JP2016113587A5 - - Google Patents
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- JP2016113587A5 JP2016113587A5 JP2014255218A JP2014255218A JP2016113587A5 JP 2016113587 A5 JP2016113587 A5 JP 2016113587A5 JP 2014255218 A JP2014255218 A JP 2014255218A JP 2014255218 A JP2014255218 A JP 2014255218A JP 2016113587 A5 JP2016113587 A5 JP 2016113587A5
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- JP
- Japan
- Prior art keywords
- formula
- represented
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- same
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 125000001424 substituent group Chemical group 0.000 claims 10
- 150000001875 compounds Chemical class 0.000 claims 8
- 239000005011 phenolic resin Substances 0.000 claims 8
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims 7
- 125000004432 carbon atom Chemical group C* 0.000 claims 6
- 125000000217 alkyl group Chemical group 0.000 claims 5
- 229920003986 novolac Polymers 0.000 claims 4
- 125000004430 oxygen atom Chemical group O* 0.000 claims 4
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims 3
- 125000002947 alkylene group Chemical group 0.000 claims 3
- 125000003118 aryl group Chemical group 0.000 claims 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 3
- 239000000463 material Substances 0.000 claims 3
- 229920001568 phenolic resin Polymers 0.000 claims 3
- 125000004429 atom Chemical group 0.000 claims 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims 2
- 239000002253 acid Substances 0.000 claims 1
- 150000001299 aldehydes Chemical class 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 125000005156 substituted alkylene group Chemical group 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014255218A JP6425078B2 (ja) | 2014-12-17 | 2014-12-17 | 変性ノボラック型フェノール樹脂、変性ノボラック型フェノール樹脂の製造方法、感光性組成物、レジスト材料、及びレジスト塗膜 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014255218A JP6425078B2 (ja) | 2014-12-17 | 2014-12-17 | 変性ノボラック型フェノール樹脂、変性ノボラック型フェノール樹脂の製造方法、感光性組成物、レジスト材料、及びレジスト塗膜 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016113587A JP2016113587A (ja) | 2016-06-23 |
| JP2016113587A5 true JP2016113587A5 (https=) | 2017-12-21 |
| JP6425078B2 JP6425078B2 (ja) | 2018-11-21 |
Family
ID=56140906
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014255218A Active JP6425078B2 (ja) | 2014-12-17 | 2014-12-17 | 変性ノボラック型フェノール樹脂、変性ノボラック型フェノール樹脂の製造方法、感光性組成物、レジスト材料、及びレジスト塗膜 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6425078B2 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6863077B2 (ja) * | 2017-05-24 | 2021-04-21 | Dic株式会社 | デンドリマー型樹脂及びレジスト材料 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100813458B1 (ko) * | 2003-05-20 | 2008-03-13 | 도오꾜오까고오교 가부시끼가이샤 | 화학증폭형 포지티브형 포토레지스트 조성물 및 레지스트패턴형성방법 |
| JP4173413B2 (ja) * | 2003-08-28 | 2008-10-29 | 東京応化工業株式会社 | リフトオフ用レジストパターンの形成方法 |
| JP4476680B2 (ja) * | 2004-04-20 | 2010-06-09 | 東京応化工業株式会社 | インプランテーション工程用化学増幅型ポジ型ホトレジスト組成物 |
| JP4893270B2 (ja) * | 2006-11-29 | 2012-03-07 | 住友化学株式会社 | 化学増幅型ポジ型レジスト組成物 |
| CN103270451B (zh) * | 2010-11-10 | 2015-08-26 | Dic株式会社 | 正型光致抗蚀剂组合物 |
| JP5152447B2 (ja) * | 2011-04-12 | 2013-02-27 | Ｄｉｃ株式会社 | ポジ型フォトレジスト組成物、その塗膜及びノボラック型フェノール樹脂 |
| US20160017083A1 (en) * | 2013-03-14 | 2016-01-21 | Dic Corporation | Modified novolac phenol resin, resist material, coating film, and resist permanent film |
-
2014
- 2014-12-17 JP JP2014255218A patent/JP6425078B2/ja active Active
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