JP7105555B2 - 反応生成物の製法 - Google Patents
反応生成物の製法 Download PDFInfo
- Publication number
- JP7105555B2 JP7105555B2 JP2017216578A JP2017216578A JP7105555B2 JP 7105555 B2 JP7105555 B2 JP 7105555B2 JP 2017216578 A JP2017216578 A JP 2017216578A JP 2017216578 A JP2017216578 A JP 2017216578A JP 7105555 B2 JP7105555 B2 JP 7105555B2
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- peak
- infrared
- reaction product
- wavelength
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000007795 chemical reaction product Substances 0.000 title claims description 36
- 238000004519 manufacturing process Methods 0.000 title claims description 24
- 238000006243 chemical reaction Methods 0.000 claims description 53
- 229910052751 metal Inorganic materials 0.000 claims description 48
- 239000002184 metal Substances 0.000 claims description 48
- 239000007858 starting material Substances 0.000 claims description 43
- 238000003786 synthesis reaction Methods 0.000 claims description 32
- 239000000758 substrate Substances 0.000 claims description 17
- 230000001678 irradiating effect Effects 0.000 claims description 15
- 238000000862 absorption spectrum Methods 0.000 claims description 12
- 239000010410 layer Substances 0.000 description 57
- 239000004020 conductor Substances 0.000 description 33
- 230000005855 radiation Effects 0.000 description 17
- AFFLGGQVNFXPEV-UHFFFAOYSA-N 1-decene Chemical compound CCCCCCCCC=C AFFLGGQVNFXPEV-UHFFFAOYSA-N 0.000 description 14
- 238000010438 heat treatment Methods 0.000 description 14
- 239000000463 material Substances 0.000 description 13
- 239000007789 gas Substances 0.000 description 12
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 10
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical compound CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 10
- -1 alcohol compound Chemical class 0.000 description 9
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 8
- 239000012790 adhesive layer Substances 0.000 description 8
- 238000007337 electrophilic addition reaction Methods 0.000 description 8
- 239000004593 Epoxy Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 5
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 5
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 5
- TVMXDCGIABBOFY-UHFFFAOYSA-N n-Octanol Natural products CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 5
- 238000006462 rearrangement reaction Methods 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 238000005481 NMR spectroscopy Methods 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- 229910000042 hydrogen bromide Inorganic materials 0.000 description 4
- 230000000737 periodic effect Effects 0.000 description 4
- 230000035484 reaction time Effects 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- YPHMISFOHDHNIV-FSZOTQKASA-N cycloheximide Chemical compound C1[C@@H](C)C[C@H](C)C(=O)[C@@H]1[C@H](O)CC1CC(=O)NC(=O)C1 YPHMISFOHDHNIV-FSZOTQKASA-N 0.000 description 3
- 238000006297 dehydration reaction Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- NEBYCXAKZCQWAW-UHFFFAOYSA-N 2-bromohexane Chemical compound CCCCC(C)Br NEBYCXAKZCQWAW-UHFFFAOYSA-N 0.000 description 2
- HKDCIIMOALDWHF-UHFFFAOYSA-N 2-chlorooctane Chemical compound CCCCCCC(C)Cl HKDCIIMOALDWHF-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 description 2
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 150000007824 aliphatic compounds Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 150000001491 aromatic compounds Chemical class 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 238000000231 atomic layer deposition Methods 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 230000008602 contraction Effects 0.000 description 2
- 229940043279 diisopropylamine Drugs 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012039 electrophile Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- RYVBINGWVJJDPU-UHFFFAOYSA-M tributyl(hexadecyl)phosphanium;bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[P+](CCCC)(CCCC)CCCC RYVBINGWVJJDPU-UHFFFAOYSA-M 0.000 description 2
- RBACIKXCRWGCBB-UHFFFAOYSA-N 1,2-Epoxybutane Chemical compound CCC1CO1 RBACIKXCRWGCBB-UHFFFAOYSA-N 0.000 description 1
- OOZCPPCMBPSCDZ-UHFFFAOYSA-N 2-chlorodecane Chemical compound CCCCCCCCC(C)Cl OOZCPPCMBPSCDZ-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- BSYNRYMUTXBXSQ-UHFFFAOYSA-N Aspirin Chemical compound CC(=O)OC1=CC=CC=C1C(O)=O BSYNRYMUTXBXSQ-UHFFFAOYSA-N 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- 229910002060 Fe-Cr-Al alloy Inorganic materials 0.000 description 1
- 101000878457 Macrocallista nimbosa FMRFamide Proteins 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 150000001345 alkine derivatives Chemical class 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000026030 halogenation Effects 0.000 description 1
- 238000005658 halogenation reaction Methods 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 238000005935 nucleophilic addition reaction Methods 0.000 description 1
- 238000010534 nucleophilic substitution reaction Methods 0.000 description 1
- 239000012074 organic phase Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C17/00—Preparation of halogenated hydrocarbons
- C07C17/07—Preparation of halogenated hydrocarbons by addition of hydrogen halides
- C07C17/08—Preparation of halogenated hydrocarbons by addition of hydrogen halides to unsaturated hydrocarbons
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B61/00—Other general methods
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
- B01J19/122—Incoherent waves
- B01J19/128—Infrared light
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C17/00—Preparation of halogenated hydrocarbons
- C07C17/013—Preparation of halogenated hydrocarbons by addition of halogens
- C07C17/02—Preparation of halogenated hydrocarbons by addition of halogens to unsaturated hydrocarbons
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C19/00—Acyclic saturated compounds containing halogen atoms
- C07C19/075—Acyclic saturated compounds containing halogen atoms containing bromine
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/02—Details
- H05B3/03—Electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
- H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
- H05B3/26—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Health & Medical Sciences (AREA)
- Health & Medical Sciences (AREA)
- Pathology (AREA)
- Biochemistry (AREA)
- Analytical Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Electromagnetism (AREA)
- Toxicology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Resistance Heating (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Description
出発原料から所定の有機合成反応を経て反応生成物を得る反応生成物の製法であって、(a)前記出発原料の赤外吸収スペクトルにおいて前記有機合成反応に関与する反応部位のピーク波長を目的波長に設定する工程と、
(b)外から内に向かって金属パターンと誘電体層と金属基板とがこの順に積層された構造体から前記目的波長にピークを持つ赤外線を放射する赤外線ヒーターを準備する工程と、
(c)前記目的波長にピークを持つ赤外線を前記赤外線ヒーターから前記出発原料に照射しながら前記有機合成反応を進行させることにより前記反応生成物を得る工程と、
を含むものである。
(a)前記出発原料の赤外吸収スペクトルにおいて前記有機合成反応に関与する反応部位のピーク波長を目的波長に設定する工程と、
(b)外から内に向かって金属パターンと誘電体層と金属基板とがこの順に積層された構造体から前記目的波長にピークを持つ赤外線を放射する赤外線ヒーターを準備する工程と、
(c)前記目的波長にピークを持つ赤外線を前記赤外線ヒーターから前記出発原料に照射しながら前記有機合成反応を進行させることにより前記反応生成物を得る工程と、
を含むものである。
62.8mLの1-ヘキセン(0.5mol:東京化成工業株式会社製)を反応容器に加え、Arガスにより15分間パージさせた。続いて、この反応容器を冷却しながら(-20℃)、反応容器上部から1650cm-1にピークをもつ1600~1700cm-1の赤外線の照射(5W:赤外線照射面積3cm角/単位面積当たりの照射エネルギー:約0.5W/cm2)を開始した。続いて、攪拌している1-ヘキセンに臭化水素ガス(太陽日酸)を0.21mol/hrの条件で導入した。臭化水素ガス導入から30分後、1時間後、2時間後、3時間後にそれぞれガスの導入を停止し、反応容器内をArガスに置換後、各反応液を-196℃中で保存した。
62.8mLの1-ヘキセン(0.5mol:東京化成工業株式会社製)を反応容器に加え、Arガスにより15分間パージさせた。続いて、この反応容器を冷却させ(-20℃)、攪拌している1-ヘキセンに臭化水素ガス(太陽日酸株式会社製)を0.21mol/hrの条件で導入した。臭化水素ガス導入から30分後、1時間後、2時間後、3時間後にそれぞれガスの導入を停止し、反応容器内をArガスに置換後、各反応液を-196℃中で保存した。
0.25molの1-オクテン(39.2mL:東京化成工業株式会社製)と0.025molのトリブチルヘキサデシルホスホニウムブロミド(12.7g:東京化成工業株式会社製)と3.75molのHCl水溶液(40mL)を反応容器に加え、Arガスにより15分間パージさせた。続いて、油浴中(115℃)に反応容器を移し、反応容器上部(有機相上部)から1630cm-1にピークをもつ1580~1680cm-1の赤外線の照射(5W:赤外線照射面積3cm角/単位面積当たりの照射エネルギー:約0.5W/cm2)を開始し、混合液を攪拌し反応を開始した。反応開始から25時間後に赤外線の照射および攪拌を止め、反応容器を油浴から取り出し反応を停止させた。
0.25molの1-オクテン(39.2mL:東京化成工業株式会社製)と0.025molのトリブチルヘキサデシルホスホニウムブロミド(12.7g:東京化成工業株式会社製)と3.75molのHCl水溶液(40mL)を反応容器に加え、Arガスにより15分間パージさせた。続いて、油浴中(115℃)にて混合液を攪拌し反応を開始した。反応開始から25時間後に攪拌を止め、反応容器を油浴から取り出し反応を停止させた。
Claims (9)
- 出発原料から所定の有機合成反応を経て反応生成物を得る反応生成物の製法であって、
(a)前記出発原料の赤外吸収スペクトルにおいて前記有機合成反応に関与する反応部位のピーク波長を目的波長に設定する工程と、
(b)前記目的波長にピークを持つ赤外線を放射する板状の赤外線ヒーターを準備する工程と、
(c)前記目的波長にピークを持つ赤外線を前記赤外線ヒーターから前記出発原料に照射しながら前記有機合成反応を進行させることにより前記反応生成物を得る工程と、
を含み、
前記赤外線ヒーターから照射される赤外線が持つ前記ピークの半値幅は、1.5μm以下であり、前記赤外線の最大ピークの放射率は、0.7以上である、
反応生成物の製法。 - 前記板状の赤外線ヒーターは、外から内に向かって金属パターンと誘電体層と金属基板とがこの順に積層された構造体から前記目的波長にピークを持つ赤外線を放射する赤外線ヒーターであり、前記金属パターンは、前記誘電体層上に同じ形状で同じサイズの金属電極が互いに等間隔に配設されたものであり、前記赤外線ヒーターは、前記金属電極の幅に応じて放射する赤外線のピーク波長が変化する、
請求項1に記載の反応生成物の製法。 - 前記目的波長は、波長2.5μm以上25μm以下の範囲で設定される、
請求項1又は2に記載の反応生成物の製法。 - 前記目的波長は、前記出発原料の前記反応部位の伸縮振動に関わるピーク波長に設定される、
請求項1~3のいずれか1項に記載の反応生成物の製法。 - 出発原料から所定の有機合成反応を経て反応生成物を得る反応生成物の製法であって、
(a)前記出発原料の赤外吸収スペクトルにおいて前記有機合成反応に関与する反応部位のピーク波長を目的波長に設定する工程と、
(b)前記目的波長にピークを持つ赤外線を赤外線ヒーターから前記出発原料に照射しながら前記有機合成反応を進行させることにより前記反応生成物を得る工程と、
を含み、
前記目的波長は、波長2.5μm以上25μm以下の範囲で設定され、
前記赤外線ヒーターから照射される赤外線が持つ前記ピークの半値幅は、1.5μm以下であり、前記赤外線の最大ピークの放射率は、0.7以上である、
反応生成物の製法。 - 前記赤外線ヒーターは、外から内に向かって金属パターンと誘電体層と金属基板とがこの順に積層された構造体から前記目的波長にピークを持つ赤外線を放射する、
請求項5に記載の反応生成物の製法。 - 前記金属パターンは、前記誘電体層上に同じ形状で同じサイズの金属電極が互いに等間隔に配設されたものであり、
前記赤外線ヒーターは、前記金属電極の幅に応じて放射する赤外線のピーク波長が変化する、
請求項6に記載の反応生成物の製法。 - 前記目的波長は、前記出発原料の前記反応部位の伸縮振動に関わるピーク波長に設定される、
請求項5~7のいずれか1項に記載の反応生成物の製法。 - 前記赤外線ヒーターは、板状である、
請求項5~8のいずれか1項に記載の反応生成物の製法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2022099434A JP2022145679A (ja) | 2016-08-03 | 2022-06-21 | 反応生成物の製法 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016152522 | 2016-08-03 | ||
JP2016152522 | 2016-08-03 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017551337A Division JP6272589B1 (ja) | 2016-08-03 | 2017-08-02 | 反応生成物の製法 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022099434A Division JP2022145679A (ja) | 2016-08-03 | 2022-06-21 | 反応生成物の製法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2018041743A JP2018041743A (ja) | 2018-03-15 |
JP2018041743A5 JP2018041743A5 (ja) | 2020-05-07 |
JP7105555B2 true JP7105555B2 (ja) | 2022-07-25 |
Family
ID=61073821
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017551337A Active JP6272589B1 (ja) | 2016-08-03 | 2017-08-02 | 反応生成物の製法 |
JP2017216578A Active JP7105555B2 (ja) | 2016-08-03 | 2017-11-09 | 反応生成物の製法 |
JP2022099434A Pending JP2022145679A (ja) | 2016-08-03 | 2022-06-21 | 反応生成物の製法 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017551337A Active JP6272589B1 (ja) | 2016-08-03 | 2017-08-02 | 反応生成物の製法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022099434A Pending JP2022145679A (ja) | 2016-08-03 | 2022-06-21 | 反応生成物の製法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US10822292B2 (ja) |
EP (2) | EP3495339B1 (ja) |
JP (3) | JP6272589B1 (ja) |
DK (2) | DK3495339T3 (ja) |
WO (1) | WO2018025914A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DK3495339T3 (da) * | 2016-08-03 | 2021-05-03 | Ngk Insulators Ltd | Fremgangsmåde til fremstilling af reaktionsprodukt |
ES2962286T3 (es) | 2017-01-10 | 2024-03-18 | Fujifilm Corp | Recipiente de separación centrífuga y separador centrífugo |
JP6977943B2 (ja) * | 2018-04-23 | 2021-12-08 | 日本碍子株式会社 | 赤外線放射装置 |
US11499724B2 (en) * | 2018-07-03 | 2022-11-15 | Goodrich Corporation | Heated floor panels |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007052778A1 (ja) | 2005-11-02 | 2007-05-10 | Buhei Kono | 有機物や無機物の反応を促進する方法 |
JP2013167496A (ja) | 2012-02-15 | 2013-08-29 | Alps Electric Co Ltd | 赤外線光源 |
JP2015198063A (ja) | 2014-04-03 | 2015-11-09 | 日本碍子株式会社 | 赤外線ヒーター |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57200273A (en) * | 1981-05-30 | 1982-12-08 | Tdk Electronics Co Ltd | Infrared radiation element |
JPH08138841A (ja) * | 1994-11-01 | 1996-05-31 | Mitsui Toatsu Chem Inc | 透明導電性フィルムならびにそれを用いた透明面状ヒーター |
US7193237B2 (en) | 2002-03-27 | 2007-03-20 | Mitsubishi Chemical Corporation | Organic semiconductor material and organic electronic device |
JP2003304014A (ja) * | 2002-04-08 | 2003-10-24 | Mitsubishi Chemicals Corp | 有機電子デバイス及びその作製方法 |
JP4120633B2 (ja) * | 2004-11-15 | 2008-07-16 | 松下電器産業株式会社 | シート状回路基板 |
JP5992555B2 (ja) | 2015-02-18 | 2016-09-14 | 日本電信電話株式会社 | 仮想光回線交換方式 |
JP6692046B2 (ja) * | 2015-09-04 | 2020-05-13 | 国立大学法人北海道大学 | 赤外線ヒーター |
DE102016206999A1 (de) * | 2016-03-18 | 2017-09-21 | Ihp Gmbh - Innovations For High Performance Microelectronics / Leibniz-Institut Für Innovative Mikroelektronik | Sub-THz- bis Mittelinfrarot- durchstimmbare Halbleiterplasmonik |
DK3495339T3 (da) * | 2016-08-03 | 2021-05-03 | Ngk Insulators Ltd | Fremgangsmåde til fremstilling af reaktionsprodukt |
WO2018034305A1 (ja) * | 2016-08-19 | 2018-02-22 | 日本碍子株式会社 | 有機化合物の精製方法 |
-
2017
- 2017-08-02 DK DK17837016.9T patent/DK3495339T3/da active
- 2017-08-02 JP JP2017551337A patent/JP6272589B1/ja active Active
- 2017-08-02 WO PCT/JP2017/028051 patent/WO2018025914A1/ja unknown
- 2017-08-02 EP EP17837016.9A patent/EP3495339B1/en active Active
- 2017-08-02 EP EP20189998.6A patent/EP3750863B1/en active Active
- 2017-08-02 DK DK20189998.6T patent/DK3750863T3/da active
- 2017-11-09 JP JP2017216578A patent/JP7105555B2/ja active Active
-
2019
- 2019-01-23 US US16/254,957 patent/US10822292B2/en active Active
-
2022
- 2022-06-21 JP JP2022099434A patent/JP2022145679A/ja active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007052778A1 (ja) | 2005-11-02 | 2007-05-10 | Buhei Kono | 有機物や無機物の反応を促進する方法 |
JP2013167496A (ja) | 2012-02-15 | 2013-08-29 | Alps Electric Co Ltd | 赤外線光源 |
JP2015198063A (ja) | 2014-04-03 | 2015-11-09 | 日本碍子株式会社 | 赤外線ヒーター |
Also Published As
Publication number | Publication date |
---|---|
DK3495339T3 (da) | 2021-05-03 |
US20190152881A1 (en) | 2019-05-23 |
DK3750863T3 (da) | 2022-08-08 |
JP6272589B1 (ja) | 2018-01-31 |
EP3750863B1 (en) | 2022-07-06 |
EP3495339A1 (en) | 2019-06-12 |
EP3495339B1 (en) | 2021-03-24 |
US10822292B2 (en) | 2020-11-03 |
WO2018025914A1 (ja) | 2018-02-08 |
JP2018041743A (ja) | 2018-03-15 |
JPWO2018025914A1 (ja) | 2018-08-09 |
EP3750863A1 (en) | 2020-12-16 |
JP2022145679A (ja) | 2022-10-04 |
EP3495339A4 (en) | 2020-03-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2022145679A (ja) | 反応生成物の製法 | |
JP7242806B2 (ja) | 有機化合物の精製方法 | |
JPWO2018079386A1 (ja) | 赤外線ヒーター | |
WO2019009288A1 (ja) | 赤外線処理装置 | |
JP6134274B2 (ja) | 半導体製造装置および半導体装置の製造方法 | |
JP6977943B2 (ja) | 赤外線放射装置 | |
JP6692046B2 (ja) | 赤外線ヒーター | |
JP2018041743A5 (ja) | ||
JP7096958B2 (ja) | 精製方法 | |
Felischak et al. | Detailed Kinetic Model for the Reaction of Ethene to Propene on Ni/AlMCM‐41 | |
JP7506883B2 (ja) | 精製方法 | |
WO2017179563A1 (ja) | 熱-電磁波変換構造、熱-電磁波変換部材、波長選択性放熱機器、波長選択性加熱機器、波長選択性放熱方法、波長選択性加熱方法および熱-電磁波変換構造の製造方法 | |
Alsunaidi et al. | Toward a More Rational Design of the Direct Synthesis of Aniline: A Density Functional Theory Study | |
JP5541068B2 (ja) | Cvd装置用加熱ユニット、加熱ユニットを備えたcvd装置及び半導体素子の製造方法 | |
Allotta | UV-Raman studies of coke formation during hydrocarbon conversion reactions over zeolite H-MFI | |
Steddum | Structural and chemical changes in the topochemical 1, 4-polymerization of 3, 4-bis (methylene) hexanedioic acid |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20200324 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20200324 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20210212 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20210302 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20210414 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20210628 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20211012 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20220322 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20220519 |
|
C60 | Trial request (containing other claim documents, opposition documents) |
Free format text: JAPANESE INTERMEDIATE CODE: C60 Effective date: 20220519 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20220606 |
|
C21 | Notice of transfer of a case for reconsideration by examiners before appeal proceedings |
Free format text: JAPANESE INTERMEDIATE CODE: C21 Effective date: 20220607 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20220621 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20220712 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7105555 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |