JP6261055B2 - 集積回路モジュール - Google Patents

集積回路モジュール Download PDF

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Publication number
JP6261055B2
JP6261055B2 JP2015552768A JP2015552768A JP6261055B2 JP 6261055 B2 JP6261055 B2 JP 6261055B2 JP 2015552768 A JP2015552768 A JP 2015552768A JP 2015552768 A JP2015552768 A JP 2015552768A JP 6261055 B2 JP6261055 B2 JP 6261055B2
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Japan
Prior art keywords
lead frame
lead
dap
frame
peripheral
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Japanese (ja)
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JP2016503240A (ja
JP2016503240A5 (enExample
Inventor
ハン メン ユージーン リー リー
ハン メン ユージーン リー リー
ファウジ ビン アブディク アジズ アニス
ファウジ ビン アブディク アジズ アニス
ゴー ゲオク リン スーザン
ゴー ゲオク リン スーザン
スウィー ティアン エヌジー
スウィー ティアン エヌジー
Original Assignee
日本テキサス・インスツルメンツ株式会社
テキサス インスツルメンツ インコーポレイテッド
テキサス インスツルメンツ インコーポレイテッド
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Publication of JP2016503240A publication Critical patent/JP2016503240A/ja
Publication of JP2016503240A5 publication Critical patent/JP2016503240A5/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
    • H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
    • H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/565—Moulds
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    • H01—ELECTRIC ELEMENTS
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    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495—Lead-frames or other flat leads
    • H01L23/49537—Plurality of lead frames mounted in one device
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    • H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495—Lead-frames or other flat leads
    • H01L23/49541—Geometry of the lead-frame
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    • H01L23/49551—Cross section geometry characterised by bent parts
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    • H01L23/49575—Assemblies of semiconductor devices on lead frames
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    • H01L24/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
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    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01—Manufacture or treatment
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    • H01L2224/08151—Disposition the bonding area connecting directly to another bonding area, i.e. connectorless bonding, e.g. bumpless bonding the bonding area connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/08221—Disposition the bonding area connecting directly to another bonding area, i.e. connectorless bonding, e.g. bumpless bonding the bonding area connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/08245—Disposition the bonding area connecting directly to another bonding area, i.e. connectorless bonding, e.g. bumpless bonding the bonding area connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
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    • H01L2224/13001—Core members of the bump connector
    • H01L2224/13099—Material
    • H01L2224/131—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
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    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10—Bump connectors; Manufacturing methods related thereto
    • H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
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    • H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16245—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
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    • H01L2224/732—Location after the connecting process
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    • H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/80001—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by connecting a bonding area directly to another bonding area, i.e. connectorless bonding, e.g. bumpless bonding
    • H01L2224/809—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by connecting a bonding area directly to another bonding area, i.e. connectorless bonding, e.g. bumpless bonding with the bonding area not providing any mechanical bonding
    • H01L2224/80901—Pressing a bonding area against another bonding area by means of a further bonding area or connector
    • H01L2224/80904—Pressing a bonding area against another bonding area by means of a further bonding area or connector by means of an encapsulation layer or foil
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    • H01L2224/92—Specific sequence of method steps
    • H01L2224/922—Connecting different surfaces of the semiconductor or solid-state body with connectors of different types
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    • H01L2224/93—Batch processes
    • H01L2224/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L2224/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
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    • H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
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    • H01L24/02—Bonding areas ; Manufacturing methods related thereto
    • H01L24/07—Structure, shape, material or disposition of the bonding areas after the connecting process
    • H01L24/08—Structure, shape, material or disposition of the bonding areas after the connecting process of an individual bonding area
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    • H01L24/10—Bump connectors ; Manufacturing methods related thereto
    • H01L24/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
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    • H01L24/10—Bump connectors ; Manufacturing methods related thereto
    • H01L24/15—Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L24/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
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    • H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
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    • H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181—Encapsulation

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Manufacturing & Machinery (AREA)
  • Lead Frames For Integrated Circuits (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
JP2015552768A 2013-01-09 2014-01-09 集積回路モジュール Active JP6261055B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/737,697 US8884414B2 (en) 2013-01-09 2013-01-09 Integrated circuit module with dual leadframe
US13/737,697 2013-01-09
PCT/US2014/010860 WO2014110247A1 (en) 2013-01-09 2014-01-09 Integrated circuit module

Publications (3)

Publication Number Publication Date
JP2016503240A JP2016503240A (ja) 2016-02-01
JP2016503240A5 JP2016503240A5 (enExample) 2017-01-26
JP6261055B2 true JP6261055B2 (ja) 2018-01-17

Family

ID=51060383

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015552768A Active JP6261055B2 (ja) 2013-01-09 2014-01-09 集積回路モジュール

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US (2) US8884414B2 (enExample)
JP (1) JP6261055B2 (enExample)
CN (1) CN104956782B (enExample)
WO (1) WO2014110247A1 (enExample)

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JP1537980S (enExample) * 2015-04-20 2015-11-16
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US9922904B2 (en) * 2015-05-26 2018-03-20 Infineon Technologies Ag Semiconductor device including lead frames with downset
US10381293B2 (en) * 2016-01-21 2019-08-13 Texas Instruments Incorporated Integrated circuit package having an IC die between top and bottom leadframes
US10134660B2 (en) * 2017-03-23 2018-11-20 Nxp Usa, Inc. Semiconductor device having corrugated leads and method for forming
US10636729B2 (en) * 2017-06-19 2020-04-28 Texas Instruments Incorporated Integrated circuit package with pre-wetted contact sidewall surfaces
US10896869B2 (en) * 2018-01-12 2021-01-19 Amkor Technology Singapore Holding Pte. Ltd. Method of manufacturing a semiconductor device
US10867894B2 (en) * 2018-10-11 2020-12-15 Asahi Kasei Microdevices Corporation Semiconductor element including encapsulated lead frames
DE102019118174B3 (de) * 2019-07-04 2020-11-26 Infineon Technologies Ag Verarbeitung von einem oder mehreren trägerkörpern und elektronischen komponenten durch mehrfache ausrichtung
US11158567B2 (en) 2019-08-09 2021-10-26 Texas Instruments Incorporated Package with stacked power stage and integrated control die
US11715679B2 (en) 2019-10-09 2023-08-01 Texas Instruments Incorporated Power stage package including flexible circuit and stacked die
US11302615B2 (en) 2019-12-30 2022-04-12 Texas Instruments Incorporated Semiconductor package with isolated heat spreader
US11264310B2 (en) 2020-06-04 2022-03-01 Texas Instruments Incorporated Spring bar leadframe, method and packaged electronic device with zero draft angle
US11450593B2 (en) * 2020-07-02 2022-09-20 Infineon Technologies Ag Spacer frame for semiconductor packages
US11611170B2 (en) 2021-03-23 2023-03-21 Amkor Technology Singapore Holding Pte. Ltd Semiconductor devices having exposed clip top sides and methods of manufacturing semiconductor devices
US11848244B2 (en) * 2021-09-30 2023-12-19 Texas Instruments Incorporated Leaded wafer chip scale packages
US12424523B2 (en) * 2021-12-20 2025-09-23 Texas Instruments Incorporated Leadframe strip with complimentary unit design

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US8884414B2 (en) 2014-11-11
US20140191381A1 (en) 2014-07-10
CN104956782A (zh) 2015-09-30
CN104956782B (zh) 2018-05-11
US20140242755A1 (en) 2014-08-28
US9029194B2 (en) 2015-05-12
WO2014110247A1 (en) 2014-07-17

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