JP6366263B2 - 光学多層膜、光学レンズ及び光学多層膜の製造方法 - Google Patents

光学多層膜、光学レンズ及び光学多層膜の製造方法 Download PDF

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JP6366263B2
JP6366263B2 JP2013258141A JP2013258141A JP6366263B2 JP 6366263 B2 JP6366263 B2 JP 6366263B2 JP 2013258141 A JP2013258141 A JP 2013258141A JP 2013258141 A JP2013258141 A JP 2013258141A JP 6366263 B2 JP6366263 B2 JP 6366263B2
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Prior art keywords
film
multilayer film
optical multilayer
magnesium
optical
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JP2013258141A
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English (en)
Japanese (ja)
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JP2015114599A5 (enExample
JP2015114599A (ja
Inventor
秋葉　英生
英生 秋葉
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Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2013258141A priority Critical patent/JP6366263B2/ja
Priority to US15/103,781 priority patent/US10114150B2/en
Priority to PCT/JP2014/006108 priority patent/WO2015087534A1/en
Publication of JP2015114599A publication Critical patent/JP2015114599A/ja
Publication of JP2015114599A5 publication Critical patent/JP2015114599A5/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3447—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a halide
    • C03C17/3452—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a halide comprising a fluoride
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
JP2013258141A 2013-12-13 2013-12-13 光学多層膜、光学レンズ及び光学多層膜の製造方法 Active JP6366263B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2013258141A JP6366263B2 (ja) 2013-12-13 2013-12-13 光学多層膜、光学レンズ及び光学多層膜の製造方法
US15/103,781 US10114150B2 (en) 2013-12-13 2014-12-05 Optical multilayer coating, optical lens, and method of manufacturing optical multilayer coating
PCT/JP2014/006108 WO2015087534A1 (en) 2013-12-13 2014-12-05 Optical multilayer coating, optical lens, and method of manufacturing optical multilayer coating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013258141A JP6366263B2 (ja) 2013-12-13 2013-12-13 光学多層膜、光学レンズ及び光学多層膜の製造方法

Publications (3)

Publication Number Publication Date
JP2015114599A JP2015114599A (ja) 2015-06-22
JP2015114599A5 JP2015114599A5 (enExample) 2017-02-02
JP6366263B2 true JP6366263B2 (ja) 2018-08-01

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JP2013258141A Active JP6366263B2 (ja) 2013-12-13 2013-12-13 光学多層膜、光学レンズ及び光学多層膜の製造方法

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Country Link
US (1) US10114150B2 (enExample)
JP (1) JP6366263B2 (enExample)
WO (1) WO2015087534A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11572617B2 (en) 2016-05-03 2023-02-07 Applied Materials, Inc. Protective metal oxy-fluoride coatings
JP6995491B2 (ja) 2017-04-21 2022-01-14 キヤノン株式会社 光学薄膜、光学素子、光学素子の製造方法
JP6953197B2 (ja) * 2017-06-22 2021-10-27 キヤノン株式会社 フッ化膜を有する光学素子の製造方法およびフッ化膜の製造方法
JP7418098B2 (ja) 2019-04-26 2024-01-19 キヤノン株式会社 光学多層膜の成膜方法および光学素子の製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4273826A (en) * 1979-12-03 1981-06-16 Owens-Illinois, Inc. Process of making glass articles having antireflective coatings and product
JP3079580B2 (ja) * 1990-12-25 2000-08-21 株式会社ニコン 光学部品用薄膜及びこれを有する光学部品及びその製造方法
US5332618A (en) * 1992-02-07 1994-07-26 Tru Vue, Inc. Antireflection layer system with integral UV blocking properties
JP3625876B2 (ja) * 1994-11-14 2005-03-02 オリンパス株式会社 光学薄膜の製造方法および該光学薄膜を有する光学部品
JP3585276B2 (ja) * 1994-12-01 2004-11-04 オリンパス株式会社 光学薄膜の製造方法およびこの光学薄膜を有する基板
US5719705A (en) 1995-06-07 1998-02-17 Sola International, Inc. Anti-static anti-reflection coating
JPH09291358A (ja) 1996-04-24 1997-11-11 Olympus Optical Co Ltd 光学薄膜の製造方法および光学薄膜
JP3967416B2 (ja) * 1997-02-28 2007-08-29 オリンパス株式会社 光学薄膜の成膜方法および成膜装置
FR2793889B1 (fr) * 1999-05-20 2002-06-28 Saint Gobain Vitrage Substrat transparent a revetement anti-reflets
EP2128658A3 (en) * 2008-05-22 2011-05-11 Fujinon Corporation Reflection reducing film, optical member and optical system
US20120212830A1 (en) * 2011-02-23 2012-08-23 Qioptiq Photonics GmbH Nonpolarizing beam splitter
JP5932251B2 (ja) * 2011-06-17 2016-06-08 キヤノン株式会社 フッ化膜形成方法及び光学素子の製造方法
US20140147594A1 (en) * 2012-11-27 2014-05-29 Intermolecular Inc. Magnesium Fluoride and Magnesium Oxyfluoride based Anti-Reflection Coatings via Chemical Solution Deposition Processes

Also Published As

Publication number Publication date
US10114150B2 (en) 2018-10-30
WO2015087534A1 (en) 2015-06-18
JP2015114599A (ja) 2015-06-22
US20160313473A1 (en) 2016-10-27

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