JP6159651B2 - フィルタ洗浄方法、液処理装置及び記憶媒体 - Google Patents

フィルタ洗浄方法、液処理装置及び記憶媒体 Download PDF

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Publication number
JP6159651B2
JP6159651B2 JP2013243124A JP2013243124A JP6159651B2 JP 6159651 B2 JP6159651 B2 JP 6159651B2 JP 2013243124 A JP2013243124 A JP 2013243124A JP 2013243124 A JP2013243124 A JP 2013243124A JP 6159651 B2 JP6159651 B2 JP 6159651B2
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liquid
tank
flushing liquid
filter
circulation line
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JP2013243124A
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Japanese (ja)
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JP2015103662A5 (enrdf_load_stackoverflow
JP2015103662A (ja
Inventor
田 昌 吾 溝
田 昌 吾 溝
田 貴 士 藪
田 貴 士 藪
中 純 野
中 純 野
瀬 浩 巳 清
瀬 浩 巳 清
村 英 樹 西
村 英 樹 西
野 崇 烏
野 崇 烏
澤 貴 士 中
澤 貴 士 中
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Priority to JP2013243124A priority Critical patent/JP6159651B2/ja
Priority to TW103139780A priority patent/TWI568485B/zh
Priority to KR1020140162505A priority patent/KR102314052B1/ko
Publication of JP2015103662A publication Critical patent/JP2015103662A/ja
Publication of JP2015103662A5 publication Critical patent/JP2015103662A5/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP2013243124A 2013-11-25 2013-11-25 フィルタ洗浄方法、液処理装置及び記憶媒体 Active JP6159651B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2013243124A JP6159651B2 (ja) 2013-11-25 2013-11-25 フィルタ洗浄方法、液処理装置及び記憶媒体
TW103139780A TWI568485B (zh) 2013-11-25 2014-11-17 Filter cleaning method, liquid treatment device and memory media
KR1020140162505A KR102314052B1 (ko) 2013-11-25 2014-11-20 필터 세정 방법, 액처리 장치 및 기억 매체

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013243124A JP6159651B2 (ja) 2013-11-25 2013-11-25 フィルタ洗浄方法、液処理装置及び記憶媒体

Publications (3)

Publication Number Publication Date
JP2015103662A JP2015103662A (ja) 2015-06-04
JP2015103662A5 JP2015103662A5 (enrdf_load_stackoverflow) 2015-12-24
JP6159651B2 true JP6159651B2 (ja) 2017-07-05

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JP2013243124A Active JP6159651B2 (ja) 2013-11-25 2013-11-25 フィルタ洗浄方法、液処理装置及び記憶媒体

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JP (1) JP6159651B2 (enrdf_load_stackoverflow)
KR (1) KR102314052B1 (enrdf_load_stackoverflow)
TW (1) TWI568485B (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW202135914A (zh) * 2020-02-05 2021-10-01 日商東京威力科創股份有限公司 過濾器洗淨系統及過濾器洗淨方法
KR102583556B1 (ko) * 2021-01-07 2023-10-10 세메스 주식회사 처리액 공급 장치 및 처리액 공급 장치의 고형 제거 방법
JP7628450B2 (ja) 2021-03-24 2025-02-10 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および配管着脱パーツ洗浄方法
KR102504552B1 (ko) 2021-09-10 2023-03-02 (주)디바이스이엔지 반도체 제조 부품의 플러싱 조건 결정 장치 및 플러싱 조건 결정 방법
JP7526237B2 (ja) 2022-09-15 2024-07-31 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置、および、フィルタの気泡除去方法
JP2025064258A (ja) * 2023-10-05 2025-04-17 株式会社Sumco フィルタ洗浄方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04162627A (ja) * 1990-10-26 1992-06-08 Matsushita Electric Ind Co Ltd 薬液処理装置
JPH0516114U (ja) * 1991-08-14 1993-03-02 三菱重工業株式会社 潤滑油タンク及びラインフイルターのフラツシング回路
KR960025332U (ko) * 1994-12-26 1996-07-22 약액처리조용 여과필터
US5753135A (en) * 1995-10-23 1998-05-19 Jablonsky; Julius James Apparatus and method for recovering photoresist developers and strippers
JP4692997B2 (ja) * 1998-07-07 2011-06-01 東京エレクトロン株式会社 処理装置及び処理方法
TW514561B (en) * 2000-08-28 2002-12-21 Henkel Corp Antiplugging method and apparatus for separating multivalent metal ions from autodeposition compositions, and for regenerating ion exchange resins useful therewith
JP2003251290A (ja) * 2002-03-05 2003-09-09 Dainippon Screen Mfg Co Ltd 洗浄装置及びこれを備えた基板処理装置
JP5503602B2 (ja) * 2011-07-29 2014-05-28 東京エレクトロン株式会社 処理液供給装置、処理液供給方法、プログラム及びコンピュータ記憶媒体

Also Published As

Publication number Publication date
TWI568485B (zh) 2017-02-01
KR102314052B1 (ko) 2021-10-15
JP2015103662A (ja) 2015-06-04
TW201534381A (zh) 2015-09-16
KR20150060547A (ko) 2015-06-03

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