JP2013511843A5 - - Google Patents
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- JP2013511843A5 JP2013511843A5 JP2012539944A JP2012539944A JP2013511843A5 JP 2013511843 A5 JP2013511843 A5 JP 2013511843A5 JP 2012539944 A JP2012539944 A JP 2012539944A JP 2012539944 A JP2012539944 A JP 2012539944A JP 2013511843 A5 JP2013511843 A5 JP 2013511843A5
- Authority
- JP
- Japan
- Prior art keywords
- magnification
- plate
- deformation
- projection system
- curvature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000003384 imaging method Methods 0.000 claims description 20
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- 238000000034 method Methods 0.000 claims description 7
- 238000012544 monitoring process Methods 0.000 claims description 3
- 230000001186 cumulative effect Effects 0.000 claims 1
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- 238000005452 bending Methods 0.000 description 11
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- 230000000694 effects Effects 0.000 description 6
- 210000001747 pupil Anatomy 0.000 description 6
- 238000007789 sealing Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000001459 lithography Methods 0.000 description 3
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 3
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
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- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 238000012634 optical imaging Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US26317809P | 2009-11-20 | 2009-11-20 | |
| US61/263,178 | 2009-11-20 | ||
| PCT/US2010/056123 WO2011062812A2 (en) | 2009-11-20 | 2010-11-10 | Magnification control for lithographic imaging system |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015094783A Division JP2015180945A (ja) | 2009-11-20 | 2015-05-07 | リソグラフィック結像システムの倍率制御 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2013511843A JP2013511843A (ja) | 2013-04-04 |
| JP2013511843A5 true JP2013511843A5 (enExample) | 2015-01-08 |
Family
ID=43824739
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012539944A Pending JP2013511843A (ja) | 2009-11-20 | 2010-11-10 | リソグラフィック結像システムの倍率制御 |
| JP2015094783A Pending JP2015180945A (ja) | 2009-11-20 | 2015-05-07 | リソグラフィック結像システムの倍率制御 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015094783A Pending JP2015180945A (ja) | 2009-11-20 | 2015-05-07 | リソグラフィック結像システムの倍率制御 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8922750B2 (enExample) |
| EP (1) | EP2502117B1 (enExample) |
| JP (2) | JP2013511843A (enExample) |
| CN (1) | CN102725696B (enExample) |
| WO (1) | WO2011062812A2 (enExample) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9316838B2 (en) * | 2011-02-04 | 2016-04-19 | Tseng-Lu Chien | LED device has changeable image |
| JP2013195487A (ja) * | 2012-03-16 | 2013-09-30 | Topcon Corp | 露光装置 |
| JP5989233B2 (ja) * | 2012-05-24 | 2016-09-07 | エーエスエムエル ネザーランズ ビー．ブイ． | リソグラフィ装置およびデバイス製造方法 |
| CN103105741B (zh) * | 2013-01-22 | 2015-01-21 | 北京京东方光电科技有限公司 | 对位补偿装置及曝光装置 |
| DE102014209150A1 (de) * | 2014-05-14 | 2015-07-02 | Carl Zeiss Smt Gmbh | Optisches Modul |
| JP6754699B2 (ja) | 2014-05-14 | 2020-09-16 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 光学素子上のアクチュエータ及びセンサ点の最適配置 |
| DE102014209147A1 (de) * | 2014-05-14 | 2015-11-19 | Carl Zeiss Smt Gmbh | Optisches Modul |
| DE102014209151A1 (de) * | 2014-05-14 | 2015-07-02 | Carl Zeiss Smt Gmbh | Optisches Modul |
| DE102014209153A1 (de) * | 2014-05-14 | 2015-07-02 | Carl Zeiss Smt Gmbh | Optisches Modul |
| DE102014209160A1 (de) * | 2014-05-14 | 2015-11-19 | Carl Zeiss Smt Gmbh | Optisches Modul |
| DE102014212710A1 (de) * | 2014-07-01 | 2016-01-07 | Carl Zeiss Smt Gmbh | Optischer Manipulator, Projektionsobjektiv und Projektionsbelichtungsanlage |
| DE102019200981B3 (de) | 2019-01-25 | 2020-06-25 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage für die Mikrolithographie |
| KR20240055798A (ko) | 2021-09-01 | 2024-04-29 | 코닝 인코포레이티드 | 변형 가능 렌즈 플레이트를 사용한 배율 조정 가능 투사 시스템 |
| EP4427098A1 (en) * | 2021-11-02 | 2024-09-11 | Corning Incorporated | Magnification adjustable projection system using movable lens plates |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59144127A (ja) | 1983-02-07 | 1984-08-18 | Canon Inc | 像調整された光学装置 |
| JPS61278141A (ja) * | 1985-05-31 | 1986-12-09 | Canon Inc | 投影倍率調整方法 |
| US4769680A (en) * | 1987-10-22 | 1988-09-06 | Mrs Technology, Inc. | Apparatus and method for making large area electronic devices, such as flat panel displays and the like, using correlated, aligned dual optical systems |
| US5995263A (en) * | 1993-11-12 | 1999-11-30 | Nikon Corporation | Projection exposure apparatus |
| JPH08124831A (ja) * | 1994-10-25 | 1996-05-17 | Toshiba Corp | 倍率補正装置及びこれを適用した露光装置 |
| US5557469A (en) * | 1994-10-28 | 1996-09-17 | Ultratech Stepper, Inc. | Beamsplitter in single fold optical system and optical variable magnification method and system |
| JPH10133150A (ja) * | 1996-10-29 | 1998-05-22 | Canon Inc | 回折光学装置及びこれを用いた露光装置 |
| US6043863A (en) * | 1996-11-14 | 2000-03-28 | Nikon Corporation | Holder for reflecting member and exposure apparatus having the same |
| JP3352354B2 (ja) * | 1997-04-28 | 2002-12-03 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
| JPH113856A (ja) * | 1997-06-11 | 1999-01-06 | Canon Inc | 投影露光方法及び投影露光装置 |
| JP2000199850A (ja) * | 1999-01-07 | 2000-07-18 | Nikon Corp | 投影光学系及び投影露光装置並びにデバイスの製造方法 |
| CN100526986C (zh) * | 2001-11-21 | 2009-08-12 | 株式会社阿迪泰克工程 | 光学投影曝光设备 |
| TWI267708B (en) * | 2001-11-21 | 2006-12-01 | Adtec Eng Co Ltd | Optical magnification adjustment system and projection exposure device |
| JP2003222795A (ja) * | 2001-11-21 | 2003-08-08 | Adtec Engineeng Co Ltd | 倍率補正光学系 |
| JP2003223003A (ja) * | 2001-11-22 | 2003-08-08 | Adtec Engineeng Co Ltd | 露光装置 |
| JP4368639B2 (ja) * | 2003-08-19 | 2009-11-18 | 株式会社アドテックエンジニアリング | 投影露光装置 |
| JP4195674B2 (ja) | 2004-03-31 | 2008-12-10 | 株式会社オーク製作所 | 投影光学系および投影露光装置 |
| US8009271B2 (en) * | 2004-12-16 | 2011-08-30 | Nikon Corporation | Projection optical system, exposure apparatus, exposure system, and exposure method |
-
2010
- 2010-10-20 US US12/908,392 patent/US8922750B2/en active Active
- 2010-11-10 WO PCT/US2010/056123 patent/WO2011062812A2/en not_active Ceased
- 2010-11-10 CN CN201080052464.7A patent/CN102725696B/zh active Active
- 2010-11-10 JP JP2012539944A patent/JP2013511843A/ja active Pending
- 2010-11-10 EP EP10779623.7A patent/EP2502117B1/en active Active
-
2015
- 2015-05-07 JP JP2015094783A patent/JP2015180945A/ja active Pending
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