JP5936487B2 - アモルファス合金、成形用型および光学素子の製造方法 - Google Patents
アモルファス合金、成形用型および光学素子の製造方法 Download PDFInfo
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- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
- C03B11/084—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
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- C22C1/11—Making amorphous alloys
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- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/16—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of other metals or alloys based thereon
- C22F1/18—High-melting or refractory metals or alloys based thereon
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
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- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/10—Die base materials
- C03B2215/12—Ceramics or cermets, e.g. cemented WC, Al2O3 or TiC
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/14—Die top coat materials, e.g. materials for the glass-contacting layers
- C03B2215/16—Metals or alloys, e.g. Ni-P, Ni-B, amorphous metals
- C03B2215/17—Metals or alloys, e.g. Ni-P, Ni-B, amorphous metals comprising one or more of the noble meals, i.e. Ag, Au, platinum group metals
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/30—Intermediate layers, e.g. graded zone of base/top material
- C03B2215/31—Two or more distinct intermediate layers or zones
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/30—Intermediate layers, e.g. graded zone of base/top material
- C03B2215/32—Intermediate layers, e.g. graded zone of base/top material of metallic or silicon material
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/30—Intermediate layers, e.g. graded zone of base/top material
- C03B2215/34—Intermediate layers, e.g. graded zone of base/top material of ceramic or cermet material, e.g. diamond-like carbon
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C14/00—Alloys based on titanium
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C2204/00—End product comprising different layers, coatings or parts of cermet
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
- C22C27/02—Alloys based on vanadium, niobium, or tantalum
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
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- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Physical Vapour Deposition (AREA)
Description
以下に本発明に関わるアモルファス合金膜とそれを用いた成形型の実施例を示す。
アモルファス合金の原料として、Reには直径76.2mm(3インチ)、純度99.9%の焼結Reターゲット材を用いた。Nbには直径76.2mm(3インチ)、純度99.9%の溶融Nbターゲット材を用いた。Irには直径76.2mm(3インチ)、純度99.9%の焼結Irターゲット材を用いた。これらターゲット材と実施形態で述べた成膜プロセスを用いて合金膜を成膜した。
表1に示す様に、Reが54at%以上79at%以下、Irが8at%以上28at%以下、Nbが11at%以上18at%以下からなるアモルファス合金を用いることで、前述の実施例1、2と同様に硬度が18GPa以上であるアモルファス合金が得られる。
本発明の効果を示すため、Re−Ir−Nbの組成が、本発明の組成から外れた組成である比較例1から12の結果を表2に示す。組成はULVAC−PHI社製XPS装置:PHI Quantera SXMによる測定である。硬度はAgilent Technologies, Incのナノインデンターによる測定である。結晶性はフィリップス社X’pertのθ−2θ法による測定である。比較例では合金の結晶化や、硬度不足が生じることが判る。合金がアモルファスであると化学的安定性を有するが、合金が結晶化すると化学的安定性が失われてしまう。
11 超硬基材
12 Ti層
13 TiN層
14 離型膜
20 スパッタリング装置
21 真空チャンバー
22 基板ホルダー
23 ハロゲンランプヒーター
24 熱電対温度計
25 Reターゲット
26 Hfターゲット
215 DCバイアス電源
50 成形機
51 チャンバー
52 硝子プリフォーム
53 ヒーター
54 軸
55 胴型
56 支持台
Claims (3)
- Reが54at%以上79at%以下、Irが8at%以上28at%以下、Nbが11at%以上18at%以下からなることを特徴とするアモルファス合金。
- 請求項1に記載のアモルファス合金からなる離型膜を有することを特徴とする成形用型。
- 請求項2に記載の成形用型を用いて、硝子プリフォームをプレスして成形する工程を有することを特徴とする光学素子の製造方法。
Priority Applications (2)
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JP2012183950A JP5936487B2 (ja) | 2012-08-23 | 2012-08-23 | アモルファス合金、成形用型および光学素子の製造方法 |
US13/972,746 US9102561B2 (en) | 2012-08-23 | 2013-08-21 | Amorphous alloy, molding die, and method for producing optical element |
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JP2012183950A JP5936487B2 (ja) | 2012-08-23 | 2012-08-23 | アモルファス合金、成形用型および光学素子の製造方法 |
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JP2014040642A JP2014040642A (ja) | 2014-03-06 |
JP5936487B2 true JP5936487B2 (ja) | 2016-06-22 |
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JP (1) | JP5936487B2 (ja) |
Families Citing this family (2)
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JP5930725B2 (ja) * | 2012-01-17 | 2016-06-08 | キヤノン株式会社 | アモルファス合金、成形用型および光学素子の成形方法 |
US10968505B2 (en) * | 2015-06-22 | 2021-04-06 | Tohoku University | Process for producing molded material, molded material, wavefront control element and diffraction grating |
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JPS60243242A (ja) * | 1984-05-16 | 1985-12-03 | Pilot Pen Co Ltd:The | 耐摩耗性Re合金の焼結体およびその製造方法 |
JPS60246230A (ja) | 1984-05-17 | 1985-12-05 | Matsushita Electric Ind Co Ltd | 光学ガラス素子のプレス成形用型 |
US6830827B2 (en) * | 2000-03-07 | 2004-12-14 | Ebara Corporation | Alloy coating, method for forming the same, and member for high temperature apparatuses |
JP2003073134A (ja) * | 2001-08-31 | 2003-03-12 | Canon Inc | 光学素子の成形方法及び成形型 |
JP2006225190A (ja) * | 2005-02-16 | 2006-08-31 | Pentax Corp | 光学ガラス素子成形用金型及びその製造方法 |
JP4690100B2 (ja) * | 2005-04-14 | 2011-06-01 | Hoya株式会社 | ガラス光学素子用成形型およびガラス光学素子の製造方法 |
US7704335B2 (en) * | 2005-07-26 | 2010-04-27 | General Electric Company | Refractory metal intermetallic composites based on niobium-silicides, and related articles |
DE112006002822B4 (de) | 2005-10-19 | 2013-07-25 | Tokyo Institute Of Technology | Korrosions- und wärmebeständige Metalllegierung für eine Formmatrize und daraus hergestellte Matrize |
JP4959306B2 (ja) * | 2006-02-23 | 2012-06-20 | 東海ゴム工業株式会社 | ガラス成形型 |
US20080166596A1 (en) * | 2007-01-08 | 2008-07-10 | Heraeus Inc. | Re-based alloys usable as deposition targets for forming interlayers in granular perpendicular magnetic recording media & media utilizing said alloys |
JP5376984B2 (ja) * | 2008-02-15 | 2013-12-25 | 東芝機械株式会社 | ガラス成形用金型 |
JP5570047B2 (ja) * | 2009-08-21 | 2014-08-13 | 株式会社オハラ | 光学ガラス素子成形用金型およびその製造方法 |
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US20140053606A1 (en) | 2014-02-27 |
JP2014040642A (ja) | 2014-03-06 |
US9102561B2 (en) | 2015-08-11 |
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