Classifications

• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
  • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
  • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
  • B01F23/10—Mixing gases with gases
  • B01F23/19—Mixing systems, i.e. flow charts or diagrams; Arrangements, e.g. comprising controlling means
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
  • Y10T137/00—Fluid handling
  • Y10T137/0318—Processes
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
  • Y10T137/00—Fluid handling
  • Y10T137/8593—Systems
  • Y10T137/87249—Multiple inlet with multiple outlet
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
  • Y10T137/00—Fluid handling
  • Y10T137/8593—Systems
  • Y10T137/87265—Dividing into parallel flow paths with recombining
  • Y10T137/87281—System having plural inlets
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
  • Y10T137/00—Fluid handling
  • Y10T137/8593—Systems
  • Y10T137/87571—Multiple inlet with single outlet
  • Y10T137/87652—With means to promote mixing or combining of plural fluids
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
  • Y10T137/00—Fluid handling
  • Y10T137/8593—Systems
  • Y10T137/877—With flow control means for branched passages
  • Y10T137/87885—Sectional block structure

Definitions

• Substrate processing systems have long been employed to process substrates to produce electronic devices (such as integrated circuit dies or fiat display panels or solar panels).
• electronic devices such as integrated circuit dies or fiat display panels or solar panels.
• multiple process modules may be provisioned per system. This is commonly known as the clustered tool approach, and a cluster tool is commonl understood to include multiple processing modules for processing multiple substrates in parallel.
• each process module is configured to process one or more substrates in accordance with the same or different recipes/processes. Since the processing of substrates typically requires a plurality of process gases (such as etching or deposition or timing gases), each process module (or chamber, as the term “chamber” is used interchangeably with “process module” herein) is typically provisioned with its own gas panel in the past in order to selectively provide a set of required process gases to the process module to execute a desi red recipe,
• a gas panel represents the arrangement that perforins the function of receiving the plurality of process gases, selectively providing selective gases of the plurality of process gases to the process module in accordance with parameters specified by the recipe. These parameters ma include one or more of volume, pressure, and temperature, for example.
• Gas panels are, however, fairly bulky and are relatively expensive items to purchase, operate, and maintain.
• Atypical gas panel includes a plurality of input and output gas lines, a plurality of valves for volume/pressure control and for safety/isolation of the individual process gases and associated sensor/controi communication electronics.
• the typical gas panel also typically includes a mixing manifold for mixing the process gases prior to supplying such process gases to the process module. The large number of components increases the cost to acquire, operate, and maintain the substrate processing system.
• the invention relates, in an embodiment, to a gas panel for supplying selective ones of a plurality of process gases to a set of process modules having at least two process modules.
• the gas panel includes a plurality of mass flow controllers, each of the plurality of mass flow controllers having an MFC input port and an MFC output port, wherein MFC input ports of the plurality of mass flow controllers are coupled to receive the first plurality of process gases.
• the gas panel also includes a plurality of mixing valves, each of the plurality of mixing valves having an input port and a first output port and a second output port, wherein input ports of the plurality of m ixing valves are in gaseous communication with MFC outpui ports of the plurality of mass flow controllers.
• the gas pane further includes a first mixing manifold having plurality of first mixing manifold input ports and at least one first mixing manifold output port for outputt ig gas from the first mixing man ifold to a fi rst process module of the at least two process modul es, wherein first output ports of the plurality of mixing valves are in gaseous communication with the first mixing manifold input ports.
• the gas panel additionally includes a second mixing mani fold having a plurality of second mixing manifold input ports and at least one second mixing manifold output port for oittputting gas from the second mixing manifold to a second process module of the at least two process modules, wherein second outpui ports of the plurality of mixing valves are in gaseous communication with the second mixing manifold input ports, wherein the first mixing manifold and the second manifold are disposed under the plurality of mixing valves thereby reducing a volume of the gas panel,
• the invention relates to a method of supplying selective ones of a plurality of process gases to a set of process modules of a substrate processing system, the set of process modules having at least two process modules.
• the method includes providing a gas e vacuation containment structure and providing a phirality of mixing val ves, each of the plurality of mixing val ves having an input port and a first output port and a second output port, wherein each input port of the input ports of the plurality of mixing valves is configured t receive one of the plurality of process gases.
• the method also includes providing a first mixing manifold having a plurality of first mixing manifold input ports and at least one first mixing manifold output port for outputting gas from the first mixing manifold to a first process module of the at least two process modules, wherein first output ports of the plurali ty of mixing valves are in gaseous communication with the first mixing manifold input ports.
• the method additionally includes providing a second mixing manifold having a plurality of second mixing manifold input ports and at least one second mixing manifold output port for ouipitttmg gas from the second mixing manifold to a second process module of the at least two process modules, wherein second output ports of the plurality of mixing valves are in gaseous communication with the second mixing manifold input ports, wherein the p lurality of mixing valves, the first mix ing manifold, and the second mixing manifold are disposed within the gas evacuation containment siructure and wherein the first mixing manifold and the second manifold are disposed under the plurality of mixing valves, thereby reducing a volume of the gas evacuation containment structure.
• FIG. 1 shows, in accordance with an embodiment of the invention, an arrangement for supplying process gases to a set of process modules of a cluster tool
• Fig. 2 conceptually shows, in accordance with an embodiment of the invention, some relevant components within a shared gas panel (SGP),
• SGP shared gas panel
• Fig, 3 sho ws the spatial arrangements of some rele vant components of the shared gas panel in accordance with one or more embodiments of the invention.
• FIG. 4 shows another view of the mixing valve of the type commonly employed in industry
• Fig, 5 shows the stagger arrangement of the two weldments forming two mixing mani folds of a shared gas panel.
• the computer readable medium may include, for example, semiconductor, magnetic, opio-magoeiic, optical, or other forms of computer readable medium for storing computer readable code.
• the invention may also cover apparatuses for practicing embodiments of the invention. Such apparatus may include circuits, dedicated and/or programmable, to carry out tasks pertaining to embodiments of the invention. Examples of such apparatus include a general-purpose computer and/or a dedicated computing device when appropriately programmed and may include a combination of a
• Embodiments of the invention relate to methods and apparatus for reducing the number and size of gas panels in a substrate processing system.
• substrate processing systems are constructed and best practices are established such that if multiple process modules of the same cluster tool carry out the same recipe at the same time to execute the same process on different substrates in these di fferent process modules, it is unnecessary to provide each such process module with an independently controllable gas box.
• multiple process modules share a gas panel, thereby reducing the number of components that need to be purchased and maintained.
• Each shared gas panel (SGP) can service two or more process modules simultaneously.
• embodiments of the invention involve arrangements and techniques to minimize the volume occupied by components of the shared ga panel (SGP).
• embodiment of the invention involve staggering the mixing manifolds such that multiple .mixing manifolds can. occupy the same footprint as one prior art manifold. This is important since modem safety requirements specify that components of a gas panel ⁇ such, as valves, mass flow controllers, gas line connectors) be isolated from the ambient environment by a containment structure.
• the air in the containment structure is constantly pumped out and scrubbed (i.e., processed to remove or render relatively harmless any gas that may be leaked from the gas panel components), in an example gas panel currently in use, about 150 CFM
• an apparatus for supplying selective process gases to a set of process modules that includes at least two process modules.
• the apparatus includes a gas evacuation containment structure (i.e., a containment structure that, isolates the components within the containment structure from the ambient environment and is configured to have its interior air frequently or constantly evacuated to a treatment system).
• a gas evacuation containment structure i.e., a containment structure that, isolates the components within the containment structure from the ambient environment and is configured to have its interior air frequently or constantly evacuated to a treatment system.
• a gas evacuation containment structure i.e., a containment structure that, isolates the components within the containment structure from the ambient environment and is configured to have its interior air frequently or constantly evacuated to a treatment system.
• a gas evacuation containment structure i.e., a containment structure that, isolates the components within the containment structure from the ambient environment and is configured to have its interior air frequently or constantly evacuated to a treatment system.
• the process gases are selectively supplied to the input ports of the mixing valves using a plurality of upstream primary val e and/or mass flow controllers, if an upstream primary valve and/or mass flow controller shuts off, the process gas associated with the gas line on which the upstream primary valve and/or mass flow controlled is closed does not get delivered to an input port of a mixing valve and is not used in the processing of the substrate.
• the input port is coupled to both the first output, port and the second output, port such that when the 3-port mixing val e is on, the input port provides gas to both the first output port and the second output port. When the 3-port mixing valve is off, the input port stops providing gas to both the first output port and the second output port.
• each 3-port mixing valve in each 3-port mixing valve, the input port is selectively coupled to both the first output port and the second output port such that when the 3-port mixing valve is on, the input port provides gas (depending on a control input, which may be pneumatic, hydraulic, or electrical) to I) both the first output port and the second output port, or 2) only the first output port, or 3) only the second ouiput port.
• a control input which may be pneumatic, hydraulic, or electrical
• the first output ports of the mixing valves are coupled to the plural ity of input ports of a first mixi ng manifold, while the second output ports of the mixing vaives are coupled to the plurality of input ports of a second mixing manifold
• the first mixing manifold represents the shared gas manifold within which process gases from various first output ports of various mixing valves are mixed before being delivered via a first mixing manifold output port to the first process module of the cluster tool
• the second mixing manifold represents the gas manifold within which process gases from various second output posts of various mixing valves are mixed before being delivered via a second mixing manifold output port to the second process module of the cl uster tool.
• the first mixing manifold and the second mixing manifold are oriented in parallel, such that their longitudinal axis are parallel to a first direction or such that their manifold input ports generally line up parallel to the first direction.
• each of these mixing manifolds assumes the general shape of a tubular length having a longitudinal dimension and a cross section.
• the cross-section may be circular or may be square or rectangular or any other enclosed shape.
• the longitudinal dimension forms an axis that is parallel to the aforementioned first dimension in this
• Each set of three ports that incl udes the input port, the first output port, and the second output port of each mixing valve are lined up in a line that is parallel to a second direction. More importantly, the second direction is at an angle with the first direction with which the mixing manifolds are oriented. As the terra is employed herein, the second direction is deemed to be "at an angle" with the first direction when the second direction is neither orthogonal nor parallel to the first direction.
• the mixing manifolds may be placed closer together, thereb reducing the volume of the components of the shared gas panel and concomitantly reducing the v olume of the containment structure that houses these components, in some cases, multiple mi ing manifolds can occupy the same footprint formerly employed to accommodate a prior art manifold.
• the mixing valves occupy a given plane.
• the first mixing manifold is disposed on a first plane under the mixing valves plane, while the inlet lines that supply the process gas to the mixing val ve input ports are placed on a second plane under the nnxing valves, with the second plane being disposed between the first plane and the mixing valves, in a embodiment, both the first mixing manifold and the second mixing manifold are disposed on the first plane under the mixing valves while the inlet Hues that supply the process gas to the input ports of the mixing val ves are placed on a second plane under the mixing valves plane, with the second plane being disposed between the first plane and the mixing valves plane.
• Fig. 1 shows, in accordance with an embodiment of the invention, an arrangement for supplying process gases to a set of process modules PMl- PM4 of a cluster tool 100.
• a gas supply 1 10 is shown providing process gases to Shared Gas Panel I and Shared Gas Panel 2.
• the gas supply includes multiple gas lines, each of which may provide one specific process gas from the gas supply store (such as a storage tank via appropriate supply tubing).
• Shared Gas Panel 1 is shown supplying process gas(es) to both process modules PMl and P.M2. in an embodiment, PM 1 and PM 2 both execute the same recipe, in another embodiment, PMl and PM2 may execute different recipes.
• a cluster tool may include any number of shared gas panels and individual (one-per-process-module) gas panels or any mixture thereof. Further, although two process modules per shared gas panel are shown, a shared gas panel may supply process gas(es) to as many process modules as desired. Further, although only four process modules are shown, a cluster tool may have as many process modules as desired.
• Shared Gas Panel I is shown with a gas evacuation containment structure 102, representing the environmental enclosure for isolating the components of the shared gas panel from the ambient environment. In use, the gas within gas evacuation containment structure 102 is evacuated periodically or continually (using pumps, for example) for treatment (such as scrubbing).
• Fig. 2 conceptually shows, in accordance with an embodiment of the invention, some relevant components within a shared gas panel (SGP) 202, suc as shared gas panel 1 of Fig. I .
• SGP 202 is shown receiving four process gases throug four gas input lines 204A, 206A, 208A, and 21 OA although a typical SGP may receive 1 or more gases (the number of gas input lines may vary as desired).
• Each of gas input lines 204 A, 206 A, 208 A, and 21 OA is coupled to a respective primary valve 204B, 206B, 208B, and 21.0B.
• Each primary valve may be
• a set of purge valves 204D, 206D, 208D, and 21 OD which is part of a purging system, are also sho wn altlioug purge valves and purge systems are conventional and are not past of the present invention.
• Mass Flow Controllers (MFC) 204C 206G 208C. 210C are in gaseous
• a mass flow controller is employed to regulate (including shutting off) the flow rate and/or pressure of the gas delivered. Downstream of the mass flow controllers are the mixing valves, each of which is in gaseous communication with a respective mass flow controller.
• each mixing valve has one input port for receiving a process gas from its respective manifold (e.g., mixing valve 204E receiving process gas from MFC 204C and mixing valve 208E receiving process gas from MFC208C and two output ports for coupling to the two mixing manifolds 250 and 252, each mixing valve is thus a 3-port valve (one input port and 2 output ports).
• Mixing valves 204E-210E may be pneumatically operated, electrically operated, mechanically operated, or hydrauJically operated, for example.
• Mixing manifold 250 receives its input gas(es) via the mixing valves and mixes the process gas(es) before delivering the process gas(es) to its process module PM t via an isolation valve 260.
• mixing manifold 252 receives its input gas(es) via the mixing valves and mixes the process gas(es) before delivering the process gas(es) to its process module PM 2 via an
• Isolation valves isolate the process modules from the gas panels and are employed for volume/flow control purposes during processing and maintenance, for example. ⁇ " 00031]
• the mixing valves are siog!e-input-two-common-outpufts valves. In other words, when the valve is open, gas from the input port is provided to both output ports simultaneously, in this case, each mixing valve is essentially a splitter valve and both mixing manifolds 250 and 252 will receive the same type of process gas(es).
• the mixing valve may, as discussed earlier, selectively provide gas from its i nput port to any one of the output ports, any combination of output ports, or to all output ports.
• the mixing valve may, as discussed earlier, selectively provide gas from its i nput port to any one of the output ports, any combination of output ports, or to all output ports.
• more than 2 output ports may be provided per mixing valve if there are more than 2 mixing manifolds and/or more than 2 process modules.
• the mixing manifolds are disposed under the mixing valves in order to save space and to reduce the volume within the containment enclosure. This is best seen in Fig, 3 wherein mixing manifolds 250 and 252 are disposed under plane portion 302, representing a portion of a plane at which the mixing valve flange (402 of Fig. 4) may be disposed. In Fig. 3, mixing manifolds 250 and 252 occupy the same plane in the Y dimension under the mixing val ve.
• gas line portion 310 that is coupled to the input port occupies, at its bottom end, a different plane in the Y- diraension that is higher than the Y -dimension plane occupied by the mixing manifolds 250 and 252.
• the input gas line (whether is vertical portion or the circumference of its horizontal portion) does not extend downward to the plane occupied by mixing manifolds 250 and 252.
• a process gas is provided via gas line 310 and travels upward portion 31 OA in the + Y direction to the input port of the mixing valve via hole 320 (hole 320 represents an imaginary cut-away aperture in gas line portion 31 OA for illustration purposes).
• Holes 322 and 324 represent imaginary cut-away apertures in gas line portions 250A and 252A (which are in gaseous communication with mixing manifolds 250 and 252 respectively) to be mixed in manifolds 252 and 250 respectively.
• gas is provided to the mixing manifolds 252 and 250 from portions 252A and 250A via T-coupiiiigs 372 and 370.
• Gas is provided to the input port of the mixing valve (by traveling up portion 310A) via an L-coupling 374.
• a short horizontal portion 310B is employed to provide the input gas in a plane that is higher (more positive in the Y direction) than the plane occupied by the mixing manifolds 250 and 252).
• the tubing lengths, number of turns, and/or the tubing conshraction diameters of the two gas paths from the two mixing valve outlet ports to its two mixing manifold are kept as similar as possible to ensure that each mixing manifold receive the same mass flow from the MFC with the same pressure, gas velocity, and concentration, in one or more embodiments, these gas paths may be optimized with different tubing lengths, number of turns, and/or tubing diameters/construction to ensure that each mixing manifold recei e the same mass flow from the MFC with the same pressure, gas velocity, and concentration.
• FIG. 3 also shows another process gas provided via L-coupling 368 and gas line 360 to another mixing valve coupled to plane portion 38 and distributed t the two mixing manifolds 250 and 252 via lines 362 and 364.
• Fig. 3 shows mixing manifolds 250 and 252 oriented along direction X such thai its input ports line u along the same direction X.
• input ports of manifold 252 i.e., the upward pointing portions of T-couplings 366 and 372 that couple to portions 364 and 252A respectively line up parallel to direction X of Fig. 3 (also directio X of Fig. 5).
• input ports of manifold 250 i.e., the upward pointing portions of T-couplings 370 and 376) that couple to portions 250A and 362 respectively line up parallel to direction X of Fig. 3.
• each mixing manifold has a long dimension (e.g., longitudinal dimension in the case of a tubular structure such as those shown in Fig, 3) and a cross section (e.g., a round or some other polygonal cross section in the case of a tubular structure), the long dimension of the mixing manifold represents the mixing manifold direction herein. In the example of Fig. 3, this mixing manifold direction is also in the direction +/- X.
• each mixing valve line up in a direction that is at an angle with direction X of Fig. 3.
• the input post for the mixing val ve that is coupled plane portion 302 occupies the positions denoted by reference number 320.
• the two output posts for the mixing valve that is coupled to plane portion 302 occupy the positions denoted by reference numbers 322 and 324.
• holes 320, 322, and 324 line up along the direction of line 380, which is at an angle (i.e. other than orthogonal, or parallel) to the X direction (i.e., the mixing manifold direction or the mixing manifold longitudinal direction).
• Fig. 4 shows the three ports 404, 406, and 408 of the mixing valve.
• Input port 406 is sandwiched between output ports 404 and 408.
• ports 404, 406, and 408 line up in the direction 414, which is at an angle to the mixing manifold direction X.
• the mixing manifolds are oriented in the direction X of Fig. 4, and the ports of a gi ven mixing valve (either a!l three or the input port to the mixing valve and either of the output ports to the two mixing manifolds) line up along direction 414, which is at an angle (i.e.. not orthogonal or parallel) to mixing manifold direction X.
• This angle may be deemed diagonal or an acute angle (less than 90 degrees) depending on which direction is deemed positive for reference direction X, for example.
• body 412 housing the valve body and controls is also shown in Fig, 4, Also shown are mounting flange 402 and mounting holes 414 A, B, 414C, and 414D. In practice, flange 402 of Fig. 4 mates with tabes 252 A, 31 OA, and 250A of Fig. 3 at the plane shown by plane portion 302.
• the mixin manifolds are parallel and essentially "staggered" such that each set of 3 ports of each mixing valve (1 input port to the mixing valve and 2 output ports to the two mixing manifolds) line up parallel to direction 506. i one or more embodiments, these two mixing manifolds are identical weldment parts to save inventory and manufacturing cost.
• the input port for the mixing valve that is coupled to mixing manifold input ports 510 and 514 occupy the position denoted by reference number 512,
• this mi ing valve input port and its two mixing val ve output ports ⁇ coupled to mixing manifold input ports 510 and 514) line up parallel to direction 506.
• direction 506 is considered to be "at an angle" with the X direction ⁇ which is parallel to the longitude of the mixing mani folds) if they are not. orthogonal or parallel to one another.
• Fig. 5 also shows a mixing assembly output port 502, representing the port for outpotting the mixed process gas to the process module coupled to mixing manifold 250.
• Another mixing assembly output post (not shown to improve clarity in Fig. 5) is also provided for mixing manifold 252.
• the output port may be provided at one end of the mixing manifold, or may be provided anywhere along its shared length.
• embodi ments of the in vention permit a single shared gas panel to selectively provide process gas(es) to a plurality of process modules. By ensuring that each mixing manifold receive the same mass flow, matching issues are eliminated. By reducing the number of gas panels per cluster tool fewer gas panel components (such as valves, MFCs, connectors, transducers, sensors, etc.) need to be acquired and/or maintained. Further, one or more embodiments of the in vention stagger the mixing manifolds (e.g., in th X-Z direction of Fig. 3) and/or vertically displace (e.g., in th Y direction of Fig.
• the components can be squeezed into a smaller footprint and thus smaller volume, thereby reducing the volume occupied by the gas panel components.
• volume is reduced, less air needs to be pumped and purged, leading to reduced operating cost

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• Chemical & Material Sciences (AREA)
• Chemical Kinetics & Catalysis (AREA)
• Drying Of Semiconductors (AREA)
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• Chemical Vapour Deposition (AREA)

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