JP6038637B2 - 金属酸化物ナノ粒子とシルセスキオキサンポリマーとの複合体およびその製造方法、ならびにその複合体を用いて製造した複合材料 - Google Patents
金属酸化物ナノ粒子とシルセスキオキサンポリマーとの複合体およびその製造方法、ならびにその複合体を用いて製造した複合材料 Download PDFInfo
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- JP6038637B2 JP6038637B2 JP2012280116A JP2012280116A JP6038637B2 JP 6038637 B2 JP6038637 B2 JP 6038637B2 JP 2012280116 A JP2012280116 A JP 2012280116A JP 2012280116 A JP2012280116 A JP 2012280116A JP 6038637 B2 JP6038637 B2 JP 6038637B2
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- 238000001953 recrystallisation Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- DZLFLBLQUQXARW-UHFFFAOYSA-N tetrabutylammonium Chemical class CCCC[N+](CCCC)(CCCC)CCCC DZLFLBLQUQXARW-UHFFFAOYSA-N 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
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Description
[PhSiO1.5]n[MeSiO1.5]m[SiO2]l[OMe2Si-Ph-Me2SiO]k (1)
式中、Phはフェニル基を表し、Meはメチル基を表し、n、m、l、およびkはそれぞれの繰り返し単位の構成比を表す数であり、一般に
n+mは40〜100モル%、
lは0〜40モル%、
kは0〜40モル%であり、
好ましくは
n+mは70〜90モル%、
lは5〜15モル%、
kは0〜20モル%であり、
である。
なお、nは40〜60モル%、mは30〜50モル%であることが好ましい。
MxOy(OR)z (2)
(式中、
MはTi、Zr、Eu、Zn、B、Al、Ta、およびHfからなる群から選択される元素であり、
Rは、水素、またはC1〜C10の、好ましくはC1〜C6の、アルキル基またはアルケニル基であり、
2y+z=x×[Mの価数]を満たす)
四口フラスコにメチルトリエトキシシラン(MeSi(OC2H5)3)174gとPGMEA360gを仕込み、溶解させた。次に48%水酸化ナトリウム水溶液を8.33g添加し、500rpmで2時間撹拌した。次に酢酸12gと純水120gを添加し1時間撹拌した。
四口フラスコにメチルトリエトキシシラン156gとフェニルトリエトキシシラン 24gとPGMEA360gを仕込み、溶解させた。次に48%水酸化ナトリウム水溶液8.33gを添加し、2時間攪拌して反応させた。
メチルトリエトキシシランに代えてフェニルトリエトキシシラン240gを用いたほかは、合成例1に従い合成および精製を実施して、シルセスキオキサンポリマーCを得た。
四口フラスコにメチルトリエトキシシラン89gとフェニルトリエトキシシラン96gとテトラエトキシシラン21gを用いた他は、合成例1に従い合成および精製を実施して、シルセスキオキサンポリマーDを得た。
三口フラスコに、CIKナノテック株式会社製ジルコニアナノ粒子(水分散、濃度15wt%、平均粒子径50nm)を50g、PGMEAを50g投入した。次に相間移動触媒であるトリオクチルメチルアンモニウムクロライドを2.1g(0.09mol)添加した。この反応混合物にシルセスキオキサンポリマーCを25g加えて1時間反応させた。
ポリマーとしてシルセスキオキサンポリマーAを用いた以外は実施例1に従い実験した。
テトライソプロポキシチタネート50gとIPA400gを三口フラスコに仕込み、純水60g加え、約30分撹拌し、ゾルを調製した。さらにテトラブチルアンモニウムヒドロキシド20wt%水溶液を加え、30分撹拌後、PGMEを200g加えた。これを120℃で還流させることで、酸化チタン粒子(粒径100nm)を調製した。この溶液にポリマーとしてシルセスキオキサンポリマーDを116g加え2時間反応させた。反応後、溶液を分液ロートに移し、水400gとノルマルプロピルアセテート500g加え、静置した。液は透明な状態で2層に分離した。水層を除去し、有機層を回収した後、エバポレーターにて濃縮し、濃度約20wt%に調整した。
シルセスキオキサンDを41.2g用いた以外実施例3と同様にハイブリット化を実施した。
シルセスキオキサンDを32.8g用いた以外実施例3と同様にハイブリット化を実施した。
四口フラスコにフェニルトリエトキシシラン(PhSi(OC2H5)3)27gとPGME30gを仕込み、溶解させた。続いて純水30gとPGME30gに溶解させたトリオクチルメチルアンモニウムを0.3g添加し、500rpm、100度で30分撹拌した。これに実施例3で作成した酸化チタン粒子(粒径100nm)を加え、120度で2時間反応させた。反応後、溶液を分液ロートに移し、水400gとノルマルプロピルアセテート500g加え、静置した。液は透明な状態で2層に分離した。水層を除去し、有機層を回収した後、エバポレーターにて濃縮し、濃度約20wt%に調整した。
本発明による複合体は、用いられている金属酸化物ナノ粒子の性質により異なった物性を実現できる。
Claims (11)
- 末端にシラノール基を有する、シルセスキオキサンポリマーまたはシランモノマーと、表面に水酸基またはアルコキシ基を有する金属酸化物ナノ粒子とを、水性溶媒と有機性溶媒との混合溶媒中、相間移動触媒の存在下で反応させることを含んでなり、
前記相間移動触媒が、第4級アンモニウム化合物、第4級フォスフォニウム化合物、ピリジニウム化合物およびクラウンエーテルからなる群から選択されることを特徴とする金属酸化物ナノ粒子とシルセスキオキサンポリマーとの複合体の製造方法。 - 前記シルセスキオキサンポリマーが、[R1SiO1.5](式中、R1は、水素、アルキル基、アリール基、およびアルケニル基からなる群から選択される基である)および[SiO2]からなる群から選択される繰り返し単位を含んでなるものである請求項1に記載の複合体の製造方法。
- 前記シルセスキオキサンポリマーの平均重量分子量が500〜20,000である、請求項1または2に記載の複合体の製造方法。
- 前記金属酸化物ナノ粒子が、下記一般式(2)
MxOy(OR)z (2)
(式中、
MはTi、Zr、Eu、Zn、B、Al、Ta、およびHfからなる群から選択される元素であり、
Rは、水素、またはC1〜C10のアルキル基またはアルケニル基であり、 2y+z=x×[Mの価数]を満たす)
で表される、請求項1〜3のいずれか1項に記載の複合体の製造方法。 - 前記金属酸化物ナノ粒子の平均粒子径が5〜200nmである、請求項1〜4のいずれか1項に記載の複合体の製造方法。
- 前記水性溶媒が、水、または水とアルコールとの混合溶媒である、請求項1〜5のいずれか1項に記載の複合体の製造方法。
- 前記複合体の総量を基準として、10〜90重量%の金属酸化物ナノ粒子を含有する、請求項1〜6のいずれか1項に記載の複合体の製造方法。
- 請求項1〜7のいずれか一項に記載の複合体の製造方法であって、シルセスキオキサンポリマーと、金属酸化物ナノ粒子とを含んでなり、前記シルセスキオキサンポリマーのケイ素原子と前記金属酸化物ナノ粒子の表面が酸素原子を介して結合していることを特徴とする、金属酸化物ナノ粒子とシルセスキオキサンポリマーとの複合体の製造方法。
- 末端にシラノール基を有する、シルセスキオキサンポリマーまたはシランモノマーと、表面に水酸基またはアルコキシ基を有する金属酸化物ナノ粒子とを、水性溶媒と有機性溶媒との混合溶媒中、相間移動触媒の存在下で反応させて、金属酸化物ナノ粒子とシルセスキオキサンポリマーとの複合体を形成させること、および
前記複合体を空気中または不活性雰囲気中、150℃以上で加熱して硬化させることを含んでなり、
前記相間移動触媒が、第4級アンモニウム化合物、第4級フォスフォニウム化合物、ピリジニウム化合物およびクラウンエーテルからなる群から選択されることを特徴とする、金属酸化物含有複合材料の製造方法。 - 末端にシラノール基を有する、シルセスキオキサンポリマーまたはシランモノマーと、表面に水酸基またはアルコキシ基を有する金属酸化物ナノ粒子とを、水性溶媒と有機性溶媒との混合溶媒中、相間移動触媒の存在下で反応させて、金属酸化物ナノ粒子とシルセスキオキサンポリマーとの複合体を形成させること、および
前記複合体を空気中または不活性雰囲気中、150℃以上で加熱して硬化させて、複合金属酸化物含有複合材料を具備してなる、層間膜、屈折率制御膜、または保護膜を形成させることを含んでなり、
前記相間移動触媒が、第4級アンモニウム化合物、第4級フォスフォニウム化合物、ピリジニウム化合物およびクラウンエーテルからなる群から選択されることを特徴とする電子素子の製造方法。 - 前記金属酸化物ナノ粒子が、
M(OR)4
(式中、
MはTi、Zr、Eu、Zn、B、Al、Ta、およびHfからなる群から選択される元素であり、
Rは、水素、またはC1〜C10のアルキル基またはアルケニル基である)を出発原料として、ゾルゲル法により調製されたものである、請求項1〜10のいずれか一項に記載の方法。
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