JP6315673B2 - 着色感光性樹脂組成物 - Google Patents

着色感光性樹脂組成物 Download PDF

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Publication number
JP6315673B2
JP6315673B2 JP2014051180A JP2014051180A JP6315673B2 JP 6315673 B2 JP6315673 B2 JP 6315673B2 JP 2014051180 A JP2014051180 A JP 2014051180A JP 2014051180 A JP2014051180 A JP 2014051180A JP 6315673 B2 JP6315673 B2 JP 6315673B2
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Japan
Prior art keywords
weight
butyl
resin composition
photosensitive resin
colored photosensitive
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JP2014051180A
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English (en)
Japanese (ja)
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JP2014182383A (ja
Inventor
ヒ リ フン
ヒ リ フン
ユ キム ボン
ユ キム ボン
ラム ジュン ボ
ラム ジュン ボ
ソ リ ジョン
ソ リ ジョン
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Dongwoo Fine Chem Co Ltd
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Dongwoo Fine Chem Co Ltd
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Publication of JP2014182383A publication Critical patent/JP2014182383A/ja
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/23—Photochromic filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
JP2014051180A 2013-03-15 2014-03-14 着色感光性樹脂組成物 Active JP6315673B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020130028107A KR101852509B1 (ko) 2013-03-15 2013-03-15 착색 감광성 수지 조성물
KR10-2013-0028107 2013-03-15

Publications (2)

Publication Number Publication Date
JP2014182383A JP2014182383A (ja) 2014-09-29
JP6315673B2 true JP6315673B2 (ja) 2018-04-25

Family

ID=51502510

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014051180A Active JP6315673B2 (ja) 2013-03-15 2014-03-14 着色感光性樹脂組成物

Country Status (4)

Country Link
JP (1) JP6315673B2 (zh)
KR (1) KR101852509B1 (zh)
CN (1) CN104049460B (zh)
TW (1) TWI516864B (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103293855B (zh) * 2013-05-20 2015-12-23 常州强力先端电子材料有限公司 一种丙烯酸酯类光固化组合物
JP6707348B2 (ja) 2015-01-09 2020-06-10 三星ディスプレイ株式會社Ｓａｍｓｕｎｇ Ｄｉｓｐｌａｙ Ｃｏ．，Ｌｔｄ． 感光性樹脂組成物、これを用いた色変換パネル及び表示装置
KR102195690B1 (ko) * 2015-03-26 2020-12-28 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이로부터 형성된 광경화 패턴 및 이를 포함하는 화상 표시 장치
KR20170072381A (ko) 2015-12-16 2017-06-27 삼성디스플레이 주식회사 액정 표시 장치
KR102333141B1 (ko) 2016-02-22 2021-11-30 삼성디스플레이 주식회사 감광성 수지 조성물 및 이를 사용하여 제조된 색변환층을 포함하는 표시 장치
KR102450251B1 (ko) * 2016-03-29 2022-10-04 동우 화인켐 주식회사 유기발광다이오드용 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치
JP7230559B2 (ja) * 2018-03-20 2023-03-01 三菱ケミカル株式会社 感光性着色組成物、硬化物、着色スペーサー、及び画像表示装置
KR102558491B1 (ko) * 2019-03-12 2023-07-21 동우 화인켐 주식회사 유기발광다이오드용 청색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 화상표시장치
CN113652152A (zh) * 2021-08-10 2021-11-16 深圳市金达盛化工有限公司 Led冷光源固化金属涂层材料制备及其应用方法

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TW482765B (en) * 1996-08-05 2002-04-11 Sumitomo Chemical Co Phosphites, process for producing the same and their use
SG77689A1 (en) * 1998-06-26 2001-01-16 Ciba Sc Holding Ag New o-acyloxime photoinitiators
JP4280147B2 (ja) 2003-10-27 2009-06-17 Ｊｓｒ株式会社 放射線硬化性樹脂組成物
JP4590893B2 (ja) * 2004-03-23 2010-12-01 Ｊｓｒ株式会社 接着剤用液状硬化性樹脂組成物
JP4750381B2 (ja) 2004-05-31 2011-08-17 Ｊｓｒ株式会社 光学的立体造形用放射線硬化性液状樹脂組成物及びそれを光硬化させて得られる光造形物
JP5233379B2 (ja) * 2008-04-11 2013-07-10 住友化学株式会社 硬化性樹脂組成物
JP5344943B2 (ja) * 2009-02-02 2013-11-20 富士フイルム株式会社 染料含有ネガ型硬化性組成物、カラーフィルタ及びその製造方法
CN101565472B (zh) * 2009-05-19 2011-05-04 常州强力电子新材料有限公司 酮肟酯类光引发剂
JP2012058728A (ja) * 2010-08-10 2012-03-22 Sumitomo Chemical Co Ltd 感光性樹脂組成物
CN101923287B (zh) * 2010-08-31 2011-11-30 常州强力电子新材料有限公司 一种含有二苯硫醚基酮肟酯类光引发剂的感光性组合物及其应用
JP5121912B2 (ja) * 2010-11-24 2013-01-16 富士フイルム株式会社 着色感光性樹脂組成物、パターン形成方法、カラーフィルタの製造方法、カラーフィルタ及びそれを備えた表示装置
JP6009774B2 (ja) * 2011-02-22 2016-10-19 東京応化工業株式会社 感光性樹脂組成物、並びにそれを用いたカラーフィルタ及び表示装置
JP5659858B2 (ja) * 2011-02-28 2015-01-28 東洋インキＳｃホールディングス株式会社 感光性着色組成物およびカラーフィルタ
JP5929496B2 (ja) * 2011-06-30 2016-06-08 Jsr株式会社 感放射線性樹脂組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法及び表示素子
JP5887867B2 (ja) * 2011-11-22 2016-03-16 日立化成株式会社 感光性樹脂組成物、これを用いた感光性樹脂フィルム、並びにこれらを用いた電子部品
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CN102778814B (zh) * 2012-07-05 2014-04-23 常州强力先端电子材料有限公司 一种含有酮肟酯类光引发剂的感光性组合物及其应用

Also Published As

Publication number Publication date
TW201435494A (zh) 2014-09-16
JP2014182383A (ja) 2014-09-29
CN104049460B (zh) 2018-02-09
TWI516864B (zh) 2016-01-11
KR101852509B1 (ko) 2018-04-26
KR20140113131A (ko) 2014-09-24
CN104049460A (zh) 2014-09-17

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