JP6977943B2 - 赤外線放射装置 - Google Patents
赤外線放射装置 Download PDFInfo
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- JP6977943B2 JP6977943B2 JP2020516222A JP2020516222A JP6977943B2 JP 6977943 B2 JP6977943 B2 JP 6977943B2 JP 2020516222 A JP2020516222 A JP 2020516222A JP 2020516222 A JP2020516222 A JP 2020516222A JP 6977943 B2 JP6977943 B2 JP 6977943B2
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- 239000004020 conductor Substances 0.000 claims description 96
- 230000005855 radiation Effects 0.000 claims description 43
- 239000010410 layer Substances 0.000 description 156
- 239000000463 material Substances 0.000 description 25
- 239000000758 substrate Substances 0.000 description 23
- 238000010438 heat treatment Methods 0.000 description 19
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- 230000002093 peripheral effect Effects 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 239000012790 adhesive layer Substances 0.000 description 6
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 6
- 229910052737 gold Inorganic materials 0.000 description 6
- 239000010931 gold Substances 0.000 description 6
- 230000000737 periodic effect Effects 0.000 description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 239000012298 atmosphere Substances 0.000 description 4
- 230000020169 heat generation Effects 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 230000000630 rising effect Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 238000000231 atomic layer deposition Methods 0.000 description 2
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- BSYNRYMUTXBXSQ-UHFFFAOYSA-N Aspirin Chemical compound CC(=O)OC1=CC=CC=C1C(O)=O BSYNRYMUTXBXSQ-UHFFFAOYSA-N 0.000 description 1
- 229910004261 CaF 2 Inorganic materials 0.000 description 1
- 229910002060 Fe-Cr-Al alloy Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000010436 fluorite Substances 0.000 description 1
- -1 gold and nickel Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910000953 kanthal Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 238000007751 thermal spraying Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/40—Heating elements having the shape of rods or tubes
- H05B3/42—Heating elements having the shape of rods or tubes non-flexible
- H05B3/48—Heating elements having the shape of rods or tubes non-flexible heating conductor embedded in insulating material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
- H05B3/12—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/0033—Heating devices using lamps
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/0033—Heating devices using lamps
- H05B3/009—Heating devices using lamps heating devices not specially adapted for a particular application
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
- H05B3/18—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor the conductor being embedded in an insulating material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/032—Heaters specially adapted for heating by radiation heating
Landscapes
- Resistance Heating (AREA)
Description
発熱部と、前記発熱部から熱エネルギーを入力すると非プランク分布のピーク波長を有する赤外線を放射可能な第1,第2メタマテリアル構造体と、を有し、前記第1メタマテリアル構造体が前記発熱部の第1面側に配置され、前記第2メタマテリアル構造体が前記発熱部の前記第1面とは反対側である第2面側に配置された本体部、
を備えたものである。
導体層、38A 放射面、41A マイクロキャビティ、42A 側面、44A 底面。
Claims (7)
- 赤外線処理を行うための赤外線放射装置であって、
発熱部と、前記発熱部から熱エネルギーを入力すると非プランク分布のピーク波長を有する赤外線を放射可能な第1,第2メタマテリアル構造体と、を有し、前記第1メタマテリアル構造体が前記発熱部の第1面側に配置され、前記第2メタマテリアル構造体が前記発熱部の前記第1面とは反対側である第2面側に配置された本体部、
を備えた赤外線放射装置。 - 請求項1に記載の赤外線放射装置であって、
前記第1メタマテリアル構造体と前記第2メタマテリアル構造体との少なくとも一方から放射される赤外線を対象物に向けて反射可能な赤外線反射部、
を備えた赤外線放射装置。 - 請求項1又は2に記載の赤外線放射装置であって、
前記第1,第2メタマテリアル構造体からの赤外線を外部に透過可能な赤外線透過部を有するケーシング、
を備え、
前記本体部は、前記ケーシングの内部空間に配置されている、
赤外線放射装置。 - 前記第1,第2メタマテリアル構造体は、各々が放射する赤外線の最大ピークのピーク波長の差が0.5μm以下である、
請求項1〜3のいずれか1項に記載の赤外線放射装置。 - 前記本体部は、外部空間に露出しているか、又は内部空間が非減圧状態のケーシングの該内部空間に配置されている、
請求項1〜4のいずれか1項に記載の赤外線放射装置。 - 前記第1,第2メタマテリアル構造体の少なくとも一方は、前記発熱部側から順に、第1導体層と、該第1導体層に接合された誘電体層と、各々が前記誘電体層に接合され互いに離間して周期的に配置された複数の個別導体層を有する第2導体層と、を備える、
請求項1〜5のいずれか1項に記載の赤外線放射装置。 - 前記第1,第2メタマテリアル構造体の少なくとも一方は、少なくとも表面が導体からなり互いに離間して周期的に配置された複数のマイクロキャビティを備える、
請求項1〜6のいずれか1項に記載の赤外線放射装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018082171 | 2018-04-23 | ||
JP2018082171 | 2018-04-23 | ||
PCT/JP2019/015890 WO2019208252A1 (ja) | 2018-04-23 | 2019-04-12 | 赤外線放射装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2019208252A1 JPWO2019208252A1 (ja) | 2021-04-22 |
JP6977943B2 true JP6977943B2 (ja) | 2021-12-08 |
Family
ID=68295403
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020516222A Active JP6977943B2 (ja) | 2018-04-23 | 2019-04-12 | 赤外線放射装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20210045195A1 (ja) |
EP (1) | EP3787372A4 (ja) |
JP (1) | JP6977943B2 (ja) |
CN (1) | CN112005616A (ja) |
WO (1) | WO2019208252A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11501076B2 (en) | 2018-02-09 | 2022-11-15 | Salesforce.Com, Inc. | Multitask learning as question answering |
JP6997060B2 (ja) * | 2018-10-05 | 2022-01-17 | 日本碍子株式会社 | 赤外線放射装置 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61114485A (ja) * | 1984-11-09 | 1986-06-02 | 株式会社 リボ−ル | 赤外線両面放射装置 |
JP4194540B2 (ja) * | 2004-07-27 | 2008-12-10 | キヤノン株式会社 | 画像形成装置 |
JP2011099715A (ja) * | 2009-11-04 | 2011-05-19 | Panasonic Electric Works Co Ltd | 電磁波放射装置および電磁波検出装置 |
JP2011228004A (ja) * | 2010-04-15 | 2011-11-10 | Panasonic Corp | 発熱体ユニット及び加熱装置 |
KR101704946B1 (ko) * | 2012-11-07 | 2017-02-08 | 엔지케이 인슐레이터 엘티디 | 적외선 가열 장치 및 건조로 |
US20150228844A1 (en) * | 2014-02-13 | 2015-08-13 | Palo Alto Research Center Incorporated | Spectrally-Selective Metamaterial Emitter |
JP2015198063A (ja) * | 2014-04-03 | 2015-11-09 | 日本碍子株式会社 | 赤外線ヒーター |
KR102435770B1 (ko) * | 2014-11-28 | 2022-08-23 | 엔지케이 인슐레이터 엘티디 | 적외선 히터 및 적외선 처리 장치 |
JP6165307B2 (ja) | 2015-10-01 | 2017-07-19 | 三菱鉛筆株式会社 | フッ素系樹脂の非水系分散体 |
CN108925146B (zh) | 2016-03-24 | 2022-02-11 | 日本碍子株式会社 | 辐射装置以及使用辐射装置的处理装置 |
JP6783571B2 (ja) * | 2016-07-13 | 2020-11-11 | 日本碍子株式会社 | 放射装置及び放射装置を用いた処理装置 |
DK3495339T3 (da) * | 2016-08-03 | 2021-05-03 | Ngk Insulators Ltd | Fremgangsmåde til fremstilling af reaktionsprodukt |
-
2019
- 2019-04-12 JP JP2020516222A patent/JP6977943B2/ja active Active
- 2019-04-12 WO PCT/JP2019/015890 patent/WO2019208252A1/ja unknown
- 2019-04-12 CN CN201980027263.2A patent/CN112005616A/zh active Pending
- 2019-04-12 EP EP19791559.8A patent/EP3787372A4/en active Pending
-
2020
- 2020-10-19 US US17/073,700 patent/US20210045195A1/en active Pending
Also Published As
Publication number | Publication date |
---|---|
CN112005616A (zh) | 2020-11-27 |
WO2019208252A1 (ja) | 2019-10-31 |
EP3787372A1 (en) | 2021-03-03 |
EP3787372A4 (en) | 2021-12-22 |
US20210045195A1 (en) | 2021-02-11 |
JPWO2019208252A1 (ja) | 2021-04-22 |
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