JP6047395B2 - 高純度シリカゾルおよびその製造方法 - Google Patents

高純度シリカゾルおよびその製造方法 Download PDF

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JP6047395B2
JP6047395B2 JP2012277817A JP2012277817A JP6047395B2 JP 6047395 B2 JP6047395 B2 JP 6047395B2 JP 2012277817 A JP2012277817 A JP 2012277817A JP 2012277817 A JP2012277817 A JP 2012277817A JP 6047395 B2 JP6047395 B2 JP 6047395B2
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solution
concentration
silica sol
purity
silicic acid
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JP2014122123A (ja
JP2014122123A5 (enExample
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中山　和洋
和洋 中山
中島　昭
昭 中島
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JGC Catalysts and Chemicals Ltd
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JP2012277817A 2012-12-20 2012-12-20 高純度シリカゾルおよびその製造方法 Active JP6047395B2 (ja)

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JP2012277817A JP6047395B2 (ja) 2012-12-20 2012-12-20 高純度シリカゾルおよびその製造方法

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JP2014122123A5 JP2014122123A5 (enExample) 2015-11-05
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Publication number Priority date Publication date Assignee Title
US10865113B2 (en) * 2015-10-20 2020-12-15 Nissan Chemical Industries, Ltd. Method for producing purified aqueous solution of silicic acid
CN111186840B (zh) * 2020-01-17 2022-09-23 山东百特新材料有限公司 一种提高硅溶胶颗粒球形度的方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3463328B2 (ja) * 1992-09-25 2003-11-05 日産化学工業株式会社 酸性シリカゾルの製造方法
JP4643085B2 (ja) * 2001-09-19 2011-03-02 日本化学工業株式会社 研磨剤用高純度コロイダルシリカの製造方法
JP4011566B2 (ja) * 2003-07-25 2007-11-21 扶桑化学工業株式会社 シリカゾル及びその製造方法
JP4566645B2 (ja) * 2003-07-25 2010-10-20 扶桑化学工業株式会社 シリカゾル及びその製造方法
JP4580674B2 (ja) * 2004-04-13 2010-11-17 裕子 石栗 微細な高純度金属酸化物の製造方法
JP2006104354A (ja) * 2004-10-06 2006-04-20 Nippon Chem Ind Co Ltd 研磨用組成物、その製造方法及び該研磨用組成物を用いる研磨方法
JP5398963B2 (ja) * 2007-04-23 2014-01-29 日本化学工業株式会社 低ナトリウムで非球状のコロイダルシリカ
JP5464834B2 (ja) * 2008-10-14 2014-04-09 日揮触媒化成株式会社 研磨用シリカゾル、研磨用組成物および研磨用シリカゾルの製造方法

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