JP6130304B2 - 保護されたバッキングプレートを有するpvdスパッタリングターゲット - Google Patents
保護されたバッキングプレートを有するpvdスパッタリングターゲット Download PDFInfo
- Publication number
- JP6130304B2 JP6130304B2 JP2013553463A JP2013553463A JP6130304B2 JP 6130304 B2 JP6130304 B2 JP 6130304B2 JP 2013553463 A JP2013553463 A JP 2013553463A JP 2013553463 A JP2013553463 A JP 2013553463A JP 6130304 B2 JP6130304 B2 JP 6130304B2
- Authority
- JP
- Japan
- Prior art keywords
- target
- backing plate
- nickel
- inner concave
- concave surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000005477 sputtering target Methods 0.000 title claims description 57
- 238000005240 physical vapour deposition Methods 0.000 title description 63
- 239000010410 layer Substances 0.000 claims description 146
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 78
- 239000011253 protective coating Substances 0.000 claims description 61
- 238000000034 method Methods 0.000 claims description 53
- 229910052759 nickel Inorganic materials 0.000 claims description 35
- 229910052751 metal Inorganic materials 0.000 claims description 33
- 239000002184 metal Substances 0.000 claims description 33
- 229910052721 tungsten Inorganic materials 0.000 claims description 31
- 239000010937 tungsten Substances 0.000 claims description 31
- 239000000463 material Substances 0.000 claims description 30
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 30
- PCLURTMBFDTLSK-UHFFFAOYSA-N nickel platinum Chemical compound [Ni].[Pt] PCLURTMBFDTLSK-UHFFFAOYSA-N 0.000 claims description 28
- 229910001260 Pt alloy Inorganic materials 0.000 claims description 27
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 26
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 24
- 229910052802 copper Inorganic materials 0.000 claims description 24
- 239000010949 copper Substances 0.000 claims description 24
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 18
- TVZPLCNGKSPOJA-UHFFFAOYSA-N copper zinc Chemical compound [Cu].[Zn] TVZPLCNGKSPOJA-UHFFFAOYSA-N 0.000 claims description 16
- 238000000151 deposition Methods 0.000 claims description 16
- 229910001297 Zn alloy Inorganic materials 0.000 claims description 14
- 229910052697 platinum Inorganic materials 0.000 claims description 13
- 229910000990 Ni alloy Inorganic materials 0.000 claims description 12
- 230000003746 surface roughness Effects 0.000 claims description 11
- 229910001080 W alloy Inorganic materials 0.000 claims description 10
- 229910045601 alloy Inorganic materials 0.000 claims description 8
- 239000000956 alloy Substances 0.000 claims description 8
- 238000005422 blasting Methods 0.000 claims description 8
- 230000008021 deposition Effects 0.000 claims description 8
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 7
- 229910017052 cobalt Inorganic materials 0.000 claims description 7
- 239000010941 cobalt Substances 0.000 claims description 7
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 7
- 239000011701 zinc Substances 0.000 claims description 7
- 229910052725 zinc Inorganic materials 0.000 claims description 7
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 6
- 150000001875 compounds Chemical class 0.000 claims description 3
- 229910052763 palladium Inorganic materials 0.000 claims description 3
- 230000001681 protective effect Effects 0.000 claims description 2
- 239000007921 spray Substances 0.000 claims description 2
- 239000000758 substrate Substances 0.000 description 51
- 230000008569 process Effects 0.000 description 35
- 239000007789 gas Substances 0.000 description 17
- 238000012545 processing Methods 0.000 description 14
- 229910052782 aluminium Inorganic materials 0.000 description 13
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 13
- 239000000356 contaminant Substances 0.000 description 12
- 238000004544 sputter deposition Methods 0.000 description 11
- 239000013077 target material Substances 0.000 description 9
- 239000000919 ceramic Substances 0.000 description 6
- 229910010293 ceramic material Inorganic materials 0.000 description 6
- 239000010935 stainless steel Substances 0.000 description 6
- 229910001220 stainless steel Inorganic materials 0.000 description 6
- 239000002131 composite material Substances 0.000 description 5
- 229910000679 solder Inorganic materials 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 230000003628 erosive effect Effects 0.000 description 4
- 239000007769 metal material Substances 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- 229910000531 Co alloy Inorganic materials 0.000 description 3
- 229910000599 Cr alloy Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000000788 chromium alloy Substances 0.000 description 3
- 239000011247 coating layer Substances 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 239000011573 trace mineral Substances 0.000 description 3
- 235000013619 trace mineral Nutrition 0.000 description 3
- 229910017518 Cu Zn Inorganic materials 0.000 description 2
- 229910017752 Cu-Zn Inorganic materials 0.000 description 2
- 229910017943 Cu—Zn Inorganic materials 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- GXDVEXJTVGRLNW-UHFFFAOYSA-N [Cr].[Cu] Chemical compound [Cr].[Cu] GXDVEXJTVGRLNW-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- -1 derivatives thereof Substances 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 238000007750 plasma spraying Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000005488 sandblasting Methods 0.000 description 2
- 229910021332 silicide Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910000967 As alloy Inorganic materials 0.000 description 1
- 208000000659 Autoimmune lymphoproliferative syndrome Diseases 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052878 cordierite Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- JSKIRARMQDRGJZ-UHFFFAOYSA-N dimagnesium dioxido-bis[(1-oxido-3-oxo-2,4,6,8,9-pentaoxa-1,3-disila-5,7-dialuminabicyclo[3.3.1]nonan-7-yl)oxy]silane Chemical compound [Mg++].[Mg++].[O-][Si]([O-])(O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2)O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2 JSKIRARMQDRGJZ-UHFFFAOYSA-N 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 239000011532 electronic conductor Substances 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 229940082150 encore Drugs 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- RUFLMLWJRZAWLJ-UHFFFAOYSA-N nickel silicide Chemical compound [Ni]=[Si]=[Ni] RUFLMLWJRZAWLJ-UHFFFAOYSA-N 0.000 description 1
- 229910021334 nickel silicide Inorganic materials 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229910021339 platinum silicide Inorganic materials 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910003468 tantalcarbide Inorganic materials 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- WQJQOUPTWCFRMM-UHFFFAOYSA-N tungsten disilicide Chemical compound [Si]#[W]#[Si] WQJQOUPTWCFRMM-UHFFFAOYSA-N 0.000 description 1
- 229910021342 tungsten silicide Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/03—Alloys based on nickel or cobalt based on nickel
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
- C22C9/04—Alloys based on copper with zinc as the next major constituent
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3426—Material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3435—Target holders (includes backing plates and endblocks)
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
Description
110 バッキングプレート
112 中心軸
120 表側
124 内側ターゲット表面
130 裏側
132 外側裏面
134 内側凹型表面
136 平面
150 ターゲット層
151 ターゲット表面
Claims (15)
- 裏側と反対側の表側とを有するバッキングプレートであって、前記表側が、複数の締結孔を有する外側支持表面を含み、前記外側支持表面が、内側ターゲット表面を取り囲んでおり、前記裏側が、前記裏側の中心に内側凹型表面を取り囲む外側裏面を含み、前記外側裏面は、前記バッキングプレートの中心軸を中心に前記内側凹型表面及び前記外側裏面に広がる平行平面の間にあるターゲット凹部深さを有している、バッキングプレートと、
前記バッキングプレートの前記内側ターゲット表面に配置される少なくとも1つの金属を含むターゲット層とを備え、
前記内側凹型表面は、深さ及び直径を有し、前記ターゲット層は、前記内側凹型表面の前記直径より小さい直径に前記中心軸から外側に広がっており、前記内側凹型表面の前記深さは、前記内側凹型表面の前記直径にわたり一定であり、更に、
前記外側支持表面の少なくとも一部に配置されるニッケル又はタングステンを含み、実質的に前記外側支持表面と同一平面上にある、保護コーティング層
を備えるスパッタリングターゲット。 - 前記ターゲット層が、ニッケル、白金、ニッケル−白金合金、タングステン、パラジウム、コバルト、それらの合金、それらの派生物、又はそれらの化合物から成るグループから選択される材料を含む、請求項1に記載のスパッタリングターゲット。
- 前記ターゲット層の材料はニッケル−白金合金を含み、前記ニッケル−白金合金は2%から20%の範囲の重量濃度の白金を含む、請求項2に記載のスパッタリングターゲット。
- 前記ターゲット層の材料はニッケル−白金合金を含み、前記ニッケル−白金合金は80%から98%の範囲の重量濃度のニッケルを含む、請求項2に記載のスパッタリングターゲット。
- 前記ターゲット層は、1.3mm(0.050インチ)から10.2mm(0.400インチ)の範囲の厚さを有し、406mm(16インチ)から483mm(19インチ)の範囲の直径を有する、請求項1に記載のスパッタリングターゲット。
- 前記保護コーティング層は0.10mm(0.004インチ)から1.02mm(0.040インチ)の範囲の厚さを有する、請求項1に記載のスパッタリングターゲット。
- 前記保護コーティング層はプラズマ溶射された金属ニッケルを含み、前記ターゲット層はニッケル又はニッケル合金を含み、前記バッキングプレートは銅−亜鉛合金を含む、請求項6に記載のスパッタリングターゲット。
- 前記保護コーティング層はプラズマ溶射された金属タングステンを含み、前記ターゲット層はタングステン又はタングステン合金を含み、前記バッキングプレートは銅−亜鉛合金を含む、請求項6に記載のスパッタリングターゲット。
- 前記中心軸に沿った前記平行平面の間の所定の距離は1.3mm(0.050インチ)から12.7mm(0.50インチ)の範囲である、請求項1に記載のスパッタリングターゲット。
- 銅合金を含み裏側と反対側の表側とを有するバッキングプレートであって、前記表側が複数の締結孔を有する外側支持表面を含み、前記外側支持表面が、前記外側支持表面の平面から広がる内側ターゲット表面を取り囲んでおり、前記裏側が内側凹型表面を取り囲む外側裏面を含み、前記内側凹型表面が、前記内側凹型表面及び前記外側裏面に広がる平行平面の間に中心軸から前記外側裏面に広がっている、バッキングプレートと、
前記バッキングプレートの前記内側ターゲット表面に配置されるニッケル−白金合金を含むターゲット層とを備え、
前記内側凹型表面は、深さ及び直径を有し、前記ターゲット層は、前記内側凹型表面の前記直径より小さい直径に前記中心軸から外側に広がっており、前記内側凹型表面の前記深さは、前記内側凹型表面の前記直径にわたり一定であり、更に、
前記内側ターゲット表面に隣接する前記外側支持表面の少なくとも一部に配置されるニッケルを含む保護コーティング層であって、前記保護コーティング層の外側表面の一部は、実質的に前記外側支持表面と同一平面上にある、保護コーティング層を備え、
前記保護コーティング層は、0.10mm(0.004インチ)から1.02mm(0.04インチ)の範囲の厚さを有し、前記保護コーティング層の上面は、2.54μm(100マイクロインチ)から12.7μm(500マイクロインチ)の範囲の平均表面粗さを有する、スパッタリングターゲット。 - 前記ニッケル−白金合金は80%から98%の範囲の重量濃度のニッケルと、2%から80%の範囲の重量濃度の白金とを含む、請求項10に記載のスパッタリングターゲット。
- 前記銅合金は銅−亜鉛合金を含み、前記銅−亜鉛合金は58%から62%の範囲の重量濃度の銅と、38%から42%の範囲の重量濃度の亜鉛とを含む、請求項10に記載のスパッタリングターゲット。
- 銅合金を含み裏側と反対側の表側とを有するバッキングプレートであって、前記表側が複数の締結孔を有する外側支持表面を含み、前記外側支持表面が、内側ターゲット表面を取り囲んでおり、前記裏側が内側凹型表面を取り囲む外側裏面を含み、前記内側凹型表面が中心軸から前記外側裏面に広がっており、前記内側凹型表面と前記外側裏面の間の側壁は、前記中心軸に向かって内側にテーパ付けされている、バッキングプレートと、
前記バッキングプレートの前記内側ターゲット表面に配置され、金属タングステンを含み、3.8mm(0.150インチ)から8.9mm(0.350インチ)の範囲の厚さを有する、ターゲット層とを備え、
前記内側凹型表面は、深さ及び直径を有し、前記ターゲット層は、前記内側凹型表面の前記直径より小さい直径に前記中心軸から外側に広がっており、前記内側凹型表面の前記深さは、前記内側凹型表面の前記直径にわたり一定であり、更に、
前記外側支持表面の少なくとも一部に配置され、タングステンを含み、0.10mm(0.004インチ)から1.02mm(0.04インチ)の範囲の厚さを有し、上面が2.54μm(100マイクロインチ)から12.7μm(500マイクロインチ)の範囲の平均表面粗さを有する、保護コーティング層
を備えるスパッタリングターゲット。 - ターゲットのバッキングプレートを覆う保護薄膜を有する堆積用ターゲットを形成する方法であって、
スパッタリングターゲットの粗面化領域上にニッケルを含む保護コーティング層を堆積する段階を含み、
前記保護コーティング層は、0.05mm(0.002インチ)から2.54mm(0.100インチ)の範囲の厚さを有しており、前記スパッタリングターゲットが、
銅合金を含み裏側と反対側の表側とを有し、前記表側が内側ターゲット表面を取り囲む外側支持表面を含み、前記裏側が内側凹型表面を取り囲む外側裏面を含み、前記外側支持表面の少なくとも一部が2.03μm(80マイクロインチ)から12.7μm(500マイクロインチ)の範囲の平均表面粗さを有する粗面化領域を含む、バッキングプレートと、
前記バッキングプレートの内側ターゲット表面に配置されるニッケル合金を含むターゲット層と、
を備え、前記内側凹型表面は、深さ及び直径を有し、前記ターゲット層は、前記内側凹型表面の前記直径より小さい直径に中心軸から外側に広がっており、前記内側凹型表面の前記深さは、前記内側凹型表面の前記直径にわたり一定である方法。 - 前記バッキングプレートの前記外側支持表面の前記粗面化領域は、ブラスト処理により粗面化され、前記保護コーティング層は、プラズマ溶射技術により堆積される、請求項14に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/024,198 | 2011-02-09 | ||
US13/024,198 US8968537B2 (en) | 2011-02-09 | 2011-02-09 | PVD sputtering target with a protected backing plate |
PCT/US2012/023474 WO2012109069A2 (en) | 2011-02-09 | 2012-02-01 | Pvd sputtering target with a protected backing plate |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014508222A JP2014508222A (ja) | 2014-04-03 |
JP6130304B2 true JP6130304B2 (ja) | 2017-05-17 |
Family
ID=46599914
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013553463A Active JP6130304B2 (ja) | 2011-02-09 | 2012-02-01 | 保護されたバッキングプレートを有するpvdスパッタリングターゲット |
Country Status (6)
Country | Link |
---|---|
US (1) | US8968537B2 (ja) |
JP (1) | JP6130304B2 (ja) |
KR (1) | KR101938851B1 (ja) |
CN (1) | CN103348037B (ja) |
TW (1) | TWI540216B (ja) |
WO (1) | WO2012109069A2 (ja) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9534286B2 (en) * | 2013-03-15 | 2017-01-03 | Applied Materials, Inc. | PVD target for self-centering process shield |
JP2016531203A (ja) | 2013-08-01 | 2016-10-06 | エイチ.シー. スターク インコーポレイテッド | スパッタリングターゲットの部分的スプレー修復 |
CN104416253B (zh) * | 2013-09-02 | 2016-08-31 | 宁波江丰电子材料股份有限公司 | 背板的形成方法和背板 |
KR102112912B1 (ko) * | 2013-11-06 | 2020-05-19 | 제이엑스금속주식회사 | 스퍼터링 타깃/배킹 플레이트 조립체 |
TWI491449B (zh) * | 2014-01-29 | 2015-07-11 | Taiwan Green Point Entpr Co | Painting and shielding fixture and painting method |
US9644269B2 (en) | 2014-01-30 | 2017-05-09 | Varian Semiconductor Equipment Associates, Inc | Diffusion resistant electrostatic clamp |
US20160333460A1 (en) * | 2014-03-26 | 2016-11-17 | Jx Nippon Mining & Metals Corporation | Sputtering target comprising tungsten carbide or titanium carbide |
US20160053365A1 (en) * | 2014-08-20 | 2016-02-25 | Honeywell International Inc. | Encapsulated composite backing plate |
JP6672595B2 (ja) | 2015-03-17 | 2020-03-25 | 凸版印刷株式会社 | 成膜装置 |
US9397011B1 (en) * | 2015-04-13 | 2016-07-19 | Lam Research Corporation | Systems and methods for reducing copper contamination due to substrate processing chambers with components made of alloys including copper |
JP6126648B2 (ja) * | 2015-06-26 | 2017-05-10 | 田中貴金属工業株式会社 | 白金合金ターゲット |
WO2017053771A1 (en) | 2015-09-25 | 2017-03-30 | Applied Materials, Inc. | Grooved backing plate for standing wave compensation |
US9721765B2 (en) | 2015-11-16 | 2017-08-01 | Agc Flat Glass North America, Inc. | Plasma device driven by multiple-phase alternating or pulsed electrical current |
US9721764B2 (en) | 2015-11-16 | 2017-08-01 | Agc Flat Glass North America, Inc. | Method of producing plasma by multiple-phase alternating or pulsed electrical current |
JP2018535324A (ja) * | 2015-11-24 | 2018-11-29 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | Vhf−rf pvdチャンバで使用するためのプレコートされたシールド |
US10699878B2 (en) * | 2016-02-12 | 2020-06-30 | Lam Research Corporation | Chamber member of a plasma source and pedestal with radially outward positioned lift pins for translation of a substrate c-ring |
CN108690961A (zh) * | 2017-04-06 | 2018-10-23 | 北京北方华创微电子装备有限公司 | 磁控溅射组件、磁控溅射腔室及磁控溅射设备 |
US10570504B2 (en) | 2017-04-26 | 2020-02-25 | International Business Machines Corporation | Structure and method to fabricate highly reactive physical vapor deposition target |
CN109385608A (zh) * | 2017-08-08 | 2019-02-26 | 宁波江丰电子材料股份有限公司 | 靶材组件及其制造方法 |
KR102300756B1 (ko) * | 2017-11-21 | 2021-09-10 | 와틀로 일렉트릭 매뉴팩츄어링 컴파니 | 원자 보호층을 갖는 세라믹 받침대 |
US11584985B2 (en) * | 2018-08-13 | 2023-02-21 | Honeywell International Inc. | Sputter trap having a thin high purity coating layer and method of making the same |
TWI672387B (zh) * | 2018-08-28 | 2019-09-21 | 住華科技股份有限公司 | 濺射靶材及其使用方法 |
US11114288B2 (en) * | 2019-02-08 | 2021-09-07 | Applied Materials, Inc. | Physical vapor deposition apparatus |
CN112210763B (zh) * | 2019-07-11 | 2022-05-24 | 联芯集成电路制造(厦门)有限公司 | 在晶片上沉积金属层的方法 |
Family Cites Families (54)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3855612A (en) * | 1972-01-03 | 1974-12-17 | Signetics Corp | Schottky barrier diode semiconductor structure and method |
JPH0730681Y2 (ja) * | 1988-09-19 | 1995-07-12 | 日電アネルバ株式会社 | スパッタリングカソード |
JPH04314857A (ja) * | 1991-04-15 | 1992-11-06 | Mitsubishi Kasei Corp | スパッタリング装置用バッキングプレート |
US5282943A (en) | 1992-06-10 | 1994-02-01 | Tosoh Smd, Inc. | Method of bonding a titanium containing sputter target to a backing plate and bonded target/backing plate assemblies produced thereby |
US5593082A (en) * | 1994-11-15 | 1997-01-14 | Tosoh Smd, Inc. | Methods of bonding targets to backing plate members using solder pastes and target/backing plate assemblies bonded thereby |
US6045670A (en) * | 1997-01-08 | 2000-04-04 | Applied Materials, Inc. | Back sputtering shield |
JP4551561B2 (ja) * | 1999-12-28 | 2010-09-29 | 株式会社東芝 | 真空成膜装置用部品とそれを用いた真空成膜装置、およびターゲット装置 |
JP4817486B2 (ja) * | 2000-09-29 | 2011-11-16 | 株式会社東芝 | タングステン粉末およびその製造方法ならびにスパッタ・ターゲットおよび切削工具 |
DE60236264D1 (de) * | 2001-04-24 | 2010-06-17 | Tosoh Smd Inc | Verfahren zur optimierung des targetprofils |
US20020162741A1 (en) | 2001-05-01 | 2002-11-07 | Applied Materials, Inc. | Multi-material target backing plate |
US6764265B2 (en) | 2002-01-07 | 2004-07-20 | Applied Materials Inc. | Erosion resistant slit valve |
US6822158B2 (en) * | 2002-03-11 | 2004-11-23 | Sharp Kabushiki Kaisha | Thin-film solar cell and manufacture method therefor |
JP2003293126A (ja) * | 2002-04-09 | 2003-10-15 | Fujitsu Ltd | スパッタリングターゲット及びその製造方法 |
WO2005007920A2 (en) * | 2003-07-14 | 2005-01-27 | Tosoh Smd, Inc. | Sputtering target assembly having low conductivity backing plate and method of making same |
US7611610B2 (en) * | 2003-11-18 | 2009-11-03 | Fei Company | Method and apparatus for controlling topographical variation on a milled cross-section of a structure |
JP4336206B2 (ja) | 2004-01-07 | 2009-09-30 | Hoya株式会社 | マスクブランクの製造方法、及びマスクブランク製造用スパッタリングターゲット |
CN1910304A (zh) | 2004-02-03 | 2007-02-07 | 霍尼韦尔国际公司 | 物理气相沉积靶构造 |
US20050178653A1 (en) * | 2004-02-17 | 2005-08-18 | Charles Fisher | Method for elimination of sputtering into the backing plate of a target/backing plate assembly |
KR100925691B1 (ko) * | 2004-03-01 | 2009-11-10 | 닛코킨조쿠 가부시키가이샤 | 니켈-플라티늄 합금 및 동(同) 합금 타겟트 |
US8252126B2 (en) * | 2004-05-06 | 2012-08-28 | Global Advanced Metals, Usa, Inc. | Sputter targets and methods of forming same by rotary axial forging |
US7550066B2 (en) | 2004-07-09 | 2009-06-23 | Applied Materials, Inc. | Staggered target tiles |
US20060024451A1 (en) | 2004-07-30 | 2006-02-02 | Applied Materials Inc. | Enhanced magnetic shielding for plasma-based semiconductor processing tool |
US7316763B2 (en) | 2005-05-24 | 2008-01-08 | Applied Materials, Inc. | Multiple target tiles with complementary beveled edges forming a slanted gap therebetween |
US20060266639A1 (en) | 2005-05-24 | 2006-11-30 | Applied Materials, Inc. | Sputtering target tiles having structured edges separated by a gap |
US7550055B2 (en) | 2005-05-31 | 2009-06-23 | Applied Materials, Inc. | Elastomer bonding of large area sputtering target |
US20060289305A1 (en) | 2005-06-27 | 2006-12-28 | Applied Materials, Inc. | Centering mechanism for aligning sputtering target tiles |
US8097133B2 (en) | 2005-07-19 | 2012-01-17 | Applied Materials, Inc. | Evacuable magnetron chamber |
US7811411B2 (en) | 2005-08-09 | 2010-10-12 | Applied Materials, Inc. | Thermal management of inductively coupled plasma reactors |
US7588668B2 (en) | 2005-09-13 | 2009-09-15 | Applied Materials, Inc. | Thermally conductive dielectric bonding of sputtering targets using diamond powder filler or thermally conductive ceramic fillers |
US20070056845A1 (en) | 2005-09-13 | 2007-03-15 | Applied Materials, Inc. | Multiple zone sputtering target created through conductive and insulation bonding |
US8647484B2 (en) * | 2005-11-25 | 2014-02-11 | Applied Materials, Inc. | Target for sputtering chamber |
US8157973B2 (en) * | 2006-06-29 | 2012-04-17 | Jx Nippon Mining & Metals Corporation | Sputtering target/backing plate bonded body |
US7476289B2 (en) | 2006-06-29 | 2009-01-13 | Applied Materials, Inc. | Vacuum elastomer bonding apparatus and method |
US20080188090A1 (en) | 2007-02-02 | 2008-08-07 | Applied Materials, Inc. | Internal balanced coil for inductively coupled high density plasma processing chamber |
US7789993B2 (en) | 2007-02-02 | 2010-09-07 | Applied Materials, Inc. | Internal balanced coil for inductively coupled high density plasma processing chamber |
US7572647B2 (en) | 2007-02-02 | 2009-08-11 | Applied Materials, Inc. | Internal balanced coil for inductively coupled high density plasma processing chamber |
JP2008306180A (ja) | 2007-05-21 | 2008-12-18 | Applied Materials Inc | 膜の基板斜面及び縁部の研磨プロファイルを制御する方法及び装置 |
US8968536B2 (en) | 2007-06-18 | 2015-03-03 | Applied Materials, Inc. | Sputtering target having increased life and sputtering uniformity |
US20090025636A1 (en) | 2007-07-27 | 2009-01-29 | Applied Materials, Inc. | High profile minimum contact process kit for hdp-cvd application |
US9202736B2 (en) | 2007-07-31 | 2015-12-01 | Applied Materials, Inc. | Method for refurbishing an electrostatic chuck with reduced plasma penetration and arcing |
US7848076B2 (en) | 2007-07-31 | 2010-12-07 | Applied Materials, Inc. | Method and apparatus for providing an electrostatic chuck with reduced plasma penetration and arcing |
US8108981B2 (en) | 2007-07-31 | 2012-02-07 | Applied Materials, Inc. | Method of making an electrostatic chuck with reduced plasma penetration and arcing |
US8252410B2 (en) | 2007-09-05 | 2012-08-28 | Applied Materials, Inc. | Ceramic cover wafers of aluminum nitride or beryllium oxide |
US7901552B2 (en) * | 2007-10-05 | 2011-03-08 | Applied Materials, Inc. | Sputtering target with grooves and intersecting channels |
US20090197015A1 (en) | 2007-12-25 | 2009-08-06 | Applied Materials, Inc. | Method and apparatus for controlling plasma uniformity |
US20090258162A1 (en) | 2008-04-12 | 2009-10-15 | Applied Materials, Inc. | Plasma processing apparatus and method |
US8409355B2 (en) | 2008-04-24 | 2013-04-02 | Applied Materials, Inc. | Low profile process kit |
US9222172B2 (en) | 2008-08-20 | 2015-12-29 | Applied Materials, Inc. | Surface treated aluminum nitride baffle |
US8133368B2 (en) | 2008-10-31 | 2012-03-13 | Applied Materials, Inc. | Encapsulated sputtering target |
US9714465B2 (en) | 2008-12-01 | 2017-07-25 | Applied Materials, Inc. | Gas distribution blocker apparatus |
US9752228B2 (en) | 2009-04-03 | 2017-09-05 | Applied Materials, Inc. | Sputtering target for PVD chamber |
WO2010115128A2 (en) | 2009-04-03 | 2010-10-07 | Applied Materials, Inc. | High pressure rf-dc sputtering and methods to improve film uniformity and step-coverage of this process |
US20100288631A1 (en) | 2009-05-12 | 2010-11-18 | Solar Applied Materials Technology Corp. | Ceramic sputtering target assembly and a method for producing the same |
KR20120089647A (ko) | 2009-08-11 | 2012-08-13 | 어플라이드 머티어리얼스, 인코포레이티드 | Rf 물리적 기상 증착을 위한 프로세스 키트 |
-
2011
- 2011-02-09 US US13/024,198 patent/US8968537B2/en active Active
-
2012
- 2012-02-01 JP JP2013553463A patent/JP6130304B2/ja active Active
- 2012-02-01 KR KR1020137023437A patent/KR101938851B1/ko active IP Right Grant
- 2012-02-01 WO PCT/US2012/023474 patent/WO2012109069A2/en active Application Filing
- 2012-02-01 CN CN201280007376.4A patent/CN103348037B/zh active Active
- 2012-02-03 TW TW101103567A patent/TWI540216B/zh active
Also Published As
Publication number | Publication date |
---|---|
US20120199469A1 (en) | 2012-08-09 |
TW201243078A (en) | 2012-11-01 |
JP2014508222A (ja) | 2014-04-03 |
CN103348037B (zh) | 2016-01-20 |
KR101938851B1 (ko) | 2019-01-15 |
KR20140044306A (ko) | 2014-04-14 |
WO2012109069A3 (en) | 2013-01-03 |
CN103348037A (zh) | 2013-10-09 |
TWI540216B (zh) | 2016-07-01 |
WO2012109069A2 (en) | 2012-08-16 |
US8968537B2 (en) | 2015-03-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6130304B2 (ja) | 保護されたバッキングプレートを有するpvdスパッタリングターゲット | |
US9689070B2 (en) | Deposition ring and electrostatic chuck for physical vapor deposition chamber | |
US9978569B2 (en) | Adjustable process spacing, centering, and improved gas conductance | |
US10060024B2 (en) | Sputtering target for PVD chamber | |
JP5563197B2 (ja) | 基板処理チャンバ用処理キット | |
JP5762281B2 (ja) | Rf物理気相蒸着用処理キット | |
US20080308416A1 (en) | Sputtering target having increased life and sputtering uniformity | |
WO2012109104A2 (en) | Uniformity tuning capable esc grounding kit for rf pvd chamber | |
TWI616550B (zh) | 用於物理氣相沉積之濺射系統的靶材 | |
JP7326106B2 (ja) | スパッタリング装置 | |
US11251024B2 (en) | Coating for chamber particle reduction |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20150202 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20151016 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20151026 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20160126 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160426 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20160912 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170112 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20170224 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20170315 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20170413 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6130304 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |