JP6043204B2 - マスクブランク、及び転写用マスクの製造方法 - Google Patents

マスクブランク、及び転写用マスクの製造方法 Download PDF

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Publication number
JP6043204B2
JP6043204B2 JP2013029740A JP2013029740A JP6043204B2 JP 6043204 B2 JP6043204 B2 JP 6043204B2 JP 2013029740 A JP2013029740 A JP 2013029740A JP 2013029740 A JP2013029740 A JP 2013029740A JP 6043204 B2 JP6043204 B2 JP 6043204B2
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Japan
Prior art keywords
mask blank
thin film
mask
etching
ions
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Japanese (ja)
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JP2013218301A5 (enExample
JP2013218301A (ja
Inventor
鈴木　寿幸
寿幸 鈴木
山田　剛之
剛之 山田
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Hoya Corp
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Hoya Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Drying Of Semiconductors (AREA)
JP2013029740A 2012-03-14 2013-02-19 マスクブランク、及び転写用マスクの製造方法 Active JP6043204B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2013029740A JP6043204B2 (ja) 2012-03-14 2013-02-19 マスクブランク、及び転写用マスクの製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012057489 2012-03-14
JP2012057489 2012-03-14
JP2013029740A JP6043204B2 (ja) 2012-03-14 2013-02-19 マスクブランク、及び転写用マスクの製造方法

Publications (3)

Publication Number Publication Date
JP2013218301A JP2013218301A (ja) 2013-10-24
JP2013218301A5 JP2013218301A5 (enExample) 2015-08-20
JP6043204B2 true JP6043204B2 (ja) 2016-12-14

Family

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Family Applications (1)

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JP2013029740A Active JP6043204B2 (ja) 2012-03-14 2013-02-19 マスクブランク、及び転写用マスクの製造方法

Country Status (5)

Country Link
US (1) US20150079502A1 (enExample)
JP (1) JP6043204B2 (enExample)
KR (1) KR101862165B1 (enExample)
TW (1) TWI594068B (enExample)
WO (1) WO2013136881A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101862166B1 (ko) * 2012-03-14 2018-05-29 호야 가부시키가이샤 마스크 블랭크, 및 전사용 마스크의 제조방법
US10410855B2 (en) * 2015-03-19 2019-09-10 Sharp Kabushiki Kaisha Cleaning method, method for manufacturing semiconductor device, and plasma treatment device
JP6301383B2 (ja) * 2015-03-27 2018-03-28 Hoya株式会社 フォトマスクブランク及びこれを用いたフォトマスクの製造方法、並びに表示装置の製造方法
KR102313892B1 (ko) 2016-03-29 2021-10-15 호야 가부시키가이샤 마스크 블랭크, 마스크 블랭크의 제조 방법, 전사용 마스크의 제조 방법 및 반도체 디바이스의 제조 방법
WO2018074512A1 (ja) * 2016-10-21 2018-04-26 Hoya株式会社 反射型マスクブランク、反射型マスクの製造方法、及び半導体装置の製造方法
JP6900872B2 (ja) * 2016-12-26 2021-07-07 信越化学工業株式会社 フォトマスクブランク及びその製造方法
JP6900873B2 (ja) * 2016-12-26 2021-07-07 信越化学工業株式会社 フォトマスクブランク及びその製造方法
US11454876B2 (en) * 2020-12-14 2022-09-27 Applied Materials, Inc. EUV mask blank absorber defect reduction

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4604292A (en) * 1985-04-26 1986-08-05 Spire Corporation X-ray mask blank process
JP2658966B2 (ja) * 1995-04-20 1997-09-30 日本電気株式会社 フォトマスク及びその製造方法
JP2003179034A (ja) * 2001-12-12 2003-06-27 Hitachi Ltd 半導体集積回路装置の製造方法
WO2003065433A1 (fr) * 2002-01-28 2003-08-07 Mitsubishi Chemical Corporation Detergent liquide pour substrat de dispositif semi-conducteur et procede de nettoyage
US20070093406A1 (en) * 2005-10-24 2007-04-26 Omoregie Henryson Novel cleaning process for masks and mask blanks
EP2056333B1 (de) * 2007-10-29 2016-08-24 ION-TOF Technologies GmbH Flüssigmetallionenquelle, Sekundärionenmassenspektrometer, sekundärionenmassenspektrometisches Analyseverfahren sowie deren Verwendungen
US20100294306A1 (en) * 2007-12-04 2010-11-25 Mitsubishi Chemical Corporation Method and solution for cleaning semiconductor device substrate
JP5638769B2 (ja) * 2009-02-04 2014-12-10 Hoya株式会社 反射型マスクブランクの製造方法及び反射型マスクの製造方法
EP2453464A1 (en) * 2009-07-08 2012-05-16 Asahi Glass Company, Limited Euv-lithography reflection-type mask blank
JP4797114B2 (ja) * 2009-10-12 2011-10-19 Ｈｏｙａ株式会社 転写用マスクの製造方法及び半導体デバイスの製造方法
JP4739461B2 (ja) * 2009-10-12 2011-08-03 Ｈｏｙａ株式会社 転写用マスクの製造方法及び半導体デバイスの製造方法
JP2011204712A (ja) * 2010-03-24 2011-10-13 Dainippon Screen Mfg Co Ltd 基板処理方法および基板処理装置
US8524421B2 (en) * 2010-03-30 2013-09-03 Hoya Corporation Mask blank, transfer mask, methods of manufacturing the same and method of manufacturing a semiconductor device
US8435704B2 (en) * 2010-03-30 2013-05-07 Hoya Corporation Mask blank, transfer mask, and methods of manufacturing the same
JP4688966B2 (ja) * 2010-07-06 2011-05-25 Ｈｏｙａ株式会社 マスクブランクスの製造方法及び転写マスクの製造方法
KR101913431B1 (ko) * 2011-04-06 2018-10-30 호야 가부시키가이샤 마스크 블랭크의 표면 처리 방법, 및 마스크 블랭크의 제조 방법과 마스크의 제조 방법
JP5925543B2 (ja) * 2011-04-06 2016-05-25 Hoya株式会社 マスクブランクの表面処理方法、マスクブランクの製造方法、およびマスクの製造方法
JP5939662B2 (ja) * 2011-09-21 2016-06-22 Hoya株式会社 マスクブランクの製造方法
KR101862166B1 (ko) * 2012-03-14 2018-05-29 호야 가부시키가이샤 마스크 블랭크, 및 전사용 마스크의 제조방법

Also Published As

Publication number Publication date
TWI594068B (zh) 2017-08-01
TW201348853A (zh) 2013-12-01
US20150079502A1 (en) 2015-03-19
KR20140141578A (ko) 2014-12-10
KR101862165B1 (ko) 2018-05-29
WO2013136881A1 (ja) 2013-09-19
JP2013218301A (ja) 2013-10-24

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