JP6410484B2 - 蒸着用マスク組立体 - Google Patents
蒸着用マスク組立体 Download PDFInfo
- Publication number
- JP6410484B2 JP6410484B2 JP2014122808A JP2014122808A JP6410484B2 JP 6410484 B2 JP6410484 B2 JP 6410484B2 JP 2014122808 A JP2014122808 A JP 2014122808A JP 2014122808 A JP2014122808 A JP 2014122808A JP 6410484 B2 JP6410484 B2 JP 6410484B2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- deposition
- welding
- opening
- mask frame
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000008021 deposition Effects 0.000 title claims description 32
- 238000003466 welding Methods 0.000 claims description 39
- 238000007740 vapor deposition Methods 0.000 claims description 11
- 238000003780 insertion Methods 0.000 claims description 8
- 230000037431 insertion Effects 0.000 claims description 8
- 230000000149 penetrating effect Effects 0.000 claims description 3
- 238000000151 deposition Methods 0.000 description 29
- 239000000758 substrate Substances 0.000 description 19
- 230000002093 peripheral effect Effects 0.000 description 15
- 239000011324 bead Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 10
- 239000010409 thin film Substances 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 238000005137 deposition process Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000005019 vapor deposition process Methods 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C21/00—Accessories or implements for use in connection with applying liquids or other fluent materials to surfaces, not provided for in groups B05C1/00 - B05C19/00
- B05C21/005—Masking devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/042—Coating on selected surface areas, e.g. using masks using masks
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Description
110 蒸着パターン、
120 周縁、
121,231 第1面、
232 第2面、
233 第3面、
130 開口部、
200 マスクフレーム、
210 溶接孔、
220 溶接棒挿入溝、
230 周縁、
300 溶接ビード、
400 基板、
500 蒸着装置、
600 溶接棒。
Claims (6)
- 蒸着パターンが形成されたマスクと、
前記マスクの周縁が固定されるとともに、第1面と、前記第1面から下方に延長された第2面と、前記第2面と対向する第3面とを含むマスクフレームと、
前記マスクフレームの中心部に位置する開口部とを含み、
互いに対向する前記マスクの前記周縁に位置する第1面と、前記開口部に隣接した前記マスクフレームの前記第1面とが互いに溶接され、
前記第2面、および前記第3面の間に溶接棒が挿入される溶接棒挿入溝が位置する、蒸着用マスク組立体。 - 前記マスクフレームの前記第1面を貫く複数の溶接孔をさらに含む、請求項1に記載の蒸着用マスク組立体。
- 前記複数の溶接孔は、前記開口部の周りに位置する、請求項2に記載の蒸着用マスク組立体。
- 前記開口部は四角形状である、請求項1〜3のいずれか1つに記載の蒸着用マスク組立体。
- 前記第2面は、前記開口部の周りに沿って閉曲線を形成する、請求項4に記載の蒸着用マスク組立体。
- 前記第3面は、前記第2面の外側に位置する、請求項5に記載の蒸着用マスク組立体。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020130070441A KR102097706B1 (ko) | 2013-06-19 | 2013-06-19 | 증착용 마스크 조립체 |
KR10-2013-0070441 | 2013-06-19 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015004129A JP2015004129A (ja) | 2015-01-08 |
JP6410484B2 true JP6410484B2 (ja) | 2018-10-24 |
Family
ID=52109859
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014122808A Active JP6410484B2 (ja) | 2013-06-19 | 2014-06-13 | 蒸着用マスク組立体 |
Country Status (5)
Country | Link |
---|---|
US (1) | US9394600B2 (ja) |
JP (1) | JP6410484B2 (ja) |
KR (1) | KR102097706B1 (ja) |
CN (1) | CN104233188B (ja) |
TW (1) | TWI628507B (ja) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014088594A (ja) * | 2012-10-30 | 2014-05-15 | V Technology Co Ltd | 蒸着マスク |
CN103882375B (zh) * | 2014-03-12 | 2016-03-09 | 京东方科技集团股份有限公司 | 一种掩膜板及其制作方法 |
KR102322764B1 (ko) * | 2015-03-03 | 2021-11-08 | 삼성디스플레이 주식회사 | 마스크 프레임 조립체, 그 제조 방법 및 표시 장치의 제조 방법 |
KR20180041294A (ko) * | 2016-10-13 | 2018-04-24 | 삼성디스플레이 주식회사 | 마스크 조립체, 표시 장치의 제조장치 및 표시 장치의 제조방법 |
CN108441814B (zh) * | 2018-03-22 | 2020-03-13 | 京东方科技集团股份有限公司 | 掩膜装置及其制作方法、蒸镀系统 |
KR102466835B1 (ko) * | 2018-06-04 | 2022-11-15 | 주식회사 케이피에스 | 풀 사이즈 마스크 조립체와 그 제조방법 |
KR101909582B1 (ko) * | 2018-06-04 | 2018-10-18 | 주식회사 케이피에스 | 풀 사이즈 마스크 조립체와 그 제조방법 |
US11560616B2 (en) * | 2019-11-05 | 2023-01-24 | Boe Technology Group Co., Ltd. | Mask device, mask plate, and frame |
KR20220140423A (ko) * | 2021-04-09 | 2022-10-18 | 다이니폰 인사츠 가부시키가이샤 | 증착 마스크, 증착 마스크 장치, 증착 장치 및 유기 디바이스의 제조 방법 |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05104246A (ja) * | 1991-10-08 | 1993-04-27 | Nkk Corp | 栓溶接方法 |
JPH0822777A (ja) * | 1994-07-05 | 1996-01-23 | Matsushita Electron Corp | カラー陰極線管 |
JP4006173B2 (ja) * | 2000-08-25 | 2007-11-14 | 三星エスディアイ株式会社 | メタルマスク構造体及びその製造方法 |
US6650037B1 (en) * | 2002-05-20 | 2003-11-18 | Thomson Licensing S.A. | Shock absorbing stud shim for a CRT |
JP2004323888A (ja) * | 2003-04-23 | 2004-11-18 | Dainippon Printing Co Ltd | 蒸着マスク及び蒸着方法 |
JP4944367B2 (ja) * | 2004-05-25 | 2012-05-30 | キヤノン株式会社 | マスク構造体の製造方法 |
JP2005350712A (ja) * | 2004-06-09 | 2005-12-22 | Canon Components Inc | 蒸着用のメタルマスク構造体 |
KR20060102092A (ko) | 2005-03-22 | 2006-09-27 | 엘지전자 주식회사 | 유기전계발광표시소자용 마스크의 클램핑 장치 및 방법 |
KR101102037B1 (ko) | 2005-04-29 | 2012-01-04 | 엘지디스플레이 주식회사 | 유기전계발광표시소자용 마스크 장치 및 그 제조방법 |
KR101213092B1 (ko) | 2005-05-02 | 2012-12-18 | 엘지디스플레이 주식회사 | 평판 표시소자용 마스크 장치 및 이를 이용한 마스크고정방법 |
JP2007035336A (ja) * | 2005-07-25 | 2007-02-08 | Hitachi Metals Ltd | 蒸着マスク用金属製フレームの製造方法 |
KR100767006B1 (ko) | 2005-12-19 | 2007-10-15 | 두산메카텍 주식회사 | 증착용 마스크 장치 |
KR20070082317A (ko) * | 2006-02-16 | 2007-08-21 | 삼성전자주식회사 | 마스크 및 그 제조 방법 |
KR100853544B1 (ko) | 2007-04-05 | 2008-08-21 | 삼성에스디아이 주식회사 | 평판 표시장치 박막 증착용 마스크 프레임 조립체 및 이를이용한 증착장비 |
JP2009007649A (ja) * | 2007-06-29 | 2009-01-15 | Nippon Yakin Kogyo Co Ltd | マスク用フレーム |
JP5269550B2 (ja) * | 2008-10-31 | 2013-08-21 | 旭化成建材株式会社 | 鋼板の溶接方法 |
JP2010253498A (ja) * | 2009-04-23 | 2010-11-11 | Nec Energy Devices Ltd | レーザー加工機およびその飛散物回収方法 |
KR101135544B1 (ko) * | 2009-09-22 | 2012-04-17 | 삼성모바일디스플레이주식회사 | 마스크 조립체, 이의 제조 방법 및 이를 이용한 평판표시장치용 증착 장치 |
KR101742816B1 (ko) * | 2010-12-20 | 2017-06-02 | 삼성디스플레이 주식회사 | 마스크 프레임 조립체, 이의 제조 방법 및 이를 이용한 유기 발광 표시 장치의 제조 방법 |
KR20120069396A (ko) | 2010-12-20 | 2012-06-28 | 삼성모바일디스플레이주식회사 | 증착용 마스크 프레임 조립체, 이의 제조 방법 및 이를 이용한 유기 발광 표시 장치의 제조 방법 |
TWM412207U (en) * | 2011-03-04 | 2011-09-21 | Kaohsiung Monomer Company Ltd | Mask module |
KR101853265B1 (ko) * | 2011-03-15 | 2018-05-02 | 삼성디스플레이 주식회사 | 증착 마스크 |
KR101272299B1 (ko) * | 2011-08-25 | 2013-06-07 | (주)한 송 | Amoled 패널 제작용 분할 마스크 프레임 어셈블리 제조 장치 |
-
2013
- 2013-06-19 KR KR1020130070441A patent/KR102097706B1/ko active IP Right Grant
-
2014
- 2014-03-27 US US14/227,435 patent/US9394600B2/en active Active
- 2014-05-28 TW TW103118559A patent/TWI628507B/zh active
- 2014-06-13 JP JP2014122808A patent/JP6410484B2/ja active Active
- 2014-06-19 CN CN201410274708.6A patent/CN104233188B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN104233188B (zh) | 2018-06-12 |
TW201500838A (zh) | 2015-01-01 |
US9394600B2 (en) | 2016-07-19 |
CN104233188A (zh) | 2014-12-24 |
TWI628507B (zh) | 2018-07-01 |
KR102097706B1 (ko) | 2020-04-07 |
US20140373780A1 (en) | 2014-12-25 |
KR20140147353A (ko) | 2014-12-30 |
JP2015004129A (ja) | 2015-01-08 |
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