JP6178235B2 - パターン形成方法、パターン印刷方法、パターン形成システムおよびパターン印刷システム - Google Patents

パターン形成方法、パターン印刷方法、パターン形成システムおよびパターン印刷システム Download PDF

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Publication number
JP6178235B2
JP6178235B2 JP2013271823A JP2013271823A JP6178235B2 JP 6178235 B2 JP6178235 B2 JP 6178235B2 JP 2013271823 A JP2013271823 A JP 2013271823A JP 2013271823 A JP2013271823 A JP 2013271823A JP 6178235 B2 JP6178235 B2 JP 6178235B2
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JP
Japan
Prior art keywords
pattern
plate
pattern layer
carrier
printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2013271823A
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English (en)
Japanese (ja)
Other versions
JP2015123443A (ja
Inventor
増市　幹雄
幹雄 増市
理史 川越
理史 川越
博之 上野
博之 上野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Screen Holdings Co Ltd
Original Assignee
Screen Holdings Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Screen Holdings Co Ltd filed Critical Screen Holdings Co Ltd
Priority to JP2013271823A priority Critical patent/JP6178235B2/ja
Priority to KR1020140167298A priority patent/KR20150077295A/ko
Priority to TW103145837A priority patent/TWI601463B/zh
Priority to CN201410828019.5A priority patent/CN104742555B/zh
Publication of JP2015123443A publication Critical patent/JP2015123443A/ja
Application granted granted Critical
Publication of JP6178235B2 publication Critical patent/JP6178235B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Printing Methods (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Electroluminescent Light Sources (AREA)
  • Ink Jet (AREA)
JP2013271823A 2013-12-27 2013-12-27 パターン形成方法、パターン印刷方法、パターン形成システムおよびパターン印刷システム Expired - Fee Related JP6178235B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2013271823A JP6178235B2 (ja) 2013-12-27 2013-12-27 パターン形成方法、パターン印刷方法、パターン形成システムおよびパターン印刷システム
KR1020140167298A KR20150077295A (ko) 2013-12-27 2014-11-27 패턴 형성 방법, 패턴 인쇄 방법, 패턴 형성 시스템 및 패턴 인쇄 시스템
TW103145837A TWI601463B (zh) 2013-12-27 2014-12-26 圖案形成方法、圖案印刷方法、圖案形成系統以及圖案印刷系統
CN201410828019.5A CN104742555B (zh) 2013-12-27 2014-12-26 图案形成方法及系统、图案印刷方法及系统

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013271823A JP6178235B2 (ja) 2013-12-27 2013-12-27 パターン形成方法、パターン印刷方法、パターン形成システムおよびパターン印刷システム

Publications (2)

Publication Number Publication Date
JP2015123443A JP2015123443A (ja) 2015-07-06
JP6178235B2 true JP6178235B2 (ja) 2017-08-09

Family

ID=53534581

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013271823A Expired - Fee Related JP6178235B2 (ja) 2013-12-27 2013-12-27 パターン形成方法、パターン印刷方法、パターン形成システムおよびパターン印刷システム

Country Status (4)

Country Link
JP (1) JP6178235B2 (zh)
KR (1) KR20150077295A (zh)
CN (1) CN104742555B (zh)
TW (1) TWI601463B (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7047317B2 (ja) * 2017-10-11 2022-04-05 凸版印刷株式会社 階層構造体の製造方法及び製造装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0999624A (ja) * 1995-10-06 1997-04-15 Kuramoto Sangyo:Kk カーボン織模様を有する印刷シートおよび粘着シート
JPH108294A (ja) * 1996-06-19 1998-01-13 Kansai Paint Co Ltd 着色パターンの形成方法
JP2006130725A (ja) * 2004-11-04 2006-05-25 Shuho:Kk インクジェット方式を利用したオフセット印刷方法およびそれによる印刷体
JP2006247893A (ja) * 2005-03-08 2006-09-21 Nissha Printing Co Ltd 転写フィルム、加飾フィルムおよび加飾品の製造方法並びに加飾品
TWI272045B (en) * 2006-01-11 2007-01-21 Sun Sui Print Co Ltd Printing process of antenna
JP5120866B2 (ja) * 2006-03-31 2013-01-16 Ｄｉｃ株式会社 印刷方法
JP4964023B2 (ja) * 2007-05-22 2012-06-27 大日本スクリーン製造株式会社 塗布装置
JP5640321B2 (ja) * 2009-03-25 2014-12-17 凸版印刷株式会社 微小球体の配置形成方法及びそれを用いたフラットパネルディスプレイ向けカラーフィルター用スペーサー形成方法
KR20120014501A (ko) * 2010-08-09 2012-02-17 삼성전자주식회사 패턴 형성 방법 및 액정 표시 장치의 제조방법
JP5177260B2 (ja) * 2011-08-01 2013-04-03 ソニー株式会社 パターン転写方法および金属薄膜パターン転写方法、ならびに電子デバイスの製造方法
JP6086675B2 (ja) * 2011-11-30 2017-03-01 株式会社Ｓｃｒｅｅｎホールディングス 印刷装置および印刷方法
JP5891861B2 (ja) * 2012-03-09 2016-03-23 凸版印刷株式会社 反転印刷方法および反転印刷装置
JP2013205636A (ja) * 2012-03-28 2013-10-07 Toppan Printing Co Ltd 印刷方法

Also Published As

Publication number Publication date
TW201536137A (zh) 2015-09-16
CN104742555B (zh) 2018-02-02
TWI601463B (zh) 2017-10-01
JP2015123443A (ja) 2015-07-06
KR20150077295A (ko) 2015-07-07
CN104742555A (zh) 2015-07-01

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