JP6182618B2 - 薄型フィルムリチウムイオン電池及びその形成方法 - Google Patents
薄型フィルムリチウムイオン電池及びその形成方法 Download PDFInfo
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Description
る。薄型フィルム構造は調整可能な機械的、化学的、電気的性質を備える。2つの層が堆積するこの新しいクラスの薄型フィルムアノード物質の例は、PVD及び/又はCVDを用いたSiとSnとの薄型フィルム層である。
薄型フィルムアノード層120のようなハイブリッド二重金属シリコン、又は多重金属シリコンの薄型フィルムの形成に用いられる。
Claims (13)
- 基板と、
前記基板の上に形成された第1電流コレクタと、
前記第1電流コレクタの一部の上に形成されたカソード層と、
前記カソード層の上に形成された固体電解質層と、
前記固体電解質層の上に形成された薄型フィルムアノード層と、
前記薄型フィルムアノード層と電気的に結合した第2電流コレクタとを備え、
前記薄型フィルムアノード層が、シリコン材料で形成された第1層と、炭素、スズ、銀、アルミニウム、インジウム、チタニウム、タリウム、銅、又はそれらの組み合わせから選択されるいずれかである非シリコン材料で形成された第2層とからなる層対が複数積層されてなり、
前記薄型フィルムアノード層において前記第2層の2つ以上が、相異なる非シリコン材料で形成されていることを特徴とする電池。 - 請求項1の電池であって、
前記層対は、2nmから500nmの厚さであることを特徴とする電池。 - 請求項1の電池であって、
前記第1層は、1nmから499nmの厚さであることを特徴とする電池。 - 請求項1の電池であって、
前記第2層は、1nmから499nmの厚さであることを特徴とする電池。 - 請求項1の電池であって、
前記薄型フィルムアノード層における前記第1層と前記第2層との厚さの比率が1:99から99:1であることを特徴とする電池。 - 請求項1の電池であって、
前記第1電流コレクタと、前記カソード層と、前記電解質層と、前記薄型フィルムアノード層との厚さの合計が、10マイクロメートルから50マイクロメートルの間であることを特徴とする電池。 - 請求項1の電池であって、
前記薄型フィルムアノード層の厚さが2マイクロメートルから10マイクロメートルの間であることを特徴とする電池。 - 請求項1の電池であって、
前記固体電解質層の厚さは0.5マイクロメートルから10マイクロメートルの間であることを特徴とする電池。 - 請求項1の電池であって、前記基板は柔軟性基板であることを特徴とする電池。
- 薄型フィルム電池を形成する方法であって、
基板の上に第1電流コレクタを形成することと、
前記第1電流コレクタの上にカソード層を形成することと、
前記カソード層の上に固体電解質層を形成することと、
前記固体電解質層の上に薄型フィルムアノード層を形成することと、
前記薄型フィルムアノード層と第2電流コレクタとを電気的に結合することと、を備え、
前記薄型フィルムアノード層を形成することは、
第1プロセスステーションにおいて前記固定電解質層の上にシリコン材料で第1層を形成することと、
前記第1層の形成後に前記第1プロセスステーションから第2プロセスステーションへ前記基板を移送することと、
前記第2プロセスステーションにおいて前記第1層の上に、炭素、スズ、銀、アルミニウム、インジウム、チタニウム、タリウム、銅、又はそれらの組み合わせから選択されるいずれかである非シリコン材料で第2層を形成することと、
前記第2層の形成後に前記第2プロセスステーションから前記第1プロセスステーションへ前記基板を移送することと、
前記第1プロセスステーションにおいて前記第2層の上にシリコン材料で第3層を形成することと、
前記第3層の形成後に前記第1プロセスステーションから前記第2プロセスステーションへ前記基板を移送することと、
前記第2プロセスステーションにおいて前記第3層の上に、前記非シリコン材料とは異なる非シリコン材料で第4層を形成することとを含むことを特徴とする方法。 - 請求項10に記載の方法であって、
前記第1層と前記第2層とからなる層対が2nmから500nmの厚さであることを特徴とする方法。 - 請求項10に記載の方法であって、
前記第1プロセスステーション及び前記第2プロセスステーションがプロセスチャンバーに含まれており、
前記プロセスチャンバーは、前記第1プロセスステーションにシリコン材料を供給する第1ソースと、前記第2プロセスステーションに非シリコン材料を供給する第2ソースと、前記基板を前記第1プロセスステーションと前記第2プロセスステーションとの間で交互に移送する移送システムとを備えることを特徴とする方法。 - 請求項10に記載の方法であって、
前記第1プロセスステーション及び前記第2プロセスステーションが回転式プロセスチャンバーに含まれており、
前記回転式プロセスチャンバーは、前記第1プロセスステーションにシリコン材料を供給する第1ソースと、前記第2プロセスステーションに非シリコン材料を供給する第2ソースと、前記基板を前記第1プロセスステーションと前記第2プロセスステーションとの間で交互に移送する回転式移送システムとを備えることを特徴とする方法。
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