JP6211584B2 - プラズマ処理システムにおける共有ガスパネル - Google Patents

プラズマ処理システムにおける共有ガスパネル Download PDF

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Publication number
JP6211584B2
JP6211584B2 JP2015503403A JP2015503403A JP6211584B2 JP 6211584 B2 JP6211584 B2 JP 6211584B2 JP 2015503403 A JP2015503403 A JP 2015503403A JP 2015503403 A JP2015503403 A JP 2015503403A JP 6211584 B2 JP6211584 B2 JP 6211584B2
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Japan
Prior art keywords
mixing
gas
valves
output port
mixing manifold
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Japanese (ja)
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JP2015519724A5 (https=
JP2015519724A (ja
Inventor
タスカー・マーク
シャリーフ・イクバル
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Lam Research Corp
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Lam Research Corp
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/10—Mixing gases with gases
    • B01F23/19—Mixing systems, i.e. flow charts or diagrams; Arrangements, e.g. comprising controlling means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/0318—Processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/87249—Multiple inlet with multiple outlet
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/87265—Dividing into parallel flow paths with recombining
    • Y10T137/87281—System having plural inlets
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/87571—Multiple inlet with single outlet
    • Y10T137/87652—With means to promote mixing or combining of plural fluids
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/877—With flow control means for branched passages
    • Y10T137/87885—Sectional block structure

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Drying Of Semiconductors (AREA)
  • Valve Housings (AREA)
  • Chemical Vapour Deposition (AREA)
JP2015503403A 2012-03-27 2013-03-21 プラズマ処理システムにおける共有ガスパネル Active JP6211584B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/431,946 2012-03-27
US13/431,946 US8851113B2 (en) 2012-03-27 2012-03-27 Shared gas panels in plasma processing systems
PCT/US2013/033373 WO2013148474A1 (en) 2012-03-27 2013-03-21 Shared gas panels in plasma processing systems

Publications (3)

Publication Number Publication Date
JP2015519724A JP2015519724A (ja) 2015-07-09
JP2015519724A5 JP2015519724A5 (https=) 2016-05-12
JP6211584B2 true JP6211584B2 (ja) 2017-10-11

Family

ID=49233257

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015503403A Active JP6211584B2 (ja) 2012-03-27 2013-03-21 プラズマ処理システムにおける共有ガスパネル

Country Status (5)

Country Link
US (1) US8851113B2 (https=)
JP (1) JP6211584B2 (https=)
KR (1) KR102023794B1 (https=)
TW (1) TWI586900B (https=)
WO (1) WO2013148474A1 (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8851113B2 (en) 2012-03-27 2014-10-07 Lam Research Coporation Shared gas panels in plasma processing systems
US9091397B2 (en) 2012-03-27 2015-07-28 Lam Research Corporation Shared gas panels in plasma processing chambers employing multi-zone gas feeds
JP6278723B2 (ja) * 2014-01-31 2018-02-14 ポリプラスチックス株式会社 レンズ用組成物及びレンズ
JP6278722B2 (ja) * 2014-01-31 2018-02-14 ポリプラスチックス株式会社 レンズ用組成物及びレンズ
US10128087B2 (en) 2014-04-07 2018-11-13 Lam Research Corporation Configuration independent gas delivery system
US10557197B2 (en) 2014-10-17 2020-02-11 Lam Research Corporation Monolithic gas distribution manifold and various construction techniques and use cases therefor
US10022689B2 (en) 2015-07-24 2018-07-17 Lam Research Corporation Fluid mixing hub for semiconductor processing tool
US10118263B2 (en) 2015-09-02 2018-11-06 Lam Researech Corporation Monolithic manifold mask and substrate concepts
US9879795B2 (en) 2016-01-15 2018-01-30 Lam Research Corporation Additively manufactured gas distribution manifold
US10215317B2 (en) 2016-01-15 2019-02-26 Lam Research Corporation Additively manufactured gas distribution manifold
JP6589254B2 (ja) * 2016-09-28 2019-10-16 日立建機株式会社 作業車両
CN117467977A (zh) * 2023-11-06 2024-01-30 拓荆科技(上海)有限公司 一种歧管和一种薄膜沉积设备

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US2225153A (en) * 1939-04-21 1940-12-17 Brodie Ralph N Co Manifolding apparatus
IT1267915B1 (it) 1994-03-31 1997-02-18 Gianni Valerio Collettore doppio di distribuzione per centrali termo-idriche di tipo standardizzato
US5605179A (en) * 1995-03-17 1997-02-25 Insync Systems, Inc. Integrated gas panel
US5992463A (en) * 1996-10-30 1999-11-30 Unit Instruments, Inc. Gas panel
US6293310B1 (en) * 1996-10-30 2001-09-25 Unit Instruments, Inc. Gas panel
US6302141B1 (en) * 1996-12-03 2001-10-16 Insync Systems, Inc. Building blocks for integrated gas panel
US7294563B2 (en) 2000-08-10 2007-11-13 Applied Materials, Inc. Semiconductor on insulator vertical transistor fabrication and doping process
JP2002089798A (ja) * 2000-09-11 2002-03-27 Ulvac Japan Ltd 流体制御装置およびこれを用いたガス処理装置
JP2005539375A (ja) * 2002-08-27 2005-12-22 セレリティ・インコーポレイテッド 共通の平面にマニホルド接続を有するモジュール式基板ガスパネル
US6864174B2 (en) 2003-03-20 2005-03-08 Taiwan Semiconductor Manufacturing Co., Ltd Iteratively selective gas flow control and dynamic database to achieve CD uniformity
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Also Published As

Publication number Publication date
TW201402958A (zh) 2014-01-16
US20130255781A1 (en) 2013-10-03
KR102023794B1 (ko) 2019-09-20
WO2013148474A1 (en) 2013-10-03
TWI586900B (zh) 2017-06-11
US8851113B2 (en) 2014-10-07
KR20140148434A (ko) 2014-12-31
JP2015519724A (ja) 2015-07-09

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