JP2013511843A - リソグラフィック結像システムの倍率制御 - Google Patents

リソグラフィック結像システムの倍率制御 Download PDF

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Publication number
JP2013511843A
JP2013511843A JP2012539944A JP2012539944A JP2013511843A JP 2013511843 A JP2013511843 A JP 2013511843A JP 2012539944 A JP2012539944 A JP 2012539944A JP 2012539944 A JP2012539944 A JP 2012539944A JP 2013511843 A JP2013511843 A JP 2013511843A
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JP
Japan
Prior art keywords
magnification
plate
projection system
deformation
curvature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2012539944A
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English (en)
Japanese (ja)
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JP2013511843A5 (enExample
Inventor
ディー グレジダ，ロバート
エフ ミカロスキ，ポール
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Corning Inc
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Inc filed Critical Corning Inc
Publication of JP2013511843A publication Critical patent/JP2013511843A/ja
Publication of JP2013511843A5 publication Critical patent/JP2013511843A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B15/00—Optical objectives with means for varying the magnification
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
    • G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
JP2012539944A 2009-11-20 2010-11-10 リソグラフィック結像システムの倍率制御 Pending JP2013511843A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US26317809P 2009-11-20 2009-11-20
US61/263,178 2009-11-20
PCT/US2010/056123 WO2011062812A2 (en) 2009-11-20 2010-11-10 Magnification control for lithographic imaging system

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2015094783A Division JP2015180945A (ja) 2009-11-20 2015-05-07 リソグラフィック結像システムの倍率制御

Publications (2)

Publication Number Publication Date
JP2013511843A true JP2013511843A (ja) 2013-04-04
JP2013511843A5 JP2013511843A5 (enExample) 2015-01-08

Family

ID=43824739

Family Applications (2)

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JP2012539944A Pending JP2013511843A (ja) 2009-11-20 2010-11-10 リソグラフィック結像システムの倍率制御
JP2015094783A Pending JP2015180945A (ja) 2009-11-20 2015-05-07 リソグラフィック結像システムの倍率制御

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2015094783A Pending JP2015180945A (ja) 2009-11-20 2015-05-07 リソグラフィック結像システムの倍率制御

Country Status (5)

Country Link
US (1) US8922750B2 (enExample)
EP (1) EP2502117B1 (enExample)
JP (2) JP2013511843A (enExample)
CN (1) CN102725696B (enExample)
WO (1) WO2011062812A2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017516147A (ja) * 2014-05-14 2017-06-15 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学素子上のアクチュエータ及びセンサ点の最適配置

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9316838B2 (en) * 2011-02-04 2016-04-19 Tseng-Lu Chien LED device has changeable image
JP2013195487A (ja) * 2012-03-16 2013-09-30 Topcon Corp 露光装置
US9529269B2 (en) 2012-05-24 2016-12-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN103105741B (zh) * 2013-01-22 2015-01-21 北京京东方光电科技有限公司 对位补偿装置及曝光装置
DE102014209150A1 (de) * 2014-05-14 2015-07-02 Carl Zeiss Smt Gmbh Optisches Modul
DE102014209153A1 (de) * 2014-05-14 2015-07-02 Carl Zeiss Smt Gmbh Optisches Modul
DE102014209151A1 (de) * 2014-05-14 2015-07-02 Carl Zeiss Smt Gmbh Optisches Modul
DE102014209160A1 (de) * 2014-05-14 2015-11-19 Carl Zeiss Smt Gmbh Optisches Modul
DE102014209147A1 (de) * 2014-05-14 2015-11-19 Carl Zeiss Smt Gmbh Optisches Modul
DE102014212710A1 (de) 2014-07-01 2016-01-07 Carl Zeiss Smt Gmbh Optischer Manipulator, Projektionsobjektiv und Projektionsbelichtungsanlage
DE102019200981B3 (de) 2019-01-25 2020-06-25 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Mikrolithographie
KR20240055798A (ko) 2021-09-01 2024-04-29 코닝 인코포레이티드 변형 가능 렌즈 플레이트를 사용한 배율 조정 가능 투사 시스템
WO2023081041A1 (en) * 2021-11-02 2023-05-11 Corning Incorporated Magnification adjustable projection system using movable lens plates

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59144127A (ja) * 1983-02-07 1984-08-18 Canon Inc 像調整された光学装置
JPS61278141A (ja) * 1985-05-31 1986-12-09 Canon Inc 投影倍率調整方法
JPH08124831A (ja) * 1994-10-25 1996-05-17 Toshiba Corp 倍率補正装置及びこれを適用した露光装置
JPH10133150A (ja) * 1996-10-29 1998-05-22 Canon Inc 回折光学装置及びこれを用いた露光装置
JPH10509561A (ja) * 1994-10-28 1998-09-14 ウルトラテック ステッパー， インコーポレイテッド 単一フォールド光学システムにおけるビームスプリッタならびに光学可変倍率方法およびシステム
JPH113856A (ja) * 1997-06-11 1999-01-06 Canon Inc 投影露光方法及び投影露光装置
JP2000199850A (ja) * 1999-01-07 2000-07-18 Nikon Corp 投影光学系及び投影露光装置並びにデバイスの製造方法
JP2003223003A (ja) * 2001-11-22 2003-08-08 Adtec Engineeng Co Ltd 露光装置
JP2003222795A (ja) * 2001-11-21 2003-08-08 Adtec Engineeng Co Ltd 倍率補正光学系
JP2005062635A (ja) * 2003-08-19 2005-03-10 Adtec Engineeng Co Ltd 投影露光装置
JP2005292450A (ja) * 2004-03-31 2005-10-20 Orc Mfg Co Ltd 投影光学系および投影露光装置
WO2006064728A1 (ja) * 2004-12-16 2006-06-22 Nikon Corporation 投影光学系、露光装置、露光システム及び露光方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4769680A (en) * 1987-10-22 1988-09-06 Mrs Technology, Inc. Apparatus and method for making large area electronic devices, such as flat panel displays and the like, using correlated, aligned dual optical systems
US5995263A (en) * 1993-11-12 1999-11-30 Nikon Corporation Projection exposure apparatus
US6043863A (en) * 1996-11-14 2000-03-28 Nikon Corporation Holder for reflecting member and exposure apparatus having the same
JP3352354B2 (ja) * 1997-04-28 2002-12-03 キヤノン株式会社 露光装置およびデバイス製造方法
TWI267708B (en) * 2001-11-21 2006-12-01 Adtec Eng Co Ltd Optical magnification adjustment system and projection exposure device
CN100526986C (zh) * 2001-11-21 2009-08-12 株式会社阿迪泰克工程 光学投影曝光设备

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59144127A (ja) * 1983-02-07 1984-08-18 Canon Inc 像調整された光学装置
JPS61278141A (ja) * 1985-05-31 1986-12-09 Canon Inc 投影倍率調整方法
JPH08124831A (ja) * 1994-10-25 1996-05-17 Toshiba Corp 倍率補正装置及びこれを適用した露光装置
JPH10509561A (ja) * 1994-10-28 1998-09-14 ウルトラテック ステッパー， インコーポレイテッド 単一フォールド光学システムにおけるビームスプリッタならびに光学可変倍率方法およびシステム
JPH10133150A (ja) * 1996-10-29 1998-05-22 Canon Inc 回折光学装置及びこれを用いた露光装置
JPH113856A (ja) * 1997-06-11 1999-01-06 Canon Inc 投影露光方法及び投影露光装置
JP2000199850A (ja) * 1999-01-07 2000-07-18 Nikon Corp 投影光学系及び投影露光装置並びにデバイスの製造方法
JP2003222795A (ja) * 2001-11-21 2003-08-08 Adtec Engineeng Co Ltd 倍率補正光学系
JP2003223003A (ja) * 2001-11-22 2003-08-08 Adtec Engineeng Co Ltd 露光装置
JP2005062635A (ja) * 2003-08-19 2005-03-10 Adtec Engineeng Co Ltd 投影露光装置
JP2005292450A (ja) * 2004-03-31 2005-10-20 Orc Mfg Co Ltd 投影光学系および投影露光装置
WO2006064728A1 (ja) * 2004-12-16 2006-06-22 Nikon Corporation 投影光学系、露光装置、露光システム及び露光方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017516147A (ja) * 2014-05-14 2017-06-15 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学素子上のアクチュエータ及びセンサ点の最適配置
JP2017518527A (ja) * 2014-05-14 2017-07-06 カール・ツァイス・エスエムティー・ゲーエムベーハー ニアフィールドマニピュレータを有する投影露光装置

Also Published As

Publication number Publication date
EP2502117B1 (en) 2016-03-23
US20110122383A1 (en) 2011-05-26
CN102725696B (zh) 2014-12-10
EP2502117A2 (en) 2012-09-26
US8922750B2 (en) 2014-12-30
CN102725696A (zh) 2012-10-10
WO2011062812A3 (en) 2011-07-14
JP2015180945A (ja) 2015-10-15
WO2011062812A2 (en) 2011-05-26

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