JP6008468B2 - 調整可能な光学素子を有する光学モジュール - Google Patents

調整可能な光学素子を有する光学モジュール Download PDF

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Publication number
JP6008468B2
JP6008468B2 JP2011096245A JP2011096245A JP6008468B2 JP 6008468 B2 JP6008468 B2 JP 6008468B2 JP 2011096245 A JP2011096245 A JP 2011096245A JP 2011096245 A JP2011096245 A JP 2011096245A JP 6008468 B2 JP6008468 B2 JP 6008468B2
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Japan
Prior art keywords
support
axis
optical
pivot
optical module
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JP2011096245A
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English (en)
Japanese (ja)
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JP2011232751A (ja
JP2011232751A5 (enExample
Inventor
イヴァン イヴァノブ
イヴァン イヴァノブ
タオウフィク ムバレク
タオウフィク ムバレク
マティアス ヒューシング
マティアス ヒューシング
ブルクハルト コルブス
ブルクハルト コルブス
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
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Publication of JP2011232751A publication Critical patent/JP2011232751A/ja
Publication of JP2011232751A5 publication Critical patent/JP2011232751A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
    • G02B7/1827—Motorised alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/54—Lamp housings; Illuminating means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
  • Lens Barrels (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
JP2011096245A 2010-04-23 2011-04-22 調整可能な光学素子を有する光学モジュール Active JP6008468B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102010018224A DE102010018224A1 (de) 2010-04-23 2010-04-23 Optisches Modul mit einem verstellbaren optischen Element
DE102010018224.9 2010-04-23

Publications (3)

Publication Number Publication Date
JP2011232751A JP2011232751A (ja) 2011-11-17
JP2011232751A5 JP2011232751A5 (enExample) 2014-06-05
JP6008468B2 true JP6008468B2 (ja) 2016-10-19

Family

ID=44815562

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011096245A Active JP6008468B2 (ja) 2010-04-23 2011-04-22 調整可能な光学素子を有する光学モジュール

Country Status (4)

Country Link
US (1) US10274845B2 (enExample)
JP (1) JP6008468B2 (enExample)
KR (1) KR101808860B1 (enExample)
DE (1) DE102010018224A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9254538B2 (en) 2013-04-16 2016-02-09 Corning Incorporated Method of minimizing stacking element distortions in optical assemblies
DE102019112224A1 (de) * 2019-05-10 2020-11-12 Carl Zeiss Smt Gmbh Abstützung eines optischen Elements
DE102019218609A1 (de) * 2019-11-29 2021-06-02 Carl Zeiss Smt Gmbh Abstützung einer optischen einheit

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000066075A (ja) 1998-08-17 2000-03-03 Nikon Corp 光学系及びその製造方法、並びに前記光学系を備えた露光装置
JP2002083766A (ja) 2000-06-19 2002-03-22 Nikon Corp 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置
US7154684B2 (en) 2000-08-18 2006-12-26 Nikon Corporation Optical element holding apparatus
DE10115914A1 (de) * 2001-03-30 2002-10-02 Zeiss Carl Vorrichtung zur Lagerung eines optischen Elementes in einer Optik
DE10344178B4 (de) * 2003-09-24 2006-08-10 Carl Zeiss Smt Ag Halte- und Positioniervorrichtung für ein optisches Element
WO2005101131A1 (en) 2004-04-14 2005-10-27 Carl Zeiss Smt Ag Support device for positioning an optical element
US7573659B2 (en) * 2006-10-27 2009-08-11 Canon Kabushiki Kaisha Optical element holding apparatus and exposure apparatus
JP2008111891A (ja) 2006-10-30 2008-05-15 Canon Inc 光学要素の保持装置及びそれを備えた露光装置
EP1995534A1 (de) * 2007-05-19 2008-11-26 Fritz Brinkmann Steuerung und Antrieb eines kippbaren Solarreflektors zur Leistungssteigerung und zum Schutz von flächigen Sonnenkollektoren
DE102009044957A1 (de) * 2008-09-30 2010-04-08 Carl Zeiss Smt Ag Stützelemente für ein optisches Element
US9664982B2 (en) * 2015-03-12 2017-05-30 Panasonic Intellectual Property Management Co., Ltd. Optical system driving device, lens barrel, and optical device

Also Published As

Publication number Publication date
US10274845B2 (en) 2019-04-30
KR20110118579A (ko) 2011-10-31
JP2011232751A (ja) 2011-11-17
US20110261341A1 (en) 2011-10-27
DE102010018224A1 (de) 2012-02-16
KR101808860B1 (ko) 2017-12-13

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