JP6203575B2 - 表示装置 - Google Patents

表示装置 Download PDF

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Publication number
JP6203575B2
JP6203575B2 JP2013177612A JP2013177612A JP6203575B2 JP 6203575 B2 JP6203575 B2 JP 6203575B2 JP 2013177612 A JP2013177612 A JP 2013177612A JP 2013177612 A JP2013177612 A JP 2013177612A JP 6203575 B2 JP6203575 B2 JP 6203575B2
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JP
Japan
Prior art keywords
thin film
pixel
substrate
film transistor
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2013177612A
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English (en)
Japanese (ja)
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JP2015045784A5 (enExample
JP2015045784A (ja
Inventor
祐太 船橋
祐太 船橋
将史 平田
将史 平田
有吾 竹田
有吾 竹田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Liquid Crystal Display Co Ltd
Original Assignee
Panasonic Liquid Crystal Display Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Liquid Crystal Display Co Ltd filed Critical Panasonic Liquid Crystal Display Co Ltd
Priority to JP2013177612A priority Critical patent/JP6203575B2/ja
Priority to US14/199,529 priority patent/US9287296B2/en
Publication of JP2015045784A publication Critical patent/JP2015045784A/ja
Publication of JP2015045784A5 publication Critical patent/JP2015045784A5/ja
Application granted granted Critical
Publication of JP6203575B2 publication Critical patent/JP6203575B2/ja
Active legal-status Critical Current
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/441—Interconnections, e.g. scanning lines

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Liquid Crystal (AREA)
JP2013177612A 2013-08-29 2013-08-29 表示装置 Active JP6203575B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2013177612A JP6203575B2 (ja) 2013-08-29 2013-08-29 表示装置
US14/199,529 US9287296B2 (en) 2013-08-29 2014-03-06 Display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013177612A JP6203575B2 (ja) 2013-08-29 2013-08-29 表示装置

Publications (3)

Publication Number Publication Date
JP2015045784A JP2015045784A (ja) 2015-03-12
JP2015045784A5 JP2015045784A5 (enExample) 2016-09-29
JP6203575B2 true JP6203575B2 (ja) 2017-09-27

Family

ID=52581910

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013177612A Active JP6203575B2 (ja) 2013-08-29 2013-08-29 表示装置

Country Status (2)

Country Link
US (1) US9287296B2 (enExample)
JP (1) JP6203575B2 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI534682B (zh) * 2015-03-24 2016-05-21 群創光電股份有限公司 顯示面板
CN106154648B (zh) * 2015-03-24 2021-03-19 群创光电股份有限公司 显示面板
TWI559060B (zh) * 2015-04-07 2016-11-21 友達光電股份有限公司 顯示面板、彎曲顯示面板以及彎曲顯示器模組
TWI638209B (zh) * 2015-05-05 2018-10-11 友達光電股份有限公司 顯示面板
KR102446857B1 (ko) * 2015-05-26 2022-09-23 삼성디스플레이 주식회사 표시 장치
CN104820317B (zh) * 2015-05-26 2018-05-18 京东方科技集团股份有限公司 一种显示基板及其制作方法和显示装置
JP2017076009A (ja) * 2015-10-13 2017-04-20 パナソニック液晶ディスプレイ株式会社 表示装置
CN106371254A (zh) * 2016-10-28 2017-02-01 上海中航光电子有限公司 阵列基板及显示面板
CN109270749A (zh) * 2018-11-13 2019-01-25 成都中电熊猫显示科技有限公司 液晶显示面板及显示装置
CN114442387B (zh) * 2020-10-30 2025-04-22 京东方科技集团股份有限公司 阵列基板及其制造方法、显示装置

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3936126B2 (ja) * 2000-08-30 2007-06-27 シャープ株式会社 透過反射両用型液晶表示装置
JP4709375B2 (ja) 2000-12-22 2011-06-22 東芝モバイルディスプレイ株式会社 液晶表示素子
JP2002214621A (ja) 2001-01-17 2002-07-31 Toshiba Corp 液晶表示装置
JP4334166B2 (ja) * 2001-08-01 2009-09-30 シャープ株式会社 液晶表示装置及び配向膜の露光装置及び配向膜の処理方法
JP3744511B2 (ja) * 2003-05-15 2006-02-15 セイコーエプソン株式会社 電気光学装置、電子機器、及び電気光学装置の製造方法
JP4305051B2 (ja) 2003-05-15 2009-07-29 セイコーエプソン株式会社 電気光学装置、電子機器、及び電気光学装置の製造方法
JP2006350211A (ja) * 2005-06-20 2006-12-28 Toshiba Matsushita Display Technology Co Ltd 液晶表示装置
US20070216847A1 (en) * 2006-03-15 2007-09-20 Tsung-Chien Chang Liquid crystal display panel
JP4987585B2 (ja) * 2007-06-20 2012-07-25 パナソニック液晶ディスプレイ株式会社 液晶表示装置
KR20090026576A (ko) * 2007-09-10 2009-03-13 삼성전자주식회사 표시 장치 및 그 제조 방법
JP5093726B2 (ja) * 2007-12-26 2012-12-12 Ｎｌｔテクノロジー株式会社 表示装置及びそれを用いた端末装置
KR101404548B1 (ko) * 2008-01-17 2014-06-10 삼성디스플레이 주식회사 액정 표시 장치
KR20090097565A (ko) * 2008-03-12 2009-09-16 삼성전자주식회사 액정 표시패널 및 액정 표시패널의 제조방법
KR20090126765A (ko) * 2008-06-05 2009-12-09 삼성전자주식회사 액정 표시 장치 및 그 제조 방법
KR20090130938A (ko) * 2008-06-17 2009-12-28 삼성전자주식회사 표시 기판 및 이를 포함하는 표시 장치
TWI384273B (zh) * 2008-10-31 2013-02-01 Au Optronics Corp 觸控顯示面板
JP5557177B2 (ja) * 2008-11-11 2014-07-23 Ｎｌｔテクノロジー株式会社 液晶表示装置
KR101607635B1 (ko) * 2009-09-21 2016-03-31 삼성디스플레이 주식회사 표시판 및 이를 포함하는 액정 표시 장치
BR112012007128A2 (pt) * 2009-09-30 2016-07-12 Sharp Kk painel de display de cristal líquido
KR20120033688A (ko) * 2010-09-30 2012-04-09 엘지디스플레이 주식회사 액정표시장치 및 이의 제조 방법
KR101319355B1 (ko) * 2010-11-04 2013-10-18 엘지디스플레이 주식회사 액정 표시 패널 및 그의 제조 방법
JP5837350B2 (ja) * 2011-07-21 2015-12-24 株式会社ジャパンディスプレイ 液晶表示装置
JP5917126B2 (ja) * 2011-12-19 2016-05-11 株式会社ジャパンディスプレイ 液晶表示装置
KR102063987B1 (ko) * 2013-09-02 2020-01-08 엘지디스플레이 주식회사 액정표시장치

Also Published As

Publication number Publication date
US20150060858A1 (en) 2015-03-05
US9287296B2 (en) 2016-03-15
JP2015045784A (ja) 2015-03-12

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