JP6396796B2 - 高圧縮応力を有するイオン交換可能なガラス - Google Patents
高圧縮応力を有するイオン交換可能なガラス Download PDFInfo
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- 239000011521 glass Substances 0.000 title claims description 124
- 238000005342 ion exchange Methods 0.000 claims description 55
- 239000005354 aluminosilicate glass Substances 0.000 claims description 35
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 32
- 238000000034 method Methods 0.000 claims description 14
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 230000008569 process Effects 0.000 claims description 7
- 229910052708 sodium Inorganic materials 0.000 claims description 7
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 5
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 claims description 5
- 238000001816 cooling Methods 0.000 claims description 4
- 230000009477 glass transition Effects 0.000 claims description 4
- 238000003280 down draw process Methods 0.000 claims description 3
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 2
- 229910020599 Co 3 O 4 Inorganic materials 0.000 claims 1
- 235000010333 potassium nitrate Nutrition 0.000 claims 1
- 239000004323 potassium nitrate Substances 0.000 claims 1
- 239000011734 sodium Substances 0.000 description 34
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 19
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 15
- 230000006835 compression Effects 0.000 description 12
- 238000007906 compression Methods 0.000 description 12
- 229910052760 oxygen Inorganic materials 0.000 description 12
- 239000000203 mixture Substances 0.000 description 11
- 230000000694 effects Effects 0.000 description 9
- 150000003839 salts Chemical class 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 7
- 238000002844 melting Methods 0.000 description 7
- 230000008018 melting Effects 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 150000001768 cations Chemical class 0.000 description 6
- 239000011777 magnesium Substances 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 230000002411 adverse Effects 0.000 description 4
- 150000002500 ions Chemical group 0.000 description 4
- 229910052749 magnesium Inorganic materials 0.000 description 4
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000003286 fusion draw glass process Methods 0.000 description 3
- 229910052700 potassium Inorganic materials 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 238000003283 slot draw process Methods 0.000 description 3
- 238000010583 slow cooling Methods 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- 229910017976 MgO 4 Inorganic materials 0.000 description 2
- NPYPAHLBTDXSSS-UHFFFAOYSA-N Potassium ion Chemical compound [K+] NPYPAHLBTDXSSS-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical group [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000006025 fining agent Substances 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- FUJCRWPEOMXPAD-UHFFFAOYSA-N lithium oxide Chemical compound [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 2
- 229910001947 lithium oxide Inorganic materials 0.000 description 2
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 2
- -1 oxygen anions Chemical class 0.000 description 2
- 229910001414 potassium ion Inorganic materials 0.000 description 2
- 230000001902 propagating effect Effects 0.000 description 2
- 238000010791 quenching Methods 0.000 description 2
- 230000000171 quenching effect Effects 0.000 description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 235000010344 sodium nitrate Nutrition 0.000 description 2
- 239000004317 sodium nitrate Substances 0.000 description 2
- 238000005728 strengthening Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910018516 Al—O Inorganic materials 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 229910019092 Mg-O Inorganic materials 0.000 description 1
- 229910019395 Mg—O Inorganic materials 0.000 description 1
- 229910004283 SiO 4 Inorganic materials 0.000 description 1
- 229910007541 Zn O Inorganic materials 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 1
- 239000005347 annealed glass Substances 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- KOPBYBDAPCDYFK-UHFFFAOYSA-N caesium oxide Chemical class [O-2].[Cs+].[Cs+] KOPBYBDAPCDYFK-UHFFFAOYSA-N 0.000 description 1
- 229910001942 caesium oxide Inorganic materials 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 230000000755 effect on ion Effects 0.000 description 1
- 230000009881 electrostatic interaction Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 229910052839 forsterite Inorganic materials 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000000391 magnesium silicate Substances 0.000 description 1
- 229910052919 magnesium silicate Inorganic materials 0.000 description 1
- 235000019792 magnesium silicate Nutrition 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 231100000572 poisoning Toxicity 0.000 description 1
- 230000000607 poisoning effect Effects 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 239000011819 refractory material Substances 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- 229910001952 rubidium oxide Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 229910000314 transition metal oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
- C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
- C03C21/002—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to perform ion-exchange between alkali ions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
- C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
- C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31—Surface property or characteristic of web, sheet or block
- Y10T428/315—Surface modified glass [e.g., tempered, strengthened, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
- Surface Treatment Of Glass (AREA)
Description
−340+27.1・Al2O3−28.7・B2O3+15.6・Na2O−61.4・K2O+8.1・(MgO+ZnO)≧0モル% (1)
を満たす組成物についてのみ、達成される。上述した組成範囲内に入る酸化物の全ての組合せがCS基準を満たすわけではない。式(1)のCS基準を満たさないものは、一般に、許容できないほど低いイオン交換速度および/または低い圧縮応力のいずれかを示すであろう。先にここに記載した範囲に入る組成を有し、このCS基準を満たすガラスの例が、表1に列挙されている。
Na2O+K2O−Al2O3−MgO−ZnO=0 (2)
が望ましいであろう。しかながら、Na2OにK2Oを加えた濃度を超えたAl2O3、MgO、またはZnOの濃度は、一般に、圧縮応力に悪影響を与えないが、イオン交換速度は、最高のMgOおよびZnOのレベルで悪影響を受けることがある。その上、Na、K、Al、Mg、およびZnの相対比は、圧縮応力、層の深さ、またはその両方を改善するために、互いに関して変えることができる。しかしながら、アルミナの含有量が比較的高いガラスは極めて粘性であり得、溶融速度およびガラス物品中の欠陥レベルが悪影響を受けることがある。MgOの濃度が高いガラスは、高い液相線温度を有する傾向にあり、このことは、溶融、清澄、または成形プロセスを妨げるであろう。
−5モル%≦Na2O+K2O−Al2O3−MgO−ZnO≦4モル% (3)
である場合、イオン交換特性および製造条件の優れた組合せが得られることが分かった。補償基準と称される式(3)は、ここに記載されたガラスの必要条件ではないが、特定の溶融または成形プロセスのためにガラスを設計するときに考慮する要因であろう。この補償基準は、イオン交換後に達成される圧縮応力に影響する。最高の圧縮応力は、一般に、補償基準がゼロ以下である場合に得られる。表1における実施例1〜183、282、および283は、補償基準を満たす典型的な組成である。
110 第1の表面
112 第2の表面
120,122 圧縮応力層
130 中央領域
Claims (6)
- イオン交換されており、表面と、該表面から層の深さまで延在する圧縮応力下にある層とを有するガラス物品において、前記圧縮応力が少なくとも900MPaであり、前記層の深さが少なくとも30μmであり、前記ガラス物品が、50モル%以上71.68モル%以下のSiO2、8.03モル%以上26モル%以下のAl2O3、11モル%以上25モル%以下のNa2O、0モル%以上9モル%以下のB2O3、0モル%以上1.46モル%以下のK2O、0モル%以上8.5モル%以下のMgO、0モル%以上2.48モル%以下のZnO、および0モル%以上1.5モル%以下のCaOを含み、かつ、Li2Oを実質的に含まず、−340+27.1・Al2O3−28.7・B2O3+15.6・Na2O−61.4・K2O+8.1・(MgO+ZnO)≧40.476モル%、および0.7モル%≦Na2O+K2O−Al2O3−MgO−ZnO≦2モル%であるガラス物品。
- SiO2+Al2O3+B2O3+Na2O+K2O+MgO+ZnO≧95モル%である、請求項1記載のガラス物品。
- Na2O+Al2O3+MgO+ZnO>25モル%である、請求項1または2記載のガラス物品。
- ZrO2、TiO2、V2O3、Cr2O3、Co3O4、およびFe2O3の内の少なくとも1つをさらに含む、請求項1から3いずれか1項記載のガラス物品。
- 圧縮応力下にある層を有するガラス物品を製造する方法において、前記層が前記ガラス物品の表面から層の深さまで延在し、該方法が、
a. 50モル%以上71.68モル%以下のSiO2、8.03モル以上26モル%以下のAl2O3、11モル%以上25モル%以下のNa2O、0モル%以上9モル%以下のB2O3、0モル%以上1.46モル%以下のK2O、0モル%以上8.5モル%以下のMgO、0モル%以上2.48モル%以下のZnO、および0モル%以上1.5モル%以下のCaOとを含み、かつ、Li2Oを実質的に含まず、−340+27.1・Al2O3−28.7・B2O3+15.6・Na2O−61.4・K2O+8.1・(MgO+ZnO)≧40.476モル%、および0.7モル%≦Na2O+K2O−Al2O3−MgO−ZnO≦2モル%である、アルミノケイ酸塩ガラス物品を提供する工程、
b.前記アルミノケイ酸塩ガラス物品が歪み点とガラス転移温度Tgとを有し、イオン交換前に、アルミノケイ酸塩ガラス物品を、歪み点とガラス転移温度Tgとの間の温度で最長2時間徐冷する工程、および
c. 最長16時間410℃までの温度で、硝酸カリウムを含む浴中において前記アルミノケイ酸塩ガラス物品をイオン交換して、前記層を形成する工程であって、該層が少なくとも900MPaの圧縮応力下にあり、前記層の深さが少なくとも30μmである工程、
を有してなる方法。 - 前記アルミノケイ酸塩ガラス物品を提供する工程が、前記アルミノケイ酸塩ガラス物品をダウンドローし、ダウンドローの後に少なくとも4℃/秒の速度で前記アルミノケイ酸塩ガラスを冷却する各工程を含む、請求項5記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201161503734P | 2011-07-01 | 2011-07-01 | |
US61/503,734 | 2011-07-01 | ||
PCT/US2012/044113 WO2013006301A1 (en) | 2011-07-01 | 2012-06-26 | Ion exchangeable glass with high compressive stress |
Publications (2)
Publication Number | Publication Date |
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JP2014522798A JP2014522798A (ja) | 2014-09-08 |
JP6396796B2 true JP6396796B2 (ja) | 2018-09-26 |
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Family Applications (1)
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JP2014518898A Active JP6396796B2 (ja) | 2011-07-01 | 2012-06-26 | 高圧縮応力を有するイオン交換可能なガラス |
Country Status (8)
Country | Link |
---|---|
US (1) | US9290413B2 (ja) |
EP (1) | EP2726424B1 (ja) |
JP (1) | JP6396796B2 (ja) |
KR (1) | KR20140058535A (ja) |
CN (1) | CN103648996B (ja) |
BR (1) | BR112013033668A2 (ja) |
TW (1) | TWI591039B (ja) |
WO (1) | WO2013006301A1 (ja) |
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WO2009070237A1 (en) * | 2007-11-29 | 2009-06-04 | Corning Incorporated | Glasses having improved toughness and scratch resistance |
JP5612233B1 (ja) * | 2010-12-24 | 2014-10-22 | 旭硝子株式会社 | 化学強化用ガラス |
JP5834793B2 (ja) * | 2010-12-24 | 2015-12-24 | 旭硝子株式会社 | 化学強化ガラスの製造方法 |
US9783452B2 (en) * | 2011-07-01 | 2017-10-10 | Corning Incorporated | Ion-exchanged glass of high surface compression and shallow depth of layer with high resistance to radial crack formation from vickers indentation |
RU2691186C2 (ru) | 2011-10-25 | 2019-06-11 | Корнинг Инкорпорейтед | Щелочноземельные алюмосиликатные стеклянные композиции с улучшенной химической и механической стойкостью |
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US9517966B2 (en) | 2011-10-25 | 2016-12-13 | Corning Incorporated | Glass compositions with improved chemical and mechanical durability |
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US8901544B2 (en) | 2011-12-06 | 2014-12-02 | Corning Incorporated | Organic thin film transistor with ion exchanged glass substrate |
US9701580B2 (en) * | 2012-02-29 | 2017-07-11 | Corning Incorporated | Aluminosilicate glasses for ion exchange |
US9359251B2 (en) | 2012-02-29 | 2016-06-07 | Corning Incorporated | Ion exchanged glasses via non-error function compressive stress profiles |
TWI593644B (zh) | 2012-05-09 | 2017-08-01 | 康寧公司 | 製造覆蓋玻璃的方法 |
US9512029B2 (en) | 2012-05-31 | 2016-12-06 | Corning Incorporated | Cover glass article |
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KR20130072187A (ko) * | 2010-05-19 | 2013-07-01 | 아사히 가라스 가부시키가이샤 | 화학 강화용 유리 및 디스플레이 장치용 유리판 |
US8759238B2 (en) | 2010-05-27 | 2014-06-24 | Corning Incorporated | Ion exchangeable glasses |
TWI588104B (zh) | 2010-12-14 | 2017-06-21 | 康寧公司 | 用於強化玻璃之熱處理 |
JP5896338B2 (ja) * | 2011-01-18 | 2016-03-30 | 日本電気硝子株式会社 | 強化用ガラスの製造方法及び強化ガラス板の製造方法 |
US20120196110A1 (en) * | 2011-01-19 | 2012-08-02 | Takashi Murata | Tempered glass and tempered glass sheet |
CN103476727B (zh) | 2011-03-16 | 2016-12-28 | 苹果公司 | 薄玻璃的受控化学强化 |
US10781135B2 (en) | 2011-03-16 | 2020-09-22 | Apple Inc. | Strengthening variable thickness glass |
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2012
- 2012-06-22 TW TW101122443A patent/TWI591039B/zh active
- 2012-06-26 JP JP2014518898A patent/JP6396796B2/ja active Active
- 2012-06-26 CN CN201280033023.1A patent/CN103648996B/zh active Active
- 2012-06-26 WO PCT/US2012/044113 patent/WO2013006301A1/en active Application Filing
- 2012-06-26 BR BR112013033668A patent/BR112013033668A2/pt not_active IP Right Cessation
- 2012-06-26 US US13/533,298 patent/US9290413B2/en active Active
- 2012-06-26 EP EP12733568.5A patent/EP2726424B1/en active Active
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WO2013006301A1 (en) | 2013-01-10 |
TW201307235A (zh) | 2013-02-16 |
KR20140058535A (ko) | 2014-05-14 |
US20130004758A1 (en) | 2013-01-03 |
EP2726424A1 (en) | 2014-05-07 |
CN103648996B (zh) | 2017-12-22 |
US9290413B2 (en) | 2016-03-22 |
EP2726424B1 (en) | 2021-08-04 |
CN103648996A (zh) | 2014-03-19 |
JP2014522798A (ja) | 2014-09-08 |
BR112013033668A2 (pt) | 2017-03-14 |
TWI591039B (zh) | 2017-07-11 |
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