KR101808860B1 - 조정 가능한 광학 소자를 구비한 광학 모듈 - Google Patents

조정 가능한 광학 소자를 구비한 광학 모듈 Download PDF

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Publication number
KR101808860B1
KR101808860B1 KR1020110037620A KR20110037620A KR101808860B1 KR 101808860 B1 KR101808860 B1 KR 101808860B1 KR 1020110037620 A KR1020110037620 A KR 1020110037620A KR 20110037620 A KR20110037620 A KR 20110037620A KR 101808860 B1 KR101808860 B1 KR 101808860B1
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South Korea
Prior art keywords
support
joints
optical element
pivot
axis
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KR1020110037620A
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English (en)
Korean (ko)
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KR20110118579A (ko
Inventor
이반 이바노프
타오우픽 음바렉
마티아스 휘싱
부르크하르트 코르페스
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칼 짜이스 에스엠테 게엠베하
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
    • G02B7/1827—Motorised alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/54—Lamp housings; Illuminating means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
  • Lens Barrels (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
KR1020110037620A 2010-04-23 2011-04-22 조정 가능한 광학 소자를 구비한 광학 모듈 Active KR101808860B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102010018224A DE102010018224A1 (de) 2010-04-23 2010-04-23 Optisches Modul mit einem verstellbaren optischen Element
DE102010018224.9 2010-04-23

Publications (2)

Publication Number Publication Date
KR20110118579A KR20110118579A (ko) 2011-10-31
KR101808860B1 true KR101808860B1 (ko) 2017-12-13

Family

ID=44815562

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020110037620A Active KR101808860B1 (ko) 2010-04-23 2011-04-22 조정 가능한 광학 소자를 구비한 광학 모듈

Country Status (4)

Country Link
US (1) US10274845B2 (enExample)
JP (1) JP6008468B2 (enExample)
KR (1) KR101808860B1 (enExample)
DE (1) DE102010018224A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9254538B2 (en) 2013-04-16 2016-02-09 Corning Incorporated Method of minimizing stacking element distortions in optical assemblies
DE102019112224A1 (de) * 2019-05-10 2020-11-12 Carl Zeiss Smt Gmbh Abstützung eines optischen Elements
DE102019218609A1 (de) * 2019-11-29 2021-06-02 Carl Zeiss Smt Gmbh Abstützung einer optischen einheit

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000066075A (ja) * 1998-08-17 2000-03-03 Nikon Corp 光学系及びその製造方法、並びに前記光学系を備えた露光装置
US20020044260A1 (en) 2000-06-19 2002-04-18 Nikon Corporation Projection optical system, manufacturing method thereof, and projection exposure apparatus
JP2008111891A (ja) * 2006-10-30 2008-05-15 Canon Inc 光学要素の保持装置及びそれを備えた露光装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7154684B2 (en) 2000-08-18 2006-12-26 Nikon Corporation Optical element holding apparatus
DE10115914A1 (de) * 2001-03-30 2002-10-02 Zeiss Carl Vorrichtung zur Lagerung eines optischen Elementes in einer Optik
DE10344178B4 (de) * 2003-09-24 2006-08-10 Carl Zeiss Smt Ag Halte- und Positioniervorrichtung für ein optisches Element
WO2005101131A1 (en) 2004-04-14 2005-10-27 Carl Zeiss Smt Ag Support device for positioning an optical element
US7573659B2 (en) * 2006-10-27 2009-08-11 Canon Kabushiki Kaisha Optical element holding apparatus and exposure apparatus
EP1995534A1 (de) * 2007-05-19 2008-11-26 Fritz Brinkmann Steuerung und Antrieb eines kippbaren Solarreflektors zur Leistungssteigerung und zum Schutz von flächigen Sonnenkollektoren
DE102009044957A1 (de) * 2008-09-30 2010-04-08 Carl Zeiss Smt Ag Stützelemente für ein optisches Element
US9664982B2 (en) * 2015-03-12 2017-05-30 Panasonic Intellectual Property Management Co., Ltd. Optical system driving device, lens barrel, and optical device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000066075A (ja) * 1998-08-17 2000-03-03 Nikon Corp 光学系及びその製造方法、並びに前記光学系を備えた露光装置
US20020044260A1 (en) 2000-06-19 2002-04-18 Nikon Corporation Projection optical system, manufacturing method thereof, and projection exposure apparatus
JP2008111891A (ja) * 2006-10-30 2008-05-15 Canon Inc 光学要素の保持装置及びそれを備えた露光装置

Also Published As

Publication number Publication date
US10274845B2 (en) 2019-04-30
KR20110118579A (ko) 2011-10-31
JP2011232751A (ja) 2011-11-17
US20110261341A1 (en) 2011-10-27
DE102010018224A1 (de) 2012-02-16
JP6008468B2 (ja) 2016-10-19

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