JP5987988B2 - 保管容器 - Google Patents
保管容器 Download PDFInfo
- Publication number
- JP5987988B2 JP5987988B2 JP2015525109A JP2015525109A JP5987988B2 JP 5987988 B2 JP5987988 B2 JP 5987988B2 JP 2015525109 A JP2015525109 A JP 2015525109A JP 2015525109 A JP2015525109 A JP 2015525109A JP 5987988 B2 JP5987988 B2 JP 5987988B2
- Authority
- JP
- Japan
- Prior art keywords
- purge gas
- storage container
- storage
- diffusion member
- supply unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000010926 purge Methods 0.000 claims description 68
- 238000009792 diffusion process Methods 0.000 claims description 30
- 230000004308 accommodation Effects 0.000 description 7
- 238000005192 partition Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 239000000428 dust Substances 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67346—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders characterized by being specially adapted for supporting a single substrate or by comprising a stack of such individual supports
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67389—Closed carriers characterised by atmosphere control
- H01L21/67393—Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Filling Or Discharging Of Gas Storage Vessels (AREA)
Description
Claims (5)
- 物品を収容する収容領域を有する保管部が複数段設けられた保管容器であって、
パージガスを供給する供給部と、
複数の前記保管部が重ねられた状態で複数の前記保管部にわたって連通し、前記供給部から供給された前記パージガスの流路となるダクト部と、
前記ダクト部と前記収容領域とを連通し、前記パージガスを前記収容領域に導入する導入部と、を備え、
前記ダクト部における前記パージガスの流路に、拡散部材が配置されていることを特徴とする保管容器。 - 前記拡散部材は、前記ダクト部の内壁から突出する板状の部材であることを特徴とする請求項1記載の保管容器。
- 前記拡散部材は、前記供給部から供給される前記パージガスの流入方向の延長線上に配置されていることを特徴とする請求項1又は2記載の保管容器。
- 前記拡散部材は、前記供給部の近傍に配置された前記保管部に設けられていることを特徴とする請求項1〜3のいずれか一項記載の保管容器。
- 前記拡散部材は、前記供給部からの距離に応じて、面積が異なっていることを特徴とする請求項2〜4のいずれか一項記載の保管容器。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013139795 | 2013-07-03 | ||
JP2013139795 | 2013-07-03 | ||
PCT/JP2014/064980 WO2015001906A1 (ja) | 2013-07-03 | 2014-06-05 | 保管容器 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP5987988B2 true JP5987988B2 (ja) | 2016-09-07 |
JPWO2015001906A1 JPWO2015001906A1 (ja) | 2017-02-23 |
Family
ID=52143492
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015525109A Active JP5987988B2 (ja) | 2013-07-03 | 2014-06-05 | 保管容器 |
Country Status (8)
Country | Link |
---|---|
US (1) | US9841671B2 (ja) |
EP (1) | EP3018530B1 (ja) |
JP (1) | JP5987988B2 (ja) |
KR (1) | KR101742172B1 (ja) |
CN (1) | CN105324715B (ja) |
SG (1) | SG11201510614TA (ja) |
TW (1) | TWI605303B (ja) |
WO (1) | WO2015001906A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE202019101794U1 (de) * | 2018-06-27 | 2019-10-09 | Murata Machinery, Ltd. | Vorrichtungen zum mindestens einen aus Substrat-Handhabung, Substrat-Lagerung, Substrat-Behandlung und Substrat-Verarbeitung |
DE202019101793U1 (de) * | 2018-06-27 | 2019-10-09 | Murata Machinery, Ltd. | Vorrichtungen zum mindestens einen aus Substrat-Handhabung, Substrat-Lagerung, Substrat-Behandlung und Substrat-Verarbeitung |
JP7213056B2 (ja) * | 2018-10-18 | 2023-01-26 | 東京エレクトロン株式会社 | 基板処理装置及び基板処理方法 |
KR20240096824A (ko) * | 2021-11-08 | 2024-06-26 | 브룩스 오토메이션 (저머니) 게엠베하 | 스토커 시스템 |
US20240160098A1 (en) * | 2022-11-10 | 2024-05-16 | Entegris, Inc. | Reticle container with directed purge flow |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10207042A (ja) * | 1997-01-21 | 1998-08-07 | Nikon Corp | 基板収納容器、基板検出方法、搬送方法及び搬送装置 |
WO1999003139A1 (fr) * | 1997-07-07 | 1999-01-21 | Nikon Corporation | Boitier de rangement et dispositif d'alignement |
JP2008166657A (ja) * | 2007-01-05 | 2008-07-17 | Elpida Memory Inc | バッファ装置および半導体製造装置 |
JP2009541998A (ja) * | 2006-06-19 | 2009-11-26 | インテグリス・インコーポレーテッド | レチクル保管庫をパージするためのシステム |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04215079A (ja) | 1990-12-12 | 1992-08-05 | Advantest Corp | タイミング発生器 |
US5346518A (en) | 1993-03-23 | 1994-09-13 | International Business Machines Corporation | Vapor drain system |
FR2747112B1 (fr) * | 1996-04-03 | 1998-05-07 | Commissariat Energie Atomique | Dispositif de transport d'objets plats et procede de transfert de ces objets entre ledit dispositif et une machine de traitement |
JP3939101B2 (ja) | 2000-12-04 | 2007-07-04 | 株式会社荏原製作所 | 基板搬送方法および基板搬送容器 |
US6899145B2 (en) * | 2003-03-20 | 2005-05-31 | Asm America, Inc. | Front opening unified pod |
US20060185597A1 (en) | 2004-11-29 | 2006-08-24 | Kenji Suzuki | Film precursor evaporation system and method of using |
US7638002B2 (en) | 2004-11-29 | 2009-12-29 | Tokyo Electron Limited | Multi-tray film precursor evaporation system and thin film deposition system incorporating same |
US7708835B2 (en) | 2004-11-29 | 2010-05-04 | Tokyo Electron Limited | Film precursor tray for use in a film precursor evaporation system and method of using |
US7488512B2 (en) | 2004-11-29 | 2009-02-10 | Tokyo Electron Limited | Method for preparing solid precursor tray for use in solid precursor evaporation system |
US7484315B2 (en) | 2004-11-29 | 2009-02-03 | Tokyo Electron Limited | Replaceable precursor tray for use in a multi-tray solid precursor delivery system |
JP4301456B2 (ja) * | 2005-11-30 | 2009-07-22 | Tdk株式会社 | 密閉容器の蓋開閉システム |
JP4960720B2 (ja) * | 2006-02-10 | 2012-06-27 | 東京エレクトロン株式会社 | 膜前駆体蒸発システムにおいて使用される膜前駆体のトレーおよびその使用方法 |
JP4215079B2 (ja) | 2006-07-31 | 2009-01-28 | 村田機械株式会社 | クリーンストッカと物品の保管方法 |
WO2012133441A1 (ja) * | 2011-03-28 | 2012-10-04 | 株式会社日立国際電気 | 基板処理装置、半導体装置の製造方法及び基板処理方法 |
KR101368706B1 (ko) | 2011-07-22 | 2014-02-28 | 주식회사 삼에스코리아 | 웨이퍼 캐리어 |
US9748125B2 (en) * | 2012-01-31 | 2017-08-29 | Applied Materials, Inc. | Continuous substrate processing system |
US10347517B2 (en) * | 2013-10-14 | 2019-07-09 | Entegris, Inc. | Towers for substrate carriers |
-
2014
- 2014-06-05 EP EP14819677.7A patent/EP3018530B1/en active Active
- 2014-06-05 WO PCT/JP2014/064980 patent/WO2015001906A1/ja active Application Filing
- 2014-06-05 US US14/901,956 patent/US9841671B2/en active Active
- 2014-06-05 JP JP2015525109A patent/JP5987988B2/ja active Active
- 2014-06-05 CN CN201480035882.3A patent/CN105324715B/zh active Active
- 2014-06-05 KR KR1020157036737A patent/KR101742172B1/ko active IP Right Grant
- 2014-06-05 SG SG11201510614TA patent/SG11201510614TA/en unknown
- 2014-07-03 TW TW103122961A patent/TWI605303B/zh active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10207042A (ja) * | 1997-01-21 | 1998-08-07 | Nikon Corp | 基板収納容器、基板検出方法、搬送方法及び搬送装置 |
WO1999003139A1 (fr) * | 1997-07-07 | 1999-01-21 | Nikon Corporation | Boitier de rangement et dispositif d'alignement |
JP2009541998A (ja) * | 2006-06-19 | 2009-11-26 | インテグリス・インコーポレーテッド | レチクル保管庫をパージするためのシステム |
JP2008166657A (ja) * | 2007-01-05 | 2008-07-17 | Elpida Memory Inc | バッファ装置および半導体製造装置 |
Also Published As
Publication number | Publication date |
---|---|
EP3018530A1 (en) | 2016-05-11 |
EP3018530B1 (en) | 2020-10-21 |
EP3018530A4 (en) | 2017-01-25 |
KR101742172B1 (ko) | 2017-05-31 |
CN105324715B (zh) | 2019-12-10 |
CN105324715A (zh) | 2016-02-10 |
WO2015001906A1 (ja) | 2015-01-08 |
KR20160015287A (ko) | 2016-02-12 |
US9841671B2 (en) | 2017-12-12 |
TW201506533A (zh) | 2015-02-16 |
SG11201510614TA (en) | 2016-01-28 |
JPWO2015001906A1 (ja) | 2017-02-23 |
US20160202604A1 (en) | 2016-07-14 |
TWI605303B (zh) | 2017-11-11 |
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