JP2018041743A5 - - Google Patents

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Publication number
JP2018041743A5
JP2018041743A5 JP2017216578A JP2017216578A JP2018041743A5 JP 2018041743 A5 JP2018041743 A5 JP 2018041743A5 JP 2017216578 A JP2017216578 A JP 2017216578A JP 2017216578 A JP2017216578 A JP 2017216578A JP 2018041743 A5 JP2018041743 A5 JP 2018041743A5
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JP
Japan
Prior art keywords
reaction product
producing
wavelength
peak
infrared heater
Prior art date
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Application number
JP2017216578A
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English (en)
Japanese (ja)
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JP2018041743A (ja
JP7105555B2 (ja
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Publication of JP2018041743A publication Critical patent/JP2018041743A/ja
Publication of JP2018041743A5 publication Critical patent/JP2018041743A5/ja
Priority to JP2022099434A priority Critical patent/JP2022145679A/ja
Application granted granted Critical
Publication of JP7105555B2 publication Critical patent/JP7105555B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2017216578A 2016-08-03 2017-11-09 反応生成物の製法 Active JP7105555B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2022099434A JP2022145679A (ja) 2016-08-03 2022-06-21 反応生成物の製法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016152522 2016-08-03
JP2016152522 2016-08-03

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2017551337A Division JP6272589B1 (ja) 2016-08-03 2017-08-02 反応生成物の製法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2022099434A Division JP2022145679A (ja) 2016-08-03 2022-06-21 反応生成物の製法

Publications (3)

Publication Number Publication Date
JP2018041743A JP2018041743A (ja) 2018-03-15
JP2018041743A5 true JP2018041743A5 (enExample) 2020-05-07
JP7105555B2 JP7105555B2 (ja) 2022-07-25

Family

ID=61073821

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2017551337A Active JP6272589B1 (ja) 2016-08-03 2017-08-02 反応生成物の製法
JP2017216578A Active JP7105555B2 (ja) 2016-08-03 2017-11-09 反応生成物の製法
JP2022099434A Pending JP2022145679A (ja) 2016-08-03 2022-06-21 反応生成物の製法

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2017551337A Active JP6272589B1 (ja) 2016-08-03 2017-08-02 反応生成物の製法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2022099434A Pending JP2022145679A (ja) 2016-08-03 2022-06-21 反応生成物の製法

Country Status (5)

Country Link
US (1) US10822292B2 (enExample)
EP (2) EP3750863B1 (enExample)
JP (3) JP6272589B1 (enExample)
DK (2) DK3750863T3 (enExample)
WO (1) WO2018025914A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3750863B1 (en) * 2016-08-03 2022-07-06 NGK Insulators, Ltd. Reaction product preparation method
CN110167675B (zh) 2017-01-10 2022-09-06 富士胶片株式会社 离心分离容器及离心分离装置
CN112005616A (zh) * 2018-04-23 2020-11-27 日本碍子株式会社 红外线放射装置
US11499724B2 (en) * 2018-07-03 2022-11-15 Goodrich Corporation Heated floor panels
WO2025052753A1 (ja) * 2023-09-05 2025-03-13 日本碍子株式会社 赤外線ヒーター
WO2025203591A1 (ja) * 2024-03-29 2025-10-02 日本碍子株式会社 アセタール化合物の製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57200273A (en) * 1981-05-30 1982-12-08 Tdk Electronics Co Ltd Infrared radiation element
JPH08138841A (ja) * 1994-11-01 1996-05-31 Mitsui Toatsu Chem Inc 透明導電性フィルムならびにそれを用いた透明面状ヒーター
JP2003304014A (ja) * 2002-04-08 2003-10-24 Mitsubishi Chemicals Corp 有機電子デバイス及びその作製方法
US7193237B2 (en) 2002-03-27 2007-03-20 Mitsubishi Chemical Corporation Organic semiconductor material and organic electronic device
JP4120633B2 (ja) * 2004-11-15 2008-07-16 松下電器産業株式会社 シート状回路基板
WO2007052778A1 (ja) * 2005-11-02 2007-05-10 Buhei Kono 有機物や無機物の反応を促進する方法
JP2013167496A (ja) * 2012-02-15 2013-08-29 Alps Electric Co Ltd 赤外線光源
JP2015198063A (ja) * 2014-04-03 2015-11-09 日本碍子株式会社 赤外線ヒーター
JP5992555B2 (ja) 2015-02-18 2016-09-14 日本電信電話株式会社 仮想光回線交換方式
JP6692046B2 (ja) * 2015-09-04 2020-05-13 国立大学法人北海道大学 赤外線ヒーター
DE102016206999A1 (de) * 2016-03-18 2017-09-21 Ihp Gmbh - Innovations For High Performance Microelectronics / Leibniz-Institut Für Innovative Mikroelektronik Sub-THz- bis Mittelinfrarot- durchstimmbare Halbleiterplasmonik
EP3750863B1 (en) * 2016-08-03 2022-07-06 NGK Insulators, Ltd. Reaction product preparation method
WO2018034305A1 (ja) * 2016-08-19 2018-02-22 日本碍子株式会社 有機化合物の精製方法

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