JP6396775B2 - 撮像装置 - Google Patents
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- JP6396775B2 JP6396775B2 JP2014244944A JP2014244944A JP6396775B2 JP 6396775 B2 JP6396775 B2 JP 6396775B2 JP 2014244944 A JP2014244944 A JP 2014244944A JP 2014244944 A JP2014244944 A JP 2014244944A JP 6396775 B2 JP6396775 B2 JP 6396775B2
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- 238000003384 imaging method Methods 0.000 title claims description 75
- 239000012535 impurity Substances 0.000 claims description 284
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- 238000002955 isolation Methods 0.000 claims description 13
- 238000006243 chemical reaction Methods 0.000 claims description 8
- 101100116390 Schizosaccharomyces pombe (strain 972 / ATCC 24843) ded1 gene Proteins 0.000 claims description 5
- 230000000779 depleting effect Effects 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
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- 101000900567 Pisum sativum Disease resistance response protein Pi49 Proteins 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- 101100125371 Caenorhabditis elegans cil-1 gene Proteins 0.000 description 3
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- 102100024933 Protein CASP Human genes 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
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- ZRMMVODKVLXCBB-UHFFFAOYSA-N 1-n-cyclohexyl-4-n-phenylbenzene-1,4-diamine Chemical compound C1CCCCC1NC(C=C1)=CC=C1NC1=CC=CC=C1 ZRMMVODKVLXCBB-UHFFFAOYSA-N 0.000 description 1
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- 229920005591 polysilicon Polymers 0.000 description 1
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Description
態様で第2深さから第2深さよりも深い位置にわたり形成されている。第3不純物領域と第4不純物領域とは、互いに接する態様で第1方向と交差する第2方向に沿って交互に複数配置されている。第1導電型はp型である。第2導電型はn型である。第3不純物領域は、第1幅をもって第1方向に延在している。第4不純物領域は、第2幅をもって第1方向に延在している。第1幅をX P 、第2幅をX N 、シリコンの誘電率をε Si 、素電荷量をq、第3不純物領域の不純物濃度をN A 、第4不純物領域の不純物濃度をN D 、第3不純物領域および第4不純物領域を空乏化させる空乏化電位をV dep2 とすると、第2幅は、
実施の形態1に係る撮像装置のフォトダイオード等について説明する。
実施の形態1では、それぞれ所定の幅を有するN型不純物領域PD2NとP型不純物領域PD2Pが、Y方向に延在する場合について説明した。ここでは、N型不純物領域PD2NとP型不純物領域PD2Pが、X方向に延在する場合について説明する。
ここでは、分離用P型領域に沿ってN型不純物領域が形成された撮像装置について説明する。
Claims (7)
- 主表面を有する半導体基板と、
前記半導体基板に形成された素子分離領域によって規定された第1導電型の素子形成領域と、
前記素子形成領域を第1領域と第2領域とに区切る態様で前記素子形成領域を横切るように第1方向に延在する電極部と、
前記第1領域に形成された光電変換部と
を有し、
前記光電変換部は、
前記素子形成領域の表面から第1深さにわたり形成された第1導電型の第1不純物領域と、
前記第1不純物領域に接するように、前記第1深さから前記第1深さよりも深い第2深さにわたり形成された第2導電型の第2不純物領域と、
前記第1方向に延在するとともに、前記第2不純物領域に接する態様で前記第2深さから前記第2深さよりも深い位置にわたり形成された第1導電型の第3不純物領域と、
前記第1方向に延在するとともに、前記第2不純物領域に接する態様で前記第2深さから前記第2深さよりも深い位置にわたり形成された第2導電型の第4不純物領域と
を備え、
前記第3不純物領域と前記第4不純物領域とは、互いに接する態様で前記第1方向と交差する第2方向に沿って交互に複数配置され、
前記第1導電型はp型であり、
前記第2導電型はn型であり、
前記第3不純物領域は、第1幅をもって前記第1方向に延在し、
前記第4不純物領域は、第2幅をもって前記第1方向に延在し、
前記第1幅をXP、前記第2幅をXN、シリコンの誘電率をεSi、素電荷量をq、前記第3不純物領域の不純物濃度をNA、前記第4不純物領域の不純物濃度をND、前記第3不純物領域および前記第4不純物領域を空乏化させる空乏化電位をVdep2とすると、
前記第2幅は、
前記第1幅は、
- 前記第2不純物領域を空乏化させる空乏化電位をVdep1とすると、
Vdep1>Vdep2となるように、前記素子形成領域の不純物濃度、前記第1不純物領域の不純物濃度、前記第2不純物領域の不純物濃度、前記第3不純物領域の不純物濃度および前記第4不純物領域の不純物濃度が調整された、請求項1記載の撮像装置。 - 前記第3不純物領域の不純物濃度は、前記素子形成領域の不純物濃度よりも高く設定され、
前記第4不純物領域の不純物濃度は、前記第2不純物領域の不純物濃度よりも低く設定された、請求項1または2に記載の撮像装置。 - 主表面を有する半導体基板と、
前記半導体基板に形成された素子分離領域によって規定された第1導電型の素子形成領域と、
前記素子形成領域を第1領域と第2領域とに区切る態様で前記素子形成領域を横切るように第1方向に延在する電極部と、
前記第1領域に形成された光電変換部と
を有し、
前記光電変換部は、
前記素子形成領域の表面から第1深さにわたり形成された第1導電型の第1不純物領域と、
前記第1方向と交差する第2方向に延在するとともに、前記第1不純物領域に接する態様で前記第1深さから前記第1深さよりも深い位置にわたり形成された第1導電型の第2不純物領域と、
前記第2方向に延在するとともに、前記第1不純物領域に接する態様で前記第1深さから前記第1深さよりも深い位置にわたり形成された第2導電型の第3不純物領域と
を備え、
前記第2不純物領域と前記第3不純物領域とは、互いに接する態様で前記第1方向に沿って交互に複数配置され、
前記第3不純物領域では、前記電極部が位置する側において互いに繋がっている、撮像装置。 - 前記第2不純物領域は、第1幅をもって前記第2方向に延在し、
前記第3不純物領域は、第2幅をもって前記第2方向に延在する、請求項4記載の撮像装置。 - 前記第1導電型はp型であり、
前記第2導電型はn型である、請求項4または5に記載の撮像装置。 - 前記第2不純物領域の不純物濃度は、前記素子形成領域の不純物濃度よりも高く設定された、請求項4〜6のいずれかに記載の撮像装置。
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JP2014244944A JP6396775B2 (ja) | 2014-12-03 | 2014-12-03 | 撮像装置 |
US14/948,190 US9755094B2 (en) | 2014-12-03 | 2015-11-20 | Imaging device |
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JP2017054966A (ja) * | 2015-09-10 | 2017-03-16 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法および半導体装置 |
CN107924929B (zh) * | 2015-09-17 | 2022-10-18 | 索尼半导体解决方案公司 | 固体摄像器件、电子设备以及固体摄像器件的制造方法 |
JP6706481B2 (ja) * | 2015-11-05 | 2020-06-10 | ソニーセミコンダクタソリューションズ株式会社 | 撮像素子 |
JP6552479B2 (ja) * | 2016-12-28 | 2019-07-31 | キヤノン株式会社 | 固体撮像装置及び撮像システム |
JP6946379B2 (ja) * | 2016-12-28 | 2021-10-06 | キヤノン株式会社 | 固体撮像装置及び撮像システム |
JP7121468B2 (ja) * | 2017-02-24 | 2022-08-18 | ブリルニクス シンガポール プライベート リミテッド | 固体撮像装置、固体撮像装置の製造方法、および電子機器 |
JP2018186129A (ja) | 2017-04-24 | 2018-11-22 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
JP6949563B2 (ja) * | 2017-06-02 | 2021-10-13 | キヤノン株式会社 | 固体撮像装置、撮像システム及び移動体 |
EP3477710B1 (en) * | 2017-10-26 | 2023-03-29 | STMicroelectronics (Research & Development) Limited | Avalanche photodiode and method of manufacturing the avalanche photodiode |
DE112019002840T5 (de) | 2018-06-06 | 2021-02-25 | Sony Semiconductor Solutions Corporation | Bildgebungselement und elektronische vorrichtung |
JP2020013907A (ja) * | 2018-07-18 | 2020-01-23 | ソニーセミコンダクタソリューションズ株式会社 | 受光素子および測距モジュール |
JP2020053450A (ja) | 2018-09-25 | 2020-04-02 | ソニーセミコンダクタソリューションズ株式会社 | 撮像素子、電子機器 |
CN113169204A (zh) * | 2020-06-30 | 2021-07-23 | 深圳市大疆创新科技有限公司 | 图像传感器及其制作方法、搭载图像传感器的成像装置 |
CN112259565A (zh) * | 2020-08-26 | 2021-01-22 | 天津大学 | 一种基于大尺寸像素的电荷快速转移方法 |
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JP2000031451A (ja) * | 1998-07-13 | 2000-01-28 | Toshiba Corp | 固体撮像装置およびその製造方法 |
JP4604296B2 (ja) * | 1999-02-09 | 2011-01-05 | ソニー株式会社 | 固体撮像装置及びその製造方法 |
JP2002026274A (ja) * | 2000-05-01 | 2002-01-25 | Mitsubishi Electric Corp | 半導体装置の製造方法 |
FI20055057A (fi) * | 2004-05-11 | 2005-11-12 | Artto Aurola | Puolijohdelaite |
JP4752193B2 (ja) * | 2004-05-19 | 2011-08-17 | ソニー株式会社 | 固体撮像素子 |
KR20080016259A (ko) * | 2006-08-18 | 2008-02-21 | 동부일렉트로닉스 주식회사 | 씨모스 이미지 센서 및 그 제조방법 |
JP5967944B2 (ja) * | 2012-01-18 | 2016-08-10 | キヤノン株式会社 | 固体撮像装置およびカメラ |
JP2014165286A (ja) * | 2013-02-23 | 2014-09-08 | Nikon Corp | フォトダイオード、固体撮像素子及び撮像装置 |
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2014
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US20160163897A1 (en) | 2016-06-09 |
US9755094B2 (en) | 2017-09-05 |
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