JP6335735B2 - フォトマスク及び表示装置の製造方法 - Google Patents

フォトマスク及び表示装置の製造方法 Download PDF

Info

Publication number
JP6335735B2
JP6335735B2 JP2014199013A JP2014199013A JP6335735B2 JP 6335735 B2 JP6335735 B2 JP 6335735B2 JP 2014199013 A JP2014199013 A JP 2014199013A JP 2014199013 A JP2014199013 A JP 2014199013A JP 6335735 B2 JP6335735 B2 JP 6335735B2
Authority
JP
Japan
Prior art keywords
pattern
light
photomask
film
transfer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2014199013A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016071059A (ja
JP2016071059A5 (enExample
Inventor
修久 今敷
修久 今敷
裕 吉川
吉川　　裕
浩幸 菅原
浩幸 菅原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP2014199013A priority Critical patent/JP6335735B2/ja
Priority to TW106130522A priority patent/TWI635353B/zh
Priority to TW104127730A priority patent/TWI604264B/zh
Priority to TW106130523A priority patent/TWI658320B/zh
Priority to TW108109637A priority patent/TWI694302B/zh
Priority to KR1020150136927A priority patent/KR20160037806A/ko
Priority to CN201510624801.XA priority patent/CN105467745B/zh
Priority to CN201911133180.XA priority patent/CN110824828B/zh
Publication of JP2016071059A publication Critical patent/JP2016071059A/ja
Publication of JP2016071059A5 publication Critical patent/JP2016071059A5/ja
Priority to KR1020170129436A priority patent/KR102182505B1/ko
Application granted granted Critical
Publication of JP6335735B2 publication Critical patent/JP6335735B2/ja
Priority to KR1020200154522A priority patent/KR102304206B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/34—Phase-edge PSM, e.g. chromeless PSM; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
    • H10K59/1213—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements the pixel elements being TFTs

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mathematical Physics (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Geometry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2014199013A 2014-09-29 2014-09-29 フォトマスク及び表示装置の製造方法 Active JP6335735B2 (ja)

Priority Applications (10)

Application Number Priority Date Filing Date Title
JP2014199013A JP6335735B2 (ja) 2014-09-29 2014-09-29 フォトマスク及び表示装置の製造方法
TW104127730A TWI604264B (zh) 2014-09-29 2015-08-25 光罩及顯示裝置之製造方法
TW106130523A TWI658320B (zh) 2014-09-29 2015-08-25 圖案轉印方法及顯示裝置之製造方法
TW108109637A TWI694302B (zh) 2014-09-29 2015-08-25 光罩及顯示裝置之製造方法
TW106130522A TWI635353B (zh) 2014-09-29 2015-08-25 光罩及顯示裝置之製造方法
CN201510624801.XA CN105467745B (zh) 2014-09-29 2015-09-25 光掩模和显示装置的制造方法
KR1020150136927A KR20160037806A (ko) 2014-09-29 2015-09-25 포토마스크 및 표시 장치의 제조 방법
CN201911133180.XA CN110824828B (zh) 2014-09-29 2015-09-25 光掩模和显示装置的制造方法
KR1020170129436A KR102182505B1 (ko) 2014-09-29 2017-10-11 포토마스크 및 표시 장치의 제조 방법
KR1020200154522A KR102304206B1 (ko) 2014-09-29 2020-11-18 포토마스크 및 표시 장치의 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014199013A JP6335735B2 (ja) 2014-09-29 2014-09-29 フォトマスク及び表示装置の製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2018088122A Division JP6731441B2 (ja) 2018-05-01 2018-05-01 フォトマスク及び表示装置の製造方法

Publications (3)

Publication Number Publication Date
JP2016071059A JP2016071059A (ja) 2016-05-09
JP2016071059A5 JP2016071059A5 (enExample) 2016-07-14
JP6335735B2 true JP6335735B2 (ja) 2018-05-30

Family

ID=55605593

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014199013A Active JP6335735B2 (ja) 2014-09-29 2014-09-29 フォトマスク及び表示装置の製造方法

Country Status (4)

Country Link
JP (1) JP6335735B2 (enExample)
KR (3) KR20160037806A (enExample)
CN (2) CN105467745B (enExample)
TW (4) TWI658320B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018116314A (ja) * 2018-05-01 2018-07-26 Hoya株式会社 フォトマスク及び表示装置の製造方法

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6259509B1 (ja) * 2016-12-28 2018-01-10 株式会社エスケーエレクトロニクス ハーフトーンマスク、フォトマスクブランクス及びハーフトーンマスクの製造方法
JP6808665B2 (ja) * 2017-03-10 2021-01-06 Hoya株式会社 表示装置製造用フォトマスク、及び表示装置の製造方法
JP7080070B2 (ja) * 2017-03-24 2022-06-03 Hoya株式会社 フォトマスク、及び表示装置の製造方法
JP6368000B1 (ja) * 2017-04-04 2018-08-01 株式会社エスケーエレクトロニクス フォトマスク及びフォトマスクブランクス並びにフォトマスクの製造方法
TWI659262B (zh) * 2017-08-07 2019-05-11 日商Ｈｏｙａ股份有限公司 光罩之修正方法、光罩之製造方法、光罩及顯示裝置之製造方法
TWI710649B (zh) * 2017-09-12 2020-11-21 日商Ｈｏｙａ股份有限公司 光罩及顯示裝置之製造方法
KR102254646B1 (ko) 2018-07-30 2021-05-21 호야 가부시키가이샤 포토마스크 수정 방법, 포토마스크의 제조 방법, 포토마스크, 및 표시 장치용 디바이스의 제조 방법
KR102367141B1 (ko) * 2019-02-27 2022-02-23 호야 가부시키가이샤 포토마스크, 포토마스크의 제조 방법, 및 표시 장치의 제조 방법
JP7437959B2 (ja) * 2019-03-07 2024-02-26 Hoya株式会社 修正フォトマスク、及び表示装置の製造方法
CN110456610B (zh) * 2019-08-29 2023-06-13 上海华力集成电路制造有限公司 优化通孔层工艺窗口的辅助图形及方法
JP7383490B2 (ja) * 2020-01-07 2023-11-20 株式会社エスケーエレクトロニクス フォトマスク
TWI893977B (zh) * 2024-09-06 2025-08-11 力晶積成電子製造股份有限公司 檢測微影製程中缺陷圖案印出風險的方法及其具有電腦可執行指令的電腦程式產品

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0315845A (ja) 1989-06-14 1991-01-24 Hitachi Ltd マスク及びマスク作製方法
JPH0695360A (ja) * 1992-09-10 1994-04-08 Fujitsu Ltd 光学マスク
JP2000019710A (ja) * 1998-07-07 2000-01-21 Hitachi Ltd 半導体集積回路装置の製造方法
JP2000181048A (ja) * 1998-12-16 2000-06-30 Sharp Corp フォトマスクおよびその製造方法、並びにそれを用いた露光方法
JP3746497B2 (ja) * 2003-06-24 2006-02-15 松下電器産業株式会社 フォトマスク
JP4645076B2 (ja) * 2004-06-28 2011-03-09 凸版印刷株式会社 位相シフトマスクおよびその製造方法およびパターン転写方法
EP1746460B1 (en) * 2005-07-21 2011-04-06 Shin-Etsu Chemical Co., Ltd. Photomask blank, photomask and fabrication method thereof
JP3971775B2 (ja) * 2005-10-17 2007-09-05 松下電器産業株式会社 フォトマスク
JP3971774B2 (ja) * 2005-10-17 2007-09-05 松下電器産業株式会社 パターン形成方法
JP2007219038A (ja) * 2006-02-15 2007-08-30 Hoya Corp マスクブランク及びフォトマスク
JP4484909B2 (ja) * 2007-07-24 2010-06-16 キヤノン株式会社 原版データ作成方法、原版作成方法、露光方法および原版データ作成プログラム
JPWO2010119811A1 (ja) * 2009-04-16 2012-10-22 Hoya株式会社 マスクブランク及び転写用マスク並びに膜緻密性評価方法
JP5611581B2 (ja) * 2009-12-21 2014-10-22 Hoya株式会社 マスクブランク及びその製造方法、並びに、転写マスク及びその製造方法
JP6186719B2 (ja) * 2011-12-21 2017-08-30 大日本印刷株式会社 大型位相シフトマスクおよび大型位相シフトマスクの製造方法
JP2013140236A (ja) * 2011-12-29 2013-07-18 Hoya Corp マスクブランク及び位相シフトマスクの製造方法
CN109298592A (zh) * 2012-02-15 2019-02-01 大日本印刷株式会社 相移掩模及使用该相移掩模的抗蚀图案形成方法
JP6139826B2 (ja) * 2012-05-02 2017-05-31 Hoya株式会社 フォトマスク、パターン転写方法、及びフラットパネルディスプレイの製造方法
JP6093117B2 (ja) * 2012-06-01 2017-03-08 Hoya株式会社 フォトマスク、フォトマスクの製造方法及びパターンの転写方法
JP5916680B2 (ja) * 2012-10-25 2016-05-11 Hoya株式会社 表示装置製造用フォトマスク、及びパターン転写方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018116314A (ja) * 2018-05-01 2018-07-26 Hoya株式会社 フォトマスク及び表示装置の製造方法

Also Published As

Publication number Publication date
CN105467745B (zh) 2019-12-20
TW201928507A (zh) 2019-07-16
TW201627751A (zh) 2016-08-01
TWI635353B (zh) 2018-09-11
TWI694302B (zh) 2020-05-21
TW201743129A (zh) 2017-12-16
KR102304206B1 (ko) 2021-09-17
KR102182505B1 (ko) 2020-11-24
JP2016071059A (ja) 2016-05-09
CN110824828A (zh) 2020-02-21
KR20200132813A (ko) 2020-11-25
CN105467745A (zh) 2016-04-06
TWI604264B (zh) 2017-11-01
TW201740184A (zh) 2017-11-16
TWI658320B (zh) 2019-05-01
KR20160037806A (ko) 2016-04-06
KR20170117988A (ko) 2017-10-24
CN110824828B (zh) 2023-12-29

Similar Documents

Publication Publication Date Title
JP6335735B2 (ja) フォトマスク及び表示装置の製造方法
JP2016071059A5 (enExample)
KR102195658B1 (ko) 포토마스크, 포토마스크의 제조 방법, 포토마스크 블랭크 및 표시 장치의 제조 방법
JP2016024264A5 (enExample)
JP7231667B2 (ja) 表示装置製造用フォトマスクブランク、表示装置製造用フォトマスク及び表示装置の製造方法
TWI777402B (zh) 顯示裝置製造用光罩、及顯示裝置之製造方法
JP6731441B2 (ja) フォトマスク及び表示装置の製造方法
JP2019012280A (ja) フォトマスク、フォトマスクの製造方法、フォトマスクブランク及び表示装置の製造方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20160525

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20160525

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20170315

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20170321

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20170517

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20170720

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20170905

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20171030

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20180104

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20180313

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20180320

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20180403

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20180501

R150 Certificate of patent or registration of utility model

Ref document number: 6335735

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250