JP6322197B2 - ナノワイヤサイズの光電構造及びその選択された部分を改質させる方法。 - Google Patents
ナノワイヤサイズの光電構造及びその選択された部分を改質させる方法。 Download PDFInfo
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- JP6322197B2 JP6322197B2 JP2015539714A JP2015539714A JP6322197B2 JP 6322197 B2 JP6322197 B2 JP 6322197B2 JP 2015539714 A JP2015539714 A JP 2015539714A JP 2015539714 A JP2015539714 A JP 2015539714A JP 6322197 B2 JP6322197 B2 JP 6322197B2
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- 238000000034 method Methods 0.000 title claims 12
- 239000002070 nanowire Substances 0.000 claims 31
- 239000000463 material Substances 0.000 claims 10
- 239000002184 metal Substances 0.000 claims 5
- 239000000126 substance Substances 0.000 claims 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims 3
- 229910004541 SiN Inorganic materials 0.000 claims 2
- 229910004298 SiO 2 Inorganic materials 0.000 claims 2
- 229910010413 TiO 2 Inorganic materials 0.000 claims 2
- 238000005240 physical vapour deposition Methods 0.000 claims 2
- 239000004065 semiconductor Substances 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 229910004140 HfO Inorganic materials 0.000 claims 1
- -1 SiCOH Inorganic materials 0.000 claims 1
- 229910045601 alloy Inorganic materials 0.000 claims 1
- 239000000956 alloy Substances 0.000 claims 1
- 238000000151 deposition Methods 0.000 claims 1
- 230000008021 deposition Effects 0.000 claims 1
- 239000011810 insulating material Substances 0.000 claims 1
- 239000012212 insulator Substances 0.000 claims 1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/811—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
- H10H20/812—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions within the light-emitting regions, e.g. having quantum confinement structures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
- H10H20/013—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials
- H10H20/0137—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials the light-emitting regions comprising nitride materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/811—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/819—Bodies characterised by their shape, e.g. curved or truncated substrates
- H10H20/821—Bodies characterised by their shape, e.g. curved or truncated substrates of the light-emitting regions, e.g. non-planar junctions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/822—Materials of the light-emitting regions
- H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
- H10H20/825—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP containing nitrogen, e.g. GaN
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/83—Electrodes
- H10H20/832—Electrodes characterised by their material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/84—Coatings, e.g. passivation layers or antireflective coatings
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/032—Manufacture or treatment of electrodes
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- Led Devices (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261718884P | 2012-10-26 | 2012-10-26 | |
| US61/718,884 | 2012-10-26 | ||
| PCT/US2013/066151 WO2014066371A1 (en) | 2012-10-26 | 2013-10-22 | Nanowire sized opto-electronic structure and method for modifying selected portions of same |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015536566A JP2015536566A (ja) | 2015-12-21 |
| JP2015536566A5 JP2015536566A5 (enExample) | 2016-12-08 |
| JP6322197B2 true JP6322197B2 (ja) | 2018-05-09 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015539714A Active JP6322197B2 (ja) | 2012-10-26 | 2013-10-22 | ナノワイヤサイズの光電構造及びその選択された部分を改質させる方法。 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US9178106B2 (enExample) |
| EP (1) | EP2912698B1 (enExample) |
| JP (1) | JP6322197B2 (enExample) |
| TW (1) | TW201427080A (enExample) |
| WO (1) | WO2014066371A1 (enExample) |
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| DE102012101718B4 (de) * | 2012-03-01 | 2025-08-28 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Optoelektronischer Halbleiterchip |
| US9178106B2 (en) | 2012-10-26 | 2015-11-03 | Glo Ab | Nanowire sized opto-electronic structure and method for modifying selected portions of same |
| JP6353845B2 (ja) * | 2012-10-26 | 2018-07-04 | グロ アーベーGlo Ab | ナノワイヤled構造の製造方法 |
| WO2014066379A1 (en) | 2012-10-26 | 2014-05-01 | Glo Ab | Nanowire sized opto-electronic structure and method for modifying selected portions of same |
| EP2973752A4 (en) | 2013-03-15 | 2016-11-09 | Glo Ab | DIELECTRIC FILM WITH HIGH BREAKING INDEX TO INCREASE EXTRACTION EFFICIENCY OF NANODRAHT LEADS |
| FR3004006B1 (fr) * | 2013-03-28 | 2016-10-07 | Aledia | Dispositif electroluminescent a nanofils actifs et nanofils de contact et procede de fabrication |
| CN204138341U (zh) * | 2013-04-18 | 2015-02-04 | 崔波 | 硅衬底上的硅柱阵列 |
| WO2015089123A1 (en) * | 2013-12-13 | 2015-06-18 | Glo Ab | Use of dielectric film to reduce resistivity of transparent conductive oxide in nanowire leds |
| KR102188497B1 (ko) * | 2014-03-27 | 2020-12-09 | 삼성전자주식회사 | 나노구조 반도체 발광소자 |
| DE102014107167B4 (de) | 2014-05-21 | 2022-04-21 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Verfahren zur Herstellung eines Halbleiterbauelements mit einer Strukturschicht mit einer Mehrzahl von dreidimensionalen Strukturelementen und strahlungsemittierendes Halbleiterbauelement mit einer Strukturschicht mit einer Mehrzahl von dreidimensionalen Strukturelementen |
| DE102014117892A1 (de) * | 2014-12-04 | 2016-06-09 | Osram Opto Semiconductors Gmbh | Optoelektronisches Bauelement sowie optoelektronisches Bauteil |
| EP3127747A1 (fr) * | 2015-08-07 | 2017-02-08 | Valeo Vision | Dispositif d'éclairage et/ou de signalisation pour véhicule automobile |
| US10665451B2 (en) * | 2015-10-20 | 2020-05-26 | King Abdullah University Of Science And Technology | Nanowires-based light emitters on thermally and electrically conductive substrates and of making same |
| DE102015120778B4 (de) * | 2015-11-30 | 2021-09-23 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Optoelektronisches Bauelement und Verfahren zur Herstellung eines optoelektronischen Bauelements |
| DE102016102876A1 (de) * | 2016-02-18 | 2017-08-24 | Osram Opto Semiconductors Gmbh | Optoelektronisches Halbleiterbauelement und Verfahren zur Herstellung eines optoelektronischen Halbleiterbauelements |
| CN207396531U (zh) | 2017-01-31 | 2018-05-22 | 杭州探真纳米科技有限公司 | 一种悬臂末端纳米探针 |
| US10840223B2 (en) * | 2017-03-23 | 2020-11-17 | Intel Corporation | Augmented reality display systems with super-lambertian LED source |
| JP7007547B2 (ja) * | 2017-04-11 | 2022-01-24 | 日亜化学工業株式会社 | 発光素子の製造方法 |
| US10418499B2 (en) | 2017-06-01 | 2019-09-17 | Glo Ab | Self-aligned nanowire-based light emitting diode subpixels for a direct view display and method of making thereof |
| GB201718897D0 (en) | 2017-11-15 | 2017-12-27 | Microsoft Technology Licensing Llc | Superconductor-semiconductor fabrication |
| WO2019055271A1 (en) | 2017-09-15 | 2019-03-21 | Glo Ab | OPTICAL EXTENSION IMPROVEMENT OF LIGHT-EMITTING DIODE SUB-PIXELS |
| JP7137066B2 (ja) | 2018-10-23 | 2022-09-14 | 日亜化学工業株式会社 | 発光素子の製造方法 |
| US11024792B2 (en) | 2019-01-25 | 2021-06-01 | Microsoft Technology Licensing, Llc | Fabrication methods |
| KR102859951B1 (ko) | 2019-12-10 | 2025-09-15 | 삼성디스플레이 주식회사 | 발광 소자 및 이를 포함하는 표시 장치 |
| CN115004390A (zh) * | 2019-12-24 | 2022-09-02 | 密歇根大学董事会 | 第iii族氮化物激子异质结构 |
| FR3118290A1 (fr) * | 2020-12-17 | 2022-06-24 | Aledia | Dispositif optoélectronique à diodes électroluminescentes tridimensionnelles de type axial |
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| US6963086B2 (en) * | 2001-10-10 | 2005-11-08 | Sony Corporation | Semiconductor light-emitting device image display illuminator and its manufacturing method |
| US7335908B2 (en) | 2002-07-08 | 2008-02-26 | Qunano Ab | Nanostructures and methods for manufacturing the same |
| US7132677B2 (en) | 2004-02-13 | 2006-11-07 | Dongguk University | Super bright light emitting diode of nanorod array structure having InGaN quantum well and method for manufacturing the same |
| US7276389B2 (en) * | 2004-02-25 | 2007-10-02 | Samsung Electronics Co., Ltd. | Article comprising metal oxide nanostructures and method for fabricating such nanostructures |
| US20070158661A1 (en) | 2006-01-12 | 2007-07-12 | Rutgers, The State University Of New Jersey | ZnO nanostructure-based light emitting device |
| US8691011B2 (en) | 2006-03-08 | 2014-04-08 | Qunano Ab | Method for metal-free synthesis of epitaxial semiconductor nanowires on si |
| EP1994552B1 (en) * | 2006-03-10 | 2020-12-30 | UNM Rainforest Innovations | Two-phase growth of group iii-v nanowires |
| WO2008034823A1 (en) * | 2006-09-18 | 2008-03-27 | Qunano Ab | Method of producing precision vertical and horizontal layers in a vertical semiconductor structure |
| US8426224B2 (en) | 2006-12-18 | 2013-04-23 | The Regents Of The University Of California | Nanowire array-based light emitting diodes and lasers |
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| US20110079766A1 (en) * | 2009-10-01 | 2011-04-07 | Isaac Harshman Wildeson | Process for fabricating iii-nitride based nanopyramid leds directly on a metalized silicon substrate |
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| KR20120055390A (ko) * | 2010-11-23 | 2012-05-31 | 삼성엘이디 주식회사 | 발광소자 및 그 제조방법 |
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| US8350249B1 (en) | 2011-09-26 | 2013-01-08 | Glo Ab | Coalesced nanowire structures with interstitial voids and method for manufacturing the same |
| CN104769732A (zh) * | 2012-09-18 | 2015-07-08 | Glo公司 | 纳米角锥体大小的光电子结构及其制造方法 |
| JP6353845B2 (ja) | 2012-10-26 | 2018-07-04 | グロ アーベーGlo Ab | ナノワイヤled構造の製造方法 |
| WO2014066379A1 (en) | 2012-10-26 | 2014-05-01 | Glo Ab | Nanowire sized opto-electronic structure and method for modifying selected portions of same |
| US9178106B2 (en) | 2012-10-26 | 2015-11-03 | Glo Ab | Nanowire sized opto-electronic structure and method for modifying selected portions of same |
-
2013
- 2013-10-22 US US14/059,658 patent/US9178106B2/en not_active Expired - Fee Related
- 2013-10-22 JP JP2015539714A patent/JP6322197B2/ja active Active
- 2013-10-22 WO PCT/US2013/066151 patent/WO2014066371A1/en not_active Ceased
- 2013-10-22 EP EP13848477.9A patent/EP2912698B1/en active Active
- 2013-10-25 TW TW102138762A patent/TW201427080A/zh unknown
-
2015
- 2015-10-29 US US14/926,900 patent/US9799796B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| US20160141450A1 (en) | 2016-05-19 |
| US9799796B2 (en) | 2017-10-24 |
| WO2014066371A1 (en) | 2014-05-01 |
| EP2912698B1 (en) | 2018-04-04 |
| EP2912698A4 (en) | 2016-04-06 |
| TW201427080A (zh) | 2014-07-01 |
| JP2015536566A (ja) | 2015-12-21 |
| US20140117307A1 (en) | 2014-05-01 |
| US9178106B2 (en) | 2015-11-03 |
| EP2912698A1 (en) | 2015-09-02 |
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