JP5934501B2 - 走査電子線装置およびそれを用いた寸法計測方法 - Google Patents

走査電子線装置およびそれを用いた寸法計測方法 Download PDF

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Publication number
JP5934501B2
JP5934501B2 JP2011271863A JP2011271863A JP5934501B2 JP 5934501 B2 JP5934501 B2 JP 5934501B2 JP 2011271863 A JP2011271863 A JP 2011271863A JP 2011271863 A JP2011271863 A JP 2011271863A JP 5934501 B2 JP5934501 B2 JP 5934501B2
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Japan
Prior art keywords
wafer
electron beam
height
objective lens
acceleration voltage
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JP2011271863A
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English (en)
Japanese (ja)
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JP2013125583A5 (https=
JP2013125583A (ja
Inventor
矢野　資
資 矢野
早田　康成
康成 早田
福田　宗行
宗行 福田
勝則 小貫
勝則 小貫
源 川野
川野　　源
直正 鈴木
直正 鈴木
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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Priority to JP2011271863A priority Critical patent/JP5934501B2/ja
Priority to US14/364,392 priority patent/US9644955B2/en
Priority to PCT/JP2012/080509 priority patent/WO2013088944A1/ja
Publication of JP2013125583A publication Critical patent/JP2013125583A/ja
Publication of JP2013125583A5 publication Critical patent/JP2013125583A5/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/21—Means for adjusting the focus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/20—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by the properties tested or measured, e.g. structural or electrical properties
    • H10P74/203—Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2210/00—Aspects not specifically covered by any group under G01B, e.g. of wheel alignment, caliper-like sensors
    • G01B2210/56—Measuring geometric parameters of semiconductor structures, e.g. profile, critical dimensions or trench depth
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2809—Scanning microscopes characterised by the imaging problems involved
    • H01J2237/281—Bottom of trenches or holes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
JP2011271863A 2011-12-13 2011-12-13 走査電子線装置およびそれを用いた寸法計測方法 Active JP5934501B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2011271863A JP5934501B2 (ja) 2011-12-13 2011-12-13 走査電子線装置およびそれを用いた寸法計測方法
US14/364,392 US9644955B2 (en) 2011-12-13 2012-11-26 Scanning electron beam device with focus adjustment based on acceleration voltage and dimension measurement method using same
PCT/JP2012/080509 WO2013088944A1 (ja) 2011-12-13 2012-11-26 走査電子線装置およびそれを用いた寸法計測方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011271863A JP5934501B2 (ja) 2011-12-13 2011-12-13 走査電子線装置およびそれを用いた寸法計測方法

Publications (3)

Publication Number Publication Date
JP2013125583A JP2013125583A (ja) 2013-06-24
JP2013125583A5 JP2013125583A5 (https=) 2014-11-27
JP5934501B2 true JP5934501B2 (ja) 2016-06-15

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JP2011271863A Active JP5934501B2 (ja) 2011-12-13 2011-12-13 走査電子線装置およびそれを用いた寸法計測方法

Country Status (3)

Country Link
US (1) US9644955B2 (https=)
JP (1) JP5934501B2 (https=)
WO (1) WO2013088944A1 (https=)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014074649A1 (en) 2012-11-06 2014-05-15 Purdue Research Foundation Methods for directed irradiation synthesis with ion and thermal beams
JP5965851B2 (ja) * 2013-02-15 2016-08-10 株式会社日立ハイテクノロジーズ 試料観察装置
JP6230831B2 (ja) * 2013-07-08 2017-11-15 株式会社日立ハイテクノロジーズ 荷電粒子線装置および画像取得方法
US9958257B2 (en) * 2015-09-21 2018-05-01 Kla-Tencor Corporation Increasing dynamic range of a height sensor for inspection and metrology
JP7040927B2 (ja) * 2017-12-01 2022-03-23 株式会社日立ハイテク 荷電粒子線装置、及び荷電粒子線装置における撮像条件調整方法
US12505974B2 (en) * 2018-12-28 2025-12-23 Asml Netherlands B.V. Systems and methods for focusing charged—particle beams
JP7154593B2 (ja) * 2019-02-15 2022-10-18 株式会社日立ハイテクサイエンス 複合荷電粒子ビーム装置、及び制御方法
JP7308581B2 (ja) * 2019-10-18 2023-07-14 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置、複合荷電粒子ビーム装置、及び荷電粒子ビーム装置の制御方法
JP7342696B2 (ja) * 2019-12-26 2023-09-12 株式会社ニューフレアテクノロジー 電子ビーム検査装置
JP7455676B2 (ja) 2020-06-05 2024-03-26 株式会社日立ハイテク 電子顕微鏡および電子顕微鏡のフォーカス調整方法
JP2022021104A (ja) * 2020-07-21 2022-02-02 株式会社日立ハイテク 荷電粒子線装置
US20240071713A1 (en) * 2020-12-30 2024-02-29 Asml Netherlands B.V. Dual focus soluton for sem metrology tools
CN119826746B (zh) * 2025-01-07 2025-10-24 芯恩（青岛）集成电路有限公司 机台载具平整度量测方法及装置、存储介质和终端

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5594245A (en) * 1990-10-12 1997-01-14 Hitachi, Ltd. Scanning electron microscope and method for dimension measuring by using the same
JPH04269613A (ja) * 1991-02-25 1992-09-25 Nippon Telegr & Teleph Corp <Ntt> 荷電ビームの焦点合わせ方法
JPH1186769A (ja) * 1997-09-02 1999-03-30 Nikon Corp 走査電子顕微鏡の自動焦点合わせ装置および方法
JP3429988B2 (ja) * 1997-10-30 2003-07-28 株式会社日立製作所 走査電子顕微鏡
EP1143822B1 (en) * 1998-12-31 2004-03-03 Meang K. Chia Decorative jewelry article
JP4727777B2 (ja) 1999-05-24 2011-07-20 株式会社日立製作所 走査形電子顕微鏡による測長方法
JP3684943B2 (ja) * 1999-10-19 2005-08-17 株式会社日立製作所 ビーム走査形検査装置
US6521891B1 (en) 1999-09-03 2003-02-18 Applied Materials, Inc. Focusing method and system
JP3951590B2 (ja) * 2000-10-27 2007-08-01 株式会社日立製作所 荷電粒子線装置
JP4587742B2 (ja) * 2004-08-23 2010-11-24 株式会社日立ハイテクノロジーズ 荷電粒子線顕微方法及び荷電粒子線応用装置
JP5075431B2 (ja) * 2007-02-28 2012-11-21 株式会社日立ハイテクノロジーズ 帯電測定方法、焦点調整方法、及び走査電子顕微鏡
JP5474312B2 (ja) * 2007-06-20 2014-04-16 株式会社日立ハイテクノロジーズ 荷電粒子ビーム装置及びその制御方法
JP4357567B2 (ja) * 2008-01-07 2009-11-04 株式会社日立製作所 走査形電子顕微鏡による測長方法

Also Published As

Publication number Publication date
WO2013088944A1 (ja) 2013-06-20
US20140339425A1 (en) 2014-11-20
US9644955B2 (en) 2017-05-09
JP2013125583A (ja) 2013-06-24

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