JP6186623B2 - マイクロリソグラフィ投影露光装置 - Google Patents

マイクロリソグラフィ投影露光装置 Download PDF

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JP6186623B2
JP6186623B2 JP2012229290A JP2012229290A JP6186623B2 JP 6186623 B2 JP6186623 B2 JP 6186623B2 JP 2012229290 A JP2012229290 A JP 2012229290A JP 2012229290 A JP2012229290 A JP 2012229290A JP 6186623 B2 JP6186623 B2 JP 6186623B2
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heating light
light
mirror
heating
projection
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Japanese (ja)
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JP2013074299A5 (enExample
JP2013074299A (ja
Inventor
ゲー マヨーア アンドラーシュ
ゲー マヨーア アンドラーシュ
マウル マンフレート
マウル マンフレート
ワイス グンドゥラ
ワイス グンドゥラ
ヘツラー ヨッヘン
ヘツラー ヨッヘン
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70158—Diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2012229290A 2011-09-27 2012-09-27 マイクロリソグラフィ投影露光装置 Active JP6186623B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102011083559.8 2011-09-27
DE102011083559 2011-09-27

Publications (3)

Publication Number Publication Date
JP2013074299A JP2013074299A (ja) 2013-04-22
JP2013074299A5 JP2013074299A5 (enExample) 2015-11-12
JP6186623B2 true JP6186623B2 (ja) 2017-08-30

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JP2012229290A Active JP6186623B2 (ja) 2011-09-27 2012-09-27 マイクロリソグラフィ投影露光装置

Country Status (3)

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US (1) US9052606B2 (enExample)
JP (1) JP6186623B2 (enExample)
DE (1) DE102012216284A1 (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI657937B (zh) * 2013-12-05 2019-05-01 美商佛塞安科技公司 用於發射偏移照明以減少雜散光的方法和系統
DE102014216458A1 (de) 2014-08-19 2016-02-25 Carl Zeiss Smt Gmbh Optisches Element mit einer Beschichtung zur Beeinflussung von Heizstrahlung und optische Anordnung
DE102016225625A1 (de) * 2016-12-20 2017-12-07 Carl Zeiss Smt Gmbh Retikel, projektionsbelichtungsanlage und verfahren zur abbildung von overlay-markierungen
DE102019219289A1 (de) * 2019-12-11 2021-06-17 Carl Zeiss Smt Gmbh Optisches System, sowie Heizanordnung und Verfahren zum Heizen eines optischen Elements in einem optischen System
DE102020207748A1 (de) * 2020-06-23 2021-03-25 Carl Zeiss Smt Gmbh Optisches System, insbesondere in einermikrolithographischen Projektionsbelichtungsanlage
DE102020207752A1 (de) * 2020-06-23 2021-12-23 Carl Zeiss Smt Gmbh Heizanordnung und Verfahren zum Heizen eines optischen Elements
DE102020213416A1 (de) 2020-10-23 2021-10-07 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit einer Heizvorrichtung und einem Polarisator
DE102020213983A1 (de) * 2020-11-06 2022-05-12 Carl Zeiss Smt Gmbh Optisches System, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
US12461448B2 (en) 2021-01-27 2025-11-04 ASML Netherlands B.V. & ASML Holding N.V. Multi-channel light source for projection optics heating
DE102021201258A1 (de) 2021-02-10 2022-08-11 Carl Zeiss Smt Gmbh Verfahren zum Heizen eines optischen Elements in einer mikrolithographischen Projektionsbelichtungsanlage, sowie optisches System
DE102021206203A1 (de) * 2021-06-17 2022-12-22 Carl Zeiss Smt Gmbh Heizanordnung und Verfahren zum Heizen eines optischen Elements
DE102021212679A1 (de) 2021-11-11 2023-05-11 Carl Zeiss Smt Gmbh Optisches System, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
DE102022203039A1 (de) 2022-03-28 2023-03-09 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Mikrolithographie
DE102022209455A1 (de) 2022-09-09 2024-03-14 Carl Zeiss Smt Gmbh Heizanordnung, sowie optisches System und Verfahren zum Heizen eines optischen Elements
DE102023117203A1 (de) * 2023-06-29 2025-01-02 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zur Voralterung eines optischen Elements für die Halbleiterlithographie
DE102024205028A1 (de) * 2024-05-29 2025-06-05 Carl Zeiss Smt Gmbh Anlage der Halbleitertechnologie mit unterdrückter Streustrahlung

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1112750A (fr) * 1978-10-13 1981-11-17 Jean-Luc Dion Cellule acousto-optique a cristal liquide
JP4051473B2 (ja) * 1998-12-17 2008-02-27 株式会社ニコン 照明光学装置および該照明光学装置を備えた露光装置
JP2002075835A (ja) * 2000-08-30 2002-03-15 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
DE10146944A1 (de) * 2001-09-24 2003-04-10 Zeiss Carl Jena Gmbh Meßanordnung
US20030235682A1 (en) * 2002-06-21 2003-12-25 Sogard Michael R. Method and device for controlling thermal distortion in elements of a lithography system
DE10317662A1 (de) 2003-04-17 2004-11-18 Carl Zeiss Smt Ag Projektionsobjektiv, mikrolithographische Projektionsbelichtungsanlage und Verfahren zur Herstellung einer Halbleiterschaltung
WO2004095137A1 (en) 2003-04-24 2004-11-04 Carl Zeiss Smt Ag Projection optical system
WO2005040925A1 (de) 2003-09-27 2005-05-06 Carl Zeiss Smt Ag Euv-projektionsobjektiv mit spiegeln aus materialien mit unterschiedlichem vorzeichen der steigung der temperaturabhängigkeit des wärmeausdehnungskoeffizienten nahe der nulldurchgangstemperatur
DE102005031792A1 (de) * 2005-07-07 2007-01-11 Carl Zeiss Smt Ag Verfahren zur Entfernung von Kontamination von optischen Elementen, insbesondere von Oberflächen optischer Elemente sowie ein optisches System oder Teilsystem hierfür
DE102008016011A1 (de) * 2007-03-27 2008-10-02 Carl Zeiss Smt Ag Korrektur optischer Elemente mittels flach eingestrahltem Korrekturlicht
JP2009010131A (ja) * 2007-06-27 2009-01-15 Canon Inc 露光装置及びデバイス製造方法
US20090091730A1 (en) * 2007-10-03 2009-04-09 Nikon Corporation Spatial light modulation unit, illumination apparatus, exposure apparatus, and device manufacturing method
DE102008054582A1 (de) * 2007-12-21 2009-07-09 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage
US20100290020A1 (en) * 2009-05-15 2010-11-18 Shinichi Mori Optical apparatus, exposure apparatus, exposure method, and method for producing device

Also Published As

Publication number Publication date
US20130077074A1 (en) 2013-03-28
US9052606B2 (en) 2015-06-09
JP2013074299A (ja) 2013-04-22
DE102012216284A1 (de) 2013-03-28

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