JP6008556B2 - 液体吐出ヘッドの製造方法及び露光方法 - Google Patents

液体吐出ヘッドの製造方法及び露光方法 Download PDF

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Publication number
JP6008556B2
JP6008556B2 JP2012099802A JP2012099802A JP6008556B2 JP 6008556 B2 JP6008556 B2 JP 6008556B2 JP 2012099802 A JP2012099802 A JP 2012099802A JP 2012099802 A JP2012099802 A JP 2012099802A JP 6008556 B2 JP6008556 B2 JP 6008556B2
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JP
Japan
Prior art keywords
exposure
substrate
resin layer
photosensitive resin
unexposed portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2012099802A
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English (en)
Japanese (ja)
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JP2013226688A (ja
JP2013226688A5 (enExample
Inventor
石川　哲史
哲史 石川
環樹 佐藤
環樹 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2012099802A priority Critical patent/JP6008556B2/ja
Priority to US13/857,337 priority patent/US8877433B2/en
Publication of JP2013226688A publication Critical patent/JP2013226688A/ja
Publication of JP2013226688A5 publication Critical patent/JP2013226688A5/ja
Application granted granted Critical
Publication of JP6008556B2 publication Critical patent/JP6008556B2/ja
Expired - Fee Related legal-status Critical Current
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
JP2012099802A 2012-04-25 2012-04-25 液体吐出ヘッドの製造方法及び露光方法 Expired - Fee Related JP6008556B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012099802A JP6008556B2 (ja) 2012-04-25 2012-04-25 液体吐出ヘッドの製造方法及び露光方法
US13/857,337 US8877433B2 (en) 2012-04-25 2013-04-05 Method of manufacturing liquid injection head and exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012099802A JP6008556B2 (ja) 2012-04-25 2012-04-25 液体吐出ヘッドの製造方法及び露光方法

Publications (3)

Publication Number Publication Date
JP2013226688A JP2013226688A (ja) 2013-11-07
JP2013226688A5 JP2013226688A5 (enExample) 2015-05-28
JP6008556B2 true JP6008556B2 (ja) 2016-10-19

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012099802A Expired - Fee Related JP6008556B2 (ja) 2012-04-25 2012-04-25 液体吐出ヘッドの製造方法及び露光方法

Country Status (2)

Country Link
US (1) US8877433B2 (enExample)
JP (1) JP6008556B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6071560B2 (ja) 2013-01-07 2017-02-01 キヤノン株式会社 液体吐出ヘッドの製造方法
CN106232366B (zh) 2014-04-22 2018-01-19 惠普发展公司，有限责任合伙企业 流体流道结构
US20190118534A1 (en) * 2017-10-24 2019-04-25 Toshiba Tec Kabushiki Kaisha Fluid ejection head and fluid ejection apparatus
US11642886B2 (en) * 2021-04-08 2023-05-09 Funai Electric Co., Ltd. Modified fluid jet plume characteristics
GB202109076D0 (en) * 2021-06-24 2021-08-11 Xaar Technology Ltd A nozzle plate for a droplet ejection head, a droplet ejection apparatus and a method for operating the same

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4869999A (en) * 1986-08-08 1989-09-26 Hitachi, Ltd. Method of forming pattern and projection aligner for carrying out the same
JPH0810666B2 (ja) * 1986-09-05 1996-01-31 株式会社日立製作所 パターン形成方法
US5666140A (en) 1993-04-16 1997-09-09 Hitachi Koki Co., Ltd. Ink jet print head
US5896154A (en) 1993-04-16 1999-04-20 Hitachi Koki Co., Ltd. Ink jet printer
JP3335736B2 (ja) * 1993-12-17 2002-10-21 富士写真フイルム株式会社 インク噴射記録ヘッド
JP3304194B2 (ja) * 1994-04-13 2002-07-22 セイコープレシジョン株式会社 テーパー形状の孔明け方法
JP2000208394A (ja) * 1999-01-12 2000-07-28 Mitsubishi Electric Corp 半導体装置、半導体装置の製造方法およびそれに用いるレジストパタ―ン形成方法と露光装置
JP2002117756A (ja) * 2000-10-05 2002-04-19 Fujitsu Ltd 隔壁転写用元型の作製方法及び隔壁形成方法
US7585616B2 (en) * 2005-01-31 2009-09-08 Hewlett-Packard Development Company, L.P. Method for making fluid emitter orifice
JP2008119955A (ja) * 2006-11-13 2008-05-29 Canon Inc インクジェット記録ヘッド及び該ヘッドの製造方法
JP2008143088A (ja) * 2006-12-12 2008-06-26 Fujifilm Corp ノズルプレートの製造方法、液体吐出ヘッド及び画像形成装置
US7971964B2 (en) * 2006-12-22 2011-07-05 Canon Kabushiki Kaisha Liquid discharge head and method for manufacturing the same
JP2011189659A (ja) * 2010-03-16 2011-09-29 Seiko Epson Corp 液体噴射装置
JP5506600B2 (ja) * 2010-08-25 2014-05-28 キヤノン株式会社 液体吐出ヘッドの製造方法
JP5701000B2 (ja) * 2010-10-07 2015-04-15 キヤノン株式会社 インクジェット記録ヘッドおよびその製造方法
US8652767B2 (en) * 2011-02-28 2014-02-18 Canon Kabushiki Kaisha Liquid ejection head and process for producing the same

Also Published As

Publication number Publication date
US8877433B2 (en) 2014-11-04
US20130288183A1 (en) 2013-10-31
JP2013226688A (ja) 2013-11-07

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