JP6178235B2 - パターン形成方法、パターン印刷方法、パターン形成システムおよびパターン印刷システム - Google Patents
パターン形成方法、パターン印刷方法、パターン形成システムおよびパターン印刷システム Download PDFInfo
- Publication number
- JP6178235B2 JP6178235B2 JP2013271823A JP2013271823A JP6178235B2 JP 6178235 B2 JP6178235 B2 JP 6178235B2 JP 2013271823 A JP2013271823 A JP 2013271823A JP 2013271823 A JP2013271823 A JP 2013271823A JP 6178235 B2 JP6178235 B2 JP 6178235B2
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- Prior art keywords
- pattern
- plate
- pattern layer
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- printing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims description 101
- 238000007639 printing Methods 0.000 title claims description 90
- 238000012546 transfer Methods 0.000 claims description 166
- 238000000576 coating method Methods 0.000 claims description 92
- 239000011248 coating agent Substances 0.000 claims description 89
- 239000000758 substrate Substances 0.000 claims description 68
- 239000007788 liquid Substances 0.000 claims description 37
- 230000007261 regionalization Effects 0.000 claims description 12
- 230000002093 peripheral effect Effects 0.000 claims description 8
- 238000007599 discharging Methods 0.000 claims description 2
- 239000000976 ink Substances 0.000 description 63
- 230000008569 process Effects 0.000 description 63
- 230000007246 mechanism Effects 0.000 description 41
- 238000000059 patterning Methods 0.000 description 21
- 230000003028 elevating effect Effects 0.000 description 13
- 239000010408 film Substances 0.000 description 13
- 238000010586 diagram Methods 0.000 description 8
- 238000005516 engineering process Methods 0.000 description 8
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- 238000001179 sorption measurement Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 238000013518 transcription Methods 0.000 description 5
- 230000035897 transcription Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000011144 upstream manufacturing Methods 0.000 description 4
- 230000001360 synchronised effect Effects 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
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- 238000000926 separation method Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000002635 aromatic organic solvent Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 238000007644 letterpress printing Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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- 238000012545 processing Methods 0.000 description 1
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- 239000004065 semiconductor Substances 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Printing Methods (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
- Electroluminescent Light Sources (AREA)
- Ink Jet (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013271823A JP6178235B2 (ja) | 2013-12-27 | 2013-12-27 | パターン形成方法、パターン印刷方法、パターン形成システムおよびパターン印刷システム |
KR1020140167298A KR20150077295A (ko) | 2013-12-27 | 2014-11-27 | 패턴 형성 방법, 패턴 인쇄 방법, 패턴 형성 시스템 및 패턴 인쇄 시스템 |
TW103145837A TWI601463B (zh) | 2013-12-27 | 2014-12-26 | 圖案形成方法、圖案印刷方法、圖案形成系統以及圖案印刷系統 |
CN201410828019.5A CN104742555B (zh) | 2013-12-27 | 2014-12-26 | 图案形成方法及系统、图案印刷方法及系统 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013271823A JP6178235B2 (ja) | 2013-12-27 | 2013-12-27 | パターン形成方法、パターン印刷方法、パターン形成システムおよびパターン印刷システム |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015123443A JP2015123443A (ja) | 2015-07-06 |
JP6178235B2 true JP6178235B2 (ja) | 2017-08-09 |
Family
ID=53534581
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013271823A Expired - Fee Related JP6178235B2 (ja) | 2013-12-27 | 2013-12-27 | パターン形成方法、パターン印刷方法、パターン形成システムおよびパターン印刷システム |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6178235B2 (zh) |
KR (1) | KR20150077295A (zh) |
CN (1) | CN104742555B (zh) |
TW (1) | TWI601463B (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7047317B2 (ja) * | 2017-10-11 | 2022-04-05 | 凸版印刷株式会社 | 階層構造体の製造方法及び製造装置 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0999624A (ja) * | 1995-10-06 | 1997-04-15 | Kuramoto Sangyo:Kk | カーボン織模様を有する印刷シートおよび粘着シート |
JPH108294A (ja) * | 1996-06-19 | 1998-01-13 | Kansai Paint Co Ltd | 着色パターンの形成方法 |
JP2006130725A (ja) * | 2004-11-04 | 2006-05-25 | Shuho:Kk | インクジェット方式を利用したオフセット印刷方法およびそれによる印刷体 |
JP2006247893A (ja) * | 2005-03-08 | 2006-09-21 | Nissha Printing Co Ltd | 転写フィルム、加飾フィルムおよび加飾品の製造方法並びに加飾品 |
TWI272045B (en) * | 2006-01-11 | 2007-01-21 | Sun Sui Print Co Ltd | Printing process of antenna |
JP5120866B2 (ja) * | 2006-03-31 | 2013-01-16 | Dic株式会社 | 印刷方法 |
JP4964023B2 (ja) * | 2007-05-22 | 2012-06-27 | 大日本スクリーン製造株式会社 | 塗布装置 |
JP5640321B2 (ja) * | 2009-03-25 | 2014-12-17 | 凸版印刷株式会社 | 微小球体の配置形成方法及びそれを用いたフラットパネルディスプレイ向けカラーフィルター用スペーサー形成方法 |
KR20120014501A (ko) * | 2010-08-09 | 2012-02-17 | 삼성전자주식회사 | 패턴 형성 방법 및 액정 표시 장치의 제조방법 |
JP5177260B2 (ja) * | 2011-08-01 | 2013-04-03 | ソニー株式会社 | パターン転写方法および金属薄膜パターン転写方法、ならびに電子デバイスの製造方法 |
JP6086675B2 (ja) * | 2011-11-30 | 2017-03-01 | 株式会社Screenホールディングス | 印刷装置および印刷方法 |
JP5891861B2 (ja) * | 2012-03-09 | 2016-03-23 | 凸版印刷株式会社 | 反転印刷方法および反転印刷装置 |
JP2013205636A (ja) * | 2012-03-28 | 2013-10-07 | Toppan Printing Co Ltd | 印刷方法 |
-
2013
- 2013-12-27 JP JP2013271823A patent/JP6178235B2/ja not_active Expired - Fee Related
-
2014
- 2014-11-27 KR KR1020140167298A patent/KR20150077295A/ko active Search and Examination
- 2014-12-26 TW TW103145837A patent/TWI601463B/zh not_active IP Right Cessation
- 2014-12-26 CN CN201410828019.5A patent/CN104742555B/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
TW201536137A (zh) | 2015-09-16 |
JP2015123443A (ja) | 2015-07-06 |
CN104742555A (zh) | 2015-07-01 |
TWI601463B (zh) | 2017-10-01 |
CN104742555B (zh) | 2018-02-02 |
KR20150077295A (ko) | 2015-07-07 |
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