JP6129005B2 - 記録ヘッド用基板の洗浄方法 - Google Patents

記録ヘッド用基板の洗浄方法 Download PDF

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JP6129005B2
JP6129005B2 JP2013149342A JP2013149342A JP6129005B2 JP 6129005 B2 JP6129005 B2 JP 6129005B2 JP 2013149342 A JP2013149342 A JP 2013149342A JP 2013149342 A JP2013149342 A JP 2013149342A JP 6129005 B2 JP6129005 B2 JP 6129005B2
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recording head
cleaning
wafer
rotation center
spinner table
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JP2015020323A (ja
JP2015020323A5 (enExample
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武 柴田
武 柴田
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Canon Inc
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Canon Inc
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JP2013149342A 2013-07-18 2013-07-18 記録ヘッド用基板の洗浄方法 Active JP6129005B2 (ja)

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JP2013149342A JP6129005B2 (ja) 2013-07-18 2013-07-18 記録ヘッド用基板の洗浄方法

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JP2013149342A JP6129005B2 (ja) 2013-07-18 2013-07-18 記録ヘッド用基板の洗浄方法

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JP2015020323A JP2015020323A (ja) 2015-02-02
JP2015020323A5 JP2015020323A5 (enExample) 2016-07-28
JP6129005B2 true JP6129005B2 (ja) 2017-05-17

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Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7146572B2 (ja) * 2018-02-23 2022-10-04 キヤノン株式会社 基板の成膜方法、及び液体吐出ヘッドの製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10308374A (ja) * 1997-03-06 1998-11-17 Ebara Corp 洗浄方法及び洗浄装置
JPH11233473A (ja) * 1998-02-09 1999-08-27 Hitachi Ltd 半導体洗浄装置及び方法
JP2003031536A (ja) * 2001-07-12 2003-01-31 Nec Corp ウエハの洗浄方法

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