JP5957788B2 - 単結晶性ビームを伴う一体型半導体デバイスの製造方法、構造、および設計構造 - Google Patents
単結晶性ビームを伴う一体型半導体デバイスの製造方法、構造、および設計構造 Download PDFInfo
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- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1203—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body the substrate comprising an insulating body on a semiconductor body, e.g. SOI
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- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
- H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
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- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
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- H03H9/24—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive
- H03H9/2405—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive of microelectro-mechanical resonators
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Description
Claims (25)
- 絶縁体上のシリコン層から単結晶性ビームを形成すること、
前記単結晶性ビームを覆って絶縁体材料のコーティングを提供すること、
前記絶縁体の下にあるウェハを露出している前記絶縁体材料を介してバイアを形成することであって、前記絶縁体材料が前記単結晶性ビームを覆って残るように、形成すること、
前記バイア内および前記絶縁体材料を覆うように犠牲材料を提供すること、
前記犠牲材料上に蓋を提供すること、および、
前記単結晶性ビームの上に上部キャビティを形成し、前記単結晶性ビームの下の前記ウェハ内に下部キャビティを形成するために、前記蓋を介して、前記犠牲材料および前記単結晶性ビームの下の前記ウェハの一部を放出すること、
を含む、方法。 - 1つまたは複数の浅いトレンチ分離構造によって前記単結晶性ビームから分離された、前記シリコン層内の1つまたは複数のデバイスを形成することをさらに含む、請求項1に記載の方法。
- 前記1つまたは複数のデバイスのうちの少なくとも1つと電気的に接続された、バルク音響波(BAW)フィルタまたはバルク音響共振器(BAR)を形成することをさらに含む、請求項2に記載の方法。
- 前記単結晶性ビームを形成することが、前記シリコン層を覆う金属の層および圧電材料を形成することをさらに含む、請求項1に記載の方法。
- 前記金属層および圧電材料を形成することが、
前記単結晶性ビーム上に絶縁体層を覆う第1の金属層を堆積すること、
前記第1の金属層上に前記圧電材料を堆積すること、
前記圧電材料上に第2の金属層を堆積すること、および、
前記第1の金属層、前記圧電材料、前記第2の金属層、および前記絶縁体層をパターニングすることを含む、請求項4に記載の方法。 - 前記第1の金属層、前記圧電材料、前記第2の金属層、および前記絶縁体層を介して、トレンチを形成することをさらに含み、前記絶縁体材料が、少なくとも前記第1の金属層、前記圧電材料、および前記第2の金属層の露出された部分を覆って形成され、さらに前記トレンチを充填する、請求項5に記載の方法。
- 前記絶縁体材料が、高密度プラズマまたはプラズマ・エンハンスト高密度プラズマ・プロセス、あるいは低圧化学気相堆積(CVD)プロセスを使用して堆積された酸化物である、請求項1に記載の方法。
- 前記絶縁体材料が、前記バイアの形成に先立ち、逆マスクおよびRIEプロセスを使用してパターン化される、請求項1に記載の方法。
- 前記絶縁体材料に、前記バイアの形成に先立ち、酸化物堆積プロセスと共に化学機械研磨(CMP)が施される、請求項8に記載の方法。
- 前記バイアを形成することが、前記バイアの側壁および前記単結晶性ビームの露出部分が前記絶縁体材料内にコーティングされて残るように、前記絶縁体および前記絶縁体材料の一部をエッチングすることを含む、請求項9に記載の方法。
- 前記犠牲材料が、前記バイア内および前記絶縁体材料上に堆積されるシリコンである、請求項1に記載の方法。
- 前記放出することが、前記蓋内に放出ホールを形成すること、前記露出された犠牲材料のすべてをストリップすることになる、前記放出ホールを介してXeF2エッチング液を使用して前記犠牲材料をエッチングすること、ならびに、前記上部キャビティおよび前記下部キャビティの形成後に、前記放出ホールを塞ぐことを含む、請求項1に記載の方法。
- 前記絶縁体材料が、前記放出中に前記単結晶性ビームを保護する、請求項12に記載の方法。
- 前記上部キャビティおよび前記下部キャビティが単一の放出ステップで形成される、請求項1に記載の方法。
- SOI基板の単結晶性シリコン層から単結晶性ビームを形成すること、及びキャビティ形成中に絶縁体材料で前記単結晶性ビームを保護することを含む方法であって、
前記キャビティ形成が、上部キャビティおよび下部キャビティを、それぞれ前記単結晶性ビームの上および下に形成することを含み、
前記上部キャビティが、前記単結晶性ビームの露出部分をコーティングおよび保護する、前記絶縁体材料を覆って形成された犠牲層をエッチングすることによって、前記SOI基板のBOX層の上に形成され、
前記下部キャビティが、前記上部キャビティと前記下部キャビティとの間に形成された接続バイアを介して、バルク基板の一部をエッチングすることによって、前記BOX層の下に形成され、前記接続バイアが、前記単結晶性ビームの前記露出部分をコーティングおよび保護する前記絶縁体材料で裏打ちされている、方法。 - 1つまたは複数の浅いトレンチ分離構造によって前記単結晶性ビームから分離された、前記SOI基板の前記単結晶性シリコン層内の1つまたは複数のデバイスを形成すること、および、
前記1つまたは複数のデバイスのうちの少なくとも1つと電気的に接続された、バルク音響波(BAW)フィルタまたはバルク音響共振器(BAR)を形成すること、
をさらに含む、請求項15に記載の方法。 - 前記単結晶性ビームを形成することが、前記SOI基板の前記単結晶性シリコン層を覆う金属の層および圧電材料を形成することをさらに含み、前記金属層および圧電材料を形成することが、
前記単結晶性ビーム上に形成された絶縁体層を覆う第1の金属層を堆積すること、
前記第1の金属層上に前記圧電材料を堆積すること、
前記圧電材料上に第2の金属層を堆積すること、および、
前記第1の金属層、前記圧電材料、および前記第2の金属層をパターニングすること、
を含む、請求項15に記載の方法。 - 前記第1の金属層、前記圧電材料、前記第2の金属層、および前記絶縁体層を介して、トレンチを形成することをさらに含み、前記絶縁体材料が、前記トレンチ内部、ならびに少なくとも前記第1の金属層、前記圧電材料、および前記第2の金属層の露出された部分を覆って形成される、請求項17に記載の方法。
- 前記接続バイアが、前記バルク基板を露出させるために前記絶縁体材料を介して形成され、前記形成の結果、前記バイアの側壁が前記絶縁体材料でコーティングされる、請求項15に記載の方法。
- 前記絶縁体材料が、高密度プラズマまたはプラズマ・エンハンスト高密度プラズマ・プロセス、あるいは低圧化学気相堆積(CVD)プロセスを使用して堆積された酸化物である、請求項15に記載の方法。
- シリコン・オン・インシュレータ(SOI)基板のシリコン層から形成された単結晶性ビームと、
前記単結晶性ビームをコーティングする絶縁体材料と、
前記絶縁体材料の一部を覆って、前記単結晶性ビームの上に形成された上部キャビティと、
前記単結晶性ビームおよび前記SOI基板のBOX層の下の、前記SOI基板のバルク基板内に形成された下部キャビティと、
前記上部キャビティを前記下部キャビティに接続する接続バイアであって、前記絶縁体材料でコーティングされている、前記接続バイアと、
前記単結晶性ビーム上のバルク音響波(BAW)フィルタまたはバルク音響共振器(BAR)と、
を備える、構造。 - 集積回路の設計、製造、またはシミュレーションで使用される機械による読み取りが可能な設計構造であって、
シリコン・オン・インシュレータ(SOI)基板のシリコン層から形成された単結晶性ビームと、
前記単結晶性ビームをコーティングする絶縁体材料と、
前記絶縁体材料の一部を覆って前記単結晶性ビームの上に形成された上部キャビティと、
前記単結晶性ビームおよび前記SOI基板のBOX層の下の、前記SOI基板のバルク基板内に形成された下部キャビティと、
前記上部キャビティを前記下部キャビティに接続する接続バイアであって、前記絶縁体材料でコーティングされている、前記接続バイアと、
単結晶性ビーム上のバルク音響波(BAW)フィルタまたはバルク音響共振器(BAR)と、
を備える、設計構造。 - 前記設計構造がネットリストを備える、請求項22に記載の設計構造。
- 前記設計構造が、集積回路のレイアウト・データの交換に使用されるデータ形式として、記憶媒体上に常駐する、請求項22に記載の設計構造。
- 前記設計構造がプログラマブル・ゲート・アレイ内に保管される、請求項22に記載の設計構造。
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