JP6071325B2 - 露光装置、露光方法及び物品の製造方法 - Google Patents

露光装置、露光方法及び物品の製造方法 Download PDF

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Publication number
JP6071325B2
JP6071325B2 JP2012182635A JP2012182635A JP6071325B2 JP 6071325 B2 JP6071325 B2 JP 6071325B2 JP 2012182635 A JP2012182635 A JP 2012182635A JP 2012182635 A JP2012182635 A JP 2012182635A JP 6071325 B2 JP6071325 B2 JP 6071325B2
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JP
Japan
Prior art keywords
optical element
pulsed light
irradiation
exposure
light
Prior art date
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Expired - Fee Related
Application number
JP2012182635A
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English (en)
Japanese (ja)
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JP2014041880A (ja
JP2014041880A5 (https=
Inventor
貴博 中山
貴博 中山
三宅　明
明 三宅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2012182635A priority Critical patent/JP6071325B2/ja
Priority to US13/964,259 priority patent/US9568835B2/en
Publication of JP2014041880A publication Critical patent/JP2014041880A/ja
Publication of JP2014041880A5 publication Critical patent/JP2014041880A5/ja
Application granted granted Critical
Publication of JP6071325B2 publication Critical patent/JP6071325B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

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  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2012182635A 2012-08-21 2012-08-21 露光装置、露光方法及び物品の製造方法 Expired - Fee Related JP6071325B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012182635A JP6071325B2 (ja) 2012-08-21 2012-08-21 露光装置、露光方法及び物品の製造方法
US13/964,259 US9568835B2 (en) 2012-08-21 2013-08-12 Exposure apparatus with irradiation device for irradiating optical element with pulsed light having infrared wavelength, and corresponding exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012182635A JP6071325B2 (ja) 2012-08-21 2012-08-21 露光装置、露光方法及び物品の製造方法

Publications (3)

Publication Number Publication Date
JP2014041880A JP2014041880A (ja) 2014-03-06
JP2014041880A5 JP2014041880A5 (https=) 2015-09-17
JP6071325B2 true JP6071325B2 (ja) 2017-02-01

Family

ID=50147731

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012182635A Expired - Fee Related JP6071325B2 (ja) 2012-08-21 2012-08-21 露光装置、露光方法及び物品の製造方法

Country Status (2)

Country Link
US (1) US9568835B2 (https=)
JP (1) JP6071325B2 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102014216458A1 (de) * 2014-08-19 2016-02-25 Carl Zeiss Smt Gmbh Optisches Element mit einer Beschichtung zur Beeinflussung von Heizstrahlung und optische Anordnung

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4534260B2 (ja) * 1997-07-22 2010-09-01 株式会社ニコン 露光方法、露光装置、その製造方法及び光洗浄方法
US6924492B2 (en) 2000-12-22 2005-08-02 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
SG139554A1 (en) * 2002-12-20 2008-02-29 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP4564742B2 (ja) * 2003-12-03 2010-10-20 キヤノン株式会社 露光装置及びデバイス製造方法
JP5458243B2 (ja) * 2007-10-25 2014-04-02 国立大学法人大阪大学 Ｅｕｖ光の放射方法、および前記ｅｕｖ光を用いた感応基板の露光方法
US20100192973A1 (en) * 2009-01-19 2010-08-05 Yoshifumi Ueno Extreme ultraviolet light source apparatus and cleaning method
DE102009046685A1 (de) * 2009-11-13 2011-05-26 Carl Zeiss Smt Gmbh Abbildende Optik
JP5737983B2 (ja) * 2010-04-23 2015-06-17 キヤノン株式会社 露光装置およびデバイス製造方法
JP5846572B2 (ja) * 2011-07-27 2016-01-20 ギガフォトン株式会社 チャンバ装置、極端紫外光生成装置および極端紫外光生成装置の制御方法

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Publication number Publication date
JP2014041880A (ja) 2014-03-06
US20140055765A1 (en) 2014-02-27
US9568835B2 (en) 2017-02-14

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