CN102725696B - 用于平版印刷成像系统的放大控制 - Google Patents

用于平版印刷成像系统的放大控制 Download PDF

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Publication number
CN102725696B
CN102725696B CN201080052464.7A CN201080052464A CN102725696B CN 102725696 B CN102725696 B CN 102725696B CN 201080052464 A CN201080052464 A CN 201080052464A CN 102725696 B CN102725696 B CN 102725696B
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CN
China
Prior art keywords
deformable plate
magnification
deformable
curvature
plate
Prior art date
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CN201080052464.7A
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English (en)
Chinese (zh)
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CN102725696A (zh
Inventor
R·D·格雷伊达
P·F·米开罗斯基
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Corning Inc
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Corning Inc
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Publication of CN102725696A publication Critical patent/CN102725696A/zh
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B15/00—Optical objectives with means for varying the magnification
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
    • G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
CN201080052464.7A 2009-11-20 2010-11-10 用于平版印刷成像系统的放大控制 Active CN102725696B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US26317809P 2009-11-20 2009-11-20
US61/263,178 2009-11-20
PCT/US2010/056123 WO2011062812A2 (en) 2009-11-20 2010-11-10 Magnification control for lithographic imaging system

Publications (2)

Publication Number Publication Date
CN102725696A CN102725696A (zh) 2012-10-10
CN102725696B true CN102725696B (zh) 2014-12-10

Family

ID=43824739

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201080052464.7A Active CN102725696B (zh) 2009-11-20 2010-11-10 用于平版印刷成像系统的放大控制

Country Status (5)

Country Link
US (1) US8922750B2 (enExample)
EP (1) EP2502117B1 (enExample)
JP (2) JP2013511843A (enExample)
CN (1) CN102725696B (enExample)
WO (1) WO2011062812A2 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9316838B2 (en) * 2011-02-04 2016-04-19 Tseng-Lu Chien LED device has changeable image
JP2013195487A (ja) * 2012-03-16 2013-09-30 Topcon Corp 露光装置
US9529269B2 (en) 2012-05-24 2016-12-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN103105741B (zh) * 2013-01-22 2015-01-21 北京京东方光电科技有限公司 对位补偿装置及曝光装置
DE102014209150A1 (de) * 2014-05-14 2015-07-02 Carl Zeiss Smt Gmbh Optisches Modul
JP6730197B2 (ja) * 2014-05-14 2020-07-29 カール・ツァイス・エスエムティー・ゲーエムベーハー ニアフィールドマニピュレータを有する投影露光装置
DE102014209153A1 (de) * 2014-05-14 2015-07-02 Carl Zeiss Smt Gmbh Optisches Modul
DE102014209151A1 (de) * 2014-05-14 2015-07-02 Carl Zeiss Smt Gmbh Optisches Modul
DE102014209160A1 (de) * 2014-05-14 2015-11-19 Carl Zeiss Smt Gmbh Optisches Modul
DE102014209147A1 (de) * 2014-05-14 2015-11-19 Carl Zeiss Smt Gmbh Optisches Modul
DE102014212710A1 (de) 2014-07-01 2016-01-07 Carl Zeiss Smt Gmbh Optischer Manipulator, Projektionsobjektiv und Projektionsbelichtungsanlage
DE102019200981B3 (de) 2019-01-25 2020-06-25 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Mikrolithographie
KR20240055798A (ko) 2021-09-01 2024-04-29 코닝 인코포레이티드 변형 가능 렌즈 플레이트를 사용한 배율 조정 가능 투사 시스템
WO2023081041A1 (en) * 2021-11-02 2023-05-11 Corning Incorporated Magnification adjustable projection system using movable lens plates

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4676631A (en) * 1985-05-31 1987-06-30 Canon Kabushiki Kaisha Device for adjusting projection magnification
US5557469A (en) * 1994-10-28 1996-09-17 Ultratech Stepper, Inc. Beamsplitter in single fold optical system and optical variable magnification method and system
US6295118B1 (en) * 1996-10-29 2001-09-25 Canon Kabushiki Kaisha Optical arrangement for exposure apparatus
EP1835527A1 (en) * 2004-12-16 2007-09-19 Nikon Corporation Projection optical system, exposure apparatus, exposure system, and exposure method
CN100526986C (zh) * 2001-11-21 2009-08-12 株式会社阿迪泰克工程 光学投影曝光设备
CN100559274C (zh) * 2003-08-19 2009-11-11 株式会社阿迪泰克工程 投影曝光设备

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59144127A (ja) * 1983-02-07 1984-08-18 Canon Inc 像調整された光学装置
US4769680A (en) * 1987-10-22 1988-09-06 Mrs Technology, Inc. Apparatus and method for making large area electronic devices, such as flat panel displays and the like, using correlated, aligned dual optical systems
US5995263A (en) * 1993-11-12 1999-11-30 Nikon Corporation Projection exposure apparatus
JPH08124831A (ja) * 1994-10-25 1996-05-17 Toshiba Corp 倍率補正装置及びこれを適用した露光装置
US6043863A (en) * 1996-11-14 2000-03-28 Nikon Corporation Holder for reflecting member and exposure apparatus having the same
JP3352354B2 (ja) * 1997-04-28 2002-12-03 キヤノン株式会社 露光装置およびデバイス製造方法
JPH113856A (ja) * 1997-06-11 1999-01-06 Canon Inc 投影露光方法及び投影露光装置
JP2000199850A (ja) * 1999-01-07 2000-07-18 Nikon Corp 投影光学系及び投影露光装置並びにデバイスの製造方法
JP2003222795A (ja) * 2001-11-21 2003-08-08 Adtec Engineeng Co Ltd 倍率補正光学系
TWI267708B (en) * 2001-11-21 2006-12-01 Adtec Eng Co Ltd Optical magnification adjustment system and projection exposure device
JP2003223003A (ja) * 2001-11-22 2003-08-08 Adtec Engineeng Co Ltd 露光装置
JP4195674B2 (ja) 2004-03-31 2008-12-10 株式会社オーク製作所 投影光学系および投影露光装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4676631A (en) * 1985-05-31 1987-06-30 Canon Kabushiki Kaisha Device for adjusting projection magnification
US5557469A (en) * 1994-10-28 1996-09-17 Ultratech Stepper, Inc. Beamsplitter in single fold optical system and optical variable magnification method and system
US6295118B1 (en) * 1996-10-29 2001-09-25 Canon Kabushiki Kaisha Optical arrangement for exposure apparatus
CN100526986C (zh) * 2001-11-21 2009-08-12 株式会社阿迪泰克工程 光学投影曝光设备
CN100559274C (zh) * 2003-08-19 2009-11-11 株式会社阿迪泰克工程 投影曝光设备
EP1835527A1 (en) * 2004-12-16 2007-09-19 Nikon Corporation Projection optical system, exposure apparatus, exposure system, and exposure method

Also Published As

Publication number Publication date
EP2502117B1 (en) 2016-03-23
US20110122383A1 (en) 2011-05-26
JP2013511843A (ja) 2013-04-04
EP2502117A2 (en) 2012-09-26
US8922750B2 (en) 2014-12-30
CN102725696A (zh) 2012-10-10
WO2011062812A3 (en) 2011-07-14
JP2015180945A (ja) 2015-10-15
WO2011062812A2 (en) 2011-05-26

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