JP6425078B2 - 変性ノボラック型フェノール樹脂、変性ノボラック型フェノール樹脂の製造方法、感光性組成物、レジスト材料、及びレジスト塗膜 - Google Patents

変性ノボラック型フェノール樹脂、変性ノボラック型フェノール樹脂の製造方法、感光性組成物、レジスト材料、及びレジスト塗膜 Download PDF

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JP6425078B2
JP6425078B2 JP2014255218A JP2014255218A JP6425078B2 JP 6425078 B2 JP6425078 B2 JP 6425078B2 JP 2014255218 A JP2014255218 A JP 2014255218A JP 2014255218 A JP2014255218 A JP 2014255218A JP 6425078 B2 JP6425078 B2 JP 6425078B2
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今田　知之
知之 今田
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DIC Corp
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JP2014255218A 2014-12-17 2014-12-17 変性ノボラック型フェノール樹脂、変性ノボラック型フェノール樹脂の製造方法、感光性組成物、レジスト材料、及びレジスト塗膜 Active JP6425078B2 (ja)

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JP6863077B2 (ja) * 2017-05-24 2021-04-21 Dic株式会社 デンドリマー型樹脂及びレジスト材料

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CN1698016A (zh) * 2003-05-20 2005-11-16 东京应化工业株式会社 化学放大型正性光致抗蚀剂组合物及抗蚀图案的形成方法
JP4173413B2 (ja) * 2003-08-28 2008-10-29 東京応化工業株式会社 リフトオフ用レジストパターンの形成方法
JP4476680B2 (ja) * 2004-04-20 2010-06-09 東京応化工業株式会社 インプランテーション工程用化学増幅型ポジ型ホトレジスト組成物
JP4893270B2 (ja) * 2006-11-29 2012-03-07 住友化学株式会社 化学増幅型ポジ型レジスト組成物
US8623585B2 (en) * 2010-11-10 2014-01-07 Dic Corporation Positive-type photoresist composition
WO2012141165A1 (ja) * 2011-04-12 2012-10-18 Dic株式会社 ポジ型フォトレジスト組成物、その塗膜及びノボラック型フェノール樹脂
KR20150129676A (ko) * 2013-03-14 2015-11-20 디아이씨 가부시끼가이샤 변성 노볼락형 페놀 수지, 레지스트 재료, 도막 및 레지스트 영구막

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