JP2014041880A5 - - Google Patents
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- Publication number
- JP2014041880A5 JP2014041880A5 JP2012182635A JP2012182635A JP2014041880A5 JP 2014041880 A5 JP2014041880 A5 JP 2014041880A5 JP 2012182635 A JP2012182635 A JP 2012182635A JP 2012182635 A JP2012182635 A JP 2012182635A JP 2014041880 A5 JP2014041880 A5 JP 2014041880A5
- Authority
- JP
- Japan
- Prior art keywords
- optical element
- pulsed light
- exposure apparatus
- light
- period
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012182635A JP6071325B2 (ja) | 2012-08-21 | 2012-08-21 | 露光装置、露光方法及び物品の製造方法 |
| US13/964,259 US9568835B2 (en) | 2012-08-21 | 2013-08-12 | Exposure apparatus with irradiation device for irradiating optical element with pulsed light having infrared wavelength, and corresponding exposure method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012182635A JP6071325B2 (ja) | 2012-08-21 | 2012-08-21 | 露光装置、露光方法及び物品の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014041880A JP2014041880A (ja) | 2014-03-06 |
| JP2014041880A5 true JP2014041880A5 (https=) | 2015-09-17 |
| JP6071325B2 JP6071325B2 (ja) | 2017-02-01 |
Family
ID=50147731
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012182635A Expired - Fee Related JP6071325B2 (ja) | 2012-08-21 | 2012-08-21 | 露光装置、露光方法及び物品の製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US9568835B2 (https=) |
| JP (1) | JP6071325B2 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102014216458A1 (de) * | 2014-08-19 | 2016-02-25 | Carl Zeiss Smt Gmbh | Optisches Element mit einer Beschichtung zur Beeinflussung von Heizstrahlung und optische Anordnung |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4534260B2 (ja) * | 1997-07-22 | 2010-09-01 | 株式会社ニコン | 露光方法、露光装置、その製造方法及び光洗浄方法 |
| US6924492B2 (en) | 2000-12-22 | 2005-08-02 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| SG139554A1 (en) * | 2002-12-20 | 2008-02-29 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| JP4564742B2 (ja) * | 2003-12-03 | 2010-10-20 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
| JP5458243B2 (ja) * | 2007-10-25 | 2014-04-02 | 国立大学法人大阪大学 | Euv光の放射方法、および前記euv光を用いた感応基板の露光方法 |
| US20100192973A1 (en) * | 2009-01-19 | 2010-08-05 | Yoshifumi Ueno | Extreme ultraviolet light source apparatus and cleaning method |
| DE102009046685A1 (de) * | 2009-11-13 | 2011-05-26 | Carl Zeiss Smt Gmbh | Abbildende Optik |
| JP5737983B2 (ja) * | 2010-04-23 | 2015-06-17 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
| JP5846572B2 (ja) * | 2011-07-27 | 2016-01-20 | ギガフォトン株式会社 | チャンバ装置、極端紫外光生成装置および極端紫外光生成装置の制御方法 |
-
2012
- 2012-08-21 JP JP2012182635A patent/JP6071325B2/ja not_active Expired - Fee Related
-
2013
- 2013-08-12 US US13/964,259 patent/US9568835B2/en not_active Expired - Fee Related
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