JP6437020B2 - 荷電粒子顕微鏡を使用する方法及び荷電粒子顕微鏡 - Google Patents

荷電粒子顕微鏡を使用する方法及び荷電粒子顕微鏡 Download PDF

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JP6437020B2
JP6437020B2 JP2017003750A JP2017003750A JP6437020B2 JP 6437020 B2 JP6437020 B2 JP 6437020B2 JP 2017003750 A JP2017003750 A JP 2017003750A JP 2017003750 A JP2017003750 A JP 2017003750A JP 6437020 B2 JP6437020 B2 JP 6437020B2
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sample
deflection element
charged particle
pulse train
detector
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JP2017152366A (ja
JP2017152366A5 (https=
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キーフト，エーリク
デイク，ヴァルター ファン
デイク，ヴァルター ファン
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/045—Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/266—Measurement of magnetic or electric fields in the object; Lorentzmicroscopy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/043—Beam blanking
    • H01J2237/0432—High speed and short duration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/043—Beam blanking
    • H01J2237/0435—Multi-aperture
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1504—Associated circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2446—Position sensitive detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24495—Signal processing, e.g. mixing of two or more signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24571—Measurements of non-electric or non-magnetic variables
    • H01J2237/24585—Other variables, e.g. energy, mass, velocity, time, temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2802—Transmission microscopes

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2017003750A 2016-02-24 2017-01-13 荷電粒子顕微鏡を使用する方法及び荷電粒子顕微鏡 Active JP6437020B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP16157199.7 2016-02-24
EP16157199.7A EP3133633B1 (en) 2016-02-24 2016-02-24 Studying dynamic specimen behavior in a charged-particle microscope

Publications (3)

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JP2017152366A JP2017152366A (ja) 2017-08-31
JP2017152366A5 JP2017152366A5 (https=) 2018-06-07
JP6437020B2 true JP6437020B2 (ja) 2018-12-12

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US (1) US10340113B2 (https=)
EP (1) EP3133633B1 (https=)
JP (1) JP6437020B2 (https=)
CN (1) CN107123584B (https=)

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US10032599B2 (en) 2016-11-28 2018-07-24 FEI Cmnpany Time-resolved charged particle microscopy
EP3327748B1 (en) 2016-11-28 2019-03-27 FEI Company Time-of-flight charged particle spectroscopy
EP3444836B1 (en) * 2017-08-17 2020-01-29 FEI Company Diffraction pattern detection in a transmission charged particle microscope
EP3534391B1 (en) * 2018-03-01 2020-11-04 FEI Company Discriminative imaging technique in scanning transmission charged particle microscopy
EP3550585B1 (en) * 2018-04-05 2021-06-23 FEI Company Studying dynamic specimens in a transmission charged particle microscope
US10522323B2 (en) * 2018-04-05 2019-12-31 Fei Company Electron energy loss spectroscopy with adjustable energy resolution
EP3564982A1 (en) * 2018-05-02 2019-11-06 FEI Company Eels detection technique in an electron microscope
EP3591685A1 (en) * 2018-07-06 2020-01-08 FEI Company Electron microscope with improved imaging resolution
US11114272B2 (en) * 2019-09-25 2021-09-07 Fei Company Pulsed CFE electron source with fast blanker for ultrafast TEM applications
CN110890256B (zh) * 2019-11-26 2021-07-27 华中科技大学 一种会聚角可调无磁飞秒电子源装置
EP3869182A1 (en) * 2020-02-19 2021-08-25 FEI Company Device and method for determining a property of a sample that is to be used in a charged particle microscope
KR102790213B1 (ko) * 2020-04-20 2025-04-03 에이에스엠엘 네델란즈 비.브이. 검사 도구 및 검사 도구 작동 방법
EP3901982A1 (en) * 2020-04-20 2021-10-27 ASML Netherlands B.V. An inspection tool, inspection tool operating method, and non-transitory computer readable medium
US11127562B1 (en) * 2020-08-05 2021-09-21 Fei Company System and method for RF pulsed electron beam based STEM
EP3977937A1 (en) * 2020-09-30 2022-04-06 FEI Company Method of investigating a specimen using a tomographic imaging apparatus
CN113984813B (zh) * 2021-09-27 2024-07-26 上海大学 一种高通量薄膜晶体结构表征装置及方法
JP7490832B2 (ja) 2022-03-14 2024-05-27 日本電子株式会社 荷電粒子線装置および荷電粒子線装置の制御方法

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JPS5538634B2 (https=) 1972-06-24 1980-10-06
JPS5115782B2 (https=) 1972-08-17 1976-05-19
US4445041A (en) * 1981-06-02 1984-04-24 Hewlett-Packard Company Electron beam blanker
JPS60130031A (ja) 1983-12-16 1985-07-11 Toshiba Mach Co Ltd パルスビ−ム発生装置
US6414313B1 (en) * 1999-06-01 2002-07-02 Nikon Corporation Multiple numerical aperture electron beam projection lithography system
CN100399014C (zh) 2001-06-29 2008-07-02 中国科学院物理研究所 一种具有高时间分辨的电子显微镜
US7557360B2 (en) * 2003-10-16 2009-07-07 Alis Corporation Ion sources, systems and methods
JP2006196236A (ja) 2005-01-12 2006-07-27 Hitachi High-Technologies Corp 電子顕微鏡及び観察方法
US8569712B2 (en) * 2010-10-07 2013-10-29 Fei Company Beam blanker for interrupting a beam of charged particles
JP5744629B2 (ja) * 2011-06-03 2015-07-08 株式会社日立ハイテクノロジーズ 電子顕微鏡及び電子線を用いた撮像方法
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Also Published As

Publication number Publication date
US10340113B2 (en) 2019-07-02
EP3133633A1 (en) 2017-02-22
JP2017152366A (ja) 2017-08-31
CN107123584A (zh) 2017-09-01
CN107123584B (zh) 2019-03-19
US20170243713A1 (en) 2017-08-24
EP3133633B1 (en) 2018-03-28

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