JP2016113587A5

JP2016113587A5 -

Info

Publication number: JP2016113587A5
Application number: JP2014255218A
Authority: JP
Filing date: 2014-12-17
Publication date: 2017-12-21
Anticipated expiration: 2034-12-17

Claims

The following general formula (1)

Wherein ^{^{(1), R 1, R}} 2, and ^{R 3} each independently represent an alkyl group optionally having 1 to 8 carbon atoms which may have a substituent. When a plurality of R ¹ are present, they may be the same or different. When a plurality of R ² are present, they may be the same or different. When a plurality of R ³ are present, May be the same or different. P, q, and r each independently represent an integer of 0 to 4, and s represents 1 or 2. However, the sum of r and s is 5 or less. ]
And a compound represented by the following general formula (2)

Wherein ^{^{(2), R 1, R}} 2, R 3, p, and q are the same as those in the formula (1), t represents an integer of 0 to 5. ]
At least one phenolic trinuclear compound (A) selected from the group consisting of compounds represented by formula (3):

[In Formula (3), R ⁴ represents a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent. ]
In represented by aldehydes (B) as essential for at least some of the hydrogen atoms is represented by the following general formula phenol hydroxyl group that phenolic novolak resins which are Yusuke the reaction material (4u)

[In the formula (4u), R ^a represents an optionally substituted alkylene group having 1 to 10 carbon atoms, and na represents an integer of 1 to 10. ]
A group represented by the following general formula (5u)

[In the formula (5u), R ^b1 and R ^b2 each independently have a substituent, and one or more methylene groups that are not adjacent to each other may be substituted with an oxygen atom. An alkylene group having 1 to 10 atoms is represented, and m1 and m2 each independently represent 0 or 1. ]
A group represented by formula (4b):

[In Formula (4b), R ^a represents an alkylene group having 1 to 10 carbon atoms which may have ^a substituent, and na represents an integer of 1 to 10. (*) Is a site bonded to an oxygen atom derived from another phenolic hydroxyl group . ]
Or a group represented by the following general formula (5b)

[In Formula (5b), R ^b1 and R ^b2 each independently have a substituent, and one or more methylene groups that are not adjacent to each other may be substituted with an oxygen atom. An alkylene group having 1 to 10 atoms is represented, and m1 and m2 each independently represent 0 or 1. (*) Is a site bonded to an oxygen atom derived from another phenolic hydroxyl group . ]
A modified novolak-type phenolic resin, which is substituted with any of the groups represented by:

The groups represented by the general formulas (4u), (5u), (4b), and (5b) are represented by the following formulas (4u-6), (5u-1), (4b-6) , ( 5b- 1)

In a group represented by claim 1, wherein the modified novolak type phenolic resin.

The phenolic trinuclear compound (A) is (1-1), (1-2), (1-7), (1-8), (1-13), (1-14), (2 -1) and (2-2)

[Wherein, R ¹ , R ² and R ³ each independently represents an alkyl group having 1 to 8 carbon atoms which may have a substituent. A plurality of R ¹ may be the same or different from each other, a plurality of R ² may be the same or different from each other, and when a plurality of R ³ are present, they may be the same or different. May be. r1 represents an integer of 0 to 4, r2
Represents an integer of 0 to 3, and t represents an integer of 0 to 5. ]
The modified novolak-type phenol resin according to claim 1 or 2, which is at least one compound selected from the group consisting of compounds represented by:

The modified novolak-type phenol resin according to claim 3, wherein the phenol trinuclear compound (A) is a compound represented by the formula (1-1) or (2-1).

The novolac type phenol resin is represented by the following general formula (I-1) as a repeating unit.

[In Formula (I-1), R ¹ and R ² each independently represent an alkyl group having 1 to 8 carbon atoms which may have a substituent, and a plurality of R ¹ are mutually identical. Or they may be different, and a plurality of R ² may be the same or different. R ⁴ represents a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent. ]
Structural site (I-1) represented by the following general formula (I-2)

[In Formula (I-2), R ¹ , R ² and R ⁴ are the same as those in Formula (I-1). ]
The structural site (I-2) represented by the following general formula (II-1)

[In Formula (II-1), R ¹ , R ² and R ⁴ are the same as those in Formula (I-1). ]
And a structural moiety (II-1) represented by formula (II-2):

[In Formula (II-2), R ¹ , R ² and R ⁴ are the same as those in Formula (I-1). ]
The modified novolak-type phenolic resin according to claim 1 or 2, which has one or more structural sites selected from the group consisting of the structural sites (II-2) represented by formula (II).

The existence ratio [(—OR ¹⁰¹ ) / (OH)] of —OR ¹⁰¹ and —OH (phenolic hydroxyl group) bonded to the carbon atom constituting the aromatic ring skeleton is in the range of 5/95 to 50/50. The modified novolac type phenol resin according to any one of claims 1 to 5 .

The photosensitive composition containing the modified | denatured novolak-type phenol resin as described in any one of Claims 1-6 , and a photo-acid generator.

A resist material comprising the photosensitive composition according to claim 7 .

A resist coating film comprising the resist material according to claim 8 .