JP6306437B2 - 縦型成膜装置 - Google Patents

縦型成膜装置 Download PDF

Info

Publication number
JP6306437B2
JP6306437B2 JP2014113615A JP2014113615A JP6306437B2 JP 6306437 B2 JP6306437 B2 JP 6306437B2 JP 2014113615 A JP2014113615 A JP 2014113615A JP 2014113615 A JP2014113615 A JP 2014113615A JP 6306437 B2 JP6306437 B2 JP 6306437B2
Authority
JP
Japan
Prior art keywords
film
vertical
unit
film forming
forming apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2014113615A
Other languages
English (en)
Japanese (ja)
Other versions
JP2015227488A (ja
JP2015227488A5 (enExample
Inventor
俊 松本
俊 松本
司 村中
司 村中
紀夫 小野島
紀夫 小野島
茂 萩原
茂 萩原
裕 河野
裕 河野
早川 亮
亮 早川
昌子 星野
昌子 星野
哲 平木
哲 平木
禎雄 岩本
禎雄 岩本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yamanashi Prefecture
University of Yamanashi NUC
Original Assignee
Yamanashi Prefecture
University of Yamanashi NUC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yamanashi Prefecture, University of Yamanashi NUC filed Critical Yamanashi Prefecture
Priority to JP2014113615A priority Critical patent/JP6306437B2/ja
Publication of JP2015227488A publication Critical patent/JP2015227488A/ja
Publication of JP2015227488A5 publication Critical patent/JP2015227488A5/ja
Application granted granted Critical
Publication of JP6306437B2 publication Critical patent/JP6306437B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Electric Cables (AREA)
JP2014113615A 2014-05-31 2014-05-31 縦型成膜装置 Active JP6306437B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2014113615A JP6306437B2 (ja) 2014-05-31 2014-05-31 縦型成膜装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014113615A JP6306437B2 (ja) 2014-05-31 2014-05-31 縦型成膜装置

Publications (3)

Publication Number Publication Date
JP2015227488A JP2015227488A (ja) 2015-12-17
JP2015227488A5 JP2015227488A5 (enExample) 2017-03-23
JP6306437B2 true JP6306437B2 (ja) 2018-04-04

Family

ID=54885113

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014113615A Active JP6306437B2 (ja) 2014-05-31 2014-05-31 縦型成膜装置

Country Status (1)

Country Link
JP (1) JP6306437B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017186604A (ja) * 2016-04-05 2017-10-12 北川工業株式会社 親水性スパッタ膜付き部材の製造方法
EP3760759B1 (en) * 2018-03-30 2024-12-11 JFE Steel Corporation Method of using a surface treatment facility

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4364995A (en) * 1981-02-04 1982-12-21 Minnesota Mining And Manufacturing Company Metal/metal oxide coatings
JPS62287068A (ja) * 1986-06-06 1987-12-12 Nissin Electric Co Ltd イオンビ−ム蒸着装置
JP3402637B2 (ja) * 1992-12-28 2003-05-06 キヤノン株式会社 太陽電池の製造方法、その製造装置及び長尺シート基板の製造方法
JP2002020884A (ja) * 2000-07-04 2002-01-23 Canon Inc 酸化亜鉛積層薄膜体およびその製造方法
JP2004232067A (ja) * 2003-01-31 2004-08-19 Fuji Electric Holdings Co Ltd 薄膜形成装置
JP4269261B2 (ja) * 2003-07-18 2009-05-27 住友ベークライト株式会社 透明ガスバリアフィルムの製造方法
KR20080037716A (ko) * 2005-08-18 2008-04-30 고꾸리쯔다이가꾸호오징 야마나시다이가꾸 산화아연 박막의 제조 방법 및 제조 장치
JP4844867B2 (ja) * 2005-11-15 2011-12-28 住友電気工業株式会社 真空蒸着装置の運転方法および真空蒸着装置
WO2011021622A1 (ja) * 2009-08-20 2011-02-24 コニカミノルタホールディングス株式会社 パターン薄膜形成方法
JP2011202248A (ja) * 2010-03-26 2011-10-13 Fujifilm Corp 成膜装置および成膜方法
US8865258B2 (en) * 2010-06-16 2014-10-21 Panasonic Corporation Method of manufacturing thin film which suppresses unnecessary scattering and deposition of a source material

Also Published As

Publication number Publication date
JP2015227488A (ja) 2015-12-17

Similar Documents

Publication Publication Date Title
US7732265B2 (en) Thin film transistor, method for manufacturing the same and film formation apparatus
US9523147B2 (en) Vacuum film formation method and laminate obtained by the method
CN102899628B (zh) 双面真空成膜方法及利用该方法获得的层积体
CN102758189B (zh) 真空成膜方法及通过该方法得到的层叠体
EP2551371B1 (en) Method for double-side vacuum film formation
JP6306437B2 (ja) 縦型成膜装置
US9249503B2 (en) Method for double-side vacuum film formation and laminate obtainable by the method
JP5528727B2 (ja) 薄膜トランジスタ製造装置、酸化物半導体薄膜の製造方法、薄膜トランジスタの製造方法、酸化物半導体薄膜、薄膜トランジスタ及び発光デバイス
US20150147471A1 (en) Method for producing transparent gas barrier film and apparatus for producing transparent gas barrier film
CN110352264A (zh) 薄膜形成方法、薄膜形成装置及锂电池
EP2607516B1 (en) Method for forming a gas blocking layer
JP2009178956A (ja) 透明ガスバリア性フィルム及びその利用
KR20130079555A (ko) 진공 처리 장치
Li et al. 32.2: Invited paper: Integration of flexible AMOLED displays using oxide semiconductor TFT backplanes
JP6662192B2 (ja) ガラスリボン成膜装置及びガラスリボン成膜方法
KR101595005B1 (ko) 인라인 방식의 열증착 장치
JP2013142034A (ja) 巻取装置、積層体製造装置および積層体製造方法
KR20150047686A (ko) 양면 스퍼터링 진공 증착 장치 및 방법
JP2014177663A (ja) 透明導電性酸化亜鉛薄膜
JP4992232B2 (ja) 薄膜トランジスタ及びその製造方法及び成膜装置
JP6287537B2 (ja) 脱ガス装置
JP2015132005A (ja) 成膜方法、および、スパッタ装置
JP2007224332A (ja) 無機薄膜の製造方法
KR20200141987A (ko) 투명 산화물 적층막, 투명 산화물 적층막의 제조 방법, 스퍼터링 타겟 및 투명 수지 기판
KR20120122965A (ko) 진공성막 방법 및 이 방법에 따라 얻을 수 있는 적층체

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20170210

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20170214

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20170215

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20170215

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20170414

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20170414

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20171031

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20171117

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20180110

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20180227

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20180308

R150 Certificate of patent or registration of utility model

Ref document number: 6306437

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250