SG11201510614TA - Storage container - Google Patents

Storage container

Info

Publication number
SG11201510614TA
SG11201510614TA SG11201510614TA SG11201510614TA SG11201510614TA SG 11201510614T A SG11201510614T A SG 11201510614TA SG 11201510614T A SG11201510614T A SG 11201510614TA SG 11201510614T A SG11201510614T A SG 11201510614TA SG 11201510614T A SG11201510614T A SG 11201510614TA
Authority
SG
Singapore
Prior art keywords
storage container
container
storage
Prior art date
Application number
SG11201510614TA
Inventor
Masahiko Gambe
Original Assignee
Murata Machinery Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Machinery Ltd filed Critical Murata Machinery Ltd
Publication of SG11201510614TA publication Critical patent/SG11201510614TA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67346—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders characterized by being specially adapted for supporting a single substrate or by comprising a stack of such individual supports
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67389—Closed carriers characterised by atmosphere control
    • H01L21/67393—Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
SG11201510614TA 2013-07-03 2014-06-05 Storage container SG11201510614TA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013139795 2013-07-03
PCT/JP2014/064980 WO2015001906A1 (en) 2013-07-03 2014-06-05 Storage container

Publications (1)

Publication Number Publication Date
SG11201510614TA true SG11201510614TA (en) 2016-01-28

Family

ID=52143492

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201510614TA SG11201510614TA (en) 2013-07-03 2014-06-05 Storage container

Country Status (8)

Country Link
US (1) US9841671B2 (en)
EP (1) EP3018530B1 (en)
JP (1) JP5987988B2 (en)
KR (1) KR101742172B1 (en)
CN (1) CN105324715B (en)
SG (1) SG11201510614TA (en)
TW (1) TWI605303B (en)
WO (1) WO2015001906A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE202019101794U1 (en) * 2018-06-27 2019-10-09 Murata Machinery, Ltd. Devices for at least one of substrate handling, substrate storage, substrate treatment, and substrate processing
DE202019101793U1 (en) * 2018-06-27 2019-10-09 Murata Machinery, Ltd. Devices for at least one of substrate handling, substrate storage, substrate treatment, and substrate processing
WO2023078589A1 (en) * 2021-11-08 2023-05-11 Brooks Automation (Germany) Gmbh Stocker system

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04215079A (en) 1990-12-12 1992-08-05 Advantest Corp Timing generator
US5346518A (en) 1993-03-23 1994-09-13 International Business Machines Corporation Vapor drain system
FR2747112B1 (en) * 1996-04-03 1998-05-07 Commissariat Energie Atomique DEVICE FOR TRANSPORTING FLAT OBJECTS AND METHOD FOR TRANSFERRING THESE OBJECTS BETWEEN SAID DEVICE AND A PROCESSING MACHINE
JPH10207042A (en) * 1997-01-21 1998-08-07 Nikon Corp Substrate housing container, detection of substrate, transporting method and transporting device
TW408386B (en) * 1997-07-07 2000-10-11 Nikon Corp Container and lithography system
JP3939101B2 (en) 2000-12-04 2007-07-04 株式会社荏原製作所 Substrate transport method and substrate transport container
US6899145B2 (en) 2003-03-20 2005-05-31 Asm America, Inc. Front opening unified pod
US7708835B2 (en) 2004-11-29 2010-05-04 Tokyo Electron Limited Film precursor tray for use in a film precursor evaporation system and method of using
US7638002B2 (en) 2004-11-29 2009-12-29 Tokyo Electron Limited Multi-tray film precursor evaporation system and thin film deposition system incorporating same
US7484315B2 (en) 2004-11-29 2009-02-03 Tokyo Electron Limited Replaceable precursor tray for use in a multi-tray solid precursor delivery system
US20060185597A1 (en) 2004-11-29 2006-08-24 Kenji Suzuki Film precursor evaporation system and method of using
US7488512B2 (en) 2004-11-29 2009-02-10 Tokyo Electron Limited Method for preparing solid precursor tray for use in solid precursor evaporation system
JP4301456B2 (en) * 2005-11-30 2009-07-22 Ｔｄｋ株式会社 Closed container lid opening and closing system
JP4960720B2 (en) * 2006-02-10 2012-06-27 東京エレクトロン株式会社 Membrane precursor trays used in membrane precursor evaporation systems and methods of use thereof
CN101506087B (en) * 2006-06-19 2011-09-21 诚实公司 System for purging reticle storage
JP4215079B2 (en) 2006-07-31 2009-01-28 村田機械株式会社 Clean stocker and article storage method
JP2008166657A (en) * 2007-01-05 2008-07-17 Elpida Memory Inc Buffer apparatus and semiconductor manufacturing apparatus
WO2012133441A1 (en) 2011-03-28 2012-10-04 株式会社日立国際電気 Substrate processing device, method for manufacturing semiconductor device, and substrate processing method
KR101368706B1 (en) 2011-07-22 2014-02-28 주식회사 삼에스코리아 Wafer carrier
US9748125B2 (en) * 2012-01-31 2017-08-29 Applied Materials, Inc. Continuous substrate processing system
SG10201803039XA (en) * 2013-10-14 2018-05-30 Entegris Inc Towers for substrate carriers

Also Published As

Publication number Publication date
JP5987988B2 (en) 2016-09-07
EP3018530A1 (en) 2016-05-11
WO2015001906A1 (en) 2015-01-08
US20160202604A1 (en) 2016-07-14
TWI605303B (en) 2017-11-11
TW201506533A (en) 2015-02-16
CN105324715A (en) 2016-02-10
EP3018530B1 (en) 2020-10-21
KR20160015287A (en) 2016-02-12
JPWO2015001906A1 (en) 2017-02-23
KR101742172B1 (en) 2017-05-31
CN105324715B (en) 2019-12-10
US9841671B2 (en) 2017-12-12
EP3018530A4 (en) 2017-01-25

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