JP2016507875A - 薄型フィルムリチウムイオン電池を形成するシステム、方法、及び装置 - Google Patents
薄型フィルムリチウムイオン電池を形成するシステム、方法、及び装置 Download PDFInfo
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Abstract
Description
Claims (20)
- 基板と、
前記基板の上に形成された第1電流コレクタと、
前記第1電流コレクタの一部の上に形成されたカソード層と、
前記カソード層の上に形成された固体電解質層と、
前記固体電解質層の上に形成されたシリコンと金属からなる薄型フィルムアノード層と、
前記シリコンと金属からなる薄型フィルムアノード層と電気的に結合した第2電流コレクタとを備えることを特徴とする電池。 - 請求項1の電池であって、
前記シリコンと金属からなる薄型フィルムアノード層は多数の交互に重なる層の対を含んでおり、
前記交互に重なる層の対の第1層はシリコンを含み、第2層は炭素、スズ、銀、アルミニウム、インジウム、チタニウム、タリウム、銅、又はそれらの組み合わせを少なくとも1つ含んでいることを特徴とする電池。 - 請求項1の電池であって、
前記シリコンと金属からなる薄型フィルムアノード層は多数の交互に重なる層の対を含んでおり、
前記交互に重なる層の対は、各々2nmから500nmの厚さであることを特徴とする電池。 - 請求項1の電池であって、
前記シリコンと金属からなる薄型フィルムアノード層は多数の交互に重なる層の対を含んでおり、
前記交互に重なる層の対の第1層は、1nmから499nmの厚さであることを特徴とする電池。 - 請求項1の電池であって、
前記シリコンと金属からなる薄型フィルムアノード層は多数の交互に重なる層の対を含んでおり、
前記交互に重なる層の対の第2層は、1nmから499nmの厚さであることを特徴とする電池。 - 請求項1の電池であって、
前記シリコンと金属からなる薄型フィルムアノード層は多数の交互に重なる層の対を含んでおり、
前記シリコンと金属からなる薄型フィルムアノードは、1%から99%の交互に重なる第1の対と、99%から1%の交互に重なる第2の対とを備えることを特徴とする電池。 - 請求項1の電池であって、
前記第1電流コレクタと、リチウムイオンを含んだ前記カソード層と、前記電解質層と、前記シリコンと金属からなる薄型フィルムアノード層との厚さの合計が、10マイクロメートルから50マイクロメートルの間であることを特徴とする電池。 - 請求項1の電池であって、
前記アノード層の厚さが2マイクロメートルから10マイクロメートルの間であることを特徴とする電池。 - 請求項1の電池であって、
前記固体電解質層の厚さは0.5マイクロメートルから10マイクロメートルの間であることを特徴とする電池。 - 請求項1の電池であって、
前記シリコンと金属からなる薄型フィルムアノード層の厚さは2マイクロメートルから10マイクロメートルの間であることを特徴とする電池。 - 請求項1の電池であって、前記基板は柔軟性基板であることを特徴とする電池。
- 薄型フィルム電池を形成する方法であって、
基板の上に第1電流コレクタを形成することと、
前記第1電流コレクタの上にカソード層を形成することと、
前記カソード層の上に固体電解質層を形成することと、
前記固体電解質層の上にシリコンと金属からなる薄型フィルムアノード層を形成することと、
前記シリコンと金属からなる薄型フィルムアノード層と第2電流コレクタとを電気的に結合することと、を備えることを特徴とする方法。 - 請求項12に記載の方法であって、
前記シリコンと金属からなる薄型フィルムアノード層は多数の交互に重なる層の対を含んでおり、
前記交互に重なる層の対は、各々2nmから500nmの厚さであることを特徴とする方法。 - 請求項13に記載の方法であって、
前記多数の交互に重なる層の対は1つのプロセスチャンバーで形成され、
前記プロセスチャンバーは少なくとも2つのソースと移送システムを備えており、
前記交互に重なる層を形成することは、前記基板を少なくとも2つのソースの間に交互に移送させることを含んでいることを特徴とする方法。 - 請求項13に記載の方法であって、
前記多数の交互に重なる層の対は1つの回転式プロセスチャンバーで形成され、
前記プロセスチャンバーは少なくとも2つのソースと回転式移送システムを備えており、
前記交互に重なる層を形成することは、前記基板を少なくとも2つのソースの間に交互に移送させることを含んでいることを特徴とする方法。 - 薄型フィルム電池を作製するシステムであって、
少なくとも2つのソースと、
基板を少なくとも2つのソースの間に交互に移送させる移送システムと、を備えるチャンバーを備えることを特徴とするシステム。 - 請求項16に記載のシステムであって、チャンバーは更に少なくとも2つのソースのそれぞれの間にガスカーテンを備えることを特徴とするシステム。
- 請求項16に記載のシステムであって、チャンバーは更に少なくとも2つのソースのそれぞれの間に隔離壁を備えることを特徴とするシステム。
- 請求項16に記載のシステムであって、更にコントローラを備えており、
前記コントローラは、
コンピュータ読み取り可能媒体に記憶された、基板の上に第1電流コレクタを形成するロジックと、
コンピュータ読み取り可能媒体に記憶された、第1電流コレクタの上にカソード層を形成するロジックと、
コンピュータ読み取り可能媒体に記憶された、カソード層の上に電解質層を形成するロジックと、
コンピュータ読み取り可能媒体に記憶された、電解質層の上にシリコンと金属からなる薄型フィルムアノード層を形成するロジックと、
コンピュータ読み取り可能媒体に記憶された、シリコンと金属からなる薄型フィルムアノード層と第2電流コレクタとを結合するロジックと、を含んでいることを特徴とするシステム。 - 請求項19に記載のシステムであって、
前記コンピュータ読み取り可能媒体に記憶された、電解質層の上にシリコンと金属からなる薄型フィルムアノード層を形成するロジックは、
コンピュータ読み取り可能媒体に記憶された、各々2nmから500nmの厚さである多数の交互に重なる層の対を形成するロジックを含んでいることを特徴とするシステム。
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020512677A (ja) * | 2017-03-26 | 2020-04-23 | インテセルズ・インコーポレイテッド | 大気圧プラズマ堆積によるアノード構成要素の作製方法、アノード構成要素、並びにこの構成要素を含有するリチウムイオンセル及びバッテリー |
WO2021028759A1 (ja) * | 2019-08-09 | 2021-02-18 | 株式会社半導体エネルギー研究所 | 負極、二次電池及び固体二次電池 |
JP2021531625A (ja) * | 2018-07-20 | 2021-11-18 | ダイソン・テクノロジー・リミテッド | エネルギー貯蔵装置のためのスタック |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9478797B2 (en) * | 2013-01-25 | 2016-10-25 | Applejack 199 L.P. | System, method and apparatus for forming a thin film lithium ion battery |
US9718997B2 (en) * | 2013-11-13 | 2017-08-01 | R.R. Donnelley & Sons Company | Battery |
US9614256B2 (en) * | 2014-03-31 | 2017-04-04 | Infineon Technologies Ag | Lithium ion battery, integrated circuit and method of manufacturing a lithium ion battery |
US10749216B2 (en) | 2014-03-31 | 2020-08-18 | Infineon Technologies Ag | Battery, integrated circuit and method of manufacturing a battery |
US9917333B2 (en) | 2014-03-31 | 2018-03-13 | Infineon Technologies Ag | Lithium ion battery, integrated circuit and method of manufacturing a lithium ion battery |
JP6456971B2 (ja) * | 2014-04-30 | 2019-01-23 | アイメック・ヴェーゼットウェーImec Vzw | 気相の前駆体を用いて有機金属構造体薄膜を製造する方法 |
US20150357649A1 (en) * | 2014-06-05 | 2015-12-10 | The Aerospace Corporation | Battery and method of assembling same |
EP3038177B1 (en) | 2014-12-22 | 2019-12-18 | Nokia Technologies Oy | Modular electronics apparatuses and methods |
US10550469B2 (en) * | 2015-09-04 | 2020-02-04 | Lam Research Corporation | Plasma excitation for spatial atomic layer deposition (ALD) reactors |
TWI661592B (zh) * | 2016-10-28 | 2019-06-01 | 林逸樵 | Secondary battery and manufacturing method thereof |
DE102017001097A1 (de) * | 2017-02-07 | 2018-08-09 | Gentherm Gmbh | Elektrisch leitfähige Folie |
US10944128B2 (en) * | 2017-03-30 | 2021-03-09 | International Business Machines Corporation | Anode structure for solid-state lithium-based thin-film battery |
CN110710037B (zh) | 2017-03-31 | 2024-03-08 | 密执安州立大学董事会 | 与固态电解质形成简易锂金属阳极界面的系统和方法 |
US10622680B2 (en) | 2017-04-06 | 2020-04-14 | International Business Machines Corporation | High charge rate, large capacity, solid-state battery |
WO2018197750A1 (en) * | 2017-04-24 | 2018-11-01 | Aalto University Foundation Sr | Li-organic 3d thin-film microbattery |
CN110710024B (zh) * | 2017-06-09 | 2024-04-16 | 罗伯特·博世有限公司 | 具有阳极保护层的电池单元 |
CN107464913B (zh) * | 2017-07-07 | 2019-12-06 | 中国航发北京航空材料研究院 | 一种生产全固态薄膜锂电池的方法 |
KR102470105B1 (ko) | 2017-08-14 | 2022-11-22 | 티니카, 엘엘씨 | 고체상 박막 하이브리드 전기 화학 전지 |
GB2575791B (en) * | 2018-07-20 | 2021-11-03 | Dyson Technology Ltd | Energy storage device |
GB2575787B (en) * | 2018-07-20 | 2021-12-01 | Dyson Technology Ltd | Stack for an energy storage device |
US11575125B2 (en) * | 2019-02-05 | 2023-02-07 | Uchicago Argonne, Llc | Patterned anode for lithium-ion batteries |
US11621411B2 (en) | 2019-12-23 | 2023-04-04 | Intecells, Inc. | Method of insulating lithium ion electrochemical cell components with metal oxide coatings |
US20220045354A1 (en) * | 2020-08-06 | 2022-02-10 | Samsung Electronics Co., Ltd. | All-solid secondary battery and method of manufacturing the same |
KR102568235B1 (ko) * | 2020-10-26 | 2023-08-17 | 삼성에스디아이 주식회사 | 전고체 전지 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003115294A (ja) * | 2001-08-25 | 2003-04-18 | Samsung Sdi Co Ltd | リチウム2次電池用アノード薄膜及びその製造方法 |
JP2005197080A (ja) * | 2004-01-07 | 2005-07-21 | Nec Corp | 二次電池用負極およびそれを用いた二次電池 |
WO2006082846A1 (ja) * | 2005-02-02 | 2006-08-10 | Geomatec Co., Ltd. | 薄膜固体二次電池 |
JP2010121195A (ja) * | 2008-11-21 | 2010-06-03 | Mitsubishi Heavy Ind Ltd | Cvd製膜装置および製膜方法 |
US20120040233A1 (en) * | 2011-10-27 | 2012-02-16 | Sakti3, Inc. | Barrier for thin film lithium batteries made on flexible substrates and related methods |
JP2012520552A (ja) * | 2009-03-16 | 2012-09-06 | コミサリア ア レネルジー アトミック エ オ ゼネルジー アルテルナティブ | リチウムマイクロ電池及びその製造方法 |
WO2013012549A2 (en) * | 2011-07-18 | 2013-01-24 | Veeco Instruments Inc. | Multi-chamber cvd processing system |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5411592A (en) * | 1994-06-06 | 1995-05-02 | Ovonic Battery Company, Inc. | Apparatus for deposition of thin-film, solid state batteries |
US6318384B1 (en) * | 1999-09-24 | 2001-11-20 | Applied Materials, Inc. | Self cleaning method of forming deep trenches in silicon substrates |
ATE356444T1 (de) * | 2000-11-18 | 2007-03-15 | Samsung Sdi Co Ltd | Dünnschicht anode für lithium enthaltende sekundärbatterie |
KR100389908B1 (ko) | 2000-11-18 | 2003-07-04 | 삼성에스디아이 주식회사 | 리튬 2차 전지용 음극 박막 |
JP5089276B2 (ja) | 2003-11-28 | 2012-12-05 | パナソニック株式会社 | エネルギーデバイス及びその製造方法 |
US7816032B2 (en) | 2003-11-28 | 2010-10-19 | Panasonic Corporation | Energy device and method for producing the same |
JP4984553B2 (ja) * | 2006-01-30 | 2012-07-25 | ソニー株式会社 | 二次電池用負極及びそれを用いた二次電池 |
US20080032236A1 (en) * | 2006-07-18 | 2008-02-07 | Wallace Mark A | Method and apparatus for solid-state microbattery photolithographic manufacture, singulation and passivation |
WO2008023322A2 (en) * | 2006-08-22 | 2008-02-28 | Koninklijke Philips Electronics N.V. | Electrochemical energy source, and method for manufacturing of such an electrochemical energy source |
KR100878718B1 (ko) * | 2007-08-28 | 2009-01-14 | 한국과학기술연구원 | 리튬이차전지용 실리콘 박막 음극, 이의 제조방법 및 이를포함하는 리튬이차전지 |
US8118982B2 (en) * | 2009-03-06 | 2012-02-21 | Applied Materials, Inc. | Gas flow set-up for multiple, interacting reactive sputter sources |
US9478797B2 (en) * | 2013-01-25 | 2016-10-25 | Applejack 199 L.P. | System, method and apparatus for forming a thin film lithium ion battery |
-
2013
- 2013-01-25 US US13/750,825 patent/US9478797B2/en active Active
-
2014
- 2014-01-17 EP EP14743019.3A patent/EP2948995B1/en active Active
- 2014-01-17 CN CN201480006163.9A patent/CN105027332B/zh active Active
- 2014-01-17 WO PCT/US2014/012095 patent/WO2014116522A1/en active Application Filing
- 2014-01-17 JP JP2015555198A patent/JP6182618B2/ja not_active Expired - Fee Related
- 2014-01-17 KR KR1020157022766A patent/KR101820584B1/ko active IP Right Grant
-
2016
- 2016-10-24 US US15/333,027 patent/US10535868B2/en active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003115294A (ja) * | 2001-08-25 | 2003-04-18 | Samsung Sdi Co Ltd | リチウム2次電池用アノード薄膜及びその製造方法 |
JP2005197080A (ja) * | 2004-01-07 | 2005-07-21 | Nec Corp | 二次電池用負極およびそれを用いた二次電池 |
WO2006082846A1 (ja) * | 2005-02-02 | 2006-08-10 | Geomatec Co., Ltd. | 薄膜固体二次電池 |
JP2010121195A (ja) * | 2008-11-21 | 2010-06-03 | Mitsubishi Heavy Ind Ltd | Cvd製膜装置および製膜方法 |
JP2012520552A (ja) * | 2009-03-16 | 2012-09-06 | コミサリア ア レネルジー アトミック エ オ ゼネルジー アルテルナティブ | リチウムマイクロ電池及びその製造方法 |
WO2013012549A2 (en) * | 2011-07-18 | 2013-01-24 | Veeco Instruments Inc. | Multi-chamber cvd processing system |
US20120040233A1 (en) * | 2011-10-27 | 2012-02-16 | Sakti3, Inc. | Barrier for thin film lithium batteries made on flexible substrates and related methods |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020512677A (ja) * | 2017-03-26 | 2020-04-23 | インテセルズ・インコーポレイテッド | 大気圧プラズマ堆積によるアノード構成要素の作製方法、アノード構成要素、並びにこの構成要素を含有するリチウムイオンセル及びバッテリー |
JP2021531625A (ja) * | 2018-07-20 | 2021-11-18 | ダイソン・テクノロジー・リミテッド | エネルギー貯蔵装置のためのスタック |
JP7154375B2 (ja) | 2018-07-20 | 2022-10-17 | ダイソン・テクノロジー・リミテッド | エネルギー貯蔵装置のためのスタック |
US11476452B2 (en) | 2018-07-20 | 2022-10-18 | Dyson Technology Limited | Stack for an energy storage device |
WO2021028759A1 (ja) * | 2019-08-09 | 2021-02-18 | 株式会社半導体エネルギー研究所 | 負極、二次電池及び固体二次電池 |
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