JP6182375B2 - プラズマ処理装置 - Google Patents

プラズマ処理装置 Download PDF

Info

Publication number
JP6182375B2
JP6182375B2 JP2013149027A JP2013149027A JP6182375B2 JP 6182375 B2 JP6182375 B2 JP 6182375B2 JP 2013149027 A JP2013149027 A JP 2013149027A JP 2013149027 A JP2013149027 A JP 2013149027A JP 6182375 B2 JP6182375 B2 JP 6182375B2
Authority
JP
Japan
Prior art keywords
plasma processing
dielectric window
processing apparatus
conductor
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2013149027A
Other languages
English (en)
Japanese (ja)
Other versions
JP2015022855A5 (enExample
JP2015022855A (ja
Inventor
優作 属
優作 属
忠義 川口
忠義 川口
西尾　良司
良司 西尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi High Technologies Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Technologies Corp filed Critical Hitachi High Technologies Corp
Priority to JP2013149027A priority Critical patent/JP6182375B2/ja
Publication of JP2015022855A publication Critical patent/JP2015022855A/ja
Publication of JP2015022855A5 publication Critical patent/JP2015022855A5/ja
Application granted granted Critical
Publication of JP6182375B2 publication Critical patent/JP6182375B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
JP2013149027A 2013-07-18 2013-07-18 プラズマ処理装置 Active JP6182375B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2013149027A JP6182375B2 (ja) 2013-07-18 2013-07-18 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013149027A JP6182375B2 (ja) 2013-07-18 2013-07-18 プラズマ処理装置

Publications (3)

Publication Number Publication Date
JP2015022855A JP2015022855A (ja) 2015-02-02
JP2015022855A5 JP2015022855A5 (enExample) 2016-04-14
JP6182375B2 true JP6182375B2 (ja) 2017-08-16

Family

ID=52487145

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013149027A Active JP6182375B2 (ja) 2013-07-18 2013-07-18 プラズマ処理装置

Country Status (1)

Country Link
JP (1) JP6182375B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6594664B2 (ja) * 2015-05-28 2019-10-23 株式会社日立ハイテクノロジーズ プラズマ処理装置
JP2016225439A (ja) * 2015-05-29 2016-12-28 東京エレクトロン株式会社 プラズマ処理装置及び基板剥離検知方法
JP6446334B2 (ja) * 2015-06-12 2018-12-26 東京エレクトロン株式会社 プラズマ処理装置、プラズマ処理装置の制御方法及び記憶媒体
JP7232410B2 (ja) * 2019-03-20 2023-03-03 日新電機株式会社 プラズマ処理装置
JP7690576B2 (ja) * 2021-04-26 2025-06-10 東京エレクトロン株式会社 基板処理装置及び基板処理方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004079557A (ja) * 2002-08-09 2004-03-11 Hitachi High-Technologies Corp プラズマ処理装置及びプラズマ処理方法
JP2007173512A (ja) * 2005-12-22 2007-07-05 Mitsubishi Heavy Ind Ltd プラズマ処理装置
US10595365B2 (en) * 2010-10-19 2020-03-17 Applied Materials, Inc. Chamber lid heater ring assembly
JP2012211359A (ja) * 2011-03-31 2012-11-01 Mitsubishi Heavy Ind Ltd プラズマ処理装置
JP5913829B2 (ja) * 2011-04-21 2016-04-27 株式会社日立ハイテクノロジーズ プラズマ処理装置

Also Published As

Publication number Publication date
JP2015022855A (ja) 2015-02-02

Similar Documents

Publication Publication Date Title
US10790120B2 (en) Showerhead having a detachable high resistivity gas distribution plate
US11130142B2 (en) Showerhead having a detachable gas distribution plate
KR102374521B1 (ko) 재치대 및 플라즈마 처리 장치
JP6182375B2 (ja) プラズマ処理装置
JP6442296B2 (ja) 載置台及びプラズマ処理装置
CN103155118B (zh) 腔室盖加热器环组件
JP5876992B2 (ja) プラズマ処理装置
JP5189999B2 (ja) マイクロ波プラズマ処理装置、及びマイクロ波プラズマ処理装置のマイクロ波給電方法
JP2012238881A (ja) 複数の基材を処理するための広域高周波プラズマ装置
CN110383432A (zh) 基板支撑单元以及具有基板支撑单元的成膜装置
JP5325457B2 (ja) プラズマ処理装置
JP2019009306A (ja) 給電部材及び基板処理装置
KR102892518B1 (ko) 플라즈마 처리 장치 및 플라즈마 처리 방법
TWI717934B (zh) 電漿處理設備
JP2011017496A (ja) 流体加熱装置およびそれを用いた基板処理装置
KR20190058330A (ko) 가열식 기판 지지부
JP5696183B2 (ja) プラズマ処理装置
JP6454488B2 (ja) プラズマ処理装置
JP2020092034A (ja) プラズマ処理装置
JP6594664B2 (ja) プラズマ処理装置
JPWO2020116247A1 (ja) プラズマ処理装置及び下部ステージ

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20160217

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20160217

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20160217

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20161108

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20161130

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20170116

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20170123

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20170425

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20170613

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20170627

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20170724

R150 Certificate of patent or registration of utility model

Ref document number: 6182375

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350