JP5948083B2 - 走査電子顕微鏡 - Google Patents

走査電子顕微鏡 Download PDF

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Publication number
JP5948083B2
JP5948083B2 JP2012040863A JP2012040863A JP5948083B2 JP 5948083 B2 JP5948083 B2 JP 5948083B2 JP 2012040863 A JP2012040863 A JP 2012040863A JP 2012040863 A JP2012040863 A JP 2012040863A JP 5948083 B2 JP5948083 B2 JP 5948083B2
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Japan
Prior art keywords
electrons
sample
magnetic field
field generator
monochromator
Prior art date
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Active
Application number
JP2012040863A
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English (en)
Japanese (ja)
Other versions
JP2013178879A (ja
Inventor
渉 森
渉 森
伊藤　博之
博之 伊藤
裕子 笹氣
裕子 笹氣
博実 稲田
博実 稲田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi High Technologies Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Technologies Corp filed Critical Hitachi High Technologies Corp
Priority to JP2012040863A priority Critical patent/JP5948083B2/ja
Priority to US14/379,733 priority patent/US9305745B2/en
Priority to DE112013000704.5T priority patent/DE112013000704T5/de
Priority to PCT/JP2013/053608 priority patent/WO2013129125A1/ja
Publication of JP2013178879A publication Critical patent/JP2013178879A/ja
Application granted granted Critical
Publication of JP5948083B2 publication Critical patent/JP5948083B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2801—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2803—Scanning microscopes characterised by the imaging method
    • H01J2237/2806—Secondary charged particle
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2012040863A 2012-02-28 2012-02-28 走査電子顕微鏡 Active JP5948083B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2012040863A JP5948083B2 (ja) 2012-02-28 2012-02-28 走査電子顕微鏡
US14/379,733 US9305745B2 (en) 2012-02-28 2013-02-15 Scanning electron microscope
DE112013000704.5T DE112013000704T5 (de) 2012-02-28 2013-02-15 Rasterelektronenmikroskop
PCT/JP2013/053608 WO2013129125A1 (ja) 2012-02-28 2013-02-15 走査電子顕微鏡

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012040863A JP5948083B2 (ja) 2012-02-28 2012-02-28 走査電子顕微鏡

Publications (2)

Publication Number Publication Date
JP2013178879A JP2013178879A (ja) 2013-09-09
JP5948083B2 true JP5948083B2 (ja) 2016-07-06

Family

ID=49082327

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012040863A Active JP5948083B2 (ja) 2012-02-28 2012-02-28 走査電子顕微鏡

Country Status (4)

Country Link
US (1) US9305745B2 (de)
JP (1) JP5948083B2 (de)
DE (1) DE112013000704T5 (de)
WO (1) WO2013129125A1 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5663412B2 (ja) * 2011-06-16 2015-02-04 株式会社日立ハイテクノロジーズ 荷電粒子線装置
DE12870629T1 (de) * 2012-03-06 2015-03-19 Vg Scienta Ab Analysatoranordnung für Teilchenspektrometer
US20140361164A1 (en) * 2013-06-07 2014-12-11 Samsung Electronics Co., Ltd. Electron beam inspection apparatus
JP6420905B2 (ja) * 2014-06-27 2018-11-07 ガタン インコーポレイテッドＧａｔａｎ，Ｉｎｃ． 電子エネルギー損失分光器
US9330884B1 (en) * 2014-11-11 2016-05-03 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Dome detection for charged particle beam device
US10297413B2 (en) * 2015-03-10 2019-05-21 North-Western International Cleaner Production Centre Method and device for the production of highly charged ions
US11282671B2 (en) * 2016-07-28 2022-03-22 Hitachi High-Tech Corporation Charged-particle beam apparatus
CN109300760B (zh) * 2017-07-25 2020-10-09 东方晶源微电子科技（北京）有限公司 电子束控制装置和方法、电子束成像模块、电子束检测设备
JP6920539B2 (ja) * 2018-03-23 2021-08-18 株式会社日立ハイテク 走査電子顕微鏡及びその撮像方法
EP4002420A1 (de) * 2020-11-12 2022-05-25 FEI Company Verfahren zur bestimmung der energiebreite eines geladenen teilchenstrahls
CN114486961A (zh) * 2022-01-25 2022-05-13 上海交通大学 多能段易操控超快电子衍射装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3532699A1 (de) * 1985-09-13 1987-03-26 Zeiss Carl Fa Elektronenenergiefilter vom omega-typ
JPH09270241A (ja) 1996-04-01 1997-10-14 Jeol Ltd 走査電子顕微鏡
DE19746785A1 (de) * 1997-10-23 1999-04-29 Leo Elektronenmikroskopie Gmbh Teilchenstrahlgerät mit Energiefilter
JP3441955B2 (ja) * 1998-02-23 2003-09-02 株式会社日立製作所 投射方式の荷電粒子顕微鏡および基板検査システム
US6610980B2 (en) * 2000-05-15 2003-08-26 Kla-Tencor Corporation Apparatus for inspection of semiconductor wafers and masks using a low energy electron microscope with two illuminating beams
DE10235981B9 (de) * 2002-08-06 2009-01-22 Leo Elektronenmikroskopie Gmbh Teilchenoptische Vorrichtung und Elektronenmikroskop
US7022987B2 (en) * 2001-02-20 2006-04-04 Carl Zeiss Nis Gmbh Particle-optical arrangements and particle-optical systems
DE10236738B9 (de) * 2002-08-09 2010-07-15 Carl Zeiss Nts Gmbh Elektronenmikroskopiesystem und Elektronenmikroskopieverfahren
JP4685637B2 (ja) 2006-01-05 2011-05-18 株式会社日立ハイテクノロジーズ モノクロメータを備えた走査電子顕微鏡
JP5280238B2 (ja) * 2009-02-09 2013-09-04 日本電子株式会社 荷電粒子ビーム装置

Also Published As

Publication number Publication date
JP2013178879A (ja) 2013-09-09
DE112013000704T5 (de) 2014-10-09
US20150034824A1 (en) 2015-02-05
US9305745B2 (en) 2016-04-05
WO2013129125A1 (ja) 2013-09-06

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