JP6117457B1 - 低温焼付け対応レジストインキ - Google Patents
低温焼付け対応レジストインキ Download PDFInfo
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- JP6117457B1 JP6117457B1 JP2017503978A JP2017503978A JP6117457B1 JP 6117457 B1 JP6117457 B1 JP 6117457B1 JP 2017503978 A JP2017503978 A JP 2017503978A JP 2017503978 A JP2017503978 A JP 2017503978A JP 6117457 B1 JP6117457 B1 JP 6117457B1
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- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 239000001057 purple pigment Substances 0.000 description 1
- IZMJMCDDWKSTTK-UHFFFAOYSA-N quinoline yellow Chemical compound C1=CC=CC2=NC(C3C(C4=CC=CC=C4C3=O)=O)=CC=C21 IZMJMCDDWKSTTK-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 239000002195 soluble material Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- JOUDBUYBGJYFFP-FOCLMDBBSA-N thioindigo Chemical compound S\1C2=CC=CC=C2C(=O)C/1=C1/C(=O)C2=CC=CC=C2S1 JOUDBUYBGJYFFP-FOCLMDBBSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 150000003628 tricarboxylic acids Chemical class 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000001052 yellow pigment Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
- C09D11/037—Printing inks characterised by features other than the chemical nature of the binder characterised by the pigment
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/10—Printing inks based on artificial resins
- C09D11/102—Printing inks based on artificial resins containing macromolecular compounds obtained by reactions other than those only involving unsaturated carbon-to-carbon bonds
- C09D11/104—Polyesters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/14—Printing inks based on carbohydrates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Molecular Biology (AREA)
- Health & Medical Sciences (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- ing And Chemical Polishing (AREA)
Abstract
Description
ICタグは一般的に金属箔にレジストインキで回路パターンとなるコイル状のマスキング印刷を行い、必要に応じて印刷部の紫外線硬化や熱硬化を経て、酸性又はアルカリ性のエッチング液に浸漬させ回路パターンとして不要な部分をエッチング除去し、必要とされる回路パターンを作成する(例えば、特許文献1:特開2015−65384)。
エッチングの際のレジストとなる印刷皮膜を熱硬化するタイプでは、通常オーブンを用いて170℃〜200℃の焼付けを要する事から、省エネ・コスト削減の観点から、焼付け温度の低温化が望まれている。一方で、焼付け温度を下げると、基材の金属箔と印刷皮膜の密着性が低下したり、例えば酸性エッチング工程にて耐酸性エッチング性が低下する弊害が発生する傾向が見られる。オーブン温度150℃の低温条件下においても、金属箔との密着性、耐酸性エッチング性の双方を保持した低温焼付け対応レジストインキが望まれる。
また、本発明は、前記酸化チタンをレジストインキ全量の5〜30質量%含有する低温焼付け対応レジストインキに関する。
また、本発明は、前記ポリエステル樹脂が、数平均分子量2,000〜80,000、ガラス転移温度(Tg)が50〜85℃のポリエステル樹脂(A)を樹脂全量の70質量%以上含有する低温焼付け対応レジストインキに関する。
さらに、本発明は、前記有機ケイ素化合物が、3−メルカプトプロピルトリメトキシシラン、メチルトリメトキシシラン、メチルトリエトキシシラン、デシルトリメトキシラン、3−アミノプロピルトリメトキシシラン、3−グリシドキシプロピルトリメトキシシラン 、3−イソシアネートプロピルトリエトキシシラン、フェニルトリエトキシシラン、p−スチリルトリメトキシシラン、3−クロロプロピルトリメトキシシランからなる群から選ばれる1つ以上である低温焼付け対応レジストインキに関する。
加えて、本発明は硝化綿を含有する低温焼付け対応レジストインキに関する。
また前記酸化チタンの平均粒径としては、100〜500nmのものを使用することが好ましく、150〜400nmのものを使用することがより好ましい。平均粒径が100nm未満であると分散安定性はより実現し易くなるものの、白色度が低下しカラーICチップ向けとして彩色制御がしにくい一方、平均粒径が500nmを超えるとインキ塗膜の平滑性や見た目の光沢性が低下する傾向にある。粒径について実用的には200〜300nmが更により好ましい。
なお原料としての酸化チタンの平均粒径は電子顕微鏡写真により20個の粒径測定を行って平均をとったものとする。
なお、本発明におけるGPC(ゲルパーミエーションクロマトグラフィー)による数平均分子量(ポリスチレン換算)Mnの測定は東ソー(株)社製HLC8220システムを用い以下の条件で行った。
分離カラム:東ソー(株)製TSKgelGMHHR−Nを4本使用。カラム温度:40℃。移動層:和光純薬工業(株)製テトラヒドロフラン。流速:1.0ml/分。試料濃度:1.0質量%。試料注入量:100マイクロリットル。検出器:示差屈折計。
また、ガラス転移温度(Tg)の測定は、示差雰囲気下、冷却装置を用い温度範囲−80〜450℃、昇温温度10℃/分の条件で走査を実施した。
東洋紡(株)社製ポリエステル樹脂バイロン200(Tg:67℃、Mn:17000)を43部、トルエン50部、メチルエチルケトン30部、酢酸エチル20部を4つ口フラスコに入れ、80℃に加温後2時間保温し樹脂が完全に溶解したのを確認した後室温まで冷却し、バイロン200固形分35%の樹脂溶液(A1)を得た。
同様に、樹脂・各溶剤を同比率、同手順にてバイロン240(東洋紡(株)製、Tg:60℃、数平均分子量Mn:15000)の固形分35%の樹脂溶液(A2)を得た。
以下、バイロン296(東洋紡(株)製、Tg:71℃、Mn:14000)、バイロン290(東洋紡(株)製、Tg:72℃、Mn:22000)、バイロン660(東洋紡(株)製、Tg:55℃、Mn:8000)、バイロン600(東洋紡(株)製、Tg:47℃、Mn:16000)、バイロン500(東洋紡(株)製、Tg:4℃、Mn:23000)、バイロンGX880(東洋紡(株)製、Tg:84℃、Mn:18000)についても同様に固形分35%の各樹脂溶液(A3)〜(A8)を得た。
工業用硝化綿DHX3−5(ニトロセルロース、不揮発分70%、Nobel NC,Ltd.製)37.5部に、トルエン/メチルエチルケトン/酢酸エチル(質量比で50/30/20の比率)の混合液を62.5部加え、充分混合し硝化綿ニス液(S)を作製した。
得られたポリエステル樹脂溶液(A1)を35部、チタンホワイトR−830(ルチル型硫酸法酸化チタン、平均粒子径250nm 吸油量21、石原産業(株)社製)を13部、シランカップリング剤Z6040(3−グリシドキシプロピルトリメトキシシラン、東レ・ダウコーティング(株)社製)を1部、トルエン25.1部、メチルエチルケトン15.1部、酢酸エチル10.1部の混合物に、ピンク色を再現するカラーICチップ用としてSymuler Fast Red4613黄顔料(DIC(株)社製)0.5部、Fastogen Super Violet RN紫顔料(DIC(株)社製)0.2部を加え練肉し、ピンク色のレジストインキを作成した。
トルエン/メチルエチルケトン/酢酸エチルは質量比で50/30/20の比率で、レジストインキ全体で100部とする。
得られたレジストインキに、前記トルエン/メチルエチルケトン/酢酸エチルは質量比で50/30/20の混合液を更に加え、粘度がザーンカップ#3(離合社製)で18秒(25℃)に調整し、金属箔(サイズ:縦20cm×横10cm)に、ヘリオダイレクト彫刻グラビア凹版(225線/inch)を備えたグラビア校正機を用い、塗膜量が2.7g/m2になる様、全面ベタで2度刷りを行った。
表1に示す組成配合により、実施例2〜17と比較例1,2について、実施例1と同様にレジストインキを作成し粘度調整した後、同じ要領で金属箔にベタ刷りを行った。
実施例6については、実施例1の組合せに更に硝化綿ニス液(S)7.5部を添加した。
実施例17については、シランカップリング剤としてZ6040(3−グリシドキシプロピルトリメトキシシラン)1部の代わりに、KBE903(3−アミノプロピルトリメトキシシラン、東レ・ダウコーティング(株)社製)1部を添加した。
レジストインキをベタ刷りした金属箔を150℃にて6分間オーブン加熱(楠本化成製 環境試験機 HISPEC HT310)した後、常温(25℃)で2時間放置後、印刷面にセロハンテープ(ニチバン製)を貼り付け、これを急速に剥がしたときのレジスト印刷皮膜の外観の状態を目視判定した。なお判定基準は次の5段階とした。
5:レジスト皮膜が全く剥がれなかった。
4:レジスト皮膜の70%以上〜90%が金属箔に残った。
3:レジスト皮膜の50%以上〜70%未満が金属箔に残った。
2:レジスト皮膜の30%以上〜50%未満が金属箔に残った。
1:レジスト皮膜の30%以下が金属箔に残った。
耐酸性トレーに濃度20%塩酸液を液温45℃で保管し、120秒間前記のレジストインキをベタ刷りした金属箔を浸漬後、引上げ水洗しレジスト印刷皮膜の外観の状態を、下記判定基準の5段階にて目視判定した。
5:レジスト皮膜が全く剥がれなかった。
4:レジスト皮膜の70%以上〜90%が金属箔に残った。
3:レジスト皮膜の50%以上〜70%未満が金属箔に残った。
2:レジスト皮膜の30%以上〜50%未満が金属箔に残った。
1:レジスト皮膜の30%以下が金属箔に残った。
Claims (4)
- ポリエステル樹脂、酸化チタン、及びシランカップリング剤を含有する低温焼付け対応レジストインキであって、前記酸化チタンをインキ全量の5〜30重量%含有することを特徴とする低温焼付け対応レジストインキ。
- 前記ポリエステル樹脂が、数平均分子量2,000〜80,000、ガラス転移温度(Tg)が50〜85℃のポリエステル樹脂(A)をポリエステル樹脂全量の70重量%以上含有する請求項1に記載の低温焼付け対応レジストインキ。
- 前記シランカップリング剤が、3−メルカプトプロピルトリメトキシシラン、メチルトリメトキシシラン、メチルトリエトキシシラン、デシルトリメトキシラン、3−アミノプロピルトリメトキシシラン、3−グリシドキシプロピルトリメトキシシラン 、3−イソシアネートプロピルトリエトキシシラン、フェニルトリエトキシシラン、p−スチリルトリメトキシシラン、3−クロロプロピルトリメトキシシランからなる群から選ばれる1つ以上である請求項1に記載の低温焼付け対応レジストインキ。
- 更に、硝化綿を含有する請求項1〜3のいずれか1つに記載の低温焼付け対応レジストインキ。
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05140208A (ja) * | 1991-11-20 | 1993-06-08 | Dainippon Ink & Chem Inc | 活性エネルギー線硬化性組成物 |
JPH10152542A (ja) * | 1996-11-21 | 1998-06-09 | Nippon Kayaku Co Ltd | 樹脂組成物、レジストインキ組成物及びその硬化物 |
JP2002129079A (ja) * | 2000-07-14 | 2002-05-09 | Dainippon Ink & Chem Inc | 紫外線硬化型レジスト用グラビアインキ組成物 |
JP2013036024A (ja) * | 2011-07-11 | 2013-02-21 | Sanyo Chem Ind Ltd | 感光性樹脂組成物 |
JP2015090903A (ja) * | 2013-11-05 | 2015-05-11 | 太陽インキ製造株式会社 | プリント配線板用硬化型組成物、これを用いた硬化塗膜及びプリント配線板 |
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---|---|---|---|---|
GB0324947D0 (en) * | 2003-10-25 | 2003-11-26 | Avecia Ltd | Process |
TW200533692A (en) * | 2003-11-06 | 2005-10-16 | Showa Denko Kk | Curable polyester having an oxetanyl group at end and process for preparing the same, resist composition, jet printing ink composition, curing methods and uses thereof |
WO2012121235A1 (ja) * | 2011-03-07 | 2012-09-13 | 三洋化成工業株式会社 | 感光性組成物、硬化物、及び、活性光線硬化物の製造方法 |
US8828706B2 (en) * | 2012-06-27 | 2014-09-09 | Lawrence Livermore National Security, Llc. | Use of carbonates for biological and chemical synthesis |
JP2015065384A (ja) | 2013-09-26 | 2015-04-09 | 東洋アルミニウム株式会社 | 回路基板の製造方法 |
CN107254205B (zh) | 2013-11-05 | 2020-08-14 | 太阳油墨制造株式会社 | 固化型组合物、使用其的固化涂膜和印刷电路板 |
WO2017056372A1 (en) * | 2015-09-30 | 2017-04-06 | Canon Kabushiki Kaisha | Compound, ink, resist composition for color filter, thermal transfer recording sheet, and toner |
-
2016
- 2016-10-11 US US15/771,663 patent/US10429733B2/en active Active
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05140208A (ja) * | 1991-11-20 | 1993-06-08 | Dainippon Ink & Chem Inc | 活性エネルギー線硬化性組成物 |
JPH10152542A (ja) * | 1996-11-21 | 1998-06-09 | Nippon Kayaku Co Ltd | 樹脂組成物、レジストインキ組成物及びその硬化物 |
JP2002129079A (ja) * | 2000-07-14 | 2002-05-09 | Dainippon Ink & Chem Inc | 紫外線硬化型レジスト用グラビアインキ組成物 |
JP2013036024A (ja) * | 2011-07-11 | 2013-02-21 | Sanyo Chem Ind Ltd | 感光性樹脂組成物 |
JP2015090903A (ja) * | 2013-11-05 | 2015-05-11 | 太陽インキ製造株式会社 | プリント配線板用硬化型組成物、これを用いた硬化塗膜及びプリント配線板 |
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US10429733B2 (en) | 2019-10-01 |
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