of the first wall body 221 and the first concave portion 223c of the third wall body 223 are fitted, and the second convex portion 221d of the first wall body 221 and the third of the fourth wall body 224 are fitted. The concave portion 224c is fitted, the third convex portion 222c of the second wall body 222 and the second concave portion 223d of the third wall body 223 are fitted, and the fourth convex portion 222d and the fourth convex portion 222d of the second wall body 222 are fitted. In a state where the fourth recess 224d of the wall body 224 is fitted, the other end portion of the first wall body 221 is between the one end portion 221a of the first wall body 221 and the one end portion 223a of the third wall body 223. 221b and one end 224a of the fourth wall 224, between one end 222a of the second wall 222 and the other end 223b of the third wall 223, and the other end of the second wall 222 A step D as shown in the example of FIG. 10 is formed between 222b and the other end 224b of the fourth wall body 224. It may be.

すなわち、第1壁体221の一部が、第3壁体223の一方端部223aおよび第4壁体224の一方端部224aよりも外方側に突出していてもよいし、第3壁体223の一方端部223aおよび第4壁体224の一方端部224aよりも内方側に退避していてもよい。また、第2壁体222の一部が、第3壁体223の他方端部223bおよび第4壁体224の他方端部224bよりも外方側に突出していてもよいし、第3壁体223の他方端部223bおよび第4壁体224の他方端部224bよりも内方側に退避していてもよい。このようにして、前記段差Dが形成されることによって、段差Dに沿って連続的に接合材25のメニスカスが形成されるので、接合面積が増加して接合強度を向上することができる。   That is, a part of the first wall 221 may protrude outward from the one end 223a of the third wall 223 and the one end 224a of the fourth wall 224, or the third wall The one end 223a of 223 and the one end 224a of the fourth wall 224 may be retracted inward. Further, a part of the second wall 222 may protrude outward from the other end 223b of the third wall 223 and the other end 224b of the fourth wall 224, or the third wall The other end 223b of 223 and the other end 224b of the fourth wall 224 may be retracted inward. Thus, since the meniscus of the bonding material 25 is continuously formed along the step D by forming the step D, the bonding area can be increased and the bonding strength can be improved.

また、本実施形態の半導体素子収納用パッケージ2は、第1壁体221、第2壁体222、第3壁体223および第4壁体224から成る周壁体22において、第3壁体223および第4壁体224が切欠き部による嵌合構造を有するように、構成されてもよい。具体的には、図4に示すように、周壁体22において、第3壁体223は、基体21の主面21aに平行な方向の一方端部223aの内側の角部が上端から下端にわたって切り欠かれた第1切欠き部223fと、他方端部223bの内側の角部が上端から下端にわたって切り欠かれた第2切欠き部223gとを有する。第4壁体224は、基体21の主面21aに平行な方向の一方端部224aの内側の角部が上端から下端にわたって切り欠かれた第3切欠き部224fと、他方端部224bの内側の角部が上端から下端にわたって切り欠かれた第4切欠き部224gとを有する。   Further, the semiconductor element housing package 2 of the present embodiment includes a third wall body 223 and a peripheral wall body 22 composed of a first wall body 221, a second wall body 222, a third wall body 223, and a fourth wall body 224. You may comprise so that the 4th wall body 224 may have the fitting structure by a notch part. Specifically, as shown in FIG. 4, in the peripheral wall body 22, the third wall body 223 has a corner portion inside the one end 223 a in a direction parallel to the main surface 21 a of the base 21 cut from the upper end to the lower end. The cutout first cutout portion 223f and the second cutout portion 223g cut out from the upper end to the lower end of the corner portion inside the other end portion 223b are provided. The fourth wall body 224 includes a third notch portion 224f in which a corner portion inside one end portion 224a in a direction parallel to the main surface 21a of the base 21 is notched from the upper end to the lower end, and an inner side of the other end portion 224b. Has a fourth cutout portion 224g cut out from the upper end to the lower end.

そして、第1壁体221は、基体21の主面21aに平行な方向の一方端部221aの内側の角部が第3壁体223の第1切欠き部223fに嵌合するとともに、他方端部221bの内側の角部が第4壁体224の第3切欠き部224fに嵌合する。第2壁体222は、基体21の主面21aに平行な方向の一方端部222aの内側の角部が第3壁体223の第2切欠き部223gに嵌合するとともに、他方端部222bの内側の角部が第4壁体224の第4切欠き部224gに嵌合する。   The first wall body 221 has an inner corner portion of one end portion 221a in a direction parallel to the main surface 21a of the base body 21 fitted into the first cutout portion 223f of the third wall body 223, and the other end. An inner corner portion of the portion 221b is fitted into the third cutout portion 224f of the fourth wall body 224. The second wall 222 has an inner corner of one end 222a in a direction parallel to the main surface 21a of the base 21 fitted into the second notch 223g of the third wall 223 and the other end 222b. The inner corner of the second wall 224 fits into the fourth notch 224g of the fourth wall 224.

第1壁体221、第2壁体222、第3壁体223および第4壁体224の各壁体の嵌合構造において、第1切欠き部223fおよび第2切欠き部223gが第3壁体223の上端から下端にわたって設けられ、第3切欠き部224fおよび第4切欠き部224gが第4壁体224の上端から下端にわたって設けられていることによって、第1壁体221
および第2壁体222に垂直な方向に、第1壁体221および第2壁体222が補強されるため、第1壁体221および第2壁体222の反りや変形を抑制することができる。すなわち、第1壁体221および第2壁体222は、第1切欠き部223f、第2切欠き部223g、第3切欠き部224fおよび第4切欠き部224gの各切欠き部の延在方向(第3壁体223および第4壁体224の上端から下端に向かう方向)に垂直な方向の反りや変形によって生じる位置ずれが抑制される。
In the fitting structure of the first wall body 221, the second wall body 222, the third wall body 223, and the fourth wall body 224, the first notch 223f and the second notch 223g are the third wall. The first wall body 221 is provided from the upper end to the lower end of the body 223, and the third notch 224f and the fourth notch 224g are provided from the upper end to the lower end of the fourth wall 224.
Since the first wall body 221 and the second wall body 222 are reinforced in the direction perpendicular to the second wall body 222, warping and deformation of the first wall body 221 and the second wall body 222 can be suppressed. . That is, the first wall body 221 and the second wall body 222 are formed by extending the cutout portions of the first cutout portion 223f, the second cutout portion 223g, the third cutout portion 224f, and the fourth cutout portion 224g. Misalignment caused by warpage or deformation in the direction perpendicular to the direction (the direction from the upper end to the lower end of the third wall body 223 and the fourth wall body 224) is suppressed.

また、本実施形態の周壁体22において、第1壁体221の第1凸部221cおよび第2凸部221d、第2壁体222の第3凸部222cおよび第4凸部222dは、凸状の先端部の角部が曲線状になっていてもよい。これによって、第1凸部221cおよび第2凸部221dと、第3凸部222cおよび第4凸部222dとにおける、角部での応力の集中を緩和することができる。なお、第1凸部221cと嵌合する第1凹部223c、第2凸部221dと嵌合する第3凹部224c、第3凸部222cと嵌合する第2凹部223d、第4凸部222dと嵌合する第4凹部224dの、各凹部の形状は、嵌合対象の各凸部の形状に対応して形成される。たとえば、第1凹部223c、第2凹部223d、第3凹部224c、第4凹部224dの形状は、嵌合対象の各凸部の先端部の角部が曲線状である場合には、その曲線に合致した形状であればよい。   Further, in the peripheral wall body 22 of the present embodiment, the first convex portion 221c and the second convex portion 221d of the first wall body 221, and the third convex portion 222c and the fourth convex portion 222d of the second wall body 222 are convex. A corner portion of the tip portion may be curved. As a result, stress concentration at the corners of the first and second convex portions 221c and 221d and the third and fourth convex portions 222c and 222d can be alleviated. In addition, the 1st recessed part 223c fitted to the 1st convex part 221c, the 3rd recessed part 224c fitted to the 2nd convex part 221d, the 2nd recessed part 223d fitted to the 3rd convex part 222c, and the 4th convex part 222d The shape of each recess of the fourth recess 224d to be fitted is formed corresponding to the shape of each projection to be fitted. For example, the shape of the first concave portion 223c, the second concave portion 223d, the third concave portion 224c, and the fourth concave portion 224d is the curve when the corner of the tip of each convex portion to be fitted is curved. Any matching shape may be used.

また、前述したように、本実施形態の周壁体22において、第3壁体223の上端部に端子嵌合用切欠き部223hが形成され、第4壁体224の上端部に端子嵌合用切欠き部224hが形成されている。端子嵌合用切欠き部223h,224hには、端子部材23が嵌合される。   Further, as described above, in the peripheral wall body 22 of the present embodiment, the terminal fitting notch portion 223 h is formed at the upper end portion of the third wall body 223, and the terminal fitting notch portion is formed at the upper end portion of the fourth wall body 224. A portion 224h is formed. The terminal member 23 is fitted into the terminal fitting notches 223h and 224h.

端子部材23は、上面に信号配線導体23aaが形成された平坦部23aと、平坦部23aの上面に信号配線導体23aaを挟んで接合された立壁部23bとから成る。端子部材23は、周壁体22の端子嵌合用切欠き部223h,224hに嵌合された状態で、周壁体22とシールリング24とに、ろう材などの接合材25によって接合される。   The terminal member 23 includes a flat portion 23a having a signal wiring conductor 23aa formed on the upper surface, and a standing wall portion 23b joined to the upper surface of the flat portion 23a with the signal wiring conductor 23aa interposed therebetween. The terminal member 23 is joined to the peripheral wall body 22 and the seal ring 24 by a joining material 25 such as a brazing material in a state of being fitted to the terminal fitting notches 223h and 224h of the peripheral wall body 22.

信号配線導体23aaは、端子部材23の平坦部23aの上面に、周壁体22の内外を導通するように形成されている。周壁体22の内側に位置している信号配線導体23aaは、半導体素子3にボンディングワイヤなどで電気的に接続される。また、周壁体22の外側に位置している信号配線導体23aaは、外部リード端子(不図示)に電気的に接続される。   The signal wiring conductor 23aa is formed on the upper surface of the flat portion 23a of the terminal member 23 so as to conduct inside and outside of the peripheral wall body 22. The signal wiring conductor 23aa located inside the peripheral wall body 22 is electrically connected to the semiconductor element 3 by a bonding wire or the like. Further, the signal wiring conductor 23aa located outside the peripheral wall body 22 is electrically connected to an external lead terminal (not shown).

端子部材23において平坦部23aおよび立壁部23bは、たとえば、酸化アルミニウム質焼結体、窒化アルミニウム質焼結体またはムライト質焼結体などのセラミック材料から成る。また、信号配線導体23aaは、タングステン、モリブデンまたはマンガンなどから成る。なお、信号配線導体23aaの外表面には、電気めっき法または無電解めっき法によって、ニッケルまたは金などの金属層が形成されていてもよい。   In the terminal member 23, the flat portion 23a and the standing wall portion 23b are made of a ceramic material such as an aluminum oxide sintered body, an aluminum nitride sintered body, or a mullite sintered body. The signal wiring conductor 23aa is made of tungsten, molybdenum, manganese, or the like. A metal layer such as nickel or gold may be formed on the outer surface of the signal wiring conductor 23aa by electroplating or electroless plating.

図1および図2に示すように、本実施形態の半導体装置1において、上記のように構成される半導体素子収納用パッケージ2には、素子載置用基台4に載置された半導体素子3が収納され、半導体素子収納用パッケージ2における周壁体22の上面に接合されたシールリング24上には、蓋体5が配置されている。   As shown in FIGS. 1 and 2, in the semiconductor device 1 of the present embodiment, the semiconductor element storage package 2 configured as described above includes the semiconductor element 3 mounted on the element mounting base 4. The lid body 5 is disposed on the seal ring 24 joined to the upper surface of the peripheral wall body 22 in the semiconductor element housing package 2.

半導体素子3は、素子載置用基台4を介して基体21の主面21aにおける載置領域Rに載置される。本実施形態では、半導体素子3は、発光素子、受光素子などの光半導体素子であるが、半導体素子収納用パッケージ2に収納可能な半導体素子であれば、センサ素子や撮像素子などその他の半導体素子であってもよい。   The semiconductor element 3 is placed on the placement region R on the main surface 21 a of the base 21 via the element placement base 4. In the present embodiment, the semiconductor element 3 is an optical semiconductor element such as a light emitting element or a light receiving element. However, as long as it is a semiconductor element that can be accommodated in the semiconductor element accommodating package 2, other semiconductor elements such as a sensor element and an imaging element. It may be.

半導体装置1を使用する場合には、周壁体22における第1壁体221に設けられた貫通開口221eに光ファイバ固定部材を介して光ファイバが接続され固定される。半導体素子3が、たとえばLDなどの発光素子であれば、端子部材23の信号配線導体23aaを介して外部から入力された電気信号に応じて発光素子から光が出射され、出射された光が光ファイバに入射する。半導体素子3が、たとえばPDなどの受光素子であれば、光ファイバから出射された光が受光素子に照射され、受光量に応じた電気信号が、端子部材23の信号配線導体23aaを介して外部に出力される。   When the semiconductor device 1 is used, an optical fiber is connected and fixed to the through-opening 221e provided in the first wall body 221 in the peripheral wall body 22 via an optical fiber fixing member. If the semiconductor element 3 is a light emitting element such as an LD, for example, light is emitted from the light emitting element in response to an electric signal input from the outside via the signal wiring conductor 23aa of the terminal member 23, and the emitted light is light. Incident on the fiber. If the semiconductor element 3 is a light receiving element such as a PD, for example, light emitted from the optical fiber is irradiated onto the light receiving element, and an electrical signal corresponding to the amount of received light is externally transmitted via the signal wiring conductor 23aa of the terminal member 23. Is output.

素子載置用基台4は、基体21の主面21aにおける載置領域Rに載置される。その素子載置用基台4の上面に、半導体素子3が載置される。素子載置用基台4は、たとえば、酸化アルミニウム質焼結体、窒化アルミニウム質焼結体またはムライト質焼結体などのセラミック材料から成る。また、素子載置用基台4は、たとえば、銅−タングステン合金、銅−モリブデン合金などの材料から成る台座に絶縁性の基板を接合して構成してもよい。素子載置用基台4は、半導体素子3を載置固定することができるものであればよく、たとえば、ペルチェ素子などの電子冷却素子であってもよい。   The element mounting base 4 is mounted on the mounting region R on the main surface 21 a of the base 21. The semiconductor element 3 is mounted on the upper surface of the element mounting base 4. The element mounting base 4 is made of a ceramic material such as an aluminum oxide sintered body, an aluminum nitride sintered body, or a mullite sintered body. The element mounting base 4 may be configured by bonding an insulating substrate to a base made of a material such as a copper-tungsten alloy or a copper-molybdenum alloy. The element mounting base 4 only needs to be capable of mounting and fixing the semiconductor element 3, and may be, for example, an electronic cooling element such as a Peltier element.

蓋体5は、周壁体22の上面に接合されたシールリング24上に、ろう材などの接合材または溶接によって接合され、基体21および周壁体22によって囲まれた空間を封止する。蓋体5は、たとえば、銅、鉄、タングステン、モリブデン、ニッケルまたはコバルトなどの金属材料、あるいはこれらの金属材料を含有する合金材料から成る。   The lid 5 is joined to the seal ring 24 joined to the upper surface of the peripheral wall body 22 by a joining material such as brazing material or welding, and seals the space surrounded by the base body 21 and the peripheral wall body 22. The lid 5 is made of, for example, a metal material such as copper, iron, tungsten, molybdenum, nickel, or cobalt, or an alloy material containing these metal materials.

上記のように構成される半導体装置1では、各壁体に位置ずれが生じることが抑制された周壁体22を備えた半導体素子収納用パッケージ2に、素子載置用基台4に載置された半導体素子3が収納されているので、半導体素子3と、周壁体22における第1壁体221に設けられた貫通開口221eに固定される光ファイバとの位置ずれによって発生する光軸ずれを抑制することができ、光伝送効率を向上させることができる。   In the semiconductor device 1 configured as described above, the element mounting base 4 is mounted on the semiconductor element storage package 2 including the peripheral wall body 22 in which the displacement of each wall body is suppressed. Since the semiconductor element 3 is housed, the optical axis deviation caused by the positional deviation between the semiconductor element 3 and the optical fiber fixed to the through-opening 221e provided in the first wall body 221 in the peripheral wall body 22 is suppressed. And the optical transmission efficiency can be improved.

なお、本発明は以上の実施の形態の例に限定されるものではなく、本発明の要旨を逸脱しない範囲内で種々の変更を加えることは何ら差し支えない。   In addition, this invention is not limited to the example of the above embodiment, A various change may be added in the range which does not deviate from the summary of this invention.

1 半導体装置
2 半導体素子収納用パッケージ
3 半導体素子
4 素子載置用基台
5 蓋体
21 基体
21a 主面
22 周壁体
23 端子部材
23aa 信号配線導体
24 シールリング
25 接合材
221 第1壁体
221c 第1凸部
221d 第2凸部
221e 貫通開口
222 第2壁体
222c 第3凸部
222d 第4凸部
223 第3壁体
223c 第1凹部
223d 第2凹部
223f 第1切欠き部
223g 第2切欠き部
224 第4壁体
224c 第3凹部
224d 第4凹部
224f 第3切欠き部
224g 第4切欠き部
DESCRIPTION OF SYMBOLS 1 Semiconductor device 2 Package for semiconductor element storage 3 Semiconductor element 4 Base for element mounting 5 Lid 21 Base 21a Main surface 22 Peripheral wall 23 Terminal member 23aa Signal wiring conductor 24 Seal ring 25 Bonding material 221 First wall 221c First 1 convex part 221d 2nd convex part 221e Through-opening 222 2nd wall body 222c 3rd convex part 222d 4th convex part 223 3rd wall body 223c 1st recessed part 223d 2nd recessed part 223f 1st notch part 223g 2nd notch Portion 224 Fourth wall 224c Third recess 224d Fourth recess 224f Third notch 224g Fourth notch

Claims (4)

半導体素子が載置される載置領域を含む主面を有する板状の基体と、
前記載置領域を囲むように前記基体の前記主面に設けられて枠状を成す周壁体とを含み、
前記周壁体は、
前記主面に垂直に立設された矩形板状の第1壁体であって、前記主面に平行な方向の一方端部に第1凸部が設けられ、かつ他方端部に第2凸部が設けられるとともに、厚み方向に貫通した貫通開口が設けられた第1壁体と、
前記主面に垂直に立設された、前記第1壁体に対向する矩形板状の第2壁体であって、前記主面に平行な方向の一方端部に第3凸部が設けられ、かつ他方端部に第4凸部が設けられた第2壁体と、
前記主面に垂直に立設された、前記第1壁体および前記第2壁体に隣接する矩形板状の第3壁体であって、前記主面に平行な方向の一方端部に前記第1凸部と嵌合する第1凹部が設けられ、かつ他方端部に前記第3凸部と嵌合する第2凹部が設けられた、前記第1壁体および前記第2壁体よりも高さが高い第3壁体と、
前記主面に垂直に立設された、前記第1壁体および前記第2壁体に隣接する矩形板状の第4壁体であって、前記主面に平行な方向の一方端部に前記第2凸部と嵌合する第3凹部が設けられ、かつ他方端部に前記第4凸部と嵌合する第4凹部が設けられた、前記第1壁体および前記第2壁体よりも高さが高い第4壁体と、から成ることを特徴とする半導体素子収納用パッケージ。
A plate-like substrate having a main surface including a placement region on which a semiconductor element is placed;
A peripheral wall body that is provided on the main surface of the base body so as to surround the placement region and forms a frame shape,
The peripheral wall body is
A rectangular plate-like first wall body erected perpendicularly to the main surface, wherein a first protrusion is provided at one end in a direction parallel to the main surface, and a second protrusion is provided at the other end. A first wall body provided with a through-opening penetrating in the thickness direction,
A rectangular plate-like second wall body standing vertically to the main surface and facing the first wall body, wherein a third convex portion is provided at one end in a direction parallel to the main surface. And the 2nd wall body in which the 4th convex part was provided in the other end, and
A rectangular plate-like third wall that is erected vertically to the main surface and is adjacent to the first wall and the second wall, and is arranged at one end in a direction parallel to the main surface. Than the first wall body and the second wall body provided with a first concave portion that fits with the first convex portion and provided with a second concave portion that fits with the third convex portion at the other end. A third wall with a high height,
A rectangular plate-like fourth wall body that is erected perpendicularly to the main surface and is adjacent to the first wall body and the second wall body, and is disposed at one end in a direction parallel to the main surface. Than the first wall body and the second wall body provided with a third concave portion that fits with the second convex portion and provided with a fourth concave portion that fits with the fourth convex portion at the other end. A package for housing a semiconductor element, comprising a fourth wall body having a high height.
前記第3壁体は、前記主面に平行な方向の一方端部の内側の角部が上端から下端にわたって切り欠かれた第1切欠き部と、他方端部の内側の角部が上端から下端にわたって切り欠かれた第2切欠き部とを有し、
前記第4壁体は、前記主面に平行な方向の一方端部の内側の角部が上端から下端にわたって切り欠かれた第3切欠き部と、他方端部の内側の角部が上端から下端にわたって切り欠かれた第4切欠き部とを有し、
前記第1壁体は、前記主面に平行な方向の一方端部の内側の角部が前記第1切欠き部に嵌合するとともに、他方端部の内側の角部が前記第3切欠き部に嵌合し、
前記第2壁体は、前記主面に平行な方向の一方端部の内側の角部が前記第2切欠き部に嵌合するとともに、他方端部の内側の角部が前記第4切欠き部に嵌合する、ことを特徴とする請求項1に記載の半導体素子収納用パッケージ。
The third wall body includes a first cutout portion in which an inner corner portion of one end portion in a direction parallel to the main surface is cut from the upper end to the lower end, and an inner corner portion of the other end portion from the upper end. A second notch cut out over the lower end,
The fourth wall body includes a third cutout portion in which an inner corner of one end in a direction parallel to the main surface is cut from the upper end to the lower end, and an inner corner of the other end from the upper end. A fourth notch cut out over the lower end,
In the first wall body, an inner corner of one end in a direction parallel to the main surface is fitted into the first notch, and an inner corner of the other end is the third notch. Mated with the
In the second wall body, an inner corner of one end in a direction parallel to the main surface is fitted into the second notch, and an inner corner of the other end is the fourth notch. The package for housing a semiconductor element according to claim 1, wherein the package is fitted into a portion.
前記第1壁体において、前記貫通開口は、前記主面に垂直な方向に関して、前記第1凸部および前記第2凸部よりも上方側に位置することを特徴とする請求項1または2に記載の半導体素子収納用パッケージ。   3. The first wall body according to claim 1, wherein in the first wall body, the through-opening is positioned above the first convex portion and the second convex portion with respect to a direction perpendicular to the main surface. A package for housing a semiconductor element as described. 請求項1〜3のいずれか1つに記載の半導体素子収納用パッケージと、
前記基体における前記主面の載置領域に載置された半導体素子と、を含むことを特徴とする半導体装置。
A package for housing a semiconductor element according to any one of claims 1 to 3,
A semiconductor device mounted on a mounting region of the main surface of the base body.
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