JP6272589B1 - 反応生成物の製法 - Google Patents

反応生成物の製法 Download PDF

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Publication number
JP6272589B1
JP6272589B1 JP2017551337A JP2017551337A JP6272589B1 JP 6272589 B1 JP6272589 B1 JP 6272589B1 JP 2017551337 A JP2017551337 A JP 2017551337A JP 2017551337 A JP2017551337 A JP 2017551337A JP 6272589 B1 JP6272589 B1 JP 6272589B1
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Japan
Prior art keywords
reaction
infrared
wavelength
peak
organic synthesis
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JP2017551337A
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English (en)
Japanese (ja)
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JPWO2018025914A1 (ja
Inventor
孝介 丹羽
孝介 丹羽
良夫 近藤
良夫 近藤
宏晃 磯部
宏晃 磯部
青木　道郎
道郎 青木
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NGK Insulators Ltd
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NGK Insulators Ltd
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Publication of JPWO2018025914A1 publication Critical patent/JPWO2018025914A1/ja
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
    • C07B61/00—Other general methods
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C17/00—Preparation of halogenated hydrocarbons
    • C07C17/07—Preparation of halogenated hydrocarbons by addition of hydrogen halides
    • C07C17/08—Preparation of halogenated hydrocarbons by addition of hydrogen halides to unsaturated hydrocarbons
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/122—Incoherent waves
    • B01J19/128—Infrared light
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C17/00—Preparation of halogenated hydrocarbons
    • C07C17/013—Preparation of halogenated hydrocarbons by addition of halogens
    • C07C17/02—Preparation of halogenated hydrocarbons by addition of halogens to unsaturated hydrocarbons
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C19/00—Acyclic saturated compounds containing halogen atoms
    • C07C19/075—Acyclic saturated compounds containing halogen atoms containing bromine
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/02—Details
    • H05B3/03—Electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
    • H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
    • H05B3/26—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Pathology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electromagnetism (AREA)
  • Toxicology (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Resistance Heating (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP2017551337A 2016-08-03 2017-08-02 反応生成物の製法 Active JP6272589B1 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016152522 2016-08-03
JP2016152522 2016-08-03
PCT/JP2017/028051 WO2018025914A1 (ja) 2016-08-03 2017-08-02 反応生成物の製法

Related Child Applications (1)

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JP2017216578A Division JP7105555B2 (ja) 2016-08-03 2017-11-09 反応生成物の製法

Publications (2)

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JP6272589B1 true JP6272589B1 (ja) 2018-01-31
JPWO2018025914A1 JPWO2018025914A1 (ja) 2018-08-09

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JP2017551337A Active JP6272589B1 (ja) 2016-08-03 2017-08-02 反応生成物の製法
JP2017216578A Active JP7105555B2 (ja) 2016-08-03 2017-11-09 反応生成物の製法
JP2022099434A Pending JP2022145679A (ja) 2016-08-03 2022-06-21 反応生成物の製法

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JP2017216578A Active JP7105555B2 (ja) 2016-08-03 2017-11-09 反応生成物の製法
JP2022099434A Pending JP2022145679A (ja) 2016-08-03 2022-06-21 反応生成物の製法

Country Status (5)

Country Link
US (1) US10822292B2 (enExample)
EP (2) EP3750863B1 (enExample)
JP (3) JP6272589B1 (enExample)
DK (2) DK3750863T3 (enExample)
WO (1) WO2018025914A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112005616A (zh) * 2018-04-23 2020-11-27 日本碍子株式会社 红外线放射装置
JP2022145679A (ja) * 2016-08-03 2022-10-04 日本碍子株式会社 反応生成物の製法

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110167675B (zh) 2017-01-10 2022-09-06 富士胶片株式会社 离心分离容器及离心分离装置
US11499724B2 (en) * 2018-07-03 2022-11-15 Goodrich Corporation Heated floor panels
WO2025052753A1 (ja) * 2023-09-05 2025-03-13 日本碍子株式会社 赤外線ヒーター
WO2025203591A1 (ja) * 2024-03-29 2025-10-02 日本碍子株式会社 アセタール化合物の製造方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57200273A (en) * 1981-05-30 1982-12-08 Tdk Electronics Co Ltd Infrared radiation element
JPH08138841A (ja) * 1994-11-01 1996-05-31 Mitsui Toatsu Chem Inc 透明導電性フィルムならびにそれを用いた透明面状ヒーター
JP2003304014A (ja) * 2002-04-08 2003-10-24 Mitsubishi Chemicals Corp 有機電子デバイス及びその作製方法
JP2006140377A (ja) * 2004-11-15 2006-06-01 Matsushita Electric Ind Co Ltd シート状回路基板
WO2007052778A1 (ja) * 2005-11-02 2007-05-10 Buhei Kono 有機物や無機物の反応を促進する方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7193237B2 (en) 2002-03-27 2007-03-20 Mitsubishi Chemical Corporation Organic semiconductor material and organic electronic device
JP2013167496A (ja) * 2012-02-15 2013-08-29 Alps Electric Co Ltd 赤外線光源
JP2015198063A (ja) * 2014-04-03 2015-11-09 日本碍子株式会社 赤外線ヒーター
JP5992555B2 (ja) 2015-02-18 2016-09-14 日本電信電話株式会社 仮想光回線交換方式
JP6692046B2 (ja) * 2015-09-04 2020-05-13 国立大学法人北海道大学 赤外線ヒーター
DE102016206999A1 (de) * 2016-03-18 2017-09-21 Ihp Gmbh - Innovations For High Performance Microelectronics / Leibniz-Institut Für Innovative Mikroelektronik Sub-THz- bis Mittelinfrarot- durchstimmbare Halbleiterplasmonik
EP3750863B1 (en) * 2016-08-03 2022-07-06 NGK Insulators, Ltd. Reaction product preparation method
WO2018034305A1 (ja) * 2016-08-19 2018-02-22 日本碍子株式会社 有機化合物の精製方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57200273A (en) * 1981-05-30 1982-12-08 Tdk Electronics Co Ltd Infrared radiation element
JPH08138841A (ja) * 1994-11-01 1996-05-31 Mitsui Toatsu Chem Inc 透明導電性フィルムならびにそれを用いた透明面状ヒーター
JP2003304014A (ja) * 2002-04-08 2003-10-24 Mitsubishi Chemicals Corp 有機電子デバイス及びその作製方法
JP2006140377A (ja) * 2004-11-15 2006-06-01 Matsushita Electric Ind Co Ltd シート状回路基板
WO2007052778A1 (ja) * 2005-11-02 2007-05-10 Buhei Kono 有機物や無機物の反応を促進する方法

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
普神敬悟 他: "中赤外パルスレーザー光による有機化合物の炭素-酸素結合の活性化", 基礎有機化学討論会要旨集, vol. v.2009, JPN7017002817, 2009, pages 352, ISSN: 0003671216 *
櫻井篤: "メタマテリアルによる熱ふく射制御", 日本伝熱シンポジウム講演論文集, vol. v.51st, JPN7017002816, 2014, pages 344, ISSN: 0003671217 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022145679A (ja) * 2016-08-03 2022-10-04 日本碍子株式会社 反応生成物の製法
CN112005616A (zh) * 2018-04-23 2020-11-27 日本碍子株式会社 红外线放射装置

Also Published As

Publication number Publication date
EP3495339B1 (en) 2021-03-24
US10822292B2 (en) 2020-11-03
JP2022145679A (ja) 2022-10-04
US20190152881A1 (en) 2019-05-23
JPWO2018025914A1 (ja) 2018-08-09
WO2018025914A1 (ja) 2018-02-08
JP2018041743A (ja) 2018-03-15
JP7105555B2 (ja) 2022-07-25
DK3750863T3 (da) 2022-08-08
EP3750863A1 (en) 2020-12-16
EP3750863B1 (en) 2022-07-06
EP3495339A1 (en) 2019-06-12
DK3495339T3 (da) 2021-05-03
EP3495339A4 (en) 2020-03-18

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