JP6094605B2 - 単結晶製造装置 - Google Patents
単結晶製造装置 Download PDFInfo
- Publication number
- JP6094605B2 JP6094605B2 JP2015008728A JP2015008728A JP6094605B2 JP 6094605 B2 JP6094605 B2 JP 6094605B2 JP 2015008728 A JP2015008728 A JP 2015008728A JP 2015008728 A JP2015008728 A JP 2015008728A JP 6094605 B2 JP6094605 B2 JP 6094605B2
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- JP
- Japan
- Prior art keywords
- single crystal
- chamber
- crucible
- crystal manufacturing
- outer periphery
- Prior art date
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/14—Heating of the melt or the crystallised materials
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/30—Mechanisms for rotating or moving either the melt or the crystal
- C30B15/305—Stirring of the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/36—Carbides
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/10—Heating of the reaction chamber or the substrate
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
- C30B31/12—Heating of the reaction chamber
Description
〈1〉坩堝と誘導加熱コイルが収容されたチャンバーを備える単結晶製造装置であって、前記チャンバーは、天板部と、底板部と、胴体部を備えており、前記胴体部は、中空筒形状の石英ガラス製であり、かつ前記天板部と前記底板部を連結しており、前記胴体部の外周に、開閉可能な反射部材が設けられており、かつ、前記反射部材は、周方向に分割されており、かつ前記チャンバの内部から発せられる熱と光を反射する、単結晶製造装置。
〈2〉前記反射部材は、外周から内周に向けて積層された複数の電磁鋼板である、〈1〉項に記載の装置。
2 誘導加熱コイル
3 チャンバ
4 天板部
5 底板部
6 胴体部
7 高周波電源
8 原料溶液
9 種結晶ホルダ
10 種結晶
11 回転軸
12、12a〜12t 反射部材
13 中空円筒状部材
14 磁束
15 渦電流
16 板状部材
17 内周
100 単結晶製造装置
Claims (1)
- 坩堝と誘導加熱コイルが収容されたチャンバを備える単結晶製造装置であって、
前記チャンバは、天板部と、底板部と、胴体部を備えており、
前記胴体部は、中空筒形状の石英ガラス製であり、かつ前記天板部と前記底板部を連結しており、
前記胴体部の外周に、開閉可能な反射部材が設けられており、
前記反射部材は、周方向に分割されて周方向に並んでおり、かつ前記チャンバの内部から発せられる熱と光を反射し、かつ、
前記反射部材は、外周から内周に向けて積層された複数の電磁鋼板である、
単結晶製造装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015008728A JP6094605B2 (ja) | 2015-01-20 | 2015-01-20 | 単結晶製造装置 |
CN201610035873.5A CN105803516B (zh) | 2015-01-20 | 2016-01-20 | 单晶制造装置 |
US15/001,830 US9938636B2 (en) | 2015-01-20 | 2016-01-20 | Single crystal production apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015008728A JP6094605B2 (ja) | 2015-01-20 | 2015-01-20 | 単結晶製造装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016132596A JP2016132596A (ja) | 2016-07-25 |
JP6094605B2 true JP6094605B2 (ja) | 2017-03-15 |
Family
ID=56407378
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015008728A Active JP6094605B2 (ja) | 2015-01-20 | 2015-01-20 | 単結晶製造装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US9938636B2 (ja) |
JP (1) | JP6094605B2 (ja) |
CN (1) | CN105803516B (ja) |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3311494A (en) * | 1964-12-07 | 1967-03-28 | Gen Electric | Processes of producing smooth adherent coatings of polytetrafluoroethylene |
US3983051A (en) * | 1973-12-06 | 1976-09-28 | Allied Chemical Corporation | Doped beryllium lanthanate crystals |
JPS59132118A (ja) * | 1983-01-18 | 1984-07-30 | Ushio Inc | 光照射装置 |
US4659601A (en) * | 1984-03-12 | 1987-04-21 | The Babcock & Wilcox Company | Adjustable multilayer thermal mirror insulation |
US4858557A (en) * | 1984-07-19 | 1989-08-22 | L.P.E. Spa | Epitaxial reactors |
IT1215444B (it) * | 1987-04-24 | 1990-02-14 | L P E S P A | Perfezionamenti ad induttori e suscettori impiegabili in reattori epitassiali. |
JPS61291485A (ja) * | 1985-06-14 | 1986-12-22 | Toshiba Corp | 単結晶育成装置 |
JPH0733307B2 (ja) * | 1986-08-18 | 1995-04-12 | ソニー株式会社 | 単結晶成長装置 |
US4823735A (en) * | 1987-05-12 | 1989-04-25 | Gemini Research, Inc. | Reflector apparatus for chemical vapor deposition reactors |
JPH05319975A (ja) * | 1992-05-19 | 1993-12-03 | Meidensha Corp | 酸化物単結晶の製造方法 |
US5444217A (en) * | 1993-01-21 | 1995-08-22 | Moore Epitaxial Inc. | Rapid thermal processing apparatus for processing semiconductor wafers |
KR20120082873A (ko) * | 2009-09-15 | 2012-07-24 | 투-식스 인코포레이티드 | SiC 단결정의 승화 성장 |
KR101488125B1 (ko) * | 2010-12-27 | 2015-01-29 | 신닛테츠스미킨 카부시키카이샤 | SiC 단결정의 제조 장치 및 SiC 단결정의 제조 방법 |
WO2013005347A1 (ja) * | 2011-07-04 | 2013-01-10 | トヨタ自動車株式会社 | SiC単結晶及びその製造方法 |
JP5910442B2 (ja) * | 2012-09-28 | 2016-04-27 | 株式会社デンソー | 炭化珪素単結晶製造装置 |
CN103342362A (zh) * | 2013-07-12 | 2013-10-09 | 新特能源股份有限公司 | 一种多晶硅cvd反应器隔热罩 |
CN103469298A (zh) * | 2013-08-22 | 2013-12-25 | 昆山开威电子有限公司 | 一种泡生法生长掺铈钇铝石榴石单晶的方法及高温炉 |
CN103603029A (zh) * | 2013-11-28 | 2014-02-26 | 于洪洲 | 一种透明结构的晶体制备装置 |
-
2015
- 2015-01-20 JP JP2015008728A patent/JP6094605B2/ja active Active
-
2016
- 2016-01-20 CN CN201610035873.5A patent/CN105803516B/zh not_active Expired - Fee Related
- 2016-01-20 US US15/001,830 patent/US9938636B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP2016132596A (ja) | 2016-07-25 |
CN105803516A (zh) | 2016-07-27 |
US9938636B2 (en) | 2018-04-10 |
US20160208407A1 (en) | 2016-07-21 |
CN105803516B (zh) | 2018-06-22 |
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