JP6185560B2 - フッ素含有合成石英ガラスからなる円筒型部品を製造する方法 - Google Patents
フッ素含有合成石英ガラスからなる円筒型部品を製造する方法 Download PDFInfo
- Publication number
- JP6185560B2 JP6185560B2 JP2015506207A JP2015506207A JP6185560B2 JP 6185560 B2 JP6185560 B2 JP 6185560B2 JP 2015506207 A JP2015506207 A JP 2015506207A JP 2015506207 A JP2015506207 A JP 2015506207A JP 6185560 B2 JP6185560 B2 JP 6185560B2
- Authority
- JP
- Japan
- Prior art keywords
- fluorine
- soot body
- chlorine
- quartz glass
- vitrification
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000011737 fluorine Substances 0.000 title claims description 121
- 229910052731 fluorine Inorganic materials 0.000 title claims description 121
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 50
- 238000000034 method Methods 0.000 title claims description 39
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 title 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 120
- 239000004071 soot Substances 0.000 claims description 113
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 70
- 239000000460 chlorine Substances 0.000 claims description 65
- 229910052801 chlorine Inorganic materials 0.000 claims description 54
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 52
- 238000005660 chlorination reaction Methods 0.000 claims description 32
- 238000004017 vitrification Methods 0.000 claims description 28
- 208000005156 Dehydration Diseases 0.000 claims description 18
- 230000018044 dehydration Effects 0.000 claims description 18
- 238000006297 dehydration reaction Methods 0.000 claims description 18
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 17
- 238000010438 heat treatment Methods 0.000 claims description 15
- 230000008569 process Effects 0.000 claims description 13
- 238000000151 deposition Methods 0.000 claims description 8
- 230000008021 deposition Effects 0.000 claims description 8
- 238000003682 fluorination reaction Methods 0.000 claims description 7
- 239000002245 particle Substances 0.000 claims description 6
- 239000011261 inert gas Substances 0.000 claims description 4
- 239000007858 starting material Substances 0.000 claims description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- 230000007062 hydrolysis Effects 0.000 claims description 3
- 238000006460 hydrolysis reaction Methods 0.000 claims description 3
- 230000003647 oxidation Effects 0.000 claims description 3
- 238000007254 oxidation reaction Methods 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- 238000009826 distribution Methods 0.000 description 37
- 239000011162 core material Substances 0.000 description 11
- 238000001035 drying Methods 0.000 description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 239000007789 gas Substances 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
- 239000013307 optical fiber Substances 0.000 description 7
- 238000005253 cladding Methods 0.000 description 6
- 238000009792 diffusion process Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 229910052736 halogen Inorganic materials 0.000 description 6
- 150000002367 halogens Chemical class 0.000 description 6
- 239000012535 impurity Substances 0.000 description 5
- 229910005793 GeO 2 Inorganic materials 0.000 description 4
- 238000000280 densification Methods 0.000 description 4
- 239000000835 fiber Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000005137 deposition process Methods 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 2
- 229910003902 SiCl 4 Inorganic materials 0.000 description 2
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 229910002091 carbon monoxide Inorganic materials 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000012681 fiber drawing Methods 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 238000009499 grossing Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000011265 semifinished product Substances 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000010561 standard procedure Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 101710134784 Agnoprotein Proteins 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 238000004566 IR spectroscopy Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000001479 atomic absorption spectroscopy Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000002274 desiccant Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 238000010574 gas phase reaction Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 150000002483 hydrogen compounds Chemical class 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000001095 inductively coupled plasma mass spectrometry Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000000918 plasma mass spectrometry Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000004876 x-ray fluorescence Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01446—Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01446—Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
- C03B37/01453—Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering for doping the preform with flourine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/07—Impurity concentration specified
- C03B2201/075—Hydroxyl ion (OH)
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
- C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Organic Chemistry (AREA)
- Thermal Sciences (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Glass Compositions (AREA)
- Glass Melting And Manufacturing (AREA)
Description
(a)シリコン含有出発化合物の火炎加水分解又は酸化と、キャリア上へのSiO2粒子の堆積によって、スート体を生成する工程と、
(b)前記スート体に脱水処理を施すことによって、水酸基を除去する工程と、
(c)フッ素含有雰囲気にて少なくとも750℃のフッ素化温度で前記スート体を処理することによって、前記スート体にフッ素を付加する工程と、
(d)塩素含有雰囲気にて後塩素化温度で前記スート体を処理することによって、前記フッ素を付加したスート体を後塩素化する工程と、
(e)前記スート体をガラス化温度まで加熱することによって、前記スート体をガラス化して円筒型部品を得る工程と
を含むフッ素含有合成石英ガラスからなる円筒型部品を製造する方法に関する。
(I)工程(b)による脱水処理において、ガラス化後に平均水酸基含有量が1重量ppm〜300重量ppmの範囲となるように、前記スート体中の水酸基の濃度を調整し、
(II)工程(c)に従って前記スート体にフッ素を付加する際に、ガラス化後に前記部品の合成石英ガラス中の平均フッ素含有量が少なくとも1500重量ppmとなるようにフッ素を付加し、
(III)工程(d)による後塩素化の際に、前記スート体において、
・ガラス化後に前記部品の合成石英ガラス中の平均水酸基含有量が0.3重量ppm未満となるように、水酸基含有量を調整し、
・ガラス化後に前記部品の合成石英ガラス中の平均塩素含有量が少なくとも50重量ppmとなるように、但し、フッ素及び塩素の含有量の重量比が30未満となるように、塩素を付加する、本発明により達成される。
「D.M.Dodd,D.B.Fraser,Optical determination of OH in fused silica,Journal of Applied Physics,Vol. 37(1966),3911頁」に記載の方法によって測定を行った。
試験試料をHF水溶液中に溶解し、得られた溶液を、AgNO3を添加した後に比濁分析にかけることよって測定を行った。
NaOH水溶液中に試験試料を溶解させ、イオン電極法によりF濃度を決定することによって測定を行った。
肉厚80mm、長さ50mmの管状石英ガラス材料において、壁全体に亘って約1mmの距離間隔で約60箇所における各濃度をX線蛍光分析(ESMA)によって測定した。
不純物Na、K、Mg、Ca、及びFeの濃度を原子吸光分光法によって測定し、不純物Li、Cr、Ni、Mo、及びWの濃度を誘導結合プラズマ質量分析(ICP−MS)によって測定した。
Claims (8)
- (a)シリコン含有出発化合物の火炎加水分解又は酸化と、キャリア(1)上へのSiO2粒子の堆積によって、スート体(3)を生成する工程と、
(b)前記スート体(3)に脱水処理を施すことによって、水酸基を除去する工程と、
(c)フッ素含有雰囲気にて少なくとも750℃のフッ素化温度で前記スート体を処理することによって、前記スート体(3)にフッ素を付加する工程と、
(d)塩素含有雰囲気にて後塩素化温度で前記スート体を処理することによって、前記フッ素を付加したスート体(3)を後塩素化する工程と、
(e)前記スート体をガラス化温度まで加熱することによって、前記スート体(3)をガラス化して円筒型部品を得る工程と
を含むフッ素含有合成石英ガラスからなる円筒型部品を製造する方法であって、
(I)工程(b)による脱水処理において、ガラス化後に平均水酸基含有量が1重量ppm〜300重量ppmの範囲となるように、前記スート体(3)中の水酸基の濃度を調整し、
(II)工程(c)に従って前記スート体(3)にフッ素を付加する際に、ガラス化後に前記部品の合成石英ガラス中の平均フッ素含有量が少なくとも1500重量ppmとなるようにフッ素を付加し、
(III)工程(d)による後塩素化の際に、前記スート体(3)において、
・ガラス化後に前記部品の合成石英ガラス中の平均水酸基含有量が0.3重量ppm未満となるように、水酸基含有量を調整し、
・ガラス化後に前記部品の合成石英ガラス中の平均塩素含有量が少なくとも50重量ppmとなるように、但し、フッ素及び塩素の含有量の重量比が30未満となるように、塩素を付加し、
前記脱水処理が、真空下、又は無塩素雰囲気における不活性ガス下で、前記スート体(3)を加熱することを含むことを特徴とする方法。 - 工程(a)に従って、前記スート体(3)を少なくとも20%でありかつ35%以下の平均密度で生成することを特徴とする請求項1に記載の方法。
- 工程(a)に従って、前記スート体(3)を25%〜30%の範囲内の平均密度で生成することを特徴とする請求項2に記載の方法。
- 工程(c)による付加の際のフッ素含有量と、工程(d)による後塩素化の際の塩素の付加量を、前記部品の合成石英ガラス中のフッ素含有量が重量比で塩素含有量の15倍未満となるようにすることを特徴とする請求項1から請求項3のいずれか一項に記載の方法。
- 前記後塩素化が、前記スート体(3)を750℃〜1200℃の範囲内の温度に加熱することを含むことを特徴とする請求項1から請求項4のいずれか一項に記載の方法。
- 前記後塩素化により、ガラス化後に前記部品の合成石英ガラス中の平均水酸基含有量が0.2重量ppm未満となるように、前記スート体(3)中の水酸基の濃度を調整することを特徴とする請求項1から請求項5のいずれか一項に記載の方法。
- 工程(e)による前記スート体(3)のガラス化が、部分ごとに行われることを特徴とする請求項1から請求項6のいずれか一項に記載の方法。
- 前記ガラス化が、前記スート体(3)を部分ごとに、前記ガラス化温度よりも低い温度に予備加熱することを含むことを特徴とする請求項7に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102012007520.0 | 2012-04-17 | ||
DE102012007520A DE102012007520B3 (de) | 2012-04-17 | 2012-04-17 | Verfahren für die Herstellung eines zylinderförmigen Bauteils aus Fluor enthaltendem synthetischem Quarzglas |
PCT/EP2013/057869 WO2013156459A1 (de) | 2012-04-17 | 2013-04-16 | Verfahren für die herstellung eines zylinderförmigen bauteils aus fluor enthaltendem synthetischem quarzglas |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015520098A JP2015520098A (ja) | 2015-07-16 |
JP6185560B2 true JP6185560B2 (ja) | 2017-08-23 |
Family
ID=48095870
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015506207A Active JP6185560B2 (ja) | 2012-04-17 | 2013-04-16 | フッ素含有合成石英ガラスからなる円筒型部品を製造する方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20150143851A1 (ja) |
JP (1) | JP6185560B2 (ja) |
CN (1) | CN104245610B (ja) |
DE (1) | DE102012007520B3 (ja) |
WO (1) | WO2013156459A1 (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9290405B2 (en) | 2013-09-06 | 2016-03-22 | Corning Incorporated | Method of making updoped cladding by using silicon tertrachloride as the dopant |
JP6310378B2 (ja) * | 2013-11-28 | 2018-04-11 | 信越化学工業株式会社 | 光ファイバ用シリカガラス母材の製造方法 |
EP2977359B1 (de) * | 2014-07-21 | 2016-10-19 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur herstellung von mit fluor dotiertem quarzglas |
CN110040942B (zh) * | 2018-01-16 | 2021-10-12 | 中天科技集团有限公司 | 粉末体脱羟处理方法及石英玻璃的制备方法 |
IT201800002494A1 (it) | 2018-02-08 | 2019-08-08 | Omron Europe B V | Dispositivo di monitoraggio per monitorare un settore limite di una zona di sicurezza. |
JP6694915B2 (ja) * | 2018-06-12 | 2020-05-20 | 株式会社フジクラ | 多孔質ガラス微粒子体の製造方法および光ファイバ母材の製造方法 |
IT201800009920A1 (it) * | 2018-10-30 | 2020-04-30 | Prysmian Spa | Metodo per fabbricare una preforma di vetro per fibre ottiche |
JP7332559B2 (ja) * | 2020-09-16 | 2023-08-23 | 信越化学工業株式会社 | 光ファイバ用ガラス母材の製造方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60239337A (ja) * | 1984-05-15 | 1985-11-28 | Sumitomo Electric Ind Ltd | 光フアイバ−用ガラス母材の製造法 |
JPH02145448A (ja) * | 1988-11-25 | 1990-06-04 | Furukawa Electric Co Ltd:The | 光フアイバ母材の製造方法 |
DE4432806C1 (de) * | 1994-09-15 | 1996-01-18 | Heraeus Quarzglas | Vorrichtung zum Halten von Hohlzylindern aus Kieselsäurepartikeln |
DE29813318U1 (de) * | 1998-07-28 | 1999-12-02 | Heraeus Quarzglas Gmbh, 63450 Hanau | Optisches Bauteil |
FR2823198B1 (fr) * | 2001-04-09 | 2003-07-04 | Cit Alcatel | Procede de fabrication de preformes a grande capacite par mcvd |
US8037717B2 (en) * | 2001-10-26 | 2011-10-18 | Corning Incorporated | Methods and apparatus for pulsed doping or drying a soot preform |
US20030221459A1 (en) * | 2002-05-31 | 2003-12-04 | Walczak Wanda J. | Method for forming an optical waveguide fiber preform |
JP5242007B2 (ja) * | 2004-12-16 | 2013-07-24 | 古河電気工業株式会社 | 光ファイバの製造方法 |
US7088900B1 (en) * | 2005-04-14 | 2006-08-08 | Corning Incorporated | Alkali and fluorine doped optical fiber |
US7536076B2 (en) * | 2006-06-21 | 2009-05-19 | Corning Incorporated | Optical fiber containing alkali metal oxide |
US20080050086A1 (en) * | 2006-08-24 | 2008-02-28 | Scott Robertson Bickham | Optical fiber containing alkali metal oxide |
CN101506703A (zh) * | 2006-08-24 | 2009-08-12 | 康宁股份有限公司 | 含碱金属氧化物的光纤 |
DE102006059779B4 (de) * | 2006-12-15 | 2010-06-24 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren für die Herstellung eines Hohlzylinders aus synthetischem Quarzglas, nach dem Verfahren erhaltener dickwandiger Hohlzylinder und Verfahren zur Herstellung einer Vorform für optische Fasern |
DE102007017004A1 (de) * | 2007-02-27 | 2008-08-28 | Heraeus Quarzglas Gmbh & Co. Kg | Optisches Bauteil aus synthetischem Quarzglas mit erhöhter Strahlenbeständigkeit, sowie Verfahren zur Herstellung des Bauteils |
WO2009096557A1 (ja) * | 2008-01-30 | 2009-08-06 | Asahi Glass Co., Ltd. | エネルギー伝送用または紫外光伝送用光ファイバプリフォームおよびその製造方法 |
DE102008056084B4 (de) * | 2008-11-06 | 2012-05-03 | Heraeus Quarzglas Gmbh & Co. Kg | Zylinderförmiges Halbzeug zur Herstellung einer optischen Faser sowie Verfahren für die Herstellung der Faser oder einer Vorform dafür |
-
2012
- 2012-04-17 DE DE102012007520A patent/DE102012007520B3/de active Active
-
2013
- 2013-04-16 CN CN201380020602.7A patent/CN104245610B/zh active Active
- 2013-04-16 JP JP2015506207A patent/JP6185560B2/ja active Active
- 2013-04-16 WO PCT/EP2013/057869 patent/WO2013156459A1/de active Application Filing
- 2013-04-16 US US14/395,468 patent/US20150143851A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
JP2015520098A (ja) | 2015-07-16 |
US20150143851A1 (en) | 2015-05-28 |
CN104245610A (zh) | 2014-12-24 |
DE102012007520B3 (de) | 2013-08-08 |
WO2013156459A1 (de) | 2013-10-24 |
CN104245610B (zh) | 2016-08-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6185560B2 (ja) | フッ素含有合成石英ガラスからなる円筒型部品を製造する方法 | |
JP5394734B2 (ja) | 半導体ウエハを処理するための石英ガラスからなる保持器および保持器の製造方法 | |
RU2736023C2 (ru) | Легированное бромом оптическое волокно | |
US8815103B2 (en) | Process for preparing an optical preform | |
JPWO2003086997A1 (ja) | 光ファイバ母材の製造方法及び光ファイバの製造方法並びに光ファイバ | |
US9676658B2 (en) | Method of making updoped cladding by using silicon tertrachloride as the dopant | |
US11795097B2 (en) | Method of producing optical fiber preform and optical fiber | |
US20120198891A1 (en) | Method for producing optical fiber preform | |
US20050232571A1 (en) | Jacket tube made of synthetically produced quartz glass and optical fibres produced using said jacket tube | |
EP2743237B1 (en) | Method for activating an inner surface of a hollow glass substrate tube for the manufacturing of an optical fiber preform. | |
JP4540034B2 (ja) | 還元剤を用いたスート・プリフォームの処理 | |
US11198635B2 (en) | Halogen-doped silica preforms for optical fibers | |
JP5744070B2 (ja) | 光ファイバを製造するための方法並びに管状半製品 | |
CN112062460A (zh) | 低损耗g.652.d光纤及其制作方法 | |
CN118339120A (zh) | 制造低损耗光纤的方法 | |
US10947149B2 (en) | Halogen-doped silica for optical fiber preforms | |
JP2002047013A (ja) | ガラス物品の製造方法 | |
JPH05301733A (ja) | シリカガラス及びその製造方法 | |
JP2003212559A (ja) | ガラス母材の製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20151216 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20161129 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20161130 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170223 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20170725 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20170727 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6185560 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |