JP6000713B2 - 液体吐出ヘッドおよびその製造方法 - Google Patents
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Images
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0015—Production of aperture devices, microporous systems or stamps
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
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- B41J2/1601—Production of bubble jet print heads
- B41J2/1603—Production of bubble jet print heads of the front shooter type
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1637—Manufacturing processes molding
- B41J2/1639—Manufacturing processes molding sacrificial molding
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/203—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electromagnetism (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Description
(1)前記感光性樹脂層の表面であって前記吐出口を形成する位置を含む領域に、略球面形状の窪み部を設ける工程と、
(2)前記窪み部内に、前記吐出口に対応する潜像を投影レンズ系を用いた露光処理によって形成する工程と、
(3)前記潜像を現像することにより、前記吐出口を形成する工程と、
を有し、
前記工程(2)の前記露光処理において、前記投影レンズ系によって屈折して基板面の垂直方向から傾斜した露光光によって前記潜像が形成され、該潜像の表面部の中心は前記窪み部の最下点から前記露光光が入射してくる側にずれていることを特徴とする液体吐出ヘッドの製造方法である。
図1Bにおいて、吐出口形成のための露光光の中心(潜像の表面部の中心)は、ほぼ均等な間隔となるように露光される。また、それぞれの吐出口は、同一の吐出口列内では、吐出エネルギー発生素子8と同じ位置関係となるように形成される。
エポキシ樹脂:EHPE−3150(ダイセル化学(株)製) 120g
光カチオン重合開始剤:SP−172(旭電化工業(株)製) 6g
増感剤:SP−100(旭電化工業(株)製) 1.2g
メチルイソブチルケトン 100g
上記材料を混合してネガ型感光性樹脂を調合した。該ネガ型感光性樹脂を石英ガラス基板上に1μmの膜厚で塗布し、365nmにおける吸光度を測定したところ、0.024であった。
本実施例では、吐出口の潜像の形成に際して、5倍の縮小光学系の6インチレチクルを用いた。また、作製するチップ9のサイズは、長手方向の長さが26mm、短手方向の横幅が2mmのものであり、縦の長さが今回使用しているレチクルの画角の最大サイズである26mmと一致しているため、画角の限界付近までパターンが配置されている。このチップ9に関しては、吐出エネルギー発生素子の配列密度が片側で600dpiであり、吐出エネルギー発生素子8の中心間では、約42μm離れている。両側の吐出口列とも、両端部には4ノズルずつ印字に使用されないダミーノズルとダミーの吐出エネルギー発生素子8がある。感光性樹脂層2の厚みは、28μmであり、吐出口6を形成するオリフィスプレート部の厚み(発泡室の型の厚みは含まない厚み)は、12μmである。
2 感光性樹脂層
3 窪み部
5 露光光
6 吐出口
7 窪み部の最下点
8 吐出エネルギー発生素子
9 露光一回分のチップ
10 レチクル
11 傾斜していない露光光
13 レチクル上にプリントされた吐出口パターン
Claims (6)
- 液体を吐出する吐出口を構成する吐出口形成部材を感光性樹脂層を用いて形成する、液体吐出ヘッドの製造方法であって、
(1)前記感光性樹脂層の表面であって前記吐出口を形成する位置を含む領域に、略球面形状の窪み部を設ける工程と、
(2)前記窪み部内に、前記吐出口に対応する潜像を投影レンズ系を用いた露光処理によって形成する工程と、
(3)前記潜像を現像することにより、前記吐出口を形成する工程と、
を有し、
前記工程(2)の前記露光処理において、前記投影レンズ系によって屈折して基板面の垂直方向から傾斜した露光光によって前記潜像が形成され、該潜像の表面部の中心は前記窪み部の最下点から前記露光光が入射してくる側にずれていることを特徴とする液体吐出ヘッドの製造方法。 - 前記潜像の表面部は、前記窪み部の最下点を含むように配置される請求項1に記載の液体吐出ヘッドの製造方法。
- 前記潜像の表面部の中心と前記窪み部の最下点を通りかつ前記基板面に垂直な面による断面において、前記潜像の側面と基板面との角度が両側面でほぼ同じである請求項1又は2に記載の液体吐出ヘッドの製造方法。
- 前記吐出口形成部材は、前記吐出口を列状に複数有し、
前記工程(1)において、前記窪み部は前記複数の吐出口に対応するように複数設けられ、
前記工程(2)の前記露光処理において、前記潜像は前記複数の吐出口にそれぞれ対応させて一括に複数形成され、
前記吐出口の列の端部付近において、前記潜像を形成する露光光と前記基板面の垂直方向との間の入射角度が大きいほど、前記潜像の表面部の中心は、前記窪み部の最下点からの前記露光光が入射してくる側へのずれ量が大きい請求項1乃至3のいずれかに記載の液体吐出ヘッドの製造方法。 - 前記窪み部の最下点は、前記吐出口の中心から、前記吐出口の列の中央側へずれている請求項4に記載の液体吐出ヘッドの製造方法。
- 前記複数の吐出口は、それぞれ、吐出エネルギー発生素子に対して同じ位置関係を有する請求項4又は5に記載の液体吐出ヘッドの製造方法。
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JP2012164688A JP6000713B2 (ja) | 2012-07-25 | 2012-07-25 | 液体吐出ヘッドおよびその製造方法 |
US13/939,513 US8785110B2 (en) | 2012-07-25 | 2013-07-11 | Liquid ejection head and method of manufacturing the same |
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JP2012164688A JP6000713B2 (ja) | 2012-07-25 | 2012-07-25 | 液体吐出ヘッドおよびその製造方法 |
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JP2014024215A JP2014024215A (ja) | 2014-02-06 |
JP6000713B2 true JP6000713B2 (ja) | 2016-10-05 |
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JP (1) | JP6000713B2 (ja) |
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JP2001264637A (ja) | 2000-03-21 | 2001-09-26 | Nikon Corp | 球面収差補正光学系、球面収差補正光学装置、及び該補正光学系又は該補正装置を備える光学観察装置 |
US20050130075A1 (en) * | 2003-12-12 | 2005-06-16 | Mohammed Shaarawi | Method for making fluid emitter orifice |
US7585616B2 (en) * | 2005-01-31 | 2009-09-08 | Hewlett-Packard Development Company, L.P. | Method for making fluid emitter orifice |
JP5506600B2 (ja) * | 2010-08-25 | 2014-05-28 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
JP5701000B2 (ja) * | 2010-10-07 | 2015-04-15 | キヤノン株式会社 | インクジェット記録ヘッドおよびその製造方法 |
JP5930812B2 (ja) * | 2012-04-06 | 2016-06-08 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
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2012
- 2012-07-25 JP JP2012164688A patent/JP6000713B2/ja not_active Expired - Fee Related
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- 2013-07-11 US US13/939,513 patent/US8785110B2/en not_active Expired - Fee Related
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US8785110B2 (en) | 2014-07-22 |
JP2014024215A (ja) | 2014-02-06 |
US20140030659A1 (en) | 2014-01-30 |
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